AU4033193A - Photocurable compositions - Google Patents

Photocurable compositions

Info

Publication number
AU4033193A
AU4033193A AU40331/93A AU4033193A AU4033193A AU 4033193 A AU4033193 A AU 4033193A AU 40331/93 A AU40331/93 A AU 40331/93A AU 4033193 A AU4033193 A AU 4033193A AU 4033193 A AU4033193 A AU 4033193A
Authority
AU
Australia
Prior art keywords
photocurable compositions
photocurable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU40331/93A
Inventor
Edward E Flagg
Gene D Rose
Donald L. Schmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Chemical Co
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/814,846 external-priority patent/US5238747A/en
Priority claimed from US07/920,029 external-priority patent/US5310581A/en
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of AU4033193A publication Critical patent/AU4033193A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
AU40331/93A 1991-12-30 1993-04-20 Photocurable compositions Abandoned AU4033193A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/814,846 US5238747A (en) 1989-12-29 1991-12-30 Photocurable compositions
US07/920,029 US5310581A (en) 1989-12-29 1992-07-27 Photocurable compositions
PCT/US1993/003717 WO1994024609A2 (en) 1991-12-30 1993-04-20 Photocurable compositions

Publications (1)

Publication Number Publication Date
AU4033193A true AU4033193A (en) 1994-11-08

Family

ID=27123886

Family Applications (1)

Application Number Title Priority Date Filing Date
AU40331/93A Abandoned AU4033193A (en) 1991-12-30 1993-04-20 Photocurable compositions

Country Status (4)

Country Link
EP (1) EP0695437A1 (en)
JP (1) JPH08509820A (en)
AU (1) AU4033193A (en)
WO (1) WO1994024609A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4285020B2 (en) * 2003-02-14 2009-06-24 コニカミノルタホールディングス株式会社 Image forming method using actinic ray curable ink
US8187991B2 (en) 2008-06-11 2012-05-29 General Electric Company Methods for regeneration of adsorbent material
JP5658932B2 (en) * 2009-07-14 2015-01-28 住友化学株式会社 Novel compound, resist composition and pattern forming method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1098892A (en) * 1965-04-08 1968-01-10 Agfa Gevaert Ag Photosensitive materials prepared from homopolymers and copolymers of salts of n-vinylbenzyl-4-vinylpyridine
US4161407A (en) * 1977-10-06 1979-07-17 Eastman Kodak Company Crosslinkable polymers having vinylsulfonyl groups or styrylsulfonyl groups and their use as hardeners for gelatin
US4617253A (en) * 1984-06-06 1986-10-14 Polaroid Corporation Polymeric pyridinium ylides and products prepared from same
US4941972A (en) * 1984-12-06 1990-07-17 The Dow Chemical Company Chlorine-stable membrane compositions
US4704324A (en) * 1985-04-03 1987-11-03 The Dow Chemical Company Semi-permeable membranes prepared via reaction of cationic groups with nucleophilic groups
US5006624A (en) * 1987-05-14 1991-04-09 The Dow Chemical Company Fluorocarbon containing, reactive polymeric surfactants and coating compositions therefrom
US5238747A (en) * 1989-12-29 1993-08-24 The Dow Chemical Company Photocurable compositions

Also Published As

Publication number Publication date
WO1994024609A3 (en) 1995-03-09
EP0695437A1 (en) 1996-02-07
JPH08509820A (en) 1996-10-15
WO1994024609A2 (en) 1994-10-27

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