BRPI0803083A8 - injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada - Google Patents

injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada

Info

Publication number
BRPI0803083A8
BRPI0803083A8 BRPI0803083A BRPI0803083A BRPI0803083A8 BR PI0803083 A8 BRPI0803083 A8 BR PI0803083A8 BR PI0803083 A BRPI0803083 A BR PI0803083A BR PI0803083 A BRPI0803083 A BR PI0803083A BR PI0803083 A8 BRPI0803083 A8 BR PI0803083A8
Authority
BR
Brazil
Prior art keywords
reactor
controlled atmosphere
chamber
atmosphere
gas injector
Prior art date
Application number
BRPI0803083A
Other languages
English (en)
Inventor
Lewis Green John
Ellsworth Knorr Robert Jr
Zurecki Zbigniew
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of BRPI0803083A2 publication Critical patent/BRPI0803083A2/pt
Publication of BRPI0803083A8 publication Critical patent/BRPI0803083A8/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada. um injetor de gás no qual um gás é passado através de descargas elétricas de alta voltagem/baixa corrente antes de ser descarregado dentro da câmara de um alto-forno de tratamento térmico. a ativação elétrica do gás acelera reações desejáveis entre o gás, gases na câmara do alto-forno, e a carga de trabalho na câmara. preferivelmente, um eletrodo quente é eletricamente carregado e as outras partes do injetor de gás e o alto-forno estão aterrados.
BRPI0803083A 2007-05-09 2008-05-09 injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada BRPI0803083A8 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US92838507P 2007-05-09 2007-05-09
US12/113,565 US8268094B2 (en) 2007-05-09 2008-05-01 Furnace atmosphere activation method and apparatus

Publications (2)

Publication Number Publication Date
BRPI0803083A2 BRPI0803083A2 (pt) 2011-08-16
BRPI0803083A8 true BRPI0803083A8 (pt) 2018-04-24

Family

ID=39699682

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0803083A BRPI0803083A8 (pt) 2007-05-09 2008-05-09 injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada

Country Status (12)

Country Link
US (1) US8268094B2 (pt)
EP (1) EP1991038B1 (pt)
KR (2) KR101151190B1 (pt)
CN (1) CN101307422B (pt)
BR (1) BRPI0803083A8 (pt)
CA (1) CA2631064C (pt)
MX (1) MX2008006049A (pt)
MY (1) MY151853A (pt)
PL (1) PL1991038T3 (pt)
RU (1) RU2008118730A (pt)
SG (1) SG148109A1 (pt)
TW (1) TWI397611B (pt)

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TW201418476A (zh) * 2012-11-01 2014-05-16 Metal Ind Res & Dev Ct 用於小型熱處理爐之爐氣產生裝置
US9740382B2 (en) * 2013-01-23 2017-08-22 Fisher-Rosemount Systems, Inc. Methods and apparatus to monitor tasks in a process system enterprise
EP2953893A4 (en) 2013-03-12 2017-01-25 Powerdyne, Inc. Systems and methods for producing fuel from parallel processed syngas
US9540279B2 (en) * 2013-05-24 2017-01-10 Corning Incorporated Method of producing glass-ceramic
JP2015130555A (ja) * 2014-01-06 2015-07-16 株式会社東芝 画像処理装置、画像処理方法、および画像投影装置
US10869502B2 (en) * 2015-07-31 2020-12-22 14Th Round Inc. Disposable assembly for vaporizing e-liquid and a method of using the same
CN205143486U (zh) * 2015-09-02 2016-04-13 深圳市合元科技有限公司 雾化头、雾化器及电子烟
CN106987792A (zh) * 2017-06-07 2017-07-28 上海颐柏热处理设备有限公司 一种常压下的乙炔渗碳炉
RU2682986C1 (ru) * 2017-10-30 2019-03-25 Федеральное государственное автономное образовательное учреждение высшего образования "Крымский федеральный университет имени В.И. Вернадского" Способ упрочнения стального изделия ионно-плазменной карбонитрацией
CN112933885B (zh) * 2021-03-05 2022-09-06 中北大学 一种超重力非平衡选择性吸收三聚氰胺尾气中氨的方法和装置
CN113414474B (zh) * 2021-07-09 2022-06-17 天津大学 一种以二氧化碳作为环境气氛的钛合金焊接系统和焊接方法

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Also Published As

Publication number Publication date
CA2631064A1 (en) 2008-11-09
TWI397611B (zh) 2013-06-01
CN101307422B (zh) 2011-10-05
TW200912039A (en) 2009-03-16
KR101258010B1 (ko) 2013-04-24
US20080283153A1 (en) 2008-11-20
MY151853A (en) 2014-07-14
KR101151190B1 (ko) 2012-06-11
EP1991038A3 (en) 2010-09-01
SG148109A1 (en) 2008-12-31
MX2008006049A (es) 2009-03-03
US8268094B2 (en) 2012-09-18
KR20110058763A (ko) 2011-06-01
CA2631064C (en) 2011-09-27
BRPI0803083A2 (pt) 2011-08-16
EP1991038A2 (en) 2008-11-12
EP1991038B1 (en) 2014-10-01
PL1991038T3 (pl) 2015-03-31
KR20080099822A (ko) 2008-11-13
RU2008118730A (ru) 2009-11-20
CN101307422A (zh) 2008-11-19

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B06G Technical and formal requirements: other requirements [chapter 6.7 patent gazette]

Free format text: SOLICITA-SE A REGULARIZACAO DA PROCURACAO, UMA VEZ QUE BASEADO NO ARTIGO 216 1O DA LPI, O DOCUMENTO DE PROCURACAO DEVE SER APRESENTADO NO ORIGINAL, TRASLADO OU FOTOCOPIA AUTENTICADA.

B03A Publication of a patent application or of a certificate of addition of invention [chapter 3.1 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B03H Publication of an application: rectification [chapter 3.8 patent gazette]