CA2490464A1 - Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents - Google Patents

Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents Download PDF

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Publication number
CA2490464A1
CA2490464A1 CA002490464A CA2490464A CA2490464A1 CA 2490464 A1 CA2490464 A1 CA 2490464A1 CA 002490464 A CA002490464 A CA 002490464A CA 2490464 A CA2490464 A CA 2490464A CA 2490464 A1 CA2490464 A1 CA 2490464A1
Authority
CA
Canada
Prior art keywords
coatings
microcomponents
metall
matrix composite
composite foils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002490464A
Other languages
French (fr)
Other versions
CA2490464C (en
Inventor
Gino Palumbo
Iain Brooks
Uwe Erb
Jonathan Mccrea
Glenn D. Hibbard
Francisco Gonzalez
Klaus Tomantschger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Integran Technologies Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2490464A1 publication Critical patent/CA2490464A1/en
Application granted granted Critical
Publication of CA2490464C publication Critical patent/CA2490464C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C25D5/06—Brush or pad plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20—Electroplating using ultrasonics, vibrations
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/67—Electroplating to repair workpiece
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/04—Tubes; Rings; Hollow bodies

Abstract

The invention relates to a process for forming coatings or free-standing deposits of nano-crystalline metals, metal alloys or metal matrix composites.
The process employs drum plating or selective plating processes involving pulse electrode-position and a non-stationary anode or cathode. Novel nano-crystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro-components with grain sizes below 1,000nm.
CA002490464A 2002-06-25 2002-06-25 Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents Expired - Lifetime CA2490464C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2002/007023 WO2004001100A1 (en) 2002-06-25 2002-06-25 Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents

Publications (2)

Publication Number Publication Date
CA2490464A1 true CA2490464A1 (en) 2003-12-31
CA2490464C CA2490464C (en) 2008-09-02

Family

ID=29762587

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002490464A Expired - Lifetime CA2490464C (en) 2002-06-25 2002-06-25 Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents

Country Status (16)

Country Link
EP (2) EP1826294A1 (en)
JP (1) JP2005530926A (en)
KR (1) KR100890819B1 (en)
AT (1) ATE387522T1 (en)
AU (1) AU2002321112B2 (en)
BR (1) BR0215787B1 (en)
CA (1) CA2490464C (en)
DE (1) DE60225352T2 (en)
DK (1) DK1516076T3 (en)
ES (1) ES2301666T3 (en)
HK (1) HK1075278A1 (en)
IL (1) IL165904A0 (en)
MX (1) MXPA04011940A (en)
PT (1) PT1516076E (en)
WO (1) WO2004001100A1 (en)
ZA (1) ZA200410368B (en)

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US9694562B2 (en) 2010-03-12 2017-07-04 Xtalic Corporation Coated articles and methods
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KR101304846B1 (en) * 2011-06-10 2013-09-05 주식회사 포스코 Substrate for flexible display having excellent heat emission property
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US20130186765A1 (en) * 2012-01-23 2013-07-25 Seagate Technology Llc Electrodeposition methods
KR101491752B1 (en) * 2012-05-04 2015-02-11 강원대학교산학협력단 Bipolar plate for fuel cell and mehtod for manufacturing the same, and fuel cell including the same
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KR101370966B1 (en) * 2012-10-17 2014-03-07 단국대학교 천안캠퍼스 산학협력단 Flexible composites with both selective electromagnetic conducting and absorbing properties and their fabrication equipment and method
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Also Published As

Publication number Publication date
KR100890819B1 (en) 2009-04-06
AU2002321112B2 (en) 2008-07-03
HK1075278A1 (en) 2005-12-09
MXPA04011940A (en) 2005-03-31
KR20050024394A (en) 2005-03-10
ES2301666T3 (en) 2008-07-01
JP2005530926A (en) 2005-10-13
EP1516076B1 (en) 2008-02-27
DE60225352T2 (en) 2008-06-12
ZA200410368B (en) 2006-07-26
EP1826294A1 (en) 2007-08-29
ATE387522T1 (en) 2008-03-15
DE60225352D1 (en) 2008-04-10
EP1516076A1 (en) 2005-03-23
AU2002321112A1 (en) 2004-01-06
IL165904A0 (en) 2006-01-15
PT1516076E (en) 2008-03-11
DK1516076T3 (en) 2008-06-23
CA2490464C (en) 2008-09-02
BR0215787A (en) 2005-03-01
BR0215787B1 (en) 2013-12-03
WO2004001100A1 (en) 2003-12-31

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