CA1010401A - Electron beam sensitive polymer t-butyl methacrylate resist - Google Patents

Electron beam sensitive polymer t-butyl methacrylate resist

Info

Publication number
CA1010401A
CA1010401A CA163,468A CA163468A CA1010401A CA 1010401 A CA1010401 A CA 1010401A CA 163468 A CA163468 A CA 163468A CA 1010401 A CA1010401 A CA 1010401A
Authority
CA
Canada
Prior art keywords
electron beam
butyl methacrylate
sensitive polymer
beam sensitive
methacrylate resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA163,468A
Other languages
English (en)
Other versions
CA163468S (en
Inventor
William A. Hewett
Harold A. Levine
Edward Gipstein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1010401A publication Critical patent/CA1010401A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • ing And Chemical Polishing (AREA)
  • Materials For Photolithography (AREA)
CA163,468A 1972-03-24 1973-02-08 Electron beam sensitive polymer t-butyl methacrylate resist Expired CA1010401A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23787572A 1972-03-24 1972-03-24

Publications (1)

Publication Number Publication Date
CA1010401A true CA1010401A (en) 1977-05-17

Family

ID=22895609

Family Applications (1)

Application Number Title Priority Date Filing Date
CA163,468A Expired CA1010401A (en) 1972-03-24 1973-02-08 Electron beam sensitive polymer t-butyl methacrylate resist

Country Status (7)

Country Link
US (1) US3779806A (online.php)
JP (1) JPS5218097B2 (online.php)
CA (1) CA1010401A (online.php)
DE (1) DE2314124C3 (online.php)
FR (1) FR2177766B1 (online.php)
GB (1) GB1370403A (online.php)
IT (1) IT981198B (online.php)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4113897A (en) * 1973-01-29 1978-09-12 Rca Corporation Smooth groove formation method employing spin coating of negative replica of inscribed disc
US3893127A (en) * 1973-09-27 1975-07-01 Rca Corp Electron beam recording media
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
US3996393A (en) * 1974-03-25 1976-12-07 International Business Machines Corporation Positive polymeric electron beam resists of very great sensitivity
US3987215A (en) * 1974-04-22 1976-10-19 International Business Machines Corporation Resist mask formation process
US4078098A (en) * 1974-05-28 1978-03-07 International Business Machines Corporation High energy radiation exposed positive resist mask process
US3976524A (en) * 1974-06-17 1976-08-24 Ibm Corporation Planarization of integrated circuit surfaces through selective photoresist masking
US4011351A (en) * 1975-01-29 1977-03-08 International Business Machines Corporation Preparation of resist image with methacrylate polymers
JPS51147324A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Solvent for electronic wire resist
JPS524834A (en) * 1975-06-30 1977-01-14 Agency Of Ind Science & Technol Image formation method through electron beam and resisting agent compo sitions which are used for the methoi
JPS5271239A (en) * 1975-12-10 1977-06-14 Matsushita Electric Ind Co Ltd Electron beam sensitive material
US4103064A (en) * 1976-01-09 1978-07-25 Dios, Inc. Microdevice substrate and method for making micropattern devices
JPS5293332A (en) * 1976-02-02 1977-08-05 Agency Of Ind Science & Technol Polymer materials for electronic irradiation resist
JPS5350681A (en) * 1976-10-19 1978-05-09 Matsushita Electric Ind Co Ltd Solvent for electron beam resist
JPS5352593A (en) * 1976-10-26 1978-05-13 Agency Of Ind Science & Technol Electron rays-sensitive polymer
DE3060510D1 (en) * 1979-03-09 1982-07-29 Thomson Csf Photomasking substances, process for preparing them and mask obtained
JPS5857734B2 (ja) * 1979-05-15 1983-12-21 超エル・エス・アイ技術研究組合 皮膜形成方法法
US4312935A (en) * 1979-08-09 1982-01-26 International Business Machines Corporation Class of E-beam resists based on conducting organic charge transfer salts
US4312936A (en) * 1979-08-09 1982-01-26 International Business Machines Corporation Class of E-beam resists based on conducting organic charge transfer salts
US4338392A (en) * 1979-08-09 1982-07-06 International Business Machines Corporation Class of E-beam resists based on conducting organic charge transfer salts
JPS5639539A (en) * 1979-09-07 1981-04-15 Chiyou Lsi Gijutsu Kenkyu Kumiai Pattern forming method
US4415653A (en) * 1981-05-07 1983-11-15 Honeywell Inc. Method of making sensitive positive electron beam resists
US4508812A (en) * 1984-05-03 1985-04-02 Hughes Aircraft Company Method of applying poly(methacrylic anhydride resist to a semiconductor
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPH0816784B2 (ja) * 1989-09-27 1996-02-21 工業技術院物質工学工業技術研究所長 感可視光樹脂組成物
US6632590B1 (en) 2000-07-14 2003-10-14 Taiwan Semiconductor Manufacturing Company Enhance the process window of memory cell line/space dense pattern in sub-wavelength process

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3392051A (en) * 1964-06-08 1968-07-09 Ibm Method for forming thin film electrical circuit elements by preferential nucleation techniques
US3436468A (en) * 1965-05-28 1969-04-01 Texas Instruments Inc Plastic bodies having regions of altered chemical structure and method of making same
US3535137A (en) * 1967-01-13 1970-10-20 Ibm Method of fabricating etch resistant masks
AT301620B (de) * 1967-10-23 1972-08-15 Siemens Ag Verfahren zum herstellen einer photolackmaske fuer halbleiterzwecke
GB1237433A (en) * 1968-06-06 1971-06-30 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
US3696742A (en) * 1969-10-06 1972-10-10 Monsanto Res Corp Method of making a stencil for screen-printing using a laser beam

Also Published As

Publication number Publication date
DE2314124A1 (de) 1973-10-04
GB1370403A (en) 1974-10-16
DE2314124B2 (de) 1980-11-13
JPS5218097B2 (online.php) 1977-05-19
IT981198B (it) 1974-10-10
FR2177766A1 (online.php) 1973-11-09
DE2314124C3 (de) 1981-06-25
JPS4915372A (online.php) 1974-02-09
US3779806A (en) 1973-12-18
FR2177766B1 (online.php) 1983-06-10

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