BRPI0805843A2 - substrato formador de estrutura oca, método de produção de substrato formador de estrutura oca e método de produção de estrutura oca usando o substrato formador de estrutura oca - Google Patents

substrato formador de estrutura oca, método de produção de substrato formador de estrutura oca e método de produção de estrutura oca usando o substrato formador de estrutura oca Download PDF

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Publication number
BRPI0805843A2
BRPI0805843A2 BRPI0805843-1A BRPI0805843A BRPI0805843A2 BR PI0805843 A2 BRPI0805843 A2 BR PI0805843A2 BR PI0805843 A BRPI0805843 A BR PI0805843A BR PI0805843 A2 BRPI0805843 A2 BR PI0805843A2
Authority
BR
Brazil
Prior art keywords
hollow structure
forming substrate
structure forming
gas
production method
Prior art date
Application number
BRPI0805843-1A
Other languages
English (en)
Inventor
Masahiro Masuzawa
Masaru Ohgaki
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Publication of BRPI0805843A2 publication Critical patent/BRPI0805843A2/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C44/00—Shaping by internal pressure generated in the material, e.g. swelling or foaming ; Producing porous or cellular expanded plastics articles
    • B29C44/34—Auxiliary operations
    • B29C44/3403—Foaming under special conditions, e.g. in sub-atmospheric pressure, in or on a liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C44/00—Shaping by internal pressure generated in the material, e.g. swelling or foaming ; Producing porous or cellular expanded plastics articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/58—Blowing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D22/00—Producing hollow articles
    • B29D22/02—Inflatable articles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2791/00—Shaping characteristics in general
    • B29C2791/004—Shaping under special conditions
    • B29C2791/006—Using vacuum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/756—Microarticles, nanoarticles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24562—Interlaminar spaces
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24628—Nonplanar uniform thickness material
    • Y10T428/24661—Forming, or cooperating to form cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249975—Void shape specified [e.g., crushed, flat, round, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Blow-Moulding Or Thermoforming Of Plastics Or The Like (AREA)
  • Molding Of Porous Articles (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

SUBSTRATO FORMADOR DE ESTRUTURA OCA, MéTODO DE PRODUçãO DE SUBSTRATO FORMADOR DE ESTRUTURA OCA E MéTODO DE PRODUçãO DE ESTRUTURA OCA USANDO O SUBSTRATO FORMADOR DE ESTRUTURA OCA. Um substrato formador de estrutura oca inclui: uma superfície (23") sobre a qual um filme de deformação plástico (24) é formado pelo uso de um material deformável plástico; uma variedade de espaços retentores de gás dispostos regularmente (21); uma variedade de partes condutoras de gás (22) cada uma tendo uma primeira abertura (22b) a qual faceia um dos espaços retentores de gás correspondentes (21) e uma segunda abertura (22a) a qual faceia a superfície (23"), as partes condutoras de gás conduzem para fora o gás retido nos espaços retentores de gás (22) em direção à superfície (23") sob condição ambiental despressurizada; e uma variedade de espaços que impedem infiltração (22c), cada um fornecido em um espaço entre uma das primeiras aberturas correspondentes (22b) e uma das segundas aberturas correspondentes (22a), em que os espaços que impedem infiltração (22c) impedem a infiltração do material deformável plástico a partir da superfície (23") para os espaços retentores de gás (22c).
BRPI0805843-1A 2007-01-29 2008-01-10 substrato formador de estrutura oca, método de produção de substrato formador de estrutura oca e método de produção de estrutura oca usando o substrato formador de estrutura oca BRPI0805843A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007017716A JP4809254B2 (ja) 2007-01-29 2007-01-29 中空構造体形成用基板及びこの中空構造体形成用基板の製造方法及びこの中空構造体形成用基板を用いた中空構造体の製造方法
PCT/JP2008/050560 WO2008093543A1 (en) 2007-01-29 2008-01-10 Hollow structure forming substrate, method of producing the same, and method of producing hollow structure using the same

Publications (1)

Publication Number Publication Date
BRPI0805843A2 true BRPI0805843A2 (pt) 2011-08-30

Family

ID=39673857

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0805843-1A BRPI0805843A2 (pt) 2007-01-29 2008-01-10 substrato formador de estrutura oca, método de produção de substrato formador de estrutura oca e método de produção de estrutura oca usando o substrato formador de estrutura oca

Country Status (8)

Country Link
US (1) US8298651B2 (pt)
EP (1) EP2086737A4 (pt)
JP (1) JP4809254B2 (pt)
KR (1) KR101118446B1 (pt)
CN (1) CN101594974B (pt)
BR (1) BRPI0805843A2 (pt)
TW (1) TWI336654B (pt)
WO (1) WO2008093543A1 (pt)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4906539B2 (ja) * 2007-03-02 2012-03-28 株式会社リコー ハニカム構造物、ハニカム構造物の製造方法及び画像表示装置
JP5157200B2 (ja) * 2007-03-08 2013-03-06 株式会社リコー ハニカム構造シートの製造方法及び表示パネルの製造方法
JP5132168B2 (ja) * 2007-03-08 2013-01-30 株式会社リコー 画像表示素子用構造体の製造方法及び製造装置、並びに電気泳動表示素子の製造方法及び製造装置
JP4869269B2 (ja) * 2008-03-10 2012-02-08 株式会社リコー 中空構造体の製造方法及び中空構造体製造用基板及び中空構造体製造装置
JP5206247B2 (ja) * 2008-09-04 2013-06-12 株式会社リコー 微細中空体の製造方法および微細複合部品の製造方法
KR100979676B1 (ko) 2008-12-15 2010-09-02 한국광기술원 마이크로렌즈 어레이 제조방법
US8501054B2 (en) * 2009-07-09 2013-08-06 Inha-Industry Partnership Institute Apparatus and method for manufacturing micro lens array
JP2012000829A (ja) 2010-06-16 2012-01-05 Ricoh Co Ltd 中空構造体の製造方法、製造装置及び中空構造体
CN103201107B (zh) * 2010-09-20 2015-12-16 加利福尼亚技术学院 多层型蜂窝状金属玻璃结构
JP5807347B2 (ja) * 2011-03-02 2015-11-10 株式会社リコー 微細中空体の製造方法
WO2013132819A1 (ja) * 2012-03-06 2013-09-12 富士フイルム株式会社 ハニカム構造フィルムの製造方法

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
BE793429A (fr) * 1971-12-29 1973-06-28 Union Carbide Corp Appareil de formage de matieres thermoplastiques
JPH08112873A (ja) 1994-01-31 1996-05-07 Sekisui Chem Co Ltd 発泡体及びその製造方法
JP3067548B2 (ja) * 1994-10-13 2000-07-17 東ソー株式会社 ポリオレフィン樹脂発泡板及びその製造方法
JPH1080964A (ja) 1996-09-06 1998-03-31 Sekisui Chem Co Ltd ハニカム構造体及びその製造方法
JPH10323909A (ja) * 1997-05-27 1998-12-08 Asahi Chem Ind Co Ltd ハニカム・パネルの製造方法
JP3588545B2 (ja) * 1998-02-09 2004-11-10 積水化学工業株式会社 ポリオレフィン系樹脂発泡体の製造方法
EP1027977B1 (en) * 1997-10-29 2007-09-12 Sekisui Kagaku Kogyo Kabushiki Kaisha Process for producing foamable composite polyolefin resin sheet and composite foam
JP3117678B2 (ja) * 1997-10-29 2000-12-18 積水化学工業株式会社 ポリオレフィン系樹脂発泡性複合シートの製造方法
JP2001315217A (ja) * 2000-05-12 2001-11-13 Canon Inc 光学素子の製造方法、該製造方法による光学素子、該光学素子を有する表示素子と表示装置、及び該光学素子を有する撮像素子と撮像装置
JP2006145767A (ja) * 2004-11-18 2006-06-08 Sumitomo Electric Ind Ltd 微細構造体の製造方法、微細構造体を用いた樹脂成型方法および微細構造体
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JP4678731B2 (ja) * 2005-09-09 2011-04-27 株式会社リコー ハニカム構造体又は微細複合部品の製造方法
JP2008093861A (ja) * 2006-10-06 2008-04-24 Ricoh Co Ltd 微細なシェルによるハニカム構造体の製造方法

Also Published As

Publication number Publication date
EP2086737A4 (en) 2012-07-25
CN101594974B (zh) 2012-10-10
TW200848236A (en) 2008-12-16
JP4809254B2 (ja) 2011-11-09
TWI336654B (en) 2011-02-01
KR20090108622A (ko) 2009-10-15
EP2086737A1 (en) 2009-08-12
KR101118446B1 (ko) 2012-03-06
US8298651B2 (en) 2012-10-30
CN101594974A (zh) 2009-12-02
WO2008093543A1 (en) 2008-08-07
JP2008183759A (ja) 2008-08-14
US20100035040A1 (en) 2010-02-11

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B06G Technical and formal requirements: other requirements [chapter 6.7 patent gazette]

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B06H Technical and formal requirements: requirement cancelled [chapter 6.8 patent gazette]

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B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2342 DE 24-11-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.