CA2590080A1 - Depot electrochimique de tantale et/ou de cuivre dans des liquides ioniques - Google Patents
Depot electrochimique de tantale et/ou de cuivre dans des liquides ioniques Download PDFInfo
- Publication number
- CA2590080A1 CA2590080A1 CA002590080A CA2590080A CA2590080A1 CA 2590080 A1 CA2590080 A1 CA 2590080A1 CA 002590080 A CA002590080 A CA 002590080A CA 2590080 A CA2590080 A CA 2590080A CA 2590080 A1 CA2590080 A1 CA 2590080A1
- Authority
- CA
- Canada
- Prior art keywords
- tantalum
- imidazolium
- methyl
- copper
- hydroxypropyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000010949 copper Substances 0.000 title claims abstract description 56
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 52
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 52
- 229910052715 tantalum Inorganic materials 0.000 title claims abstract description 49
- 239000002608 ionic liquid Substances 0.000 title claims abstract description 37
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 11
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title claims abstract 11
- 238000000034 method Methods 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 13
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims abstract description 9
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 8
- 125000005207 tetraalkylammonium group Chemical group 0.000 claims abstract description 7
- 125000005497 tetraalkylphosphonium group Chemical group 0.000 claims abstract description 7
- 229940108928 copper Drugs 0.000 claims description 50
- 238000000151 deposition Methods 0.000 claims description 32
- 230000008569 process Effects 0.000 claims description 31
- 230000008021 deposition Effects 0.000 claims description 29
- 239000007983 Tris buffer Substances 0.000 claims description 16
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 229910001431 copper ion Inorganic materials 0.000 claims description 11
- JFZKOODUSFUFIZ-UHFFFAOYSA-N trifluoro phosphate Chemical compound FOP(=O)(OF)OF JFZKOODUSFUFIZ-UHFFFAOYSA-N 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 150000001450 anions Chemical class 0.000 claims description 8
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- PXELHGDYRQLRQO-UHFFFAOYSA-N 1-butyl-1-methylpyrrolidin-1-ium Chemical compound CCCC[N+]1(C)CCCC1 PXELHGDYRQLRQO-UHFFFAOYSA-N 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 150000003949 imides Chemical class 0.000 claims description 6
- 150000003481 tantalum Chemical class 0.000 claims description 6
- 229910001460 tantalum ion Inorganic materials 0.000 claims description 6
- SVONMDAUOJGXHL-UHFFFAOYSA-N 1-hexyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(C)CCCC1 SVONMDAUOJGXHL-UHFFFAOYSA-N 0.000 claims description 5
- JWPBORWCDZAHAU-UHFFFAOYSA-N 1-methyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(C)CCCC1 JWPBORWCDZAHAU-UHFFFAOYSA-N 0.000 claims description 5
- ZGZLRWJZGFRHHQ-UHFFFAOYSA-N 2-(3-methylimidazol-3-ium-1-yl)ethanol Chemical compound CN1C=C[N+](CCO)=C1 ZGZLRWJZGFRHHQ-UHFFFAOYSA-N 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 5
- 229910001515 alkali metal fluoride Inorganic materials 0.000 claims description 5
- 229910001618 alkaline earth metal fluoride Inorganic materials 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims description 5
- LGRLWUINFJPLSH-UHFFFAOYSA-N methanide Chemical compound [CH3-] LGRLWUINFJPLSH-UHFFFAOYSA-N 0.000 claims description 5
- JKOADRMSALOJAG-UHFFFAOYSA-N 1,1-dihexylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCCCCC)CCCC1 JKOADRMSALOJAG-UHFFFAOYSA-N 0.000 claims description 4
- WQDKVNGDAHQCDU-UHFFFAOYSA-N 1-decyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCC)CCCC1 WQDKVNGDAHQCDU-UHFFFAOYSA-N 0.000 claims description 4
- XIPZVAFVVCJUQT-UHFFFAOYSA-N 1-heptyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCCCC)CCCC1 XIPZVAFVVCJUQT-UHFFFAOYSA-N 0.000 claims description 4
- XGWCAUNVXQXUIZ-UHFFFAOYSA-N 1-hexyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCCC)CCCC1 XGWCAUNVXQXUIZ-UHFFFAOYSA-N 0.000 claims description 4
- MYYZRUIUROBMBH-UHFFFAOYSA-N 4-[3-(3-hydroxypropyl)imidazol-3-ium-1-yl]butan-1-ol Chemical compound OCCCCN1C=C[N+](CCCO)=C1 MYYZRUIUROBMBH-UHFFFAOYSA-N 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- YXJSMCZTRWECJF-UHFFFAOYSA-N 1-butyl-1-ethylpyrrolidin-1-ium Chemical compound CCCC[N+]1(CC)CCCC1 YXJSMCZTRWECJF-UHFFFAOYSA-N 0.000 claims description 3
- AROZXIPMFUNQLO-UHFFFAOYSA-N 1-hexyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCCC)CCCC1 AROZXIPMFUNQLO-UHFFFAOYSA-N 0.000 claims description 3
- HBDRSCGXYGFKFA-UHFFFAOYSA-N 3-[3-(2-hydroxyethyl)imidazol-1-ium-1-yl]propan-1-ol Chemical compound OCCC[N+]=1C=CN(CCO)C=1 HBDRSCGXYGFKFA-UHFFFAOYSA-N 0.000 claims description 3
- CROSHWMSKMXXDW-UHFFFAOYSA-N 4-[3-(2-hydroxyethyl)imidazol-1-ium-1-yl]butan-1-ol Chemical compound OCCCC[N+]=1C=CN(CCO)C=1 CROSHWMSKMXXDW-UHFFFAOYSA-N 0.000 claims description 3
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 claims description 3
- 150000001879 copper Chemical class 0.000 claims description 3
- 238000004090 dissolution Methods 0.000 claims description 3
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 claims description 3
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 3
- BIUUTLHYFPFWRB-UHFFFAOYSA-N methyl-tris(2-methylpropyl)phosphanium Chemical compound CC(C)C[P+](C)(CC(C)C)CC(C)C BIUUTLHYFPFWRB-UHFFFAOYSA-N 0.000 claims description 3
- KTQDYGVEEFGIIL-UHFFFAOYSA-N n-fluorosulfonylsulfamoyl fluoride Chemical compound FS(=O)(=O)NS(F)(=O)=O KTQDYGVEEFGIIL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052755 nonmetal Inorganic materials 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- XKFPGUWSSPXXMF-UHFFFAOYSA-N tributyl(methyl)phosphanium Chemical compound CCCC[P+](C)(CCCC)CCCC XKFPGUWSSPXXMF-UHFFFAOYSA-N 0.000 claims description 3
- PYVOHVLEZJMINC-UHFFFAOYSA-N trihexyl(tetradecyl)phosphanium Chemical compound CCCCCCCCCCCCCC[P+](CCCCCC)(CCCCCC)CCCCCC PYVOHVLEZJMINC-UHFFFAOYSA-N 0.000 claims description 3
- ZKUWNFAAKJBRSA-UHFFFAOYSA-N (1-butylpyrrolidin-1-ium-1-yl)methanol Chemical compound CCCC[N+]1(CO)CCCC1 ZKUWNFAAKJBRSA-UHFFFAOYSA-N 0.000 claims description 2
- YVQWDMIFHBOEJS-UHFFFAOYSA-N (1-propylpyrrolidin-1-ium-1-yl)methanol Chemical compound CCC[N+]1(CO)CCCC1 YVQWDMIFHBOEJS-UHFFFAOYSA-N 0.000 claims description 2
- AQCASDGVNZHSRX-UHFFFAOYSA-N (3-methylimidazol-3-ium-1-yl)methanol Chemical compound C[N+]=1C=CN(CO)C=1 AQCASDGVNZHSRX-UHFFFAOYSA-N 0.000 claims description 2
- BBERJYHBIYXBBP-UHFFFAOYSA-N (3-propylimidazol-1-ium-1-yl)methanol Chemical compound CCCN1C=C[N+](CO)=C1 BBERJYHBIYXBBP-UHFFFAOYSA-N 0.000 claims description 2
- QIAZNDAYSCULMI-UHFFFAOYSA-N 1,1-dibutylpyrrolidin-1-ium Chemical compound CCCC[N+]1(CCCC)CCCC1 QIAZNDAYSCULMI-UHFFFAOYSA-N 0.000 claims description 2
- MVHJNCLVABFYGX-UHFFFAOYSA-N 1,1-didecylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCCCCC)CCCC1 MVHJNCLVABFYGX-UHFFFAOYSA-N 0.000 claims description 2
- PWZSCBSKFVJMJH-UHFFFAOYSA-N 1,1-diethylpyrrolidin-1-ium Chemical compound CC[N+]1(CC)CCCC1 PWZSCBSKFVJMJH-UHFFFAOYSA-N 0.000 claims description 2
- MOUSJWBVFFBHRT-UHFFFAOYSA-N 1,1-diheptylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCCCCC)CCCC1 MOUSJWBVFFBHRT-UHFFFAOYSA-N 0.000 claims description 2
- GARJMFRQLMUUDD-UHFFFAOYSA-N 1,1-dimethylpyrrolidin-1-ium Chemical compound C[N+]1(C)CCCC1 GARJMFRQLMUUDD-UHFFFAOYSA-N 0.000 claims description 2
- LXOSCSSPCCNKFZ-UHFFFAOYSA-N 1,1-dioctylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCCCCC)CCCC1 LXOSCSSPCCNKFZ-UHFFFAOYSA-N 0.000 claims description 2
- PUNOSRMSQRHNLX-UHFFFAOYSA-N 1,1-dipentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CCCCC)CCCC1 PUNOSRMSQRHNLX-UHFFFAOYSA-N 0.000 claims description 2
- WBHKHVSKPJNNQD-UHFFFAOYSA-N 1,1-dipropylpyrrolidin-1-ium Chemical compound CCC[N+]1(CCC)CCCC1 WBHKHVSKPJNNQD-UHFFFAOYSA-N 0.000 claims description 2
- FMSXPWVTZLNVHH-UHFFFAOYSA-N 1-butyl-1-heptylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCC)CCCC1 FMSXPWVTZLNVHH-UHFFFAOYSA-N 0.000 claims description 2
- ISRFWLYSLBASFE-UHFFFAOYSA-N 1-butyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCCC)CCCC1 ISRFWLYSLBASFE-UHFFFAOYSA-N 0.000 claims description 2
- ILEUMJQBHUIAII-UHFFFAOYSA-N 1-butyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCC)CCCC1 ILEUMJQBHUIAII-UHFFFAOYSA-N 0.000 claims description 2
- WNUMOMQLEHPHJX-UHFFFAOYSA-N 1-butyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCC)CCCC1 WNUMOMQLEHPHJX-UHFFFAOYSA-N 0.000 claims description 2
- YBKRPLNRDHUION-UHFFFAOYSA-N 1-butyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CCCC)CCCC1 YBKRPLNRDHUION-UHFFFAOYSA-N 0.000 claims description 2
- HODMCOIBCPNLAO-UHFFFAOYSA-N 1-butyl-1-propylpyrrolidin-1-ium Chemical compound CCCC[N+]1(CCC)CCCC1 HODMCOIBCPNLAO-UHFFFAOYSA-N 0.000 claims description 2
- WCDJCIZOGUUMJB-UHFFFAOYSA-N 1-decyl-1-ethylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CC)CCCC1 WCDJCIZOGUUMJB-UHFFFAOYSA-N 0.000 claims description 2
- RUKAFAVBJNZIMP-UHFFFAOYSA-N 1-decyl-1-heptylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCC)CCCC1 RUKAFAVBJNZIMP-UHFFFAOYSA-N 0.000 claims description 2
- BDNWZFLZTWLUBT-UHFFFAOYSA-N 1-decyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCCCC)CCCC1 BDNWZFLZTWLUBT-UHFFFAOYSA-N 0.000 claims description 2
- HWRXGWLPVNFXHM-UHFFFAOYSA-N 1-decyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCCC)CCCC1 HWRXGWLPVNFXHM-UHFFFAOYSA-N 0.000 claims description 2
- YKESTDZOVLJXIU-UHFFFAOYSA-N 1-decyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCC)CCCC1 YKESTDZOVLJXIU-UHFFFAOYSA-N 0.000 claims description 2
- PVHVCSARNZGEAH-UHFFFAOYSA-N 1-decyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCC)CCCC1 PVHVCSARNZGEAH-UHFFFAOYSA-N 0.000 claims description 2
- PAYARTBUZGCOKP-UHFFFAOYSA-N 1-ethyl-1-heptylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CC)CCCC1 PAYARTBUZGCOKP-UHFFFAOYSA-N 0.000 claims description 2
- NIHOUJYFWMURBG-UHFFFAOYSA-N 1-ethyl-1-methylpyrrolidin-1-ium Chemical compound CC[N+]1(C)CCCC1 NIHOUJYFWMURBG-UHFFFAOYSA-N 0.000 claims description 2
- GJGKIAQBXIXHST-UHFFFAOYSA-N 1-ethyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CC)CCCC1 GJGKIAQBXIXHST-UHFFFAOYSA-N 0.000 claims description 2
- KIJDSYJKWLPZBL-UHFFFAOYSA-N 1-ethyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CC)CCCC1 KIJDSYJKWLPZBL-UHFFFAOYSA-N 0.000 claims description 2
- BUPNNPKTBYFKKC-UHFFFAOYSA-N 1-ethyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CC)CCCC1 BUPNNPKTBYFKKC-UHFFFAOYSA-N 0.000 claims description 2
- QNXMTMCQDZQADU-UHFFFAOYSA-N 1-ethyl-1-propylpyrrolidin-1-ium Chemical compound CCC[N+]1(CC)CCCC1 QNXMTMCQDZQADU-UHFFFAOYSA-N 0.000 claims description 2
- XZDPRAGZNFQVIM-UHFFFAOYSA-N 1-heptyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(C)CCCC1 XZDPRAGZNFQVIM-UHFFFAOYSA-N 0.000 claims description 2
- OHLOVGBCBDFCNI-UHFFFAOYSA-N 1-heptyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCCCC)CCCC1 OHLOVGBCBDFCNI-UHFFFAOYSA-N 0.000 claims description 2
- XTGOIQCVRRNXNS-UHFFFAOYSA-N 1-heptyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCCCC)CCCC1 XTGOIQCVRRNXNS-UHFFFAOYSA-N 0.000 claims description 2
- WDOMGVJEVDMYAG-UHFFFAOYSA-N 1-heptyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCCC)CCCC1 WDOMGVJEVDMYAG-UHFFFAOYSA-N 0.000 claims description 2
- BRBIHAQFQIFSDL-UHFFFAOYSA-N 1-heptyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCC)CCCC1 BRBIHAQFQIFSDL-UHFFFAOYSA-N 0.000 claims description 2
- FKBYITRYIIAMSU-UHFFFAOYSA-N 1-hexyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCCCC)CCCC1 FKBYITRYIIAMSU-UHFFFAOYSA-N 0.000 claims description 2
- LMSPMULSARFKPJ-UHFFFAOYSA-N 1-methyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(C)CCCC1 LMSPMULSARFKPJ-UHFFFAOYSA-N 0.000 claims description 2
- RRYKUXCBJXYIOD-UHFFFAOYSA-N 1-methyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(C)CCCC1 RRYKUXCBJXYIOD-UHFFFAOYSA-N 0.000 claims description 2
- YQFWGCSKGJMGHE-UHFFFAOYSA-N 1-methyl-1-propylpyrrolidin-1-ium Chemical compound CCC[N+]1(C)CCCC1 YQFWGCSKGJMGHE-UHFFFAOYSA-N 0.000 claims description 2
- DQFPYJGJBDHTAL-UHFFFAOYSA-N 1-nonyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCCCCC)CCCC1 DQFPYJGJBDHTAL-UHFFFAOYSA-N 0.000 claims description 2
- SQNQYKHBPGSNRN-UHFFFAOYSA-N 1-nonyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCC)CCCC1 SQNQYKHBPGSNRN-UHFFFAOYSA-N 0.000 claims description 2
- OPMLTMOJVRKEFK-UHFFFAOYSA-N 1-nonyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCC)CCCC1 OPMLTMOJVRKEFK-UHFFFAOYSA-N 0.000 claims description 2
- YWVAERUMTYYRBP-UHFFFAOYSA-N 1-octyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCC)CCCC1 YWVAERUMTYYRBP-UHFFFAOYSA-N 0.000 claims description 2
- OOEBEUFXBPCKMQ-UHFFFAOYSA-N 1-octyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCC)CCCC1 OOEBEUFXBPCKMQ-UHFFFAOYSA-N 0.000 claims description 2
- XVNWJRAXYYMXSF-UHFFFAOYSA-N 1-pentyl-1-propylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CCC)CCCC1 XVNWJRAXYYMXSF-UHFFFAOYSA-N 0.000 claims description 2
- NDPHLMDQAUCGNE-UHFFFAOYSA-N 2-(1-butylpyrrolidin-1-ium-1-yl)ethanol Chemical compound CCCC[N+]1(CCO)CCCC1 NDPHLMDQAUCGNE-UHFFFAOYSA-N 0.000 claims description 2
- LDJQSBUDLXCWRU-UHFFFAOYSA-N 2-(1-methylpyrrolidin-1-ium-1-yl)ethanol Chemical compound OCC[N+]1(C)CCCC1 LDJQSBUDLXCWRU-UHFFFAOYSA-N 0.000 claims description 2
- LDPLFDDQVOYUFR-UHFFFAOYSA-N 2-(3-butylimidazol-3-ium-1-yl)ethanol Chemical compound CCCC[N+]=1C=CN(CCO)C=1 LDPLFDDQVOYUFR-UHFFFAOYSA-N 0.000 claims description 2
- GFNBXRZHUSGVDY-UHFFFAOYSA-N 2-(3-ethylimidazol-1-ium-1-yl)ethanol Chemical compound CCN1C=C[N+](CCO)=C1 GFNBXRZHUSGVDY-UHFFFAOYSA-N 0.000 claims description 2
- GZGCSDDVMNLPCW-UHFFFAOYSA-N 2-(3-propylimidazol-3-ium-1-yl)ethanol Chemical compound CCC[N+]=1C=CN(CCO)C=1 GZGCSDDVMNLPCW-UHFFFAOYSA-N 0.000 claims description 2
- DGGABWSTMPGDPJ-UHFFFAOYSA-N 2-[3-(2-hydroxyethyl)imidazol-3-ium-1-yl]ethanol Chemical compound OCCN1C=C[N+](CCO)=C1 DGGABWSTMPGDPJ-UHFFFAOYSA-N 0.000 claims description 2
- PPGIQUIOYKTBGB-UHFFFAOYSA-N 2-[3-(hydroxymethyl)imidazol-3-ium-1-yl]ethanol Chemical compound OCCN1C=C[N+](CO)=C1 PPGIQUIOYKTBGB-UHFFFAOYSA-N 0.000 claims description 2
- UNLQIRXDGQFNFJ-UHFFFAOYSA-N 3-(1-butylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound CCCC[N+]1(CCCO)CCCC1 UNLQIRXDGQFNFJ-UHFFFAOYSA-N 0.000 claims description 2
- GVECPPQYIUUGEG-UHFFFAOYSA-N 3-(1-methylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound OCCC[N+]1(C)CCCC1 GVECPPQYIUUGEG-UHFFFAOYSA-N 0.000 claims description 2
- HIPFJLVAAYVWTP-UHFFFAOYSA-N 3-(1-propylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound OCCC[N+]1(CCC)CCCC1 HIPFJLVAAYVWTP-UHFFFAOYSA-N 0.000 claims description 2
- FOWQARDLXGAQRN-UHFFFAOYSA-N 3-(3-butylimidazol-1-ium-1-yl)propan-1-ol Chemical compound CCCCN1C=C[N+](CCCO)=C1 FOWQARDLXGAQRN-UHFFFAOYSA-N 0.000 claims description 2
- LHCYGBJTVGBXMH-UHFFFAOYSA-N 3-(3-ethylimidazol-1-ium-1-yl)propan-1-ol Chemical compound CCN1C=C[N+](CCCO)=C1 LHCYGBJTVGBXMH-UHFFFAOYSA-N 0.000 claims description 2
- ZFXCYNGTSCSHND-UHFFFAOYSA-N 3-(3-methylimidazol-3-ium-1-yl)propan-1-ol Chemical compound CN1C=C[N+](CCCO)=C1 ZFXCYNGTSCSHND-UHFFFAOYSA-N 0.000 claims description 2
- GZBDPALRWLLVBU-UHFFFAOYSA-N 3-(3-propylimidazol-3-ium-1-yl)propan-1-ol Chemical compound CCC[N+]=1C=CN(CCCO)C=1 GZBDPALRWLLVBU-UHFFFAOYSA-N 0.000 claims description 2
- PUBXWGIBQLCGSE-UHFFFAOYSA-N 3-[3-(3-hydroxypropyl)imidazol-3-ium-1-yl]propan-1-ol Chemical compound OCCCN1C=C[N+](CCCO)=C1 PUBXWGIBQLCGSE-UHFFFAOYSA-N 0.000 claims description 2
- YLZOIGIGIUGUSJ-UHFFFAOYSA-N 3-[3-(hydroxymethyl)imidazol-3-ium-1-yl]propan-1-ol Chemical compound OCCCN1C=C[N+](CO)=C1 YLZOIGIGIUGUSJ-UHFFFAOYSA-N 0.000 claims description 2
- ICVJRSZVDGARPC-UHFFFAOYSA-N 4-(1-butylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(CCCC)CCCC1 ICVJRSZVDGARPC-UHFFFAOYSA-N 0.000 claims description 2
- OWQCSRQHMPMJOK-UHFFFAOYSA-N 4-(1-ethylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(CC)CCCC1 OWQCSRQHMPMJOK-UHFFFAOYSA-N 0.000 claims description 2
- WHTFCBOOYUIFFO-UHFFFAOYSA-N 4-(1-propylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(CCC)CCCC1 WHTFCBOOYUIFFO-UHFFFAOYSA-N 0.000 claims description 2
- PPGVIPXHAGRNMN-UHFFFAOYSA-N 4-(3-butylimidazol-1-ium-1-yl)butan-1-ol Chemical compound CCCCN1C=C[N+](CCCCO)=C1 PPGVIPXHAGRNMN-UHFFFAOYSA-N 0.000 claims description 2
- MYQCBZAULVPTBL-UHFFFAOYSA-N 4-(3-ethylimidazol-1-ium-1-yl)butan-1-ol Chemical compound CCN1C=C[N+](CCCCO)=C1 MYQCBZAULVPTBL-UHFFFAOYSA-N 0.000 claims description 2
- JWNPODYIPACARY-UHFFFAOYSA-N 4-(3-methylimidazol-3-ium-1-yl)butan-1-ol Chemical compound CN1C=C[N+](CCCCO)=C1 JWNPODYIPACARY-UHFFFAOYSA-N 0.000 claims description 2
- CYMIKBRKDBLTAH-UHFFFAOYSA-N 4-[3-(4-hydroxybutyl)imidazol-3-ium-1-yl]butan-1-ol Chemical compound OCCCCN1C=C[N+](CCCCO)=C1 CYMIKBRKDBLTAH-UHFFFAOYSA-N 0.000 claims description 2
- QHTZRPBAMGGUNI-UHFFFAOYSA-N 4-[3-(hydroxymethyl)imidazol-3-ium-1-yl]butan-1-ol Chemical compound OCCCCN1C=C[N+](CO)=C1 QHTZRPBAMGGUNI-UHFFFAOYSA-N 0.000 claims description 2
- GCUFXCLKSWFPLD-UHFFFAOYSA-N [3-(hydroxymethyl)imidazol-3-ium-1-yl]methanol Chemical compound OCN1C=C[N+](CO)=C1 GCUFXCLKSWFPLD-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- YOMFVLRTMZWACQ-UHFFFAOYSA-N ethyltrimethylammonium Chemical compound CC[N+](C)(C)C YOMFVLRTMZWACQ-UHFFFAOYSA-N 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- VWGARRKCFILYNY-UHFFFAOYSA-N tetra(nonyl)azanium Chemical compound CCCCCCCCC[N+](CCCCCCCCC)(CCCCCCCCC)CCCCCCCCC VWGARRKCFILYNY-UHFFFAOYSA-N 0.000 claims description 2
- WCKZOASXBBGEKB-UHFFFAOYSA-N tetra(nonyl)phosphanium Chemical compound CCCCCCCCC[P+](CCCCCCCCC)(CCCCCCCCC)CCCCCCCCC WCKZOASXBBGEKB-UHFFFAOYSA-N 0.000 claims description 2
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 claims description 2
- DAUOXRUBCACRRL-UHFFFAOYSA-N tetradecylphosphane Chemical compound CCCCCCCCCCCCCCP DAUOXRUBCACRRL-UHFFFAOYSA-N 0.000 claims description 2
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 claims description 2
- SZWHXXNVLACKBV-UHFFFAOYSA-N tetraethylphosphanium Chemical compound CC[P+](CC)(CC)CC SZWHXXNVLACKBV-UHFFFAOYSA-N 0.000 claims description 2
- YFZDLRVCXDBOPH-UHFFFAOYSA-N tetraheptylazanium Chemical compound CCCCCCC[N+](CCCCCCC)(CCCCCCC)CCCCCCC YFZDLRVCXDBOPH-UHFFFAOYSA-N 0.000 claims description 2
- ATWHYDCJSAROQC-UHFFFAOYSA-N tetraheptylphosphanium Chemical compound CCCCCCC[P+](CCCCCCC)(CCCCCCC)CCCCCCC ATWHYDCJSAROQC-UHFFFAOYSA-N 0.000 claims description 2
- DTIFFPXSSXFQCJ-UHFFFAOYSA-N tetrahexylazanium Chemical compound CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC DTIFFPXSSXFQCJ-UHFFFAOYSA-N 0.000 claims description 2
- AGWJLDNNUJKAHP-UHFFFAOYSA-N tetrahexylphosphanium Chemical compound CCCCCC[P+](CCCCCC)(CCCCCC)CCCCCC AGWJLDNNUJKAHP-UHFFFAOYSA-N 0.000 claims description 2
- BXYHVFRRNNWPMB-UHFFFAOYSA-N tetramethylphosphanium Chemical compound C[P+](C)(C)C BXYHVFRRNNWPMB-UHFFFAOYSA-N 0.000 claims description 2
- CHYBTAZWINMGHA-UHFFFAOYSA-N tetraoctylazanium Chemical compound CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC CHYBTAZWINMGHA-UHFFFAOYSA-N 0.000 claims description 2
- WFIYFFUAOQKJJS-UHFFFAOYSA-N tetraoctylphosphanium Chemical compound CCCCCCCC[P+](CCCCCCCC)(CCCCCCCC)CCCCCCCC WFIYFFUAOQKJJS-UHFFFAOYSA-N 0.000 claims description 2
- GJSGYPDDPQRWPK-UHFFFAOYSA-N tetrapentylammonium Chemical compound CCCCC[N+](CCCCC)(CCCCC)CCCCC GJSGYPDDPQRWPK-UHFFFAOYSA-N 0.000 claims description 2
- LRPOXSSMNVVCMT-UHFFFAOYSA-N tetrapentylphosphanium Chemical compound CCCCC[P+](CCCCC)(CCCCC)CCCCC LRPOXSSMNVVCMT-UHFFFAOYSA-N 0.000 claims description 2
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 claims description 2
- XOGCTUKDUDAZKA-UHFFFAOYSA-N tetrapropylphosphanium Chemical compound CCC[P+](CCC)(CCC)CCC XOGCTUKDUDAZKA-UHFFFAOYSA-N 0.000 claims description 2
- HOMONHWYLOPSLL-UHFFFAOYSA-N tributyl(ethyl)phosphanium Chemical compound CCCC[P+](CC)(CCCC)CCCC HOMONHWYLOPSLL-UHFFFAOYSA-N 0.000 claims description 2
- SEACXNRNJAXIBM-UHFFFAOYSA-N triethyl(methyl)azanium Chemical compound CC[N+](C)(CC)CC SEACXNRNJAXIBM-UHFFFAOYSA-N 0.000 claims description 2
- OOEBATDQOMBMIM-UHFFFAOYSA-N (1-methylpyrrolidin-1-ium-1-yl)methanol Chemical compound OC[N+]1(C)CCCC1 OOEBATDQOMBMIM-UHFFFAOYSA-N 0.000 claims 1
- KXJPFYHAMWXPCN-UHFFFAOYSA-N (3-butylimidazol-1-ium-1-yl)methanol Chemical compound CCCCN1C=C[N+](CO)=C1 KXJPFYHAMWXPCN-UHFFFAOYSA-N 0.000 claims 1
- VEVZQYCSTFYXOM-UHFFFAOYSA-N (3-ethylimidazol-1-ium-1-yl)methanol Chemical compound CCN1C=C[N+](CO)=C1 VEVZQYCSTFYXOM-UHFFFAOYSA-N 0.000 claims 1
- QUCGEEIXOHYZCR-UHFFFAOYSA-N 1-hexyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCC)CCCC1 QUCGEEIXOHYZCR-UHFFFAOYSA-N 0.000 claims 1
- GGNFSHMDTJHQCJ-UHFFFAOYSA-N 2-(1-ethylpyrrolidin-1-ium-1-yl)ethanol Chemical compound OCC[N+]1(CC)CCCC1 GGNFSHMDTJHQCJ-UHFFFAOYSA-N 0.000 claims 1
- HCXNIZVQQSKHEO-UHFFFAOYSA-N 3-(1-ethylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound OCCC[N+]1(CC)CCCC1 HCXNIZVQQSKHEO-UHFFFAOYSA-N 0.000 claims 1
- VEQDOHACAIHPFT-UHFFFAOYSA-N 4-(1-methylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(C)CCCC1 VEQDOHACAIHPFT-UHFFFAOYSA-N 0.000 claims 1
- ZJMMNXDGWMUPMY-UHFFFAOYSA-N 4-(3-propylimidazol-3-ium-1-yl)butan-1-ol Chemical compound CCC[N+]=1C=CN(CCCCO)C=1 ZJMMNXDGWMUPMY-UHFFFAOYSA-N 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 claims 1
- WTKKCYNZRWIVKL-UHFFFAOYSA-N tantalum Chemical group [Ta+5] WTKKCYNZRWIVKL-UHFFFAOYSA-N 0.000 description 41
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 24
- 239000010410 layer Substances 0.000 description 22
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 20
- -1 pentafluoro-propyl Chemical group 0.000 description 19
- YRGLXIVYESZPLQ-UHFFFAOYSA-I tantalum pentafluoride Chemical compound F[Ta](F)(F)(F)F YRGLXIVYESZPLQ-UHFFFAOYSA-I 0.000 description 12
- 238000005259 measurement Methods 0.000 description 10
- 229910052697 platinum Inorganic materials 0.000 description 10
- 229910004546 TaF5 Inorganic materials 0.000 description 9
- 239000010931 gold Substances 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 description 6
- WZJDNKTZWIOOJE-UHFFFAOYSA-M 1-butyl-1-methylpyrrolidin-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCC[N+]1(C)CCCC1 WZJDNKTZWIOOJE-UHFFFAOYSA-M 0.000 description 6
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 6
- NWRWABLKUHSJHB-UHFFFAOYSA-N [Ta+4] Chemical compound [Ta+4] NWRWABLKUHSJHB-UHFFFAOYSA-N 0.000 description 5
- 238000002484 cyclic voltammetry Methods 0.000 description 5
- 238000002848 electrochemical method Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000012736 aqueous medium Substances 0.000 description 4
- HSLXOARVFIWOQF-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-butyl-1-methylpyrrolidin-1-ium Chemical compound CCCC[N+]1(C)CCCC1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F HSLXOARVFIWOQF-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 4
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000007943 implant Substances 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 235000013024 sodium fluoride Nutrition 0.000 description 3
- 239000011775 sodium fluoride Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- GIIZYNGNGTZORC-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;2-(3-methylimidazol-3-ium-1-yl)ethanol Chemical compound CN1C=C[N+](CCO)=C1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F GIIZYNGNGTZORC-UHFFFAOYSA-N 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- SBTSVTLGWRLWOD-UHFFFAOYSA-L copper(ii) triflate Chemical compound [Cu+2].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F SBTSVTLGWRLWOD-UHFFFAOYSA-L 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000011698 potassium fluoride Substances 0.000 description 2
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 2
- DOYSIZKQWJYULQ-UHFFFAOYSA-N 1,1,2,2,2-pentafluoro-n-(1,1,2,2,2-pentafluoroethylsulfonyl)ethanesulfonamide Chemical compound FC(F)(F)C(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)C(F)(F)F DOYSIZKQWJYULQ-UHFFFAOYSA-N 0.000 description 1
- GKNWQHIXXANPTN-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)F GKNWQHIXXANPTN-UHFFFAOYSA-N 0.000 description 1
- ONUSNTKFOFBAIC-UHFFFAOYSA-N 1,2-dimethyl-1-oxidopyrrolidin-1-ium Chemical compound CC1CCC[N+]1(C)[O-] ONUSNTKFOFBAIC-UHFFFAOYSA-N 0.000 description 1
- PLBBYYNJEHFECS-UHFFFAOYSA-N 1-butyl-1-decylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCC)CCCC1 PLBBYYNJEHFECS-UHFFFAOYSA-N 0.000 description 1
- YPKUOQRBNZPMAE-UHFFFAOYSA-N 1-decyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(C)CCCC1 YPKUOQRBNZPMAE-UHFFFAOYSA-N 0.000 description 1
- VNVSNJDXLYCKSH-UHFFFAOYSA-N 1-ethyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CC)CCCC1 VNVSNJDXLYCKSH-UHFFFAOYSA-N 0.000 description 1
- BMQZYMYBQZGEEY-UHFFFAOYSA-M 1-ethyl-3-methylimidazolium chloride Chemical compound [Cl-].CCN1C=C[N+](C)=C1 BMQZYMYBQZGEEY-UHFFFAOYSA-M 0.000 description 1
- VJGVQNNAIRBPJB-UHFFFAOYSA-M 1-hexyl-1-methylpyrrolidin-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCCCC[N+]1(C)CCCC1 VJGVQNNAIRBPJB-UHFFFAOYSA-M 0.000 description 1
- CMHSNYURXVUPJO-UHFFFAOYSA-M 1-methyl-1-octylpyrrolidin-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCCCCCC[N+]1(C)CCCC1 CMHSNYURXVUPJO-UHFFFAOYSA-M 0.000 description 1
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 1
- ZEMPKEQAKRGZGQ-AAKVHIHISA-N 2,3-bis[[(z)-12-hydroxyoctadec-9-enoyl]oxy]propyl (z)-12-hydroxyoctadec-9-enoate Chemical compound CCCCCCC(O)C\C=C/CCCCCCCC(=O)OCC(OC(=O)CCCCCCC\C=C/CC(O)CCCCCC)COC(=O)CCCCCCC\C=C/CC(O)CCCCCC ZEMPKEQAKRGZGQ-AAKVHIHISA-N 0.000 description 1
- GBUDBMKIXILJTK-UHFFFAOYSA-N 2-(1-propylpyrrolidin-1-ium-1-yl)ethanol Chemical compound CCC[N+]1(CCO)CCCC1 GBUDBMKIXILJTK-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-O Pyrrolidinium ion Chemical compound C1CC[NH2+]C1 RWRDLPDLKQPQOW-UHFFFAOYSA-O 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- PLZVEHJLHYMBBY-UHFFFAOYSA-N Tetradecylamine Chemical compound CCCCCCCCCCCCCCN PLZVEHJLHYMBBY-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- YGGDPBCUKJOEGM-UHFFFAOYSA-J [I-].[I-].[I-].[I-].[Ta+4] Chemical compound [I-].[I-].[I-].[I-].[Ta+4] YGGDPBCUKJOEGM-UHFFFAOYSA-J 0.000 description 1
- RYPDYZISLALANL-UHFFFAOYSA-D [Ta+5].[Ta+5].OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O Chemical compound [Ta+5].[Ta+5].OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O.OC(C(O)C([O-])=O)C([O-])=O RYPDYZISLALANL-UHFFFAOYSA-D 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- WHLFUNXODNBHOT-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-hexyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(C)CCCC1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F WHLFUNXODNBHOT-UHFFFAOYSA-N 0.000 description 1
- IZSJXAHBNZXKSK-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-methyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(C)CCCC1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F IZSJXAHBNZXKSK-UHFFFAOYSA-N 0.000 description 1
- UQWLFOMXECTXNQ-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F UQWLFOMXECTXNQ-UHFFFAOYSA-N 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 239000000316 bone substitute Substances 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000374 eutectic mixture Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- QASMZJKUEABJNR-UHFFFAOYSA-N methanolate;tantalum(5+) Chemical compound [Ta+5].[O-]C.[O-]C.[O-]C.[O-]C.[O-]C QASMZJKUEABJNR-UHFFFAOYSA-N 0.000 description 1
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical compound CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 125000005246 nonafluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- MISXNQITXACHNJ-UHFFFAOYSA-I tantalum(5+);pentaiodide Chemical compound [I-].[I-].[I-].[I-].[I-].[Ta+5] MISXNQITXACHNJ-UHFFFAOYSA-I 0.000 description 1
- GCPVYIPZZUPXPB-UHFFFAOYSA-I tantalum(v) bromide Chemical compound Br[Ta](Br)(Br)(Br)Br GCPVYIPZZUPXPB-UHFFFAOYSA-I 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- HSXKFDGTKKAEHL-UHFFFAOYSA-N tantalum(v) ethoxide Chemical compound [Ta+5].CC[O-].CC[O-].CC[O-].CC[O-].CC[O-] HSXKFDGTKKAEHL-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- CMVSVXQSGZAWHD-UHFFFAOYSA-J tetrabromotantalum Chemical compound Br[Ta](Br)(Br)Br CMVSVXQSGZAWHD-UHFFFAOYSA-J 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- JYIFRKSFEGQVTG-UHFFFAOYSA-J tetrachlorotantalum Chemical compound Cl[Ta](Cl)(Cl)Cl JYIFRKSFEGQVTG-UHFFFAOYSA-J 0.000 description 1
- OMEWYJXIJDAKHZ-UHFFFAOYSA-J tetrafluorotantalum Chemical compound [F-].[F-].[F-].[F-].[Ta+4] OMEWYJXIJDAKHZ-UHFFFAOYSA-J 0.000 description 1
- 238000007651 thermal printing Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 230000002792 vascular Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Cell Electrode Carriers And Collectors (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Secondary Cells (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004059520.8 | 2004-12-10 | ||
| DE102004059520A DE102004059520A1 (de) | 2004-12-10 | 2004-12-10 | Elektrochemische Abscheidung von Tantal und/oder Kupfer in ionischen Flüssigkeiten |
| PCT/EP2005/012180 WO2006061081A2 (fr) | 2004-12-10 | 2005-11-15 | Depot electrochimique de tantale et/ou de cuivre dans des liquides ioniques |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2590080A1 true CA2590080A1 (fr) | 2006-06-15 |
Family
ID=35976745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002590080A Abandoned CA2590080A1 (fr) | 2004-12-10 | 2005-11-15 | Depot electrochimique de tantale et/ou de cuivre dans des liquides ioniques |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20090242414A1 (fr) |
| EP (1) | EP1831433A2 (fr) |
| JP (1) | JP2008523242A (fr) |
| KR (1) | KR20070085936A (fr) |
| CN (1) | CN101076617A (fr) |
| CA (1) | CA2590080A1 (fr) |
| DE (1) | DE102004059520A1 (fr) |
| RU (1) | RU2007125776A (fr) |
| TW (1) | TW200626755A (fr) |
| WO (1) | WO2006061081A2 (fr) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1983079A1 (fr) * | 2007-04-17 | 2008-10-22 | Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO | Couche barrière et son procédé de fabrication |
| ATE493523T1 (de) * | 2007-08-02 | 2011-01-15 | Akzo Nobel Nv | Verfahren zur elektrodeponierung von metallen mithilfe ionischer flüssigkeiten unter verwendung eines zusatzstoffs |
| GB0715258D0 (en) * | 2007-08-06 | 2007-09-12 | Univ Leuven Kath | Deposition from ionic liquids |
| EP2080972A1 (fr) | 2008-01-08 | 2009-07-22 | L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Bruleur combiné et appareil lance pour four a arc électrique |
| WO2009155297A1 (fr) | 2008-06-17 | 2009-12-23 | Wisconsin Alumni Research Foundation | Transformation chimique de biomasse lignocellulosique en combustibles et produits chimiques |
| DE102008030988B4 (de) | 2008-06-27 | 2010-04-01 | Siemens Aktiengesellschaft | Bauteil mit einer Schicht, in die CNT (Carbon Nanotubes) eingebaut sind und Verfahren zu dessen Herstellung |
| DE102008031003B4 (de) | 2008-06-30 | 2010-04-15 | Siemens Aktiengesellschaft | Verfahren zum Erzeugen einer CNT enthaltenen Schicht aus einer ionischen Flüssigkeit |
| WO2011002660A1 (fr) * | 2009-07-01 | 2011-01-06 | Wisconsin Alumni Research Foundation | Hydrolyse de biomasse |
| DE102009043594B4 (de) | 2009-09-25 | 2013-05-16 | Siemens Aktiengesellschaft | Verfahren zum elektrochemischen Beschichten und Einbau von Partikeln in die Schicht |
| DE102009060937A1 (de) * | 2009-12-22 | 2011-06-30 | Siemens Aktiengesellschaft, 80333 | Verfahren zum elektrochemischen Beschichten |
| CN101828958B (zh) * | 2010-05-19 | 2011-12-28 | 瞿东滨 | 高骨整合性的接骨钉 |
| CN102912384B (zh) * | 2012-10-31 | 2015-03-04 | 南京工业大学 | 一种由电沉积Cu-Al-Mg-Li合金制备多孔铜粉的方法 |
| DE102013202254A1 (de) | 2013-02-12 | 2014-08-14 | Siemens Aktiengesellschaft | Verfahren zur Herstellung von Hochenergiemagneten |
| US20140262800A1 (en) * | 2013-03-12 | 2014-09-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Electroplating Chemical Leveler |
| MX2015012566A (es) * | 2013-03-13 | 2016-06-06 | Fluidic Inc | Aditivos sinergicos para celdas electroquimicas con combustible electrodepositado. |
| US10006141B2 (en) | 2013-06-20 | 2018-06-26 | Baker Hughes, A Ge Company, Llc | Method to produce metal matrix nanocomposite |
| WO2015157441A1 (fr) * | 2014-04-09 | 2015-10-15 | Nulwala Hunaid B | Solvant liquide ionique pour procédé de placage électrolytique |
| CN104141151A (zh) * | 2014-08-06 | 2014-11-12 | 哈尔滨工业大学 | 离子液体电沉积金属单质的方法 |
| US10669635B2 (en) | 2014-09-18 | 2020-06-02 | Baker Hughes, A Ge Company, Llc | Methods of coating substrates with composite coatings of diamond nanoparticles and metal |
| US9702219B2 (en) | 2014-10-01 | 2017-07-11 | Halliburton Energy Services, Inc. | Polymerizable ionic liquids for use in subterranean formation operations |
| US9873827B2 (en) | 2014-10-21 | 2018-01-23 | Baker Hughes Incorporated | Methods of recovering hydrocarbons using suspensions for enhanced hydrocarbon recovery |
| US10167392B2 (en) | 2014-10-31 | 2019-01-01 | Baker Hughes Incorporated | Compositions of coated diamond nanoparticles, methods of forming coated diamond nanoparticles, and methods of forming coatings |
| JP6413751B2 (ja) * | 2014-12-22 | 2018-10-31 | 日清紡ホールディングス株式会社 | めっき液 |
| US10155899B2 (en) | 2015-06-19 | 2018-12-18 | Baker Hughes Incorporated | Methods of forming suspensions and methods for recovery of hydrocarbon material from subterranean formations |
| CN105780069A (zh) * | 2015-12-29 | 2016-07-20 | 沈阳师范大学 | 氯化1-己基-3-甲基咪唑/氯化铁体系电镀液 |
| CN105463532A (zh) * | 2015-12-29 | 2016-04-06 | 沈阳师范大学 | 一种新型的镀镍铁用电镀液 |
| US9834850B1 (en) | 2016-08-08 | 2017-12-05 | Seagate Technology Llc | Method of forming one or more metal and/or metal alloy layers in processes for making transducers in sliders, and related sliders |
| US11424484B2 (en) | 2019-01-24 | 2022-08-23 | Octet Scientific, Inc. | Zinc battery electrolyte additive |
| CN111826691B (zh) * | 2020-08-21 | 2021-09-21 | 东北大学 | 一种溶剂化离子液体制备锌钽合金的方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4624753A (en) * | 1985-06-05 | 1986-11-25 | Mcmanis Iii George E | Method for electrodeposition of metals |
| GB9919496D0 (en) * | 1999-08-18 | 1999-10-20 | British Nuclear Fuels Plc | Process for separating metals |
| JP3594530B2 (ja) * | 2000-03-30 | 2004-12-02 | 独立行政法人 科学技術振興機構 | タンタルのめっき法 |
| US6552843B1 (en) * | 2002-01-31 | 2003-04-22 | Innovative Technology Licensing Llc | Reversible electrodeposition device with ionic liquid electrolyte |
| US6862125B2 (en) * | 2003-05-05 | 2005-03-01 | The Regents Of The University Of California | Reversible electro-optic device employing aprotic molten salts and method |
| TW200526587A (en) * | 2003-09-05 | 2005-08-16 | Univ Alabama | Ionic liquids containing secondary hydroxyl-groups and a method for their preparation |
-
2004
- 2004-12-10 DE DE102004059520A patent/DE102004059520A1/de not_active Withdrawn
-
2005
- 2005-11-15 KR KR1020077012973A patent/KR20070085936A/ko not_active Application Discontinuation
- 2005-11-15 RU RU2007125776/02A patent/RU2007125776A/ru not_active Application Discontinuation
- 2005-11-15 CA CA002590080A patent/CA2590080A1/fr not_active Abandoned
- 2005-11-15 CN CNA2005800425161A patent/CN101076617A/zh active Pending
- 2005-11-15 EP EP05813986A patent/EP1831433A2/fr not_active Withdrawn
- 2005-11-15 WO PCT/EP2005/012180 patent/WO2006061081A2/fr active Application Filing
- 2005-11-15 JP JP2007544757A patent/JP2008523242A/ja active Pending
- 2005-11-15 US US11/721,277 patent/US20090242414A1/en not_active Abandoned
- 2005-12-09 TW TW094143756A patent/TW200626755A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006061081A2 (fr) | 2006-06-15 |
| TW200626755A (en) | 2006-08-01 |
| WO2006061081A3 (fr) | 2007-08-02 |
| CN101076617A (zh) | 2007-11-21 |
| JP2008523242A (ja) | 2008-07-03 |
| US20090242414A1 (en) | 2009-10-01 |
| RU2007125776A (ru) | 2009-01-20 |
| KR20070085936A (ko) | 2007-08-27 |
| EP1831433A2 (fr) | 2007-09-12 |
| DE102004059520A1 (de) | 2006-06-14 |
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Legal Events
| Date | Code | Title | Description |
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| FZDE | Discontinued |