CA2468685A1 - Deposition method for nanostructure materials - Google Patents
Deposition method for nanostructure materials Download PDFInfo
- Publication number
- CA2468685A1 CA2468685A1 CA002468685A CA2468685A CA2468685A1 CA 2468685 A1 CA2468685 A1 CA 2468685A1 CA 002468685 A CA002468685 A CA 002468685A CA 2468685 A CA2468685 A CA 2468685A CA 2468685 A1 CA2468685 A1 CA 2468685A1
- Authority
- CA
- Canada
- Prior art keywords
- substrate
- suspension
- nanostructure
- containing material
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000463 material Substances 0.000 title claims abstract description 120
- 239000002086 nanomaterial Substances 0.000 title claims abstract description 83
- 238000000151 deposition Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 133
- 239000000758 substrate Substances 0.000 claims abstract description 91
- 239000000725 suspension Substances 0.000 claims abstract description 76
- 230000005684 electric field Effects 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 17
- 239000011248 coating agent Substances 0.000 claims abstract description 14
- 238000012545 processing Methods 0.000 claims abstract description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 54
- 239000002071 nanotube Substances 0.000 claims description 41
- 239000002041 carbon nanotube Substances 0.000 claims description 40
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 40
- 239000002109 single walled nanotube Substances 0.000 claims description 38
- 239000007788 liquid Substances 0.000 claims description 34
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 21
- 239000002070 nanowire Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 239000011230 binding agent Substances 0.000 claims description 12
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 238000000137 annealing Methods 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- -1 poly(vinylidene fluoride) Polymers 0.000 claims description 6
- 230000001737 promoting effect Effects 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 5
- 229910001629 magnesium chloride Inorganic materials 0.000 claims description 5
- 239000002105 nanoparticle Substances 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000010891 electric arc Methods 0.000 claims description 3
- 238000000608 laser ablation Methods 0.000 claims description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 3
- 238000004904 shortening Methods 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910009253 Y(NO3)3 Inorganic materials 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 150000004770 chalcogenides Chemical class 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Inorganic materials [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- BXJPTTGFESFXJU-UHFFFAOYSA-N yttrium(3+);trinitrate Chemical compound [Y+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O BXJPTTGFESFXJU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 239000000523 sample Substances 0.000 claims 4
- IXQWNVPHFNLUGD-UHFFFAOYSA-N iron titanium Chemical compound [Ti].[Fe] IXQWNVPHFNLUGD-UHFFFAOYSA-N 0.000 claims 3
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000002210 silicon-based material Substances 0.000 claims 2
- 229910002339 La(NO3)3 Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 230000007774 longterm Effects 0.000 claims 1
- 239000002048 multi walled nanotube Substances 0.000 claims 1
- 229920006002 poly(vinyl butyral-co-vinyl alcohol-co-vinyl acetate) Polymers 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 claims 1
- 239000002994 raw material Substances 0.000 description 17
- 239000010408 film Substances 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 238000001962 electrophoresis Methods 0.000 description 12
- 230000008021 deposition Effects 0.000 description 11
- 238000001652 electrophoretic deposition Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000002131 composite material Substances 0.000 description 6
- 238000001878 scanning electron micrograph Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000002923 metal particle Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000010348 incorporation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- 238000003917 TEM image Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000002238 carbon nanotube film Substances 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000011133 lead Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 229920005596 polymer binder Polymers 0.000 description 2
- 239000002491 polymer binding agent Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000000527 sonication Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 241000531897 Loma Species 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000001241 arc-discharge method Methods 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003701 mechanical milling Methods 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000012982 microporous membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000002073 nanorod Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 239000013014 purified material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/02—Electrophoretic coating characterised by the process with inorganic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Cold Cathode And The Manufacture (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Electroplating Methods And Accessories (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/996,695 | 2001-11-30 | ||
| US09/996,695 US7252749B2 (en) | 2001-11-30 | 2001-11-30 | Deposition method for nanostructure materials |
| PCT/US2002/037184 WO2003075372A2 (en) | 2001-11-30 | 2002-11-20 | Deposition method for nanostructure materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2468685A1 true CA2468685A1 (en) | 2003-09-12 |
Family
ID=25543199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002468685A Abandoned CA2468685A1 (en) | 2001-11-30 | 2002-11-20 | Deposition method for nanostructure materials |
Country Status (8)
| Country | Link |
|---|---|
| US (4) | US7252749B2 (enExample) |
| EP (1) | EP1474836A4 (enExample) |
| JP (1) | JP4563686B2 (enExample) |
| KR (1) | KR20040098623A (enExample) |
| CN (1) | CN1617954A (enExample) |
| AU (1) | AU2002366269A1 (enExample) |
| CA (1) | CA2468685A1 (enExample) |
| WO (1) | WO2003075372A2 (enExample) |
Families Citing this family (180)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7082182B2 (en) * | 2000-10-06 | 2006-07-25 | The University Of North Carolina At Chapel Hill | Computed tomography system for imaging of human and small animal |
| DE60132423T2 (de) * | 2000-11-30 | 2009-01-15 | Lg Electronics Inc. | Heizvorrichtung für einen Mikrowellenherd |
| US6653625B2 (en) * | 2001-03-19 | 2003-11-25 | Gyros Ab | Microfluidic system (MS) |
| US6758957B1 (en) * | 2001-04-17 | 2004-07-06 | University Of Central Florida | Electrochemical deposition of carbon nanoparticles from organic solutions |
| US6723299B1 (en) | 2001-05-17 | 2004-04-20 | Zyvex Corporation | System and method for manipulating nanotubes |
| WO2002103737A2 (en) * | 2001-06-14 | 2002-12-27 | Hyperion Catalysis International, Inc. | Field emission devices using ion bombarded carbon nanotubes |
| US7252749B2 (en) | 2001-11-30 | 2007-08-07 | The University Of North Carolina At Chapel Hill | Deposition method for nanostructure materials |
| US7455757B2 (en) * | 2001-11-30 | 2008-11-25 | The University Of North Carolina At Chapel Hill | Deposition method for nanostructure materials |
| US7091412B2 (en) | 2002-03-04 | 2006-08-15 | Nanoset, Llc | Magnetically shielded assembly |
| US7162302B2 (en) | 2002-03-04 | 2007-01-09 | Nanoset Llc | Magnetically shielded assembly |
| US7147894B2 (en) * | 2002-03-25 | 2006-12-12 | The University Of North Carolina At Chapel Hill | Method for assembling nano objects |
| US7381316B1 (en) * | 2002-04-30 | 2008-06-03 | Northwestern University | Methods and related systems for carbon nanotube deposition |
| US20040034177A1 (en) | 2002-05-02 | 2004-02-19 | Jian Chen | Polymer and method for using the polymer for solubilizing nanotubes |
| US6905667B1 (en) | 2002-05-02 | 2005-06-14 | Zyvex Corporation | Polymer and method for using the polymer for noncovalently functionalizing nanotubes |
| US20040055420A1 (en) * | 2002-05-30 | 2004-03-25 | Arkady Garbar | Method for enhancing surface area of bulk metals |
| GB2395059B (en) | 2002-11-05 | 2005-03-16 | Imp College Innovations Ltd | Structured silicon anode |
| US20100098877A1 (en) * | 2003-03-07 | 2010-04-22 | Cooper Christopher H | Large scale manufacturing of nanostructured material |
| EP1603662B1 (en) | 2003-03-07 | 2007-08-01 | Seldon Technologies LLC | Purification of fluids with nanomaterials |
| US7419601B2 (en) * | 2003-03-07 | 2008-09-02 | Seldon Technologies, Llc | Nanomesh article and method of using the same for purifying fluids |
| US6969690B2 (en) * | 2003-03-21 | 2005-11-29 | The University Of North Carolina At Chapel Hill | Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles |
| US7082683B2 (en) * | 2003-04-24 | 2006-08-01 | Korea Institute Of Machinery & Materials | Method for attaching rod-shaped nano structure to probe holder |
| JP4871726B2 (ja) * | 2003-04-28 | 2012-02-08 | ナノシス・インク． | 超疎液性表面、その作製法及び用途 |
| WO2004106420A2 (en) | 2003-05-22 | 2004-12-09 | Zyvex Corporation | Nanocomposites and method for production |
| JP4036454B2 (ja) * | 2003-05-30 | 2008-01-23 | 独立行政法人理化学研究所 | 薄膜トランジスタ。 |
| US8070988B2 (en) | 2003-09-09 | 2011-12-06 | International Technology Center | Nano-carbon hybrid structures |
| US7224039B1 (en) * | 2003-09-09 | 2007-05-29 | International Technology Center | Polymer nanocomposite structures for integrated circuits |
| US7132298B2 (en) | 2003-10-07 | 2006-11-07 | Hewlett-Packard Development Company, L.P. | Fabrication of nano-object array |
| WO2005046305A2 (en) * | 2003-11-06 | 2005-05-26 | Brian Ruby | Method of producing nanostructure tips |
| US20050112048A1 (en) * | 2003-11-25 | 2005-05-26 | Loucas Tsakalakos | Elongated nano-structures and related devices |
| US7618300B2 (en) * | 2003-12-24 | 2009-11-17 | Duke University | Method of synthesizing small-diameter carbon nanotubes with electron field emission properties |
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2001
- 2001-11-30 US US09/996,695 patent/US7252749B2/en not_active Expired - Lifetime
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2002
- 2002-11-20 EP EP02807020A patent/EP1474836A4/en not_active Withdrawn
- 2002-11-20 WO PCT/US2002/037184 patent/WO2003075372A2/en not_active Ceased
- 2002-11-20 AU AU2002366269A patent/AU2002366269A1/en not_active Abandoned
- 2002-11-20 KR KR10-2004-7008303A patent/KR20040098623A/ko not_active Ceased
- 2002-11-20 JP JP2003573718A patent/JP4563686B2/ja not_active Expired - Fee Related
- 2002-11-20 CN CNA028277082A patent/CN1617954A/zh active Pending
- 2002-11-20 CA CA002468685A patent/CA2468685A1/en not_active Abandoned
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2004
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2005
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- 2007-06-11 US US11/811,649 patent/US20080099339A1/en not_active Abandoned
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| US8002958B2 (en) | 2011-08-23 |
| EP1474836A2 (en) | 2004-11-10 |
| AU2002366269A1 (en) | 2003-09-16 |
| US7887689B2 (en) | 2011-02-15 |
| CN1617954A (zh) | 2005-05-18 |
| US20050133372A1 (en) | 2005-06-23 |
| AU2002366269A8 (en) | 2003-09-16 |
| JP4563686B2 (ja) | 2010-10-13 |
| US20080099339A1 (en) | 2008-05-01 |
| US7252749B2 (en) | 2007-08-07 |
| EP1474836A4 (en) | 2007-12-05 |
| US20080006534A1 (en) | 2008-01-10 |
| JP2005519201A (ja) | 2005-06-30 |
| WO2003075372A2 (en) | 2003-09-12 |
| US20030102222A1 (en) | 2003-06-05 |
| WO2003075372A3 (en) | 2004-08-19 |
| KR20040098623A (ko) | 2004-11-20 |
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