CA1260649C - - Google Patents
Info
- Publication number
- CA1260649C CA1260649C CA 483186 CA483186A CA1260649C CA 1260649 C CA1260649 C CA 1260649C CA 483186 CA483186 CA 483186 CA 483186 A CA483186 A CA 483186A CA 1260649 C CA1260649 C CA 1260649C
- Authority
- CA
- Canada
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F246/00—Copolymers in which the nature of only the monomers in minority is defined
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/52—Amides or imides
- C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F20/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Pyridine Compounds (AREA)
- Paints Or Removers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA000591570A CA1260649A (en) | 1984-06-06 | 1989-02-20 | Polymeric pyridinium ylide and products prepared from same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/617,726 US4617253A (en) | 1984-06-06 | 1984-06-06 | Polymeric pyridinium ylides and products prepared from same |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000591570A Division CA1260649A (en) | 1984-06-06 | 1989-02-20 | Polymeric pyridinium ylide and products prepared from same |
Publications (2)
Publication Number | Publication Date |
---|---|
CA1258653A CA1258653A (en) | 1989-08-22 |
CA1260649C true CA1260649C (el) | 1989-09-26 |
Family
ID=24474806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000483186A Expired CA1258653A (en) | 1984-06-06 | 1985-06-05 | PYRIDINIUM YLIDE POLYMERS AND PRODUCTS DERIVED THEREOF |
Country Status (7)
Country | Link |
---|---|
US (2) | US4617253A (el) |
EP (1) | EP0164100B1 (el) |
JP (1) | JPS619410A (el) |
KR (1) | KR910000219B1 (el) |
AU (2) | AU570116B2 (el) |
CA (1) | CA1258653A (el) |
DE (1) | DE3587257T2 (el) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4706167A (en) * | 1983-11-10 | 1987-11-10 | Telemark Co., Inc. | Circuit wiring disposed on solder mask coating |
DE3527889A1 (de) * | 1985-08-03 | 1987-02-05 | Basf Ag | Photoreaktive polymere fuer die herstellung von reliefstrukturen |
US4910268A (en) * | 1987-04-22 | 1990-03-20 | Shiro Kobayashi | Acryl type macromonomer having a polyethyleneimine derivative chain and process for producing the same, as well as graft polymer having a polyethyleneimine derivative chain as the graft chain and process for producing the same |
DE3806088A1 (de) * | 1988-02-26 | 1989-09-07 | Basf Ag | Photoreaktive polymere und verfahren zur herstellung eines zweilagenresists |
US5159039A (en) * | 1989-04-13 | 1992-10-27 | Polysep Surface Technologies Inc. | Separation media containing acyl diazepines |
US5158682A (en) * | 1989-04-13 | 1992-10-27 | Polysep Surface Technologies Inc. | Separation media containing acyl diazepines |
AU4033193A (en) * | 1991-12-30 | 1994-11-08 | Dow Chemical Company, The | Photocurable compositions |
US5705585A (en) * | 1993-06-30 | 1998-01-06 | Arqule, Inc. | Aminimide-containing molecules and materials as molecular recognition agents |
US7034110B2 (en) | 1994-01-05 | 2006-04-25 | Arqule, Inc. | Method of identifying chemical compounds having selected properties for a particular application |
JPH09507852A (ja) * | 1994-01-05 | 1997-08-12 | アーキュール,インコーポレーテッド | 特定の性質を有するポリマーの製造方法 |
US5734082A (en) * | 1994-10-20 | 1998-03-31 | Arqule Inc. | Hydroxyethyl aminimides |
US5712171A (en) * | 1995-01-20 | 1998-01-27 | Arqule, Inc. | Method of generating a plurality of chemical compounds in a spatially arranged array |
WO1996031263A1 (en) * | 1995-04-06 | 1996-10-10 | Arqule, Inc. | Method for rapid purification, analysis and characterization of collections of chemical compounds |
US5962412A (en) * | 1996-06-10 | 1999-10-05 | Arqule, Inc. | Method of making polymers having specific properties |
JP4023867B2 (ja) * | 1997-05-09 | 2007-12-19 | 沖電気工業株式会社 | レジスト用感光性樹脂組成物 |
WO2000034267A1 (fr) * | 1998-12-04 | 2000-06-15 | Takeda Chemical Industries, Ltd. | Procede de production d'un compose d'amide cyclique |
US6704113B1 (en) * | 2000-03-28 | 2004-03-09 | Juliusz W. Adamczuk | Non-destructive surface inspection and profiling |
JP2004311957A (ja) * | 2003-03-26 | 2004-11-04 | Seiko Epson Corp | デバイスとその製造方法及び電気光学装置並びに電子機器 |
CN102163721B (zh) | 2006-12-15 | 2013-03-27 | 东京应化工业株式会社 | 负极基材 |
TWI384594B (zh) * | 2008-06-05 | 2013-02-01 | Unimicron Technology Corp | 內埋式線路結構的製程 |
US8388824B2 (en) * | 2008-11-26 | 2013-03-05 | Enthone Inc. | Method and composition for electrodeposition of copper in microelectronics with dipyridyl-based levelers |
US9193874B2 (en) | 2012-07-16 | 2015-11-24 | Empire Technology Development Llc | Self-renewing hydrophilic organic coatings |
US9493670B2 (en) * | 2013-04-18 | 2016-11-15 | Empire Technology Development Llc | Coatings that provide hydrophilic surface |
JP7125751B2 (ja) * | 2018-11-01 | 2022-08-25 | 学校法人 関西大学 | 化合物およびその合成方法ならびに重合体およびその合成方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2718516A (en) * | 1952-11-08 | 1955-09-20 | Rohm & Haas | Isocyanato esters of acrylic, methacrylic, and crotonic acids |
BE536847A (el) * | 1954-03-26 | |||
DE1227241B (de) * | 1964-07-16 | 1966-10-20 | Bayer Ag | Verfahren zur Herstellung von Acrylnitril-Copolymerisaten |
US3641145A (en) * | 1967-08-23 | 1972-02-08 | Ashland Oil Inc | Vinyl aromatic aminimides |
GB1240709A (en) * | 1968-07-18 | 1971-07-28 | Ciba Ltd | Curable compositions containing an epoxide resin and a copolymer of an olefine hydrocarbon with an olefine ester |
GB1465905A (en) * | 1973-11-30 | 1977-03-02 | Ici Ltd | Ammonioamidates |
FR2253011A1 (en) * | 1973-11-30 | 1975-06-27 | Ici Ltd | Ammonio-amidates for modifying polymers or polymer surfaces - are prepd. from hydrazides pref. prepd. in situ from quaternary hydrazines |
DE2456893A1 (de) * | 1974-12-02 | 1976-08-12 | Siemens Ag | Speicherelement |
US4282201A (en) * | 1979-02-02 | 1981-08-04 | Alza Corporation | Pharmaceutical comprising drug and polymer |
DE3130545C2 (de) * | 1981-08-01 | 1986-05-07 | Basf Farben + Fasern Ag, 2000 Hamburg | Selbstvernetzendes Kunstharz |
JPS61278577A (ja) * | 1985-06-05 | 1986-12-09 | Mitsubishi Rayon Co Ltd | 紫外線硬化型インキ組成物 |
-
1984
- 1984-06-06 US US06/617,726 patent/US4617253A/en not_active Expired - Lifetime
-
1985
- 1985-06-05 JP JP60122354A patent/JPS619410A/ja active Granted
- 1985-06-05 CA CA000483186A patent/CA1258653A/en not_active Expired
- 1985-06-05 DE DE8585106888T patent/DE3587257T2/de not_active Expired - Fee Related
- 1985-06-05 AU AU43309/85A patent/AU570116B2/en not_active Ceased
- 1985-06-05 EP EP85106888A patent/EP0164100B1/en not_active Expired - Lifetime
- 1985-06-05 KR KR1019850003949A patent/KR910000219B1/ko not_active IP Right Cessation
-
1986
- 1986-06-27 US US06/879,394 patent/US4670528A/en not_active Expired - Lifetime
-
1988
- 1988-01-14 AU AU10290/88A patent/AU591373B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
US4617253A (en) | 1986-10-14 |
KR860000323A (ko) | 1986-01-28 |
EP0164100A2 (en) | 1985-12-11 |
AU570116B2 (en) | 1988-03-03 |
JPH0548270B2 (el) | 1993-07-21 |
EP0164100B1 (en) | 1993-04-14 |
KR910000219B1 (ko) | 1991-01-23 |
JPS619410A (ja) | 1986-01-17 |
US4670528A (en) | 1987-06-02 |
AU4330985A (en) | 1985-12-12 |
AU1029088A (en) | 1988-04-28 |
CA1258653A (en) | 1989-08-22 |
DE3587257D1 (de) | 1993-05-19 |
DE3587257T2 (de) | 1993-07-29 |
AU591373B2 (en) | 1989-11-30 |
EP0164100A3 (en) | 1987-08-05 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |