CA1227160A - Coatings for ink jet nozzles - Google Patents
Coatings for ink jet nozzlesInfo
- Publication number
- CA1227160A CA1227160A CA000499172A CA499172A CA1227160A CA 1227160 A CA1227160 A CA 1227160A CA 000499172 A CA000499172 A CA 000499172A CA 499172 A CA499172 A CA 499172A CA 1227160 A CA1227160 A CA 1227160A
- Authority
- CA
- Canada
- Prior art keywords
- coating
- plate
- nozzle plate
- ink jet
- silane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 title claims description 14
- 150000001335 aliphatic alkanes Chemical class 0.000 claims abstract 3
- 150000001343 alkyl silanes Chemical class 0.000 claims abstract 3
- 239000011248 coating agent Substances 0.000 claims description 12
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical group FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 4
- 229960004065 perflutren Drugs 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- DIJRHOZMLZRNLM-UHFFFAOYSA-N dimethoxy-methyl-(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](C)(OC)CCC(F)(F)F DIJRHOZMLZRNLM-UHFFFAOYSA-N 0.000 claims description 2
- -1 silane compound Chemical class 0.000 claims 4
- 229910000077 silane Inorganic materials 0.000 claims 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 1
- VNICVKNFHBWJHH-UHFFFAOYSA-N FC([Si](Cl)(Cl)C(C(C(OC(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F Chemical compound FC([Si](Cl)(Cl)C(C(C(OC(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F VNICVKNFHBWJHH-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 229920006334 epoxy coating Polymers 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
- Y10T428/31544—Addition polymer is perhalogenated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
- Y10T428/31699—Ester, halide or nitrile of addition polymer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/714,770 US4643948A (en) | 1985-03-22 | 1985-03-22 | Coatings for ink jet nozzles |
US06/714,770 | 1985-03-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1227160A true CA1227160A (en) | 1987-09-22 |
Family
ID=24871383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000499172A Expired CA1227160A (en) | 1985-03-22 | 1986-01-08 | Coatings for ink jet nozzles |
Country Status (5)
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0764061B2 (ja) * | 1988-07-05 | 1995-07-12 | テクトロニックス・インコーポレイテッド | インクジェットヘッド及びその製造方法 |
US5017946A (en) * | 1988-07-21 | 1991-05-21 | Canon Kabushiki Kaisha | Ink jet recording head having surface treatment layer and recording equipment having the head |
CA1329341C (en) * | 1988-10-19 | 1994-05-10 | Rosemary Bridget Albinson | Method of forming adherent fluorosilane layer on a substrate and ink jet recording head containing such a layer |
DE3838905A1 (de) * | 1988-11-17 | 1990-05-31 | Knut Dipl Phys Dr Enke | Kratzfester gebrauchsgegenstand, verfahren zu seiner herstellung sowie vorrichtung zur durchfuehrung dieser verfahren |
GB8906379D0 (en) * | 1989-03-20 | 1989-05-04 | Am Int | Providing a surface with solvent-wettable and solvent-non wettable zones |
DE3918472A1 (de) * | 1989-06-06 | 1990-12-13 | Siemens Ag | Hydrophobierungsmittel und anwendungsverfahren, insbesondere bei tintenstrahldruckkoepfen |
US5073785A (en) * | 1990-04-30 | 1991-12-17 | Xerox Corporation | Coating processes for an ink jet printhead |
US5119116A (en) * | 1990-07-31 | 1992-06-02 | Xerox Corporation | Thermal ink jet channel with non-wetting walls and a step structure |
US5212496A (en) * | 1990-09-28 | 1993-05-18 | Xerox Corporation | Coated ink jet printhead |
US5136310A (en) * | 1990-09-28 | 1992-08-04 | Xerox Corporation | Thermal ink jet nozzle treatment |
US5434606A (en) * | 1991-07-02 | 1995-07-18 | Hewlett-Packard Corporation | Orifice plate for an ink-jet pen |
US5230929A (en) * | 1992-07-20 | 1993-07-27 | Dow Corning Corporation | Plasma-activated chemical vapor deposition of fluoridated cyclic siloxanes |
US5378504A (en) * | 1993-08-12 | 1995-01-03 | Bayard; Michel L. | Method for modifying phase change ink jet printing heads to prevent degradation of ink contact angles |
US5560544A (en) * | 1994-07-01 | 1996-10-01 | The Procter & Gamble Company | Anti-clogging atomizer nozzle |
SG83635A1 (en) * | 1994-08-30 | 2001-10-16 | Xaar Ltd | Coating, coating composition and method of forming coating |
US5598193A (en) * | 1995-03-24 | 1997-01-28 | Hewlett-Packard Company | Treatment of an orifice plate with self-assembled monolayers |
US6243112B1 (en) | 1996-07-01 | 2001-06-05 | Xerox Corporation | High density remote plasma deposited fluoropolymer films |
US5901425A (en) | 1996-08-27 | 1999-05-11 | Topaz Technologies Inc. | Inkjet print head apparatus |
US6071597A (en) * | 1997-08-28 | 2000-06-06 | 3M Innovative Properties Company | Flexible circuits and carriers and process for manufacture |
US6062679A (en) * | 1997-08-28 | 2000-05-16 | Hewlett-Packard Company | Printhead for an inkjet cartridge and method for producing the same |
US6155675A (en) * | 1997-08-28 | 2000-12-05 | Hewlett-Packard Company | Printhead structure and method for producing the same |
US6179413B1 (en) | 1997-10-31 | 2001-01-30 | Hewlett-Packard Company | High durability polymide-containing printhead system and method for making the same |
US6325490B1 (en) | 1998-12-31 | 2001-12-04 | Eastman Kodak Company | Nozzle plate with mixed self-assembled monolayer |
JP2000280481A (ja) * | 1999-04-01 | 2000-10-10 | Matsushita Electric Ind Co Ltd | インクジェットヘッド及びその製造方法 |
US6290331B1 (en) | 1999-09-09 | 2001-09-18 | Hewlett-Packard Company | High efficiency orifice plate structure and printhead using the same |
US6296344B1 (en) | 1999-12-22 | 2001-10-02 | Eastman Kodak Company | Method for replenishing coatings on printhead nozzle plate |
US6364456B1 (en) | 1999-12-22 | 2002-04-02 | Eastman Kodak Company | Replenishable coating for printhead nozzle plate |
KR100552660B1 (ko) * | 2001-08-09 | 2006-02-20 | 삼성전자주식회사 | 버블 젯 방식의 잉크 젯 프린트 헤드 |
US6737109B2 (en) | 2001-10-31 | 2004-05-18 | Xerox Corporation | Method of coating an ejector of an ink jet printhead |
US6942318B2 (en) * | 2002-05-31 | 2005-09-13 | Hewlett-Packard Development Company, L.P. | Chamber having a protective layer |
US6808745B2 (en) * | 2002-08-22 | 2004-10-26 | Eastman Kodak Company | Method of coating micro-electromechanical devices |
JP2004167415A (ja) * | 2002-11-21 | 2004-06-17 | Nikken Toso Kogyo Kk | 撥液性皮膜で被覆されたノズルおよびその形成方法 |
JP2006159730A (ja) * | 2004-12-09 | 2006-06-22 | Canon Inc | インクジェット記録ヘッド用ワイパーブレード部材およびインクジェット記録方法 |
US8042908B2 (en) * | 2007-07-27 | 2011-10-25 | Hewlett-Packard Development Company, L.P. | Fluid ejector device |
US8136922B2 (en) * | 2009-09-01 | 2012-03-20 | Xerox Corporation | Self-assembly monolayer modified printhead |
JP5491806B2 (ja) * | 2009-09-18 | 2014-05-14 | 富士フイルム株式会社 | インクジェットヘッド洗浄用メンテナンス液、インクセット及びメンテナンス方法 |
JP2015503469A (ja) * | 2011-12-30 | 2015-02-02 | オセ−テクノロジーズ ビーブイ | プリントデバイス |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3859320A (en) * | 1972-05-22 | 1975-01-07 | Ici Ltd | Fluorine-containing organosilicon compounds |
US4252848A (en) * | 1977-04-11 | 1981-02-24 | Rca Corporation | Perfluorinated polymer thin films |
US4091166A (en) * | 1977-06-17 | 1978-05-23 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Boron trifluoride coatings for thermoplastic materials and method of applying same in glow discharge |
US4125152A (en) * | 1977-09-19 | 1978-11-14 | Borg-Warner Corporation | Scale resistant heat transfer surfaces and a method for their preparation |
US4226896A (en) * | 1977-12-23 | 1980-10-07 | International Business Machines Corporation | Plasma method for forming a metal containing polymer |
US4391843A (en) * | 1981-08-14 | 1983-07-05 | Rca Corporation | Adherent perfluorinated layers |
-
1985
- 1985-03-22 US US06/714,770 patent/US4643948A/en not_active Expired - Fee Related
- 1985-12-27 JP JP60293409A patent/JPS61220863A/ja active Granted
-
1986
- 1986-01-08 CA CA000499172A patent/CA1227160A/en not_active Expired
- 1986-02-28 EP EP86102648A patent/EP0195292B1/en not_active Expired
- 1986-02-28 DE DE8686102648T patent/DE3666591D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPH03232B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-01-07 |
DE3666591D1 (en) | 1989-11-30 |
JPS61220863A (ja) | 1986-10-01 |
US4643948A (en) | 1987-02-17 |
EP0195292B1 (en) | 1989-10-25 |
EP0195292A3 (en) | 1987-07-01 |
EP0195292A2 (en) | 1986-09-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |