CA1224091A - Chemical vapor deposition of metal compound coatings utilizing metal sub-halide - Google Patents
Chemical vapor deposition of metal compound coatings utilizing metal sub-halideInfo
- Publication number
- CA1224091A CA1224091A CA000447579A CA447579A CA1224091A CA 1224091 A CA1224091 A CA 1224091A CA 000447579 A CA000447579 A CA 000447579A CA 447579 A CA447579 A CA 447579A CA 1224091 A CA1224091 A CA 1224091A
- Authority
- CA
- Canada
- Prior art keywords
- reaction
- hydrogen
- metal
- substrate
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 76
- 239000002184 metal Substances 0.000 title claims abstract description 76
- 238000000576 coating method Methods 0.000 title claims abstract description 74
- 150000002736 metal compounds Chemical group 0.000 title claims description 8
- 238000005229 chemical vapour deposition Methods 0.000 title abstract description 13
- 238000006243 chemical reaction Methods 0.000 claims abstract description 131
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 239000010936 titanium Substances 0.000 claims abstract description 50
- 238000000034 method Methods 0.000 claims abstract description 48
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 47
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 47
- 230000008021 deposition Effects 0.000 claims abstract description 31
- 230000008569 process Effects 0.000 claims abstract description 17
- 230000036961 partial effect Effects 0.000 claims abstract description 16
- 150000002739 metals Chemical class 0.000 claims abstract description 15
- 239000000376 reactant Substances 0.000 claims abstract description 11
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 239000011651 chromium Substances 0.000 claims abstract description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 73
- 239000001257 hydrogen Substances 0.000 claims description 54
- 229910052739 hydrogen Inorganic materials 0.000 claims description 54
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 48
- 239000011248 coating agent Substances 0.000 claims description 42
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 40
- 229910052757 nitrogen Inorganic materials 0.000 claims description 37
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 25
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 25
- 239000008246 gaseous mixture Substances 0.000 claims description 23
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 22
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 22
- 229910021529 ammonia Inorganic materials 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 21
- 239000004215 Carbon black (E152) Substances 0.000 claims description 15
- 229930195733 hydrocarbon Natural products 0.000 claims description 15
- 150000002430 hydrocarbons Chemical class 0.000 claims description 15
- 229910052735 hafnium Inorganic materials 0.000 claims description 9
- 150000004767 nitrides Chemical class 0.000 claims description 9
- -1 titani-um Chemical class 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 8
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 7
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 5
- 229910052753 mercury Inorganic materials 0.000 claims description 5
- 239000010935 stainless steel Substances 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 230000008859 change Effects 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910000601 superalloy Inorganic materials 0.000 claims description 4
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 239000002923 metal particle Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229960005419 nitrogen Drugs 0.000 claims 25
- 150000002431 hydrogen Chemical class 0.000 claims 14
- 229910000039 hydrogen halide Inorganic materials 0.000 claims 2
- 239000012433 hydrogen halide Substances 0.000 claims 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 230000001276 controlling effect Effects 0.000 claims 1
- 229910001873 dinitrogen Inorganic materials 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 238000000151 deposition Methods 0.000 abstract description 32
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 abstract description 13
- 229910010062 TiCl3 Inorganic materials 0.000 abstract description 5
- 150000001875 compounds Chemical class 0.000 abstract description 5
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 abstract description 4
- 230000036647 reaction Effects 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 13
- 238000005660 chlorination reaction Methods 0.000 description 11
- 230000002349 favourable effect Effects 0.000 description 5
- 229910010068 TiCl2 Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- ZWYDDDAMNQQZHD-UHFFFAOYSA-L titanium(ii) chloride Chemical compound [Cl-].[Cl-].[Ti+2] ZWYDDDAMNQQZHD-UHFFFAOYSA-L 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910010066 TiC14 Inorganic materials 0.000 description 2
- 229910001315 Tool steel Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 238000011010 flushing procedure Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000005555 metalworking Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 208000036366 Sensation of pressure Diseases 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- VNTLIPZTSJSULJ-UHFFFAOYSA-N chromium molybdenum Chemical compound [Cr].[Mo] VNTLIPZTSJSULJ-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical group C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000003334 potential effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000012932 thermodynamic analysis Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46985783A | 1983-02-25 | 1983-02-25 | |
| US469,857 | 1983-02-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1224091A true CA1224091A (en) | 1987-07-14 |
Family
ID=23865309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000447579A Expired CA1224091A (en) | 1983-02-25 | 1984-02-16 | Chemical vapor deposition of metal compound coatings utilizing metal sub-halide |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS60149777A (enrdf_load_stackoverflow) |
| CA (1) | CA1224091A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2775955B2 (ja) * | 1990-01-31 | 1998-07-16 | 三菱マテリアル株式会社 | 耐摩耗性に優れたコーティングサーメットの製造法 |
| US5192589A (en) * | 1991-09-05 | 1993-03-09 | Micron Technology, Inc. | Low-pressure chemical vapor deposition process for depositing thin titanium nitride films having low and stable resistivity |
| JP4983038B2 (ja) * | 2006-02-16 | 2012-07-25 | Ｊｆｅスチール株式会社 | ＴｉＮの成膜方法 |
| JP4816185B2 (ja) * | 2006-03-24 | 2011-11-16 | Ｊｆｅスチール株式会社 | チタン化合物の成膜方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5328575A (en) * | 1976-08-31 | 1978-03-16 | Fujikoshi Kk | Process for coating with titanium carbide |
| JPS5428240A (en) * | 1977-08-05 | 1979-03-02 | Seikosha Kk | Small size precision steel bearing and method of making same |
| JPS54109098A (en) * | 1978-02-15 | 1979-08-27 | Hitachi Metals Ltd | Method of manufacturing hafnium compound |
-
1984
- 1984-02-16 CA CA000447579A patent/CA1224091A/en not_active Expired
- 1984-02-24 JP JP3410484A patent/JPS60149777A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60149777A (ja) | 1985-08-07 |
| JPH0515787B2 (enrdf_load_stackoverflow) | 1993-03-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4803127A (en) | Vapor deposition of metal compound coating utilizing metal sub-halides and coated metal article | |
| CA2077205C (en) | Titanium carbonitride coated stratified substrate | |
| US4239819A (en) | Deposition method and products | |
| US4699082A (en) | Apparatus for chemical vapor deposition | |
| US5417952A (en) | Process for synthesizing titanium carbide, titanium nitride and titanium carbonitride | |
| US4269899A (en) | Surface hafnium-titanium carbide coated hard alloy and method | |
| EP1157143B1 (en) | Mt cvd process | |
| EP0117542B1 (en) | Chemical vapor deposition of metal compound coatings utilizing metal sub-halides | |
| CA1309903C (en) | Deposition of titanium aluminides | |
| CA1224091A (en) | Chemical vapor deposition of metal compound coatings utilizing metal sub-halide | |
| Stjernberg et al. | The rate of chemical vapor deposition of TiC | |
| EP0045291A1 (en) | Method of making a coated cemented carbide body and body produced in such a manner | |
| Täschner et al. | Structure and properties of TiCx layers prepared by plasma-assisted chemical vapour deposition methods | |
| EP0084525B1 (en) | Method of making a coated cemented carbide body and resulting body | |
| Maury et al. | Low‐temperature MOCVD of chromium carbonitride coatings from tetrakis (diethylamido) chromium and pyrolysis mechanism of this single‐source precursor | |
| Laurent et al. | Organometallic Precursors to Vanadium and Titanium Carbonitride | |
| JPS6242996B2 (enrdf_load_stackoverflow) | ||
| JPH0119469B2 (enrdf_load_stackoverflow) | ||
| JPH0119468B2 (enrdf_load_stackoverflow) | ||
| Lee | Carbonization of Titanium and Molybdenum by Hexachloroethane | |
| JPH04254585A (ja) | タングステンカーバイト膜の形成方法 | |
| JPH01252520A (ja) | ホウ素、炭素、窒素からなる繊維およびその製造法 | |
| Sjöstrand | Limitations of present CVD technologies | |
| Amato-Wierda et al. | FACTORS AFFECTING THE AMOUNT OF CARBON IN TITANIUM CARBIDE FILMS MADE BY CVD | |
| Vandenbulcke | Thermodynamic Approach to the Chemical Vapor Deposition of Non‐Stoichiometric Titanium Carbide at 1300–1500 K: Comparison with Experimental Results |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |