CA2336369A1 - Dispositif et procede permettant de reduire l'accumulation de charge sur un substrat - Google Patents

Dispositif et procede permettant de reduire l'accumulation de charge sur un substrat Download PDF

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Publication number
CA2336369A1
CA2336369A1 CA002336369A CA2336369A CA2336369A1 CA 2336369 A1 CA2336369 A1 CA 2336369A1 CA 002336369 A CA002336369 A CA 002336369A CA 2336369 A CA2336369 A CA 2336369A CA 2336369 A1 CA2336369 A1 CA 2336369A1
Authority
CA
Canada
Prior art keywords
charge
reducing device
particle beam
charged particle
charged particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002336369A
Other languages
English (en)
Inventor
Marian Mankos
Tai-Hon P. Chang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of CA2336369A1 publication Critical patent/CA2336369A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

L'invention concerne un système permettant de réduire une charge de surface cible en lithographie ou microscopie à faisceau de particules chargées. On utilise pour cela un dispositif comprenant: une colonne de faisceau produisant un faisceau de particules chargées en direction de la surface; et un dispositif de réduction de charge placé entre la surface et la colonne de faisceau, ce dispositif émettant des particules chargées pour neutraliser la charge sur la surface. Le dispositif réducteur en question peut comprendre un dispositif MOS et une source de tension, laquelle est couplée en vue de fournir une tension aux bornes du dispositif MOS pour l'émission des particules chargées via ce dispositif MOS. Le dispositif réducteur peut comporter plusieurs dispositifs MOS montés sur une structure mécanique et une source de tension, laquelle est couplée en vue de fournir une tension aux bornes des dispositifs MOS pour l'émission des particules chargées via ces dispositifs MOS. L'invention concerne en outre un procédé permettant de réduire une charge de surface, qui consiste à produire un faisceau de particules chargées en direction de la surface cible et à émettre des particules chargées afin de neutraliser la charge résultante sur la surface.
CA002336369A 1999-05-03 2000-05-03 Dispositif et procede permettant de reduire l'accumulation de charge sur un substrat Abandoned CA2336369A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30411899A 1999-05-03 1999-05-03
US09/304,118 1999-05-03
PCT/US2000/040017 WO2000067289A1 (fr) 1999-05-03 2000-05-03 Dispositif et procede permettant de reduire l'accumulation de charge sur un substrat

Publications (1)

Publication Number Publication Date
CA2336369A1 true CA2336369A1 (fr) 2000-11-09

Family

ID=23175122

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002336369A Abandoned CA2336369A1 (fr) 1999-05-03 2000-05-03 Dispositif et procede permettant de reduire l'accumulation de charge sur un substrat

Country Status (7)

Country Link
EP (1) EP1093662A1 (fr)
JP (1) JP2002543575A (fr)
KR (1) KR20010071719A (fr)
AU (1) AU4860300A (fr)
CA (1) CA2336369A1 (fr)
IL (1) IL140122A0 (fr)
WO (1) WO2000067289A1 (fr)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01296545A (ja) * 1988-05-24 1989-11-29 Mitsubishi Electric Corp イオンビーム中性化装置
EP0417354A1 (fr) * 1989-09-15 1991-03-20 Koninklijke Philips Electronics N.V. Appareil à faisceau d'électrons avec compensation des charges accumulées
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
JP2773575B2 (ja) * 1992-09-28 1998-07-09 三菱電機株式会社 半導体製造装置
JP3633154B2 (ja) * 1996-03-22 2005-03-30 株式会社日立製作所 薄膜型電子源および薄膜型電子源応用機器
JPH09274881A (ja) * 1996-04-05 1997-10-21 Jeol Ltd 走査電子顕微鏡

Also Published As

Publication number Publication date
KR20010071719A (ko) 2001-07-31
AU4860300A (en) 2000-11-17
WO2000067289A9 (fr) 2002-08-08
WO2000067289A1 (fr) 2000-11-09
EP1093662A1 (fr) 2001-04-25
IL140122A0 (en) 2002-02-10
JP2002543575A (ja) 2002-12-17

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Legal Events

Date Code Title Description
FZDE Discontinued
FZDE Discontinued

Effective date: 20030402