CA2023205A1 - Method of depositing directly activated species onto a remotely located substrate - Google Patents
Method of depositing directly activated species onto a remotely located substrateInfo
- Publication number
- CA2023205A1 CA2023205A1 CA 2023205 CA2023205A CA2023205A1 CA 2023205 A1 CA2023205 A1 CA 2023205A1 CA 2023205 CA2023205 CA 2023205 CA 2023205 A CA2023205 A CA 2023205A CA 2023205 A1 CA2023205 A1 CA 2023205A1
- Authority
- CA
- Canada
- Prior art keywords
- precursor
- species
- deposition gas
- enclosure
- activated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
A method of depositing high quality thin film at a high rate of deposition through the formation of a high flux of activated precursor species of a precursor deposition gas by employing a substantial pressure differential between the pressure adjacent the aperture in a conduit from which said precursor deposition gas is introduced into the interior of a vacuumized enclosure and the background pressure which exits in said enclosure. As the precursor deposition gas is introduced into said enclosure, a high density plume of said activated precursor species are formed therefrom due to an electromagnetic field established in an activation region adjacent said aperture. The pressure differential is sufficient to cause those activated precursor species to be deposited upon a remotely positioned substrate. In order to obtain a sufficient pressure differential, it is preferred that the flow of the precursor deposition gas reaches transonic velocity. And in order to obtain a high quality thin film, it is preferred that the plume of activated precursor species is spaced from the substrate; without structural or electrical confinement, a distance from the activation region greater than the mean free path of undesired activated precursor species and within the mean free path of desired species.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA 2023205 CA2023205C (en) | 1990-08-13 | 1990-08-13 | Method of depositing directly activated species onto a remotely located substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA 2023205 CA2023205C (en) | 1990-08-13 | 1990-08-13 | Method of depositing directly activated species onto a remotely located substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2023205A1 true CA2023205A1 (en) | 1992-02-14 |
CA2023205C CA2023205C (en) | 1998-07-07 |
Family
ID=4145727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA 2023205 Expired - Fee Related CA2023205C (en) | 1990-08-13 | 1990-08-13 | Method of depositing directly activated species onto a remotely located substrate |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA2023205C (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115572938A (en) * | 2022-07-18 | 2023-01-06 | 江西弘耀光学水晶有限公司 | High-precision optical lens coating method |
-
1990
- 1990-08-13 CA CA 2023205 patent/CA2023205C/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115572938A (en) * | 2022-07-18 | 2023-01-06 | 江西弘耀光学水晶有限公司 | High-precision optical lens coating method |
CN115572938B (en) * | 2022-07-18 | 2024-03-22 | 江西弘耀光学水晶有限公司 | High-precision optical lens coating method |
Also Published As
Publication number | Publication date |
---|---|
CA2023205C (en) | 1998-07-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4572842A (en) | Method and apparatus for reactive vapor deposition of compounds of metal and semi-conductors | |
GB1364898A (en) | Method for depositing refractory metal | |
CA2023205A1 (en) | Method of depositing directly activated species onto a remotely located substrate | |
JPS56165932A (en) | Production of magnetic recording medium | |
CA2037432A1 (en) | Method of and apparatus for preparing oxide superconducting film | |
JPS5720919A (en) | Magnetic recording medium and its manufacture | |
JPS57200945A (en) | Magnetic recording medium | |
JPH05311425A (en) | Semiconductor device manufacturing equipment | |
JPS6414727A (en) | Apparatus for producing magnetic recording medium | |
JPH073420A (en) | Molten metal plating amount control device | |
JPH06101439B2 (en) | Gas flow method for CVD apparatus | |
JPS5925884Y2 (en) | sputtering device | |
JPS6080137A (en) | Production device of vertical magnetic recording medium | |
JPS57156031A (en) | Formation of thin film and vacuum deposition device | |
JP2832385B2 (en) | Method of forming silicon-based thin film | |
JPS63182822A (en) | Microwave plasma processing equipment | |
JPS5837843A (en) | Production of magnetic recording medium | |
JPS57158374A (en) | Plated steel strip by vapor deposition of pb-zn binary alloy and producing device thereof | |
JPS5684471A (en) | Vacuum evaporation | |
JPS5591971A (en) | Thin film forming method | |
KR950007919Y1 (en) | Atmoscan Tube | |
JPH0139712Y2 (en) | ||
JPS5684470A (en) | Vacuum evaporation | |
JPH0434448B2 (en) | ||
JPS5860432A (en) | Manufacture of magnetic recording medium |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |