CA1076405A - After-treatment of offset printing plates with a protective lacquer derived from a photopolymerizable system - Google Patents
After-treatment of offset printing plates with a protective lacquer derived from a photopolymerizable systemInfo
- Publication number
- CA1076405A CA1076405A CA240,948A CA240948A CA1076405A CA 1076405 A CA1076405 A CA 1076405A CA 240948 A CA240948 A CA 240948A CA 1076405 A CA1076405 A CA 1076405A
- Authority
- CA
- Canada
- Prior art keywords
- hydrophobic
- areas
- process according
- offset printing
- protective lacquer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
- G03F7/063—Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1608874A CH599577A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-12-04 | 1974-12-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1076405A true CA1076405A (en) | 1980-04-29 |
Family
ID=4414369
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA240,948A Expired CA1076405A (en) | 1974-12-04 | 1975-12-03 | After-treatment of offset printing plates with a protective lacquer derived from a photopolymerizable system |
Country Status (7)
-
1974
- 1974-12-04 CH CH1608874A patent/CH599577A5/xx not_active IP Right Cessation
-
1975
- 1975-11-28 GB GB4897375A patent/GB1492887A/en not_active Expired
- 1975-12-01 FR FR7536711A patent/FR2293313A1/fr active Granted
- 1975-12-02 DE DE19752554165 patent/DE2554165A1/de not_active Withdrawn
- 1975-12-03 CA CA240,948A patent/CA1076405A/en not_active Expired
- 1975-12-03 BE BE162389A patent/BE836211A/xx unknown
- 1975-12-04 JP JP14341475A patent/JPS5182105A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1492887A (en) | 1977-11-23 |
| FR2293313A1 (fr) | 1976-07-02 |
| CH599577A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1978-05-31 |
| JPS5182105A (ja) | 1976-07-19 |
| FR2293313B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1979-04-13 |
| BE836211A (fr) | 1976-06-03 |
| DE2554165A1 (de) | 1976-06-10 |
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| CA1076405A (en) | After-treatment of offset printing plates with a protective lacquer derived from a photopolymerizable system | |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |