CA2146304A1 - Non-corrosion photoresist stripping composition - Google Patents
Non-corrosion photoresist stripping compositionInfo
- Publication number
- CA2146304A1 CA2146304A1 CA002146304A CA2146304A CA2146304A1 CA 2146304 A1 CA2146304 A1 CA 2146304A1 CA 002146304 A CA002146304 A CA 002146304A CA 2146304 A CA2146304 A CA 2146304A CA 2146304 A1 CA2146304 A1 CA 2146304A1
- Authority
- CA
- Canada
- Prior art keywords
- group
- stripper
- weight
- stripper composition
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US228,775 | 1994-04-18 | ||
US08/228,775 US5472830A (en) | 1994-04-18 | 1994-04-18 | Non-corrosion photoresist stripping composition |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2146304A1 true CA2146304A1 (en) | 1995-10-19 |
Family
ID=22858538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002146304A Abandoned CA2146304A1 (en) | 1994-04-18 | 1995-04-04 | Non-corrosion photoresist stripping composition |
Country Status (5)
Country | Link |
---|---|
US (1) | US5472830A (ja) |
EP (1) | EP0678788A3 (ja) |
JP (1) | JP2914646B2 (ja) |
KR (1) | KR950033702A (ja) |
CA (1) | CA2146304A1 (ja) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5597678A (en) * | 1994-04-18 | 1997-01-28 | Ocg Microelectronic Materials, Inc. | Non-corrosive photoresist stripper composition |
US5561105A (en) * | 1995-05-08 | 1996-10-01 | Ocg Microelectronic Materials, Inc. | Chelating reagent containing photoresist stripper composition |
US5507978A (en) * | 1995-05-08 | 1996-04-16 | Ocg Microelectronic Materials, Inc. | Novolak containing photoresist stripper composition |
US5612304A (en) * | 1995-07-07 | 1997-03-18 | Olin Microelectronic Chemicals, Inc. | Redox reagent-containing post-etch residue cleaning composition |
US5648324A (en) * | 1996-01-23 | 1997-07-15 | Ocg Microelectronic Materials, Inc. | Photoresist stripping composition |
US5665688A (en) * | 1996-01-23 | 1997-09-09 | Olin Microelectronics Chemicals, Inc. | Photoresist stripping composition |
US5817610A (en) * | 1996-09-06 | 1998-10-06 | Olin Microelectronic Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
US6030932A (en) | 1996-09-06 | 2000-02-29 | Olin Microelectronic Chemicals | Cleaning composition and method for removing residues |
US5780406A (en) * | 1996-09-06 | 1998-07-14 | Honda; Kenji | Non-corrosive cleaning composition for removing plasma etching residues |
US5759973A (en) * | 1996-09-06 | 1998-06-02 | Olin Microelectronic Chemicals, Inc. | Photoresist stripping and cleaning compositions |
FR2756837B1 (fr) * | 1996-12-06 | 1999-01-15 | Atochem Elf Sa | Composition decapante pour peintures, vernis ou laques |
DE69613476T2 (de) * | 1996-12-09 | 2002-04-18 | Imec Inter Uni Micro Electr | Metallspülungsverfahren mit kontrollierter Metallmikrokorrosionsreduktion |
US5798323A (en) * | 1997-05-05 | 1998-08-25 | Olin Microelectronic Chemicals, Inc. | Non-corrosive stripping and cleaning composition |
US6268323B1 (en) | 1997-05-05 | 2001-07-31 | Arch Specialty Chemicals, Inc. | Non-corrosive stripping and cleaning composition |
US6033993A (en) * | 1997-09-23 | 2000-03-07 | Olin Microelectronic Chemicals, Inc. | Process for removing residues from a semiconductor substrate |
US6130195A (en) * | 1997-11-03 | 2000-10-10 | Kyzen Corporation | Cleaning compositions and methods for cleaning using cyclic ethers and alkoxy methyl butanols |
US5962197A (en) * | 1998-03-27 | 1999-10-05 | Analyze Inc. | Alkaline organic photoresist stripper |
US6878213B1 (en) | 1998-12-07 | 2005-04-12 | Scp Global Technologies, Inc. | Process and system for rinsing of semiconductor substrates |
KR100286860B1 (ko) * | 1998-12-31 | 2001-07-12 | 주식회사 동진쎄미켐 | 포토레지스트 리무버 조성물 |
US6413923B2 (en) | 1999-11-15 | 2002-07-02 | Arch Specialty Chemicals, Inc. | Non-corrosive cleaning composition for removing plasma etching residues |
US6455479B1 (en) | 2000-08-03 | 2002-09-24 | Shipley Company, L.L.C. | Stripping composition |
TWI275903B (en) * | 2001-03-13 | 2007-03-11 | Nagase Chemtex Corp | A composition for stripping photo resist |
CN1261826C (zh) * | 2002-01-11 | 2006-06-28 | Az电子材料(日本)株式会社 | 一种用于正性或负性光刻胶的清洗剂组合物 |
NI200300043A (es) | 2002-03-28 | 2003-11-05 | Warner Lambert Co | AMINOACIDOS CON AFINIDAD POR LA PROTEINA a2DELTA. |
US7166419B2 (en) * | 2002-09-26 | 2007-01-23 | Air Products And Chemicals, Inc. | Compositions substrate for removing etching residue and use thereof |
BRPI0414819A (pt) | 2003-09-25 | 2006-11-14 | Warner Lambert Co | pró-fármacos de aminoácidos com afinidade para a proteìna alfa2delta |
JP4782200B2 (ja) * | 2005-08-13 | 2011-09-28 | テクノ セミケム シーオー., エルティーディー. | 半導体製造用感光性樹脂除去剤組成物 |
KR100793241B1 (ko) * | 2006-06-19 | 2008-01-10 | 삼성전자주식회사 | 실리콘 고분자 및 포토레지스트 제거용 조성물, 이를이용한 막 제거 방법 및 패턴 형성 방법 |
WO2010073887A1 (ja) * | 2008-12-25 | 2010-07-01 | ナガセケムテックス株式会社 | フォトレジスト剥離剤組成物、積層金属配線基板のフォトレジスト剥離方法及び製造方法 |
JP6112446B2 (ja) * | 2012-10-31 | 2017-04-12 | パナソニックIpマネジメント株式会社 | フォトレジスト剥離液組成物 |
CN110441997B (zh) * | 2019-08-19 | 2023-02-24 | 江阴江化微电子材料股份有限公司 | 一种改进的环保水系光刻胶剥离液 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4306933A (en) * | 1980-02-11 | 1981-12-22 | Chemline Industries | Tin/tin-lead stripping solutions |
JPS56115368A (en) * | 1980-02-15 | 1981-09-10 | San Ei Chem Ind Ltd | Releasing agent of photosensitive polymer |
US4455364A (en) * | 1981-11-14 | 1984-06-19 | Konishiroku Photo Industry Co., Ltd. | Process for forming metallic image, composite material for the same |
DE3501675A1 (de) * | 1985-01-19 | 1986-07-24 | Merck Patent Gmbh, 6100 Darmstadt | Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten |
US4617251A (en) * | 1985-04-11 | 1986-10-14 | Olin Hunt Specialty Products, Inc. | Stripping composition and method of using the same |
JPH0721638B2 (ja) * | 1986-07-18 | 1995-03-08 | 東京応化工業株式会社 | 基板の処理方法 |
US4770713A (en) * | 1986-12-10 | 1988-09-13 | Advanced Chemical Technologies, Inc. | Stripping compositions containing an alkylamide and an alkanolamine and use thereof |
JPS63208043A (ja) * | 1987-02-25 | 1988-08-29 | Kanto Kagaku Kk | ポジ型フオトレジスト用水溶性剥離液 |
JP2553872B2 (ja) * | 1987-07-21 | 1996-11-13 | 東京応化工業株式会社 | ホトレジスト用剥離液 |
US4824763A (en) * | 1987-07-30 | 1989-04-25 | Ekc Technology, Inc. | Triamine positive photoresist stripping composition and prebaking process |
JPH0769619B2 (ja) * | 1987-09-25 | 1995-07-31 | 旭化成工業株式会社 | フオトレジスト剥離剤 |
DE3828513A1 (de) * | 1988-08-23 | 1990-03-01 | Merck Patent Gmbh | Abloesemittel fuer fotoresists |
US5102777A (en) * | 1990-02-01 | 1992-04-07 | Ardrox Inc. | Resist stripping |
US5279771A (en) * | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
JPH04305660A (ja) * | 1991-04-03 | 1992-10-28 | Sharp Corp | 画像形成装置 |
DE69333877T2 (de) * | 1992-07-09 | 2006-06-14 | Ekc Technology Inc | Reinigungsmittelzusammensetzung, das einem Redox Aminverbindung enthält |
WO1994008276A1 (en) * | 1992-09-28 | 1994-04-14 | Ducoa L.P. | Photoresist stripping process using n,n-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide |
US5308745A (en) * | 1992-11-06 | 1994-05-03 | J. T. Baker Inc. | Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins |
-
1994
- 1994-04-18 US US08/228,775 patent/US5472830A/en not_active Expired - Fee Related
-
1995
- 1995-04-04 CA CA002146304A patent/CA2146304A1/en not_active Abandoned
- 1995-04-13 EP EP95302487A patent/EP0678788A3/en not_active Ceased
- 1995-04-17 JP JP7090427A patent/JP2914646B2/ja not_active Expired - Fee Related
- 1995-04-17 KR KR1019950008923A patent/KR950033702A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US5472830A (en) | 1995-12-05 |
EP0678788A2 (en) | 1995-10-25 |
EP0678788A3 (en) | 1997-01-08 |
KR950033702A (ko) | 1995-12-26 |
JPH07295240A (ja) | 1995-11-10 |
JP2914646B2 (ja) | 1999-07-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FZDE | Discontinued |