CA1051124A - Schottky barrier type semiconductor device - Google Patents

Schottky barrier type semiconductor device

Info

Publication number
CA1051124A
CA1051124A CA249,688A CA249688A CA1051124A CA 1051124 A CA1051124 A CA 1051124A CA 249688 A CA249688 A CA 249688A CA 1051124 A CA1051124 A CA 1051124A
Authority
CA
Canada
Prior art keywords
schottky barrier
region
substrate
layer
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA249,688A
Other languages
English (en)
French (fr)
Inventor
Kunizo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of CA1051124A publication Critical patent/CA1051124A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00—Diodes
    • H10D8/60—Schottky-barrier diodes 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/112—Constructional design considerations for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layers, e.g. by using channel stoppers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/905—Plural dram cells share common contact or common trench

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Bipolar Transistors (AREA)
CA249,688A 1975-04-25 1976-04-06 Schottky barrier type semiconductor device Expired CA1051124A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50050435A JPS51126761A (en) 1975-04-25 1975-04-25 Schottky barrier type semi-conductor unit

Publications (1)

Publication Number Publication Date
CA1051124A true CA1051124A (en) 1979-03-20

Family

ID=12858774

Family Applications (1)

Application Number Title Priority Date Filing Date
CA249,688A Expired CA1051124A (en) 1975-04-25 1976-04-06 Schottky barrier type semiconductor device

Country Status (7)

Country Link
US (1) US4062033A (enExample)
JP (1) JPS51126761A (enExample)
CA (1) CA1051124A (enExample)
DE (1) DE2617855A1 (enExample)
FR (1) FR2309042A1 (enExample)
GB (1) GB1523004A (enExample)
NL (1) NL7604388A (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5414684A (en) * 1977-07-06 1979-02-03 Fuji Electric Co Ltd Manufacture of schottky barrier diode
JPS55125663A (en) * 1979-03-22 1980-09-27 Hitachi Ltd Semiconductor integrated circuit
FR2466861A1 (fr) * 1979-10-05 1981-04-10 Thomson Csf Structure de diode schottky a faible bruit, et transistor a effet de champ dont la grille possede une telle structure
DE3012430A1 (de) * 1980-03-31 1981-10-08 Siemens AG, 1000 Berlin und 8000 München Planare halbleiteranordnung mit erhoehter durchbruchsspannung
US4433469A (en) 1980-06-30 1984-02-28 Rca Corporation Method of forming a self aligned aluminum polycrystalline silicon line
US4349408A (en) * 1981-03-26 1982-09-14 Rca Corporation Method of depositing a refractory metal on a semiconductor substrate
JPH0618276B2 (ja) * 1988-11-11 1994-03-09 サンケン電気株式会社 半導体装置
US5338750A (en) * 1992-11-27 1994-08-16 Industrial Technology Research Institute Fabrication method to produce pit-free polysilicon buffer local oxidation isolation
US5614755A (en) * 1993-04-30 1997-03-25 Texas Instruments Incorporated High voltage Shottky diode
DE19616605C2 (de) * 1996-04-25 1998-03-26 Siemens Ag Schottkydiodenanordnung und Verfahren zur Herstellung
US5930658A (en) * 1996-11-26 1999-07-27 Advanced Micro Devices, Inc. Oxidized oxygen-doped amorphous silicon ultrathin gate oxide structures
JPH10163468A (ja) * 1996-12-03 1998-06-19 Kagaku Gijutsu Shinko Jigyodan 膜状複合構造体
JP3287269B2 (ja) * 1997-06-02 2002-06-04 富士電機株式会社 ダイオードとその製造方法
US7115896B2 (en) * 2002-12-04 2006-10-03 Emcore Corporation Semiconductor structures for gallium nitride-based devices
US7528459B2 (en) * 2003-05-27 2009-05-05 Nxp B.V. Punch-through diode and method of processing the same
US7820473B2 (en) * 2005-03-21 2010-10-26 Semiconductor Components Industries, Llc Schottky diode and method of manufacture
US8072791B2 (en) * 2007-06-25 2011-12-06 Sandisk 3D Llc Method of making nonvolatile memory device containing carbon or nitrogen doped diode
US8102694B2 (en) * 2007-06-25 2012-01-24 Sandisk 3D Llc Nonvolatile memory device containing carbon or nitrogen doped diode
TWI641152B (zh) * 2017-03-24 2018-11-11 王中林 電壓增加而電阻值增加的電阻元件
US20240079478A1 (en) * 2022-09-07 2024-03-07 University Of Science And Technology Of China Preparation method of gallium oxide device based on high-temperature annealing technology and gallium oxide device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE300472B (enExample) * 1965-03-31 1968-04-29 Asea Ab
US3586542A (en) * 1968-11-22 1971-06-22 Bell Telephone Labor Inc Semiconductor junction devices
JPS5314420B2 (enExample) * 1973-05-14 1978-05-17
JPS532552B2 (enExample) * 1974-03-30 1978-01-28

Also Published As

Publication number Publication date
GB1523004A (en) 1978-08-31
US4062033A (en) 1977-12-06
NL7604388A (nl) 1976-10-27
JPS51126761A (en) 1976-11-05
DE2617855A1 (de) 1976-11-04
FR2309042A1 (fr) 1976-11-19
FR2309042B1 (enExample) 1980-04-04

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