CA2613195A1 - Matrices et detecteurs haute sensibilite, haute resolution - Google Patents

Matrices et detecteurs haute sensibilite, haute resolution Download PDF

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Publication number
CA2613195A1
CA2613195A1 CA002613195A CA2613195A CA2613195A1 CA 2613195 A1 CA2613195 A1 CA 2613195A1 CA 002613195 A CA002613195 A CA 002613195A CA 2613195 A CA2613195 A CA 2613195A CA 2613195 A1 CA2613195 A1 CA 2613195A1
Authority
CA
Canada
Prior art keywords
layer
avalanche
integrator
governor
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002613195A
Other languages
English (en)
Inventor
Dmitry A. Shushakov
Vitaly E. Shubin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Amplification Technologies Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2613195A1 publication Critical patent/CA2613195A1/fr
Abandoned legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101Devices sensitive to infrared, visible or ultraviolet radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/107Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J47/00Tubes for determining the presence, intensity, density or energy of radiation or particles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14603Special geometry or disposition of pixel-elements, address-lines or gate-electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Light Receiving Elements (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Solid State Image Pick-Up Elements (AREA)
CA002613195A 2005-06-10 2006-06-10 Matrices et detecteurs haute sensibilite, haute resolution Abandoned CA2613195A1 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US68941705P 2005-06-10 2005-06-10
US60/689,417 2005-06-10
US69193105P 2005-06-17 2005-06-17
US60/691,931 2005-06-17
PCT/US2006/022316 WO2006135683A2 (fr) 2005-06-10 2006-06-10 Matrices et detecteurs haute sensibilite, haute resolution

Publications (1)

Publication Number Publication Date
CA2613195A1 true CA2613195A1 (fr) 2006-12-21

Family

ID=37532813

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002613195A Abandoned CA2613195A1 (fr) 2005-06-10 2006-06-10 Matrices et detecteurs haute sensibilite, haute resolution

Country Status (7)

Country Link
EP (1) EP1894223A2 (fr)
JP (1) JP2008544496A (fr)
KR (1) KR20080074084A (fr)
CA (1) CA2613195A1 (fr)
IL (1) IL188040A0 (fr)
RU (1) RU2406181C2 (fr)
WO (1) WO2006135683A2 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4413940B2 (ja) 2007-03-22 2010-02-10 株式会社東芝 固体撮像素子、単板カラー固体撮像素子及び電子機器
DE102011077383A1 (de) * 2011-06-10 2012-12-13 Siemens Aktiengesellschaft Anordnung von zwei oder mehr Halbleiterbauelementen
JP6090060B2 (ja) * 2013-08-23 2017-03-08 株式会社豊田中央研究所 シングルフォトンアバランシェダイオード
RU2641620C1 (ru) * 2016-09-20 2018-01-18 Общество с ограниченной ответственностью "ДЕтектор Фотонный Аналоговый" Лавинный фотодетектор
JP2017005276A (ja) * 2016-09-30 2017-01-05 株式会社豊田中央研究所 シングルフォトンアバランシェダイオード
US11089251B2 (en) * 2018-07-12 2021-08-10 Canon Kabushiki Kaisha Image sensor and image capturing apparatus
RU2731665C1 (ru) * 2019-03-12 2020-09-07 Общество С Ограниченной Ответственностью "Детектор Фотонный Аналоговый" (Ооо "Дефан") Лавинный фотодетектор (варианты) и способ его изготовления (варианты)
RU2732695C1 (ru) * 2019-03-12 2020-09-21 Общество С Ограниченной Ответственностью "Детектор Фотонный Аналоговый" (Ооо "Дефан") Лавинный фотодетектор (варианты) и способ его изготовления (варианты)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3806772A (en) * 1972-02-07 1974-04-23 Fairchild Camera Instr Co Charge coupled amplifier
US5610416A (en) * 1995-02-16 1997-03-11 Hewlett-Packard Company Avalanche photodiode with epitaxially regrown guard rings
US6642650B1 (en) * 1998-11-10 2003-11-04 Agfa-Gevaert Refusable personal monitoring device
GB2367945B (en) * 2000-08-16 2004-10-20 Secr Defence Photodetector circuit
ATE507585T1 (de) * 2000-10-19 2011-05-15 Quantum Semiconductor Llc Verfahren zur herstellung von mit cmos integrierten heteroübergang-photodioden
US6885827B2 (en) * 2002-07-30 2005-04-26 Amplification Technologies, Inc. High sensitivity, high resolution detection of signals
US20040245592A1 (en) * 2003-05-01 2004-12-09 Yale University Solid state microchannel plate photodetector

Also Published As

Publication number Publication date
WO2006135683A2 (fr) 2006-12-21
WO2006135683A3 (fr) 2007-03-22
KR20080074084A (ko) 2008-08-12
JP2008544496A (ja) 2008-12-04
RU2406181C2 (ru) 2010-12-10
EP1894223A2 (fr) 2008-03-05
IL188040A0 (en) 2008-03-20
RU2008100029A (ru) 2009-07-20

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued

Effective date: 20130611