CA1189016A - Methode d'electrodeposition du palladium et de ses alliages - Google Patents
Methode d'electrodeposition du palladium et de ses alliagesInfo
- Publication number
- CA1189016A CA1189016A CA000397244A CA397244A CA1189016A CA 1189016 A CA1189016 A CA 1189016A CA 000397244 A CA000397244 A CA 000397244A CA 397244 A CA397244 A CA 397244A CA 1189016 A CA1189016 A CA 1189016A
- Authority
- CA
- Canada
- Prior art keywords
- palladium
- diaminopropane
- electroplating
- plating
- aliphatic polyamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23915181A | 1981-02-27 | 1981-02-27 | |
US239,151 | 1994-05-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1189016A true CA1189016A (fr) | 1985-06-18 |
Family
ID=22900832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000397244A Expired CA1189016A (fr) | 1981-02-27 | 1982-02-26 | Methode d'electrodeposition du palladium et de ses alliages |
Country Status (7)
Country | Link |
---|---|
EP (2) | EP0073236B1 (fr) |
JP (1) | JPS58500289A (fr) |
CA (1) | CA1189016A (fr) |
DE (1) | DE3266736D1 (fr) |
GB (1) | GB2112018B (fr) |
HK (1) | HK48088A (fr) |
WO (1) | WO1982002908A1 (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4478692A (en) * | 1982-12-22 | 1984-10-23 | Learonal, Inc. | Electrodeposition of palladium-silver alloys |
US4741818A (en) * | 1985-12-12 | 1988-05-03 | Learonal, Inc. | Alkaline baths and methods for electrodeposition of palladium and palladium alloys |
DE4444232C1 (de) * | 1994-07-21 | 1996-05-09 | Heraeus Gmbh W C | Bad zum galvanischen Abscheiden von Palladium-Silber-Legierungen |
EP0693579B1 (fr) * | 1994-07-21 | 1997-08-27 | W.C. Heraeus GmbH | Bain pour le dépÔt électrolytique d'alliages Palladium-Argent |
DE4431847C5 (de) * | 1994-09-07 | 2011-01-27 | Atotech Deutschland Gmbh | Substrat mit bondfähiger Beschichtung |
FR2807450B1 (fr) * | 2000-04-06 | 2002-07-05 | Engelhard Clal Sas | Bain electrolytique destine au depot electrochimique du palladium ou de ses alliages |
TWI354716B (en) * | 2007-04-13 | 2011-12-21 | Green Hydrotec Inc | Palladium-containing plating solution and its uses |
US8900436B2 (en) * | 2008-05-07 | 2014-12-02 | Umicore Galvanotechnik Gmbh | Pd and Pd-Ni electrolyte baths |
JP2012241260A (ja) * | 2011-05-23 | 2012-12-10 | Kanto Gakuin | 電解パラジウム−リン合金めっき液、めっき被膜及びめっき製品 |
DE102018126174B3 (de) * | 2018-10-22 | 2019-08-29 | Umicore Galvanotechnik Gmbh | Thermisch stabile Silberlegierungsschichten, Verfahren zur Abscheidung und Verwendung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2452308A (en) * | 1946-02-28 | 1948-10-26 | George C Lambros | Process of plating palladium and plating bath therefor |
CH534215A (fr) * | 1971-09-06 | 1973-02-28 | Oxy Metal Finishing Europ S A | Bain électrolytique pour l'électrodéposition d'alliages d'or et une utilisation de celui-ci |
DE2360834C3 (de) * | 1973-12-06 | 1978-05-18 | Inovan-Stroebe Kg, 7534 Birkenfeld | Bad und Verfahren zum galvanischen Abscheiden von Palladiumschichten |
DE2506467C2 (de) * | 1975-02-07 | 1986-07-17 | Schering AG, 1000 Berlin und 4709 Bergkamen | Bad und Verfahren zur galvanischen Abscheidung von Palladium-Nickel-Legierungen |
US4066517A (en) * | 1976-03-11 | 1978-01-03 | Oxy Metal Industries Corporation | Electrodeposition of palladium |
DE2939920C2 (de) * | 1979-10-02 | 1982-09-23 | W.C. Heraeus Gmbh, 6450 Hanau | Verwendung eines Amins in einem Bad zum galvanischen Abscheiden von Palladium |
US4278514A (en) * | 1980-02-12 | 1981-07-14 | Technic, Inc. | Bright palladium electrodeposition solution |
-
1982
- 1982-02-18 WO PCT/US1982/000200 patent/WO1982002908A1/fr active IP Right Grant
- 1982-02-18 JP JP50116582A patent/JPS58500289A/ja active Granted
- 1982-02-18 GB GB08230414A patent/GB2112018B/en not_active Expired
- 1982-02-18 DE DE8282901061T patent/DE3266736D1/de not_active Expired
- 1982-02-18 EP EP82901061A patent/EP0073236B1/fr not_active Expired
- 1982-02-26 EP EP82101494A patent/EP0059452B1/fr not_active Expired
- 1982-02-26 CA CA000397244A patent/CA1189016A/fr not_active Expired
-
1988
- 1988-06-30 HK HK48088A patent/HK48088A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
HK48088A (en) | 1988-07-08 |
DE3266736D1 (en) | 1985-11-14 |
GB2112018B (en) | 1984-08-15 |
WO1982002908A1 (fr) | 1982-09-02 |
EP0073236A4 (fr) | 1983-01-14 |
GB2112018A (en) | 1983-07-13 |
EP0059452B1 (fr) | 1985-10-09 |
JPH0219197B2 (fr) | 1990-04-27 |
JPS58500289A (ja) | 1983-02-24 |
EP0073236B1 (fr) | 1985-10-09 |
EP0059452A2 (fr) | 1982-09-08 |
EP0059452A3 (en) | 1982-11-10 |
EP0073236A1 (fr) | 1983-03-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |