CA1114974A - Photopolymerizable latex systems - Google Patents

Photopolymerizable latex systems

Info

Publication number
CA1114974A
CA1114974A CA320,410A CA320410A CA1114974A CA 1114974 A CA1114974 A CA 1114974A CA 320410 A CA320410 A CA 320410A CA 1114974 A CA1114974 A CA 1114974A
Authority
CA
Canada
Prior art keywords
polymer
light
water
emulsion
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA320,410A
Other languages
English (en)
French (fr)
Inventor
Thaddeus M. Muzyczko
Daniel C. Thomas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Richardson Graphics Co
Original Assignee
Richardson Graphics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Richardson Graphics Co filed Critical Richardson Graphics Co
Application granted granted Critical
Publication of CA1114974A publication Critical patent/CA1114974A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
CA320,410A 1978-01-30 1979-01-29 Photopolymerizable latex systems Expired CA1114974A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US873,383 1978-01-30
US05/873,383 US4186069A (en) 1978-01-30 1978-01-30 Photopolymerizable latex systems

Publications (1)

Publication Number Publication Date
CA1114974A true CA1114974A (en) 1981-12-22

Family

ID=25361535

Family Applications (1)

Application Number Title Priority Date Filing Date
CA320,410A Expired CA1114974A (en) 1978-01-30 1979-01-29 Photopolymerizable latex systems

Country Status (6)

Country Link
US (1) US4186069A (en, 2012)
JP (1) JPS54117539A (en, 2012)
CA (1) CA1114974A (en, 2012)
DE (1) DE2903454A1 (en, 2012)
FR (1) FR2415653A1 (en, 2012)
GB (1) GB2013918B (en, 2012)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS58140737A (ja) * 1982-02-15 1983-08-20 Toyobo Co Ltd 感光性樹脂組成物
US4542088A (en) * 1982-03-18 1985-09-17 Konishiroku Photo Industry Co., Ltd. Photopolymerizable compositions and image-forming materials using said compositions
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
JPS5988732A (ja) * 1982-11-13 1984-05-22 Nippon Paint Co Ltd 感光性樹脂組成物
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
US4539285A (en) * 1984-03-14 1985-09-03 American Hoechst Corporation Photosensitive negative diazo composition with two acrylic polymers for photolithography
US4614701A (en) * 1984-09-28 1986-09-30 Sekisui Fine Chemical Co., Ltd. Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units
JPS61162501A (ja) * 1985-01-10 1986-07-23 Nippon Paint Co Ltd 高エネルギ−線硬化樹脂組成物
GB2213487B (en) * 1987-12-08 1992-01-08 Kansai Paint Co Ltd Method of forming a cured coating film
JP2660000B2 (ja) * 1988-06-17 1997-09-30 理想科学工業株式会社 孔版印刷用紫外線硬化型インク
US5219705A (en) * 1988-07-04 1993-06-15 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor of direct image type
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
CA2041023C (en) * 1990-04-26 2002-03-12 William K. Goss Photocurable elements and flexographic printing plates prepared therefrom
KR100187942B1 (ko) * 1990-06-27 1999-06-01 배트 이안 지 영상 형성 방법
GB9105561D0 (en) * 1991-03-15 1991-05-01 Coates Brothers Plc Image formation
JPH07325399A (ja) * 1994-05-30 1995-12-12 Shinsei:Kk 感光乳剤
US5512607A (en) * 1995-06-06 1996-04-30 W. R. Grace & Co.-Conn. Unsaturated epoxy ester with quaternary ammonium and phosphate groups
WO1996041240A1 (en) * 1995-06-07 1996-12-19 W.R. Grace & Co.-Conn. Water photoresist emulsions and methods of preparation thereof
EP0811878A1 (en) * 1996-06-06 1997-12-10 Agfa-Gevaert N.V. A diazo based imaging element having increased sensitivity
US5688627A (en) * 1996-07-02 1997-11-18 Precision Lithograining Corp. Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them
US5811220A (en) * 1996-10-10 1998-09-22 Polaroid Corporation On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
US6315916B1 (en) 2000-05-08 2001-11-13 Pisces-Print Image Sciences, Inc. Chemical imaging of a lithographic printing plate
US20040154489A1 (en) * 2000-05-08 2004-08-12 Deutsch Albert S. Chemical imaging of a lithographic printing plate
US6691618B2 (en) 2000-05-08 2004-02-17 Pisces-Print Imaging Sciences, Inc. Chemical imaging of a lithographic printing plate
EP1160083A3 (en) * 2000-06-02 2010-03-24 FUJIFILM Corporation Lithographic printing plate precursor
US6352805B1 (en) 2000-09-25 2002-03-05 Eastman Kodak Company Photocrosslinkable latex protective overcoat for imaging elements
US6395459B1 (en) 2000-09-29 2002-05-28 Eastman Kodak Company Method of forming a protective overcoat for imaged elements and related articles
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
JP2004151691A (ja) * 2002-09-30 2004-05-27 Rohm & Haas Electronic Materials Llc 改良フォトレジスト
US7148265B2 (en) * 2002-09-30 2006-12-12 Rohm And Haas Electronic Materials Llc Functional polymer
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
US20040224259A1 (en) * 2002-12-12 2004-11-11 Shipley Company, L.L.C. Functionalized polymer
AT502764B1 (de) * 2005-09-12 2010-11-15 Semperit Ag Holding Mischung und verfahren zur herstellung eines vernetzten elastomers sowie vorrichtung zur herstellung eines tauchartikels
US8399533B2 (en) * 2010-11-15 2013-03-19 Eastman Kodak Company Photocurable compositions containing N-oxyazinium salt photoinitiators

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3898143A (en) * 1971-06-11 1975-08-05 Union Carbide Corp Process for cocrosslinking water soluble polymers and products thereof
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
JPS4938987A (en, 2012) * 1972-08-18 1974-04-11
US3926642A (en) * 1972-11-09 1975-12-16 Hercules Inc Photopolymer lithographic plate element
JPS568645B2 (en, 2012) * 1974-09-05 1981-02-25
JPS51120804A (en) * 1975-04-14 1976-10-22 Dainippon Printing Co Ltd Plate for lithographic printing

Also Published As

Publication number Publication date
FR2415653B3 (en, 2012) 1982-02-05
JPS54117539A (en) 1979-09-12
US4186069A (en) 1980-01-29
GB2013918B (en) 1983-01-12
DE2903454A1 (de) 1979-08-02
GB2013918A (en) 1979-08-15
FR2415653A1 (fr) 1979-08-24

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Legal Events

Date Code Title Description
MKEX Expiry
MKEX Expiry

Effective date: 19981222