CA1181629A - Photoconductive member including non-photoconductive layer containing amorphous silicon matrix-containing oxygen - Google Patents

Photoconductive member including non-photoconductive layer containing amorphous silicon matrix-containing oxygen

Info

Publication number
CA1181629A
CA1181629A CA000387231A CA387231A CA1181629A CA 1181629 A CA1181629 A CA 1181629A CA 000387231 A CA000387231 A CA 000387231A CA 387231 A CA387231 A CA 387231A CA 1181629 A CA1181629 A CA 1181629A
Authority
CA
Canada
Prior art keywords
member according
photoconductive
photoconductive member
atoms
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000387231A
Other languages
English (en)
French (fr)
Inventor
Eiichi Inoue
Isamu Shimizu
Shigeru Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP55138982A external-priority patent/JPS5763547A/ja
Priority claimed from JP55138981A external-priority patent/JPS5763546A/ja
Priority claimed from JP55138980A external-priority patent/JPS5763545A/ja
Priority claimed from JP55140960A external-priority patent/JPS5764245A/ja
Priority claimed from JP55140962A external-priority patent/JPS5764247A/ja
Priority claimed from JP55140961A external-priority patent/JPS5764246A/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of CA1181629A publication Critical patent/CA1181629A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/10Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/10Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors
    • H10F30/15Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors comprising amorphous semiconductors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photoreceptors In Electrophotography (AREA)
  • Light Receiving Elements (AREA)
CA000387231A 1980-10-03 1981-10-02 Photoconductive member including non-photoconductive layer containing amorphous silicon matrix-containing oxygen Expired CA1181629A (en)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP138980/1980 1980-10-03
JP55138982A JPS5763547A (en) 1980-10-03 1980-10-03 Photoconductive member
JP55138981A JPS5763546A (en) 1980-10-03 1980-10-03 Photoconductive member
JP138982/1980 1980-10-03
JP55138980A JPS5763545A (en) 1980-10-03 1980-10-03 Photoconductive member
JP138981/1980 1980-10-03
JP140960/1980 1980-10-08
JP140962/1980 1980-10-08
JP55140960A JPS5764245A (en) 1980-10-08 1980-10-08 Photoconductive member
JP55140962A JPS5764247A (en) 1980-10-08 1980-10-08 Photoconductive member
JP55140961A JPS5764246A (en) 1980-10-08 1980-10-08 Photoconductive member
JP140961/1980 1980-10-08

Publications (1)

Publication Number Publication Date
CA1181629A true CA1181629A (en) 1985-01-29

Family

ID=27552908

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000387231A Expired CA1181629A (en) 1980-10-03 1981-10-02 Photoconductive member including non-photoconductive layer containing amorphous silicon matrix-containing oxygen

Country Status (4)

Country Link
CA (1) CA1181629A (enrdf_load_stackoverflow)
DE (1) DE3139531A1 (enrdf_load_stackoverflow)
FR (1) FR2495344B1 (enrdf_load_stackoverflow)
GB (1) GB2088628B (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4572882A (en) * 1983-09-09 1986-02-25 Canon Kabushiki Kaisha Photoconductive member containing amorphous silicon and germanium
JPS60146251A (ja) * 1984-01-10 1985-08-01 Sharp Corp 電子写真用感光体の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4196438A (en) * 1976-09-29 1980-04-01 Rca Corporation Article and device having an amorphous silicon containing a halogen and method of fabrication
AU530905B2 (en) * 1977-12-22 1983-08-04 Canon Kabushiki Kaisha Electrophotographic photosensitive member
DE2954551C2 (enrdf_load_stackoverflow) * 1978-03-03 1989-02-09 Canon K.K., Tokio/Tokyo, Jp
DE3176910D1 (en) * 1980-02-15 1988-11-17 Matsushita Electric Ind Co Ltd Semiconductor photoelectric device
JPS56152280A (en) * 1980-04-25 1981-11-25 Hitachi Ltd Light receiving surface
US4394426A (en) * 1980-09-25 1983-07-19 Canon Kabushiki Kaisha Photoconductive member with α-Si(N) barrier layer

Also Published As

Publication number Publication date
FR2495344B1 (fr) 1986-07-18
GB2088628A (en) 1982-06-09
DE3139531C2 (enrdf_load_stackoverflow) 1988-12-22
GB2088628B (en) 1985-06-12
FR2495344A1 (fr) 1982-06-04
DE3139531A1 (de) 1982-05-13

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Legal Events

Date Code Title Description
MKEX Expiry