CA1224091A - Depot chimique en phase vapeur de couches metalliques, avec utilisation de sous-halogenures de metaux - Google Patents

Depot chimique en phase vapeur de couches metalliques, avec utilisation de sous-halogenures de metaux

Info

Publication number
CA1224091A
CA1224091A CA000447579A CA447579A CA1224091A CA 1224091 A CA1224091 A CA 1224091A CA 000447579 A CA000447579 A CA 000447579A CA 447579 A CA447579 A CA 447579A CA 1224091 A CA1224091 A CA 1224091A
Authority
CA
Canada
Prior art keywords
reaction
hydrogen
metal
substrate
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000447579A
Other languages
English (en)
Inventor
M. Javid Hakim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Liburdi Engineering Ltd
Original Assignee
Liburdi Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Liburdi Engineering Ltd filed Critical Liburdi Engineering Ltd
Application granted granted Critical
Publication of CA1224091A publication Critical patent/CA1224091A/fr
Expired legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
CA000447579A 1983-02-25 1984-02-16 Depot chimique en phase vapeur de couches metalliques, avec utilisation de sous-halogenures de metaux Expired CA1224091A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46985783A 1983-02-25 1983-02-25
US469,857 1983-02-25

Publications (1)

Publication Number Publication Date
CA1224091A true CA1224091A (fr) 1987-07-14

Family

ID=23865309

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000447579A Expired CA1224091A (fr) 1983-02-25 1984-02-16 Depot chimique en phase vapeur de couches metalliques, avec utilisation de sous-halogenures de metaux

Country Status (2)

Country Link
JP (1) JPS60149777A (fr)
CA (1) CA1224091A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2775955B2 (ja) * 1990-01-31 1998-07-16 三菱マテリアル株式会社 耐摩耗性に優れたコーティングサーメットの製造法
US5192589A (en) * 1991-09-05 1993-03-09 Micron Technology, Inc. Low-pressure chemical vapor deposition process for depositing thin titanium nitride films having low and stable resistivity
JP4983038B2 (ja) * 2006-02-16 2012-07-25 Ｊｆｅスチール株式会社 ＴｉＮの成膜方法
JP4816185B2 (ja) * 2006-03-24 2011-11-16 Ｊｆｅスチール株式会社 チタン化合物の成膜方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328575A (en) * 1976-08-31 1978-03-16 Fujikoshi Kk Process for coating with titanium carbide
JPS5428240A (en) * 1977-08-05 1979-03-02 Seikosha Kk Small size precision steel bearing and method of making same
JPS54109098A (en) * 1978-02-15 1979-08-27 Hitachi Metals Ltd Method of manufacturing hafnium compound

Also Published As

Publication number Publication date
JPS60149777A (ja) 1985-08-07
JPH0515787B2 (fr) 1993-03-02

Similar Documents

Publication Publication Date Title
US4803127A (en) Vapor deposition of metal compound coating utilizing metal sub-halides and coated metal article
US6080477A (en) Titanium carbonitride coated stratified substrate and cutting inserts made from the same
US5302422A (en) Deposition process of a ceramic coating on a metallic substrate
US4239819A (en) Deposition method and products
US4699082A (en) Apparatus for chemical vapor deposition
US4269899A (en) Surface hafnium-titanium carbide coated hard alloy and method
US5417952A (en) Process for synthesizing titanium carbide, titanium nitride and titanium carbonitride
EP1157143B1 (fr) Procede de depot chimique en phase vapeur a temperature moyenne
EP0117542B1 (fr) Dépôt chimique à partir de la phase vapeur de revêtements de composés métalliques à l'aide de sous-halogénures métalliques
CA1309903C (fr) Deposition d'aluminiure de titane
CA1224091A (fr) Depot chimique en phase vapeur de couches metalliques, avec utilisation de sous-halogenures de metaux
JPS6215484B2 (fr)
Stjernberg et al. The rate of chemical vapor deposition of TiC
Täschner et al. Structure and properties of TiCx layers prepared by plasma-assisted chemical vapour deposition methods
EP0084525B1 (fr) Procédé d'obtention d'une pièce en carbure cémenté revêtue et pièce obtenue par ce procédé
Tsao et al. Kinetics of Chemical Vapour Deposition of TiN in the System Ti--Cl--H--N Under Surface-Process Limiting Conditions(N sub 2/H sub 2=> 0. 5)
Maury et al. Low‐temperature MOCVD of chromium carbonitride coatings from tetrakis (diethylamido) chromium and pyrolysis mechanism of this single‐source precursor
Laurent et al. Organometallic Precursors to Vanadium and Titanium Carbonitride
JPS6242996B2 (fr)
JPH0119469B2 (fr)
JPH04254585A (ja) タングステンカーバイト膜の形成方法
JPH01252520A (ja) ホウ素、炭素、窒素からなる繊維およびその製造法
Lee Carbonization of Titanium and Molybdenum by Hexachloroethane
Sjöstrand Limitations of present CVD technologies
Randich CVD borides of the form (Ti, Zr) B 2 and (Ta, Ti) B 2

Legal Events

Date Code Title Description
MKEX Expiry