CA2613195A1 - Matrices et detecteurs haute sensibilite, haute resolution - Google Patents
Matrices et detecteurs haute sensibilite, haute resolution Download PDFInfo
- Publication number
- CA2613195A1 CA2613195A1 CA002613195A CA2613195A CA2613195A1 CA 2613195 A1 CA2613195 A1 CA 2613195A1 CA 002613195 A CA002613195 A CA 002613195A CA 2613195 A CA2613195 A CA 2613195A CA 2613195 A1 CA2613195 A1 CA 2613195A1
- Authority
- CA
- Canada
- Prior art keywords
- layer
- avalanche
- integrator
- governor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000003491 array Methods 0.000 title abstract description 7
- 230000035945 sensitivity Effects 0.000 title description 13
- 239000000758 substrate Substances 0.000 claims abstract description 188
- 238000000034 method Methods 0.000 claims abstract description 55
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- 239000000463 material Substances 0.000 claims description 163
- 239000004065 semiconductor Substances 0.000 claims description 126
- 239000000969 carrier Substances 0.000 claims description 55
- 230000000903 blocking effect Effects 0.000 claims description 33
- 230000006870 function Effects 0.000 claims description 30
- 230000004888 barrier function Effects 0.000 claims description 29
- 239000012212 insulator Substances 0.000 claims description 13
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 12
- 239000006096 absorbing agent Substances 0.000 claims description 11
- 239000002800 charge carrier Substances 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 9
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- 239000003989 dielectric material Substances 0.000 claims description 4
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 230000004297 night vision Effects 0.000 claims 1
- 238000013461 design Methods 0.000 abstract description 29
- 230000003321 amplification Effects 0.000 abstract description 17
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- 230000002441 reversible effect Effects 0.000 abstract description 5
- 230000007123 defense Effects 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 47
- 108091006146 Channels Proteins 0.000 description 39
- 229910052681 coesite Inorganic materials 0.000 description 39
- 229910052906 cristobalite Inorganic materials 0.000 description 39
- 229910052682 stishovite Inorganic materials 0.000 description 39
- 229910052905 tridymite Inorganic materials 0.000 description 39
- 230000005684 electric field Effects 0.000 description 16
- 239000002184 metal Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
- 230000031700 light absorption Effects 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 239000004020 conductor Substances 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 230000008901 benefit Effects 0.000 description 8
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- 238000002347 injection Methods 0.000 description 8
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- 238000005286 illumination Methods 0.000 description 3
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- 238000002513 implantation Methods 0.000 description 3
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- 101000822633 Pseudomonas sp 3-succinoylsemialdehyde-pyridine dehydrogenase Proteins 0.000 description 2
- 229910008062 Si-SiO2 Inorganic materials 0.000 description 2
- 229910006403 Si—SiO2 Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
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- 239000002245 particle Substances 0.000 description 2
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- 239000000126 substance Substances 0.000 description 2
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- 230000005641 tunneling Effects 0.000 description 2
- 229910020169 SiOa Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
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- 230000033228 biological regulation Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000002032 lab-on-a-chip Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J47/00—Tubes for determining the presence, intensity, density or energy of radiation or particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Light Receiving Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68941705P | 2005-06-10 | 2005-06-10 | |
US60/689,417 | 2005-06-10 | ||
US69193105P | 2005-06-17 | 2005-06-17 | |
US60/691,931 | 2005-06-17 | ||
PCT/US2006/022316 WO2006135683A2 (fr) | 2005-06-10 | 2006-06-10 | Matrices et detecteurs haute sensibilite, haute resolution |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2613195A1 true CA2613195A1 (fr) | 2006-12-21 |
Family
ID=37532813
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002613195A Abandoned CA2613195A1 (fr) | 2005-06-10 | 2006-06-10 | Matrices et detecteurs haute sensibilite, haute resolution |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1894223A2 (fr) |
JP (1) | JP2008544496A (fr) |
KR (1) | KR20080074084A (fr) |
CA (1) | CA2613195A1 (fr) |
IL (1) | IL188040A0 (fr) |
RU (1) | RU2406181C2 (fr) |
WO (1) | WO2006135683A2 (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4413940B2 (ja) | 2007-03-22 | 2010-02-10 | 株式会社東芝 | 固体撮像素子、単板カラー固体撮像素子及び電子機器 |
DE102011077383A1 (de) * | 2011-06-10 | 2012-12-13 | Siemens Aktiengesellschaft | Anordnung von zwei oder mehr Halbleiterbauelementen |
JP6090060B2 (ja) * | 2013-08-23 | 2017-03-08 | 株式会社豊田中央研究所 | シングルフォトンアバランシェダイオード |
RU2641620C1 (ru) * | 2016-09-20 | 2018-01-18 | Общество с ограниченной ответственностью "ДЕтектор Фотонный Аналоговый" | Лавинный фотодетектор |
JP2017005276A (ja) * | 2016-09-30 | 2017-01-05 | 株式会社豊田中央研究所 | シングルフォトンアバランシェダイオード |
US11089251B2 (en) * | 2018-07-12 | 2021-08-10 | Canon Kabushiki Kaisha | Image sensor and image capturing apparatus |
RU2731665C1 (ru) * | 2019-03-12 | 2020-09-07 | Общество С Ограниченной Ответственностью "Детектор Фотонный Аналоговый" (Ооо "Дефан") | Лавинный фотодетектор (варианты) и способ его изготовления (варианты) |
RU2732695C1 (ru) * | 2019-03-12 | 2020-09-21 | Общество С Ограниченной Ответственностью "Детектор Фотонный Аналоговый" (Ооо "Дефан") | Лавинный фотодетектор (варианты) и способ его изготовления (варианты) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3806772A (en) * | 1972-02-07 | 1974-04-23 | Fairchild Camera Instr Co | Charge coupled amplifier |
US5610416A (en) * | 1995-02-16 | 1997-03-11 | Hewlett-Packard Company | Avalanche photodiode with epitaxially regrown guard rings |
US6642650B1 (en) * | 1998-11-10 | 2003-11-04 | Agfa-Gevaert | Refusable personal monitoring device |
GB2367945B (en) * | 2000-08-16 | 2004-10-20 | Secr Defence | Photodetector circuit |
ATE507585T1 (de) * | 2000-10-19 | 2011-05-15 | Quantum Semiconductor Llc | Verfahren zur herstellung von mit cmos integrierten heteroübergang-photodioden |
US6885827B2 (en) * | 2002-07-30 | 2005-04-26 | Amplification Technologies, Inc. | High sensitivity, high resolution detection of signals |
US20040245592A1 (en) * | 2003-05-01 | 2004-12-09 | Yale University | Solid state microchannel plate photodetector |
-
2006
- 2006-06-10 RU RU2008100029/07A patent/RU2406181C2/ru not_active IP Right Cessation
- 2006-06-10 CA CA002613195A patent/CA2613195A1/fr not_active Abandoned
- 2006-06-10 EP EP06772574A patent/EP1894223A2/fr not_active Withdrawn
- 2006-06-10 JP JP2008515920A patent/JP2008544496A/ja active Pending
- 2006-06-10 WO PCT/US2006/022316 patent/WO2006135683A2/fr active Application Filing
- 2006-06-10 KR KR1020087000807A patent/KR20080074084A/ko not_active Application Discontinuation
-
2007
- 2007-12-10 IL IL188040A patent/IL188040A0/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO2006135683A2 (fr) | 2006-12-21 |
WO2006135683A3 (fr) | 2007-03-22 |
KR20080074084A (ko) | 2008-08-12 |
JP2008544496A (ja) | 2008-12-04 |
RU2406181C2 (ru) | 2010-12-10 |
EP1894223A2 (fr) | 2008-03-05 |
IL188040A0 (en) | 2008-03-20 |
RU2008100029A (ru) | 2009-07-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
FZDE | Discontinued |
Effective date: 20130611 |