AU4860300A - Apparatus and method for reducing charge accumulation on a substrate - Google Patents

Apparatus and method for reducing charge accumulation on a substrate

Info

Publication number
AU4860300A
AU4860300A AU48603/00A AU4860300A AU4860300A AU 4860300 A AU4860300 A AU 4860300A AU 48603/00 A AU48603/00 A AU 48603/00A AU 4860300 A AU4860300 A AU 4860300A AU 4860300 A AU4860300 A AU 4860300A
Authority
AU
Australia
Prior art keywords
substrate
charge accumulation
reducing charge
reducing
accumulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU48603/00A
Inventor
Tai-Hon P. Chang
Marian Mankos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Etec Systems Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of AU4860300A publication Critical patent/AU4860300A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AU48603/00A 1999-05-03 2000-05-03 Apparatus and method for reducing charge accumulation on a substrate Abandoned AU4860300A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30411899A 1999-05-03 1999-05-03
US09304118 1999-05-03
PCT/US2000/040017 WO2000067289A1 (en) 1999-05-03 2000-05-03 Apparatus and method for reducing charge accumulation on a substrate

Publications (1)

Publication Number Publication Date
AU4860300A true AU4860300A (en) 2000-11-17

Family

ID=23175122

Family Applications (1)

Application Number Title Priority Date Filing Date
AU48603/00A Abandoned AU4860300A (en) 1999-05-03 2000-05-03 Apparatus and method for reducing charge accumulation on a substrate

Country Status (7)

Country Link
EP (1) EP1093662A1 (en)
JP (1) JP2002543575A (en)
KR (1) KR20010071719A (en)
AU (1) AU4860300A (en)
CA (1) CA2336369A1 (en)
IL (1) IL140122A0 (en)
WO (1) WO2000067289A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01296545A (en) * 1988-05-24 1989-11-29 Mitsubishi Electric Corp Ion beam neutralizing device
EP0417354A1 (en) * 1989-09-15 1991-03-20 Koninklijke Philips Electronics N.V. Electron beam apparatus with charge-up compensation
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
JP2773575B2 (en) * 1992-09-28 1998-07-09 三菱電機株式会社 Semiconductor manufacturing equipment
JP3633154B2 (en) * 1996-03-22 2005-03-30 株式会社日立製作所 Thin film type electron source and thin film type electron source application equipment
JPH09274881A (en) * 1996-04-05 1997-10-21 Jeol Ltd Scanning electron microscope

Also Published As

Publication number Publication date
JP2002543575A (en) 2002-12-17
CA2336369A1 (en) 2000-11-09
WO2000067289A9 (en) 2002-08-08
EP1093662A1 (en) 2001-04-25
IL140122A0 (en) 2002-02-10
KR20010071719A (en) 2001-07-31
WO2000067289A1 (en) 2000-11-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase