CA1212070A - Fusing conductive element into conductive matrix using half-wave interrupted pulses - Google Patents

Fusing conductive element into conductive matrix using half-wave interrupted pulses

Info

Publication number
CA1212070A
CA1212070A CA000393906A CA393906A CA1212070A CA 1212070 A CA1212070 A CA 1212070A CA 000393906 A CA000393906 A CA 000393906A CA 393906 A CA393906 A CA 393906A CA 1212070 A CA1212070 A CA 1212070A
Authority
CA
Canada
Prior art keywords
chemical element
matrix
conductive chemical
conductive
fusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000393906A
Other languages
English (en)
French (fr)
Inventor
Ady Joseph
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Metafuse Ltd
Original Assignee
Metafuse Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metafuse Ltd filed Critical Metafuse Ltd
Application granted granted Critical
Publication of CA1212070A publication Critical patent/CA1212070A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C20/00—Chemical coating by decomposition of either solid compounds or suspensions of the coating forming compounds, without leaving reaction products of surface material in the coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/14—Electrodes, e.g. composition, counter electrode for pad-plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Packages (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
CA000393906A 1981-01-13 1982-01-11 Fusing conductive element into conductive matrix using half-wave interrupted pulses Expired CA1212070A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US22476281A 1981-01-13 1981-01-13
US224,762 1981-01-13
US31967881A 1981-11-09 1981-11-09
US319,678 1981-11-09

Publications (1)

Publication Number Publication Date
CA1212070A true CA1212070A (en) 1986-09-30

Family

ID=26918999

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000393906A Expired CA1212070A (en) 1981-01-13 1982-01-11 Fusing conductive element into conductive matrix using half-wave interrupted pulses

Country Status (15)

Country Link
EP (1) EP0056331B1 (enExample)
KR (1) KR830009256A (enExample)
AU (1) AU7944782A (enExample)
BR (1) BR8200156A (enExample)
CA (1) CA1212070A (enExample)
DD (1) DD202456A5 (enExample)
DE (1) DE3276073D1 (enExample)
DK (1) DK10982A (enExample)
FI (1) FI820064A7 (enExample)
GR (1) GR75833B (enExample)
IL (1) IL64705A0 (enExample)
MX (1) MX157087A (enExample)
NO (1) NO820074L (enExample)
PL (1) PL234880A1 (enExample)
PT (1) PT74271B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2118973A (en) * 1982-04-27 1983-11-09 Corrintec Uk Ltd Electrical connector and manufacture thereof
WO1995011107A1 (en) * 1993-10-20 1995-04-27 Orbit Technologies, Inc. Coating for a resistance welding device
AT403674B (de) * 1995-11-08 1998-04-27 Euroligna Masch Aggregate Führungsschiene mit profilrohr und verfahren zu deren herstellung

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR774077A (fr) * 1934-06-02 1934-11-30 Fortin & Saunier Ets Perfectionnement aux appareils portatifs pour dépôts électrolytiques
US3743590A (en) * 1971-04-26 1973-07-03 R Roll Electro plating device
US4206028A (en) * 1976-12-14 1980-06-03 Inoue-Japax Research Incorporated Electrochemical polishing system
JPS6056238B2 (ja) * 1979-06-01 1985-12-09 株式会社井上ジャパックス研究所 電気メツキ方法

Also Published As

Publication number Publication date
KR830009256A (ko) 1983-12-19
NO820074L (no) 1982-07-14
AU7944782A (en) 1982-07-22
BR8200156A (pt) 1982-11-03
GR75833B (enExample) 1984-08-02
PT74271A (en) 1982-02-01
DD202456A5 (de) 1983-09-14
PL234880A1 (en) 1983-05-09
MX157087A (es) 1988-10-21
IL64705A0 (en) 1982-03-31
PT74271B (en) 1983-08-23
DK10982A (da) 1982-07-14
EP0056331A1 (en) 1982-07-21
EP0056331B1 (en) 1987-04-15
FI820064L (fi) 1982-07-14
FI820064A7 (fi) 1982-07-14
DE3276073D1 (en) 1987-05-21

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Legal Events

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