CA2385675A1 - Formation of microstructures using a preformed photoresist sheet - Google Patents
Formation of microstructures using a preformed photoresist sheet Download PDFInfo
- Publication number
- CA2385675A1 CA2385675A1 CA002385675A CA2385675A CA2385675A1 CA 2385675 A1 CA2385675 A1 CA 2385675A1 CA 002385675 A CA002385675 A CA 002385675A CA 2385675 A CA2385675 A CA 2385675A CA 2385675 A1 CA2385675 A1 CA 2385675A1
- Authority
- CA
- Canada
- Prior art keywords
- photoresist
- microstructures
- substrate
- formation
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- Photosensitive Polymer And Photoresist Processing (AREA)
- Micromachines (AREA)
Abstract
In the formation of microstructures, a preformed sheet of photoresist, such as polymethylmethacrylate (PMMA), which is strain free, may be milled down before or after adherence to a substrate to a desired thickness. The photoresist is patterned by exposure through a mask to radiation, such as X-rays, and developed using a developer to remove the photoresist material which has been rendered susceptible to the developer. Micrometal structures may be formed by electroplating metal into the areas from which the photoresist has been removed. The photoresist itself may form useful microstructures, and can be removed from the substrate by utilizing a release layer between the substrate and the preformed sheet which can be removed by a remover which does not affect the photoresist. Multiple layers of patterned photoresist can be built up to allow complex three dimensional microstructures to be formed.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US99495292A | 1992-12-22 | 1992-12-22 | |
| US07/994,952 | 1992-12-22 | ||
| US08/066,988 | 1993-05-24 | ||
| US08/066,988 US5378583A (en) | 1992-12-22 | 1993-05-24 | Formation of microstructures using a preformed photoresist sheet |
| CA 2102987 CA2102987C (en) | 1992-12-22 | 1993-11-12 | Formation of microstructures using a preformed photoresist sheet |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA 2102987 Division CA2102987C (en) | 1992-12-22 | 1993-11-12 | Formation of microstructures using a preformed photoresist sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2385675A1 true CA2385675A1 (en) | 1994-06-23 |
| CA2385675C CA2385675C (en) | 2003-09-16 |
Family
ID=27169543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002385675A Expired - Lifetime CA2385675C (en) | 1992-12-22 | 1993-11-12 | Formation of microstructures using a preformed photoresist sheet |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA2385675C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114904675A (en) * | 2021-02-08 | 2022-08-16 | 中国石油化工股份有限公司 | Atomization generating device and atomization method |
-
1993
- 1993-11-12 CA CA002385675A patent/CA2385675C/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114904675A (en) * | 2021-02-08 | 2022-08-16 | 中国石油化工股份有限公司 | Atomization generating device and atomization method |
| CN114904675B (en) * | 2021-02-08 | 2023-10-10 | 中国石油化工股份有限公司 | Atomization generating device and atomization method |
Also Published As
| Publication number | Publication date |
|---|---|
| CA2385675C (en) | 2003-09-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKEX | Expiry |
Effective date: 20131112 |