CA1020494A - Method of manufacturing etched patterns - Google Patents
Method of manufacturing etched patternsInfo
- Publication number
- CA1020494A CA1020494A CA182,588A CA182588A CA1020494A CA 1020494 A CA1020494 A CA 1020494A CA 182588 A CA182588 A CA 182588A CA 1020494 A CA1020494 A CA 1020494A
- Authority
- CA
- Canada
- Prior art keywords
- etched patterns
- manufacturing etched
- manufacturing
- patterns
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
- H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
- H10P76/4083—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by their behaviours during the lithography processes, e.g. soluble masks or redeposited masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/43—Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7213625A NL7213625A (oth) | 1972-10-07 | 1972-10-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1020494A true CA1020494A (en) | 1977-11-08 |
Family
ID=19817096
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA182,588A Expired CA1020494A (en) | 1972-10-07 | 1973-10-03 | Method of manufacturing etched patterns |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3919066A (oth) |
| JP (1) | JPS5232954B2 (oth) |
| CA (1) | CA1020494A (oth) |
| FR (1) | FR2202369B2 (oth) |
| GB (1) | GB1440349A (oth) |
| IT (1) | IT1055539B (oth) |
| NL (1) | NL7213625A (oth) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4057831A (en) * | 1972-09-05 | 1977-11-08 | U.S. Philips Corporation | Video record disc manufactured by a process involving chemical or sputter etching |
| DE2547792C3 (de) * | 1974-10-25 | 1978-08-31 | Hitachi, Ltd., Tokio | Verfahren zur Herstellung eines Halbleiterbauelementes |
| JPS5210080A (en) * | 1975-07-15 | 1977-01-26 | Nippon Telegr & Teleph Corp <Ntt> | Method for manufacturing semiconductor device |
| NL7607298A (nl) * | 1976-07-02 | 1978-01-04 | Philips Nv | Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze. |
| JPS5381110A (en) * | 1976-12-25 | 1978-07-18 | Toshiba Corp | Manufacture of magnetic film head |
| JPS5539646A (en) * | 1978-09-12 | 1980-03-19 | Nec Corp | Ion taper etching |
| US4534826A (en) * | 1983-12-29 | 1985-08-13 | Ibm Corporation | Trench etch process for dielectric isolation |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2117199C3 (de) * | 1971-04-08 | 1974-08-22 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zur Herstellung geätzter Muster in dünnen Schichten mit definierten Kantenprofilen |
| US3723277A (en) * | 1971-07-14 | 1973-03-27 | Molekularelektronik | Method for the production of masks in the manufacture of semiconductor components |
-
1972
- 1972-10-07 NL NL7213625A patent/NL7213625A/xx unknown
-
1973
- 1973-09-26 US US400879A patent/US3919066A/en not_active Expired - Lifetime
- 1973-10-03 CA CA182,588A patent/CA1020494A/en not_active Expired
- 1973-10-04 IT IT69925/73A patent/IT1055539B/it active
- 1973-10-04 GB GB4637673A patent/GB1440349A/en not_active Expired
- 1973-10-04 FR FR7335435A patent/FR2202369B2/fr not_active Expired
- 1973-10-08 JP JP48112424A patent/JPS5232954B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1440349A (en) | 1976-06-23 |
| US3919066A (en) | 1975-11-11 |
| NL7213625A (oth) | 1974-04-09 |
| FR2202369B2 (oth) | 1976-10-01 |
| JPS4974483A (oth) | 1974-07-18 |
| FR2202369A2 (oth) | 1974-05-03 |
| IT1055539B (it) | 1982-01-11 |
| JPS5232954B2 (oth) | 1977-08-25 |
| DE2348779A1 (de) | 1974-04-11 |
| AU6103973A (en) | 1975-04-10 |
| DE2348779B2 (de) | 1976-05-26 |
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