CA1014889A - Sputtered dielectric thin films - Google Patents

Sputtered dielectric thin films

Info

Publication number
CA1014889A
CA1014889A CA215,398A CA215398A CA1014889A CA 1014889 A CA1014889 A CA 1014889A CA 215398 A CA215398 A CA 215398A CA 1014889 A CA1014889 A CA 1014889A
Authority
CA
Canada
Prior art keywords
thin films
dielectric thin
sputtered dielectric
sputtered
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA215,398A
Other languages
French (fr)
Other versions
CA215398S (en
Inventor
Sidney I.J. Ingrey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nortel Networks Technology Corp
Original Assignee
Bell Northern Research Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bell Northern Research Ltd filed Critical Bell Northern Research Ltd
Priority to CA215,398A priority Critical patent/CA1014889A/en
Priority to SE7513312A priority patent/SE435298B/en
Priority to DE19752554854 priority patent/DE2554854A1/en
Priority to GB50078/75A priority patent/GB1496590A/en
Priority to FR7537373A priority patent/FR2333056A1/en
Priority to JP50144047A priority patent/JPS62229B2/ja
Priority to NL7514208A priority patent/NL7514208A/en
Application granted granted Critical
Publication of CA1014889A publication Critical patent/CA1014889A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters
    • G02B5/285Interference filters comprising deposited thin solid films
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • C23C14/0084Producing gradient compositions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/25Metals
    • C03C2217/263Metals other than noble metals, Cu or Hg
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Filters (AREA)
  • Surface Treatment Of Glass (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CA215,398A 1974-12-06 1974-12-06 Sputtered dielectric thin films Expired CA1014889A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CA215,398A CA1014889A (en) 1974-12-06 1974-12-06 Sputtered dielectric thin films
SE7513312A SE435298B (en) 1974-12-06 1975-11-26 LIKE THE MEDIUM CATHOLIC NURSE ASTADKOMMA A THIN MOVIE CONTAINING NUMBERS OR NIOB
DE19752554854 DE2554854A1 (en) 1974-12-06 1975-12-05 DIELECTRIC THIN FILM MADE BY SPRAYING
GB50078/75A GB1496590A (en) 1974-12-06 1975-12-05 Sputtered dielectric thin films
FR7537373A FR2333056A1 (en) 1974-12-06 1975-12-05 THIN DIELECTRIC FILMS SPRAYING PROCESS
JP50144047A JPS62229B2 (en) 1974-12-06 1975-12-05
NL7514208A NL7514208A (en) 1974-12-06 1975-12-05 METHOD FOR APPLYING THIN FILMS OF TANTAAL OR NIOBIUM.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA215,398A CA1014889A (en) 1974-12-06 1974-12-06 Sputtered dielectric thin films

Publications (1)

Publication Number Publication Date
CA1014889A true CA1014889A (en) 1977-08-02

Family

ID=4101793

Family Applications (1)

Application Number Title Priority Date Filing Date
CA215,398A Expired CA1014889A (en) 1974-12-06 1974-12-06 Sputtered dielectric thin films

Country Status (7)

Country Link
JP (1) JPS62229B2 (en)
CA (1) CA1014889A (en)
DE (1) DE2554854A1 (en)
FR (1) FR2333056A1 (en)
GB (1) GB1496590A (en)
NL (1) NL7514208A (en)
SE (1) SE435298B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142958A (en) * 1978-04-13 1979-03-06 Litton Systems, Inc. Method for fabricating multi-layer optical films
DE3027256A1 (en) * 1980-07-18 1982-02-18 Robert Bosch Gmbh, 7000 Stuttgart MULTILAYER SYSTEM FOR HEAT PROTECTION APPLICATIONS AND METHOD FOR THE PRODUCTION THEREOF
JPS57177971A (en) * 1981-04-28 1982-11-01 Yoichi Murayama High frequency ion plating device
JPS58140705A (en) * 1982-02-15 1983-08-20 Fujitsu Ltd Optical filter and its production
JPH0610926B2 (en) * 1985-05-23 1994-02-09 松下電器産業株式会社 Dielectric film manufacturing method
GB2264718B (en) * 1992-03-04 1995-04-26 Univ Hull Coatings produced by vapour deposition
GB2310218B (en) * 1996-02-13 1999-12-22 Marconi Gec Ltd Coatings
GB9901093D0 (en) * 1999-01-20 1999-03-10 Marconi Electronic Syst Ltd Method of making coatings

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3558461A (en) * 1968-10-28 1971-01-26 Bell Telephone Labor Inc Thin film resistor and preparation thereof
DE2215151C3 (en) * 1972-03-28 1979-05-23 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for producing thin layers of tantalum

Also Published As

Publication number Publication date
FR2333056A1 (en) 1977-06-24
JPS62229B2 (en) 1987-01-06
SE435298B (en) 1984-09-17
NL7514208A (en) 1976-06-09
SE7513312L (en) 1976-06-08
JPS5192740A (en) 1976-08-14
GB1496590A (en) 1977-12-30
DE2554854A1 (en) 1976-06-16

Similar Documents

Publication Publication Date Title
CA1035255A (en) Thin film coating apparatus
CA977306A (en) Transparent sputtered metal oxide films
AU497153B2 (en) Severing film
AU501623B2 (en) Polyester films
CA1024403A (en) Paraxylylene-silane dielectric films
CA1021252A (en) Thin film coating evaporator
CA1032418A (en) Conductive coating
CA1014889A (en) Sputtered dielectric thin films
AU511961B2 (en) Sputtering apparatus
AU503587B2 (en) Substrate insulation
CA1013599A (en) Multiple thin film light polarisers
CA1014519A (en) Sputtering apparatus
AU490832B2 (en) Multiple-layer films
AU493497B2 (en) film CASSETTES
AU490403B2 (en) Film cassettes
CA997228A (en) Deposition of films
CA909035A (en) Sputtered magnetic films
CA884036A (en) Thin film high voltage switch
AU494460B2 (en) Film circuit
AU481648B2 (en) Magnetron
AU493509B2 (en) Film coating process
AU487723B2 (en) Self-sealing films
AU505872B2 (en) Electromigartion resistant thin films
AU7846375A (en) Film circuit
AU6894674A (en) Film cassettes