NL7213625A - - Google Patents

Info

Publication number
NL7213625A
NL7213625A NL7213625A NL7213625A NL7213625A NL 7213625 A NL7213625 A NL 7213625A NL 7213625 A NL7213625 A NL 7213625A NL 7213625 A NL7213625 A NL 7213625A NL 7213625 A NL7213625 A NL 7213625A
Authority
NL
Netherlands
Application number
NL7213625A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7213625A priority Critical patent/NL7213625A/xx
Priority to US400879A priority patent/US3919066A/en
Priority to DE19732348779 priority patent/DE2348779C3/de
Priority to CA182,588A priority patent/CA1020494A/en
Priority to AU61039/73A priority patent/AU493297B2/en
Priority to IT69925/73A priority patent/IT1055539B/it
Priority to FR7335435A priority patent/FR2202369B2/fr
Priority to GB4637673A priority patent/GB1440349A/en
Priority to JP48112424A priority patent/JPS5232954B2/ja
Publication of NL7213625A publication Critical patent/NL7213625A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0335Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by their behaviour during the process, e.g. soluble masks, redeposited masks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291Oxides or nitrides or carbides, e.g. ceramics, glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Drying Of Semiconductors (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
NL7213625A 1972-10-07 1972-10-07 NL7213625A (xx)

Priority Applications (9)

Application Number Priority Date Filing Date Title
NL7213625A NL7213625A (xx) 1972-10-07 1972-10-07
US400879A US3919066A (en) 1972-10-07 1973-09-26 Method of manufacturing etched patterns
DE19732348779 DE2348779C3 (de) 1972-10-07 1973-09-28 Verfahren zur Herstellung geätzter Muster
CA182,588A CA1020494A (en) 1972-10-07 1973-10-03 Method of manufacturing etched patterns
AU61039/73A AU493297B2 (en) 1972-10-07 1973-10-04 Method of manufacturing etched patterns
IT69925/73A IT1055539B (it) 1972-10-07 1973-10-04 Procedimento per la produzione di disegvi mediante incisione a polve rizzazione catodica
FR7335435A FR2202369B2 (xx) 1972-10-07 1973-10-04
GB4637673A GB1440349A (en) 1972-10-07 1973-10-04 Method of manufacturing etched patterns
JP48112424A JPS5232954B2 (xx) 1972-10-07 1973-10-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7213625A NL7213625A (xx) 1972-10-07 1972-10-07

Publications (1)

Publication Number Publication Date
NL7213625A true NL7213625A (xx) 1974-04-09

Family

ID=19817096

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7213625A NL7213625A (xx) 1972-10-07 1972-10-07

Country Status (7)

Country Link
US (1) US3919066A (xx)
JP (1) JPS5232954B2 (xx)
CA (1) CA1020494A (xx)
FR (1) FR2202369B2 (xx)
GB (1) GB1440349A (xx)
IT (1) IT1055539B (xx)
NL (1) NL7213625A (xx)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5210080A (en) * 1975-07-15 1977-01-26 Nippon Telegr & Teleph Corp <Ntt> Method for manufacturing semiconductor device

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4057831A (en) * 1972-09-05 1977-11-08 U.S. Philips Corporation Video record disc manufactured by a process involving chemical or sputter etching
DE2547792C3 (de) * 1974-10-25 1978-08-31 Hitachi, Ltd., Tokio Verfahren zur Herstellung eines Halbleiterbauelementes
NL7607298A (nl) * 1976-07-02 1978-01-04 Philips Nv Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze.
JPS5381110A (en) * 1976-12-25 1978-07-18 Toshiba Corp Manufacture of magnetic film head
JPS5539646A (en) * 1978-09-12 1980-03-19 Nec Corp Ion taper etching
US4534826A (en) * 1983-12-29 1985-08-13 Ibm Corporation Trench etch process for dielectric isolation

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2117199C3 (de) * 1971-04-08 1974-08-22 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung geätzter Muster in dünnen Schichten mit definierten Kantenprofilen
US3723277A (en) * 1971-07-14 1973-03-27 Molekularelektronik Method for the production of masks in the manufacture of semiconductor components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5210080A (en) * 1975-07-15 1977-01-26 Nippon Telegr & Teleph Corp <Ntt> Method for manufacturing semiconductor device

Also Published As

Publication number Publication date
JPS4974483A (xx) 1974-07-18
CA1020494A (en) 1977-11-08
AU6103973A (en) 1975-04-10
FR2202369B2 (xx) 1976-10-01
US3919066A (en) 1975-11-11
DE2348779A1 (de) 1974-04-11
GB1440349A (en) 1976-06-23
JPS5232954B2 (xx) 1977-08-25
IT1055539B (it) 1982-01-11
DE2348779B2 (de) 1976-05-26
FR2202369A2 (xx) 1974-05-03

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