BRPI0803083A8 - injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada - Google Patents

injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada

Info

Publication number
BRPI0803083A8
BRPI0803083A8 BRPI0803083A BRPI0803083A BRPI0803083A8 BR PI0803083 A8 BRPI0803083 A8 BR PI0803083A8 BR PI0803083 A BRPI0803083 A BR PI0803083A BR PI0803083 A BRPI0803083 A BR PI0803083A BR PI0803083 A8 BRPI0803083 A8 BR PI0803083A8
Authority
BR
Brazil
Prior art keywords
reactor
controlled atmosphere
chamber
atmosphere
gas injector
Prior art date
Application number
BRPI0803083A
Other languages
English (en)
Inventor
Lewis Green John
Ellsworth Knorr Robert Jr
Zurecki Zbigniew
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of BRPI0803083A2 publication Critical patent/BRPI0803083A2/pt
Publication of BRPI0803083A8 publication Critical patent/BRPI0803083A8/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada. um injetor de gás no qual um gás é passado através de descargas elétricas de alta voltagem/baixa corrente antes de ser descarregado dentro da câmara de um alto-forno de tratamento térmico. a ativação elétrica do gás acelera reações desejáveis entre o gás, gases na câmara do alto-forno, e a carga de trabalho na câmara. preferivelmente, um eletrodo quente é eletricamente carregado e as outras partes do injetor de gás e o alto-forno estão aterrados.
BRPI0803083A 2007-05-09 2008-05-09 injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada BRPI0803083A8 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US92838507P 2007-05-09 2007-05-09
US12/113,565 US8268094B2 (en) 2007-05-09 2008-05-01 Furnace atmosphere activation method and apparatus

Publications (2)

Publication Number Publication Date
BRPI0803083A2 BRPI0803083A2 (pt) 2011-08-16
BRPI0803083A8 true BRPI0803083A8 (pt) 2018-04-24

Family

ID=39699682

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0803083A BRPI0803083A8 (pt) 2007-05-09 2008-05-09 injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada

Country Status (12)

Country Link
US (1) US8268094B2 (pt)
EP (1) EP1991038B1 (pt)
KR (2) KR101151190B1 (pt)
CN (1) CN101307422B (pt)
BR (1) BRPI0803083A8 (pt)
CA (1) CA2631064C (pt)
MX (1) MX2008006049A (pt)
MY (1) MY151853A (pt)
PL (1) PL1991038T3 (pt)
RU (1) RU2008118730A (pt)
SG (1) SG148109A1 (pt)
TW (1) TWI397611B (pt)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100127421A1 (en) * 2008-11-25 2010-05-27 Dabich Ii Leonard Charles Bi-directional flow for processing shaped bodies
KR101025035B1 (ko) * 2009-06-23 2011-03-25 주성호 프라즈마를 이용한 버어너
KR101704849B1 (ko) * 2009-08-07 2017-02-08 스와겔로크 컴패니 저진공 하에서의 저온 침탄
EP2526339A4 (en) 2010-01-21 2015-03-11 Powerdyne Inc PRODUCTION OF STEAM FROM A CARBON SUBSTANCE
US8492979B2 (en) * 2010-03-25 2013-07-23 General Electric Company Plasma generation apparatus
US8961711B2 (en) 2010-05-24 2015-02-24 Air Products And Chemicals, Inc. Method and apparatus for nitriding metal articles
US9109277B2 (en) 2011-01-10 2015-08-18 Air Products And Chemicals, Inc. Method and apparatus for heat treating a metal
US8931278B2 (en) 2011-05-16 2015-01-13 Powerdyne, Inc. Steam generation system
US9273570B2 (en) 2012-09-05 2016-03-01 Powerdyne, Inc. Methods for power generation from H2O, CO2, O2 and a carbon feed stock
WO2014039704A1 (en) * 2012-09-05 2014-03-13 Powerdyne, Inc. Fuel generation using high-voltage electric fields methods
US9677431B2 (en) 2012-09-05 2017-06-13 Powerdyne, Inc. Methods for generating hydrogen gas using plasma sources
KR20150052226A (ko) * 2012-09-05 2015-05-13 파워다인, 인코포레이티드 고전압 전기장 방법을 사용하는 연료 생성
KR20150053943A (ko) 2012-09-05 2015-05-19 파워다인, 인코포레이티드 고전압 전기장 방법을 사용하는 연료 생성
BR112015004836A2 (pt) 2012-09-05 2017-07-04 Powerdyne Inc método para sequestrar particulados de toxina
KR101581263B1 (ko) 2012-09-05 2015-12-31 파워다인, 인코포레이티드 피셔-트롭슈 촉매 및 플라즈마 소스를 사용하는 연료 재료를 생성하는 시스템
TW201418476A (zh) * 2012-11-01 2014-05-16 Metal Ind Res & Dev Ct 用於小型熱處理爐之爐氣產生裝置
US9740382B2 (en) * 2013-01-23 2017-08-22 Fisher-Rosemount Systems, Inc. Methods and apparatus to monitor tasks in a process system enterprise
EP2953893A4 (en) 2013-03-12 2017-01-25 Powerdyne, Inc. Systems and methods for producing fuel from parallel processed syngas
US9540279B2 (en) * 2013-05-24 2017-01-10 Corning Incorporated Method of producing glass-ceramic
JP2015130555A (ja) * 2014-01-06 2015-07-16 株式会社東芝 画像処理装置、画像処理方法、および画像投影装置
US10869502B2 (en) * 2015-07-31 2020-12-22 14Th Round Inc. Disposable assembly for vaporizing e-liquid and a method of using the same
CN205143486U (zh) * 2015-09-02 2016-04-13 深圳市合元科技有限公司 雾化头、雾化器及电子烟
CN106987792A (zh) * 2017-06-07 2017-07-28 上海颐柏热处理设备有限公司 一种常压下的乙炔渗碳炉
RU2682986C1 (ru) * 2017-10-30 2019-03-25 Федеральное государственное автономное образовательное учреждение высшего образования "Крымский федеральный университет имени В.И. Вернадского" Способ упрочнения стального изделия ионно-плазменной карбонитрацией
CN112933885B (zh) * 2021-03-05 2022-09-06 中北大学 一种超重力非平衡选择性吸收三聚氰胺尾气中氨的方法和装置
CN113414474B (zh) * 2021-07-09 2022-06-17 天津大学 一种以二氧化碳作为环境气氛的钛合金焊接系统和焊接方法
JP2025001296A (ja) * 2023-06-20 2025-01-08 株式会社ダイヘン プラズマ処理装置
CN119191695B (zh) * 2024-11-28 2025-04-11 安徽火凤凰新材料科技有限公司 一种微晶玻璃加工用晶化辊道窑及使用方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2855413A1 (de) * 1978-12-21 1980-07-10 Siemens Ag Speichermaterial fuer wasserstoff
US4887005A (en) * 1987-09-15 1989-12-12 Rough J Kirkwood H Multiple electrode plasma reactor power distribution system
US4872926A (en) 1987-12-30 1989-10-10 American Air Liquide Process for heat treating metals or metal alloys in a thermal plasma
US5104634A (en) * 1989-04-20 1992-04-14 Hercules Incorporated Process for forming diamond coating using a silent discharge plasma jet process
US5059757A (en) * 1989-11-24 1991-10-22 Abar Ipsen Industries, Inc. Gas shrouded electrode for a plasma carburizing furnace
CA2047807A1 (fr) * 1991-07-24 1993-01-25 My Dung Nguyen Handfield Vitrification des cendres
CA2144834C (en) * 1994-03-17 2000-02-08 Masahiro Miyamoto Method and apparatus for generating induced plasma
JP3301857B2 (ja) * 1994-03-29 2002-07-15 マツダ株式会社 浸炭処理方法
DE19521548A1 (de) * 1995-06-13 1996-12-19 Ipsen Ind Int Gmbh Verfahren und Vorrichtung zur Steuerung der elektrischen Stromdichte über einem Werkstück bei der Wärmebehandlung im Plasma
US5693241A (en) * 1996-06-18 1997-12-02 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Atmospheric pressure method and apparatus for removal of organic matter with atomic and ionic oxygen
US5821492A (en) * 1997-02-14 1998-10-13 Celestech, Inc. Radiation and regeneratively cooled arc jet device for thin diamond film deposition
EP0872569B1 (en) * 1997-04-18 2003-12-17 Plasma Metal S.A. Nitriding process and nitriding furnace thereof
WO1999011572A1 (en) * 1997-09-01 1999-03-11 Laxarco Holding Limited Electrically assisted partial oxidation of light hydrocarbons by oxygen
DE19742442B4 (de) * 1997-09-26 2005-07-07 Raantec Gmbh & Co. Kg Vorrichtung zum Verschweißen von Kunststoff-Folien
JP4724930B2 (ja) * 2001-03-01 2011-07-13 ソニー株式会社 炭素質材料の製造方法及び製造装置
US6881386B2 (en) 2002-05-30 2005-04-19 Massachusetts Institute Of Technology Low current plasmatron fuel converter having enlarged volume discharges
CN1323751C (zh) 2003-05-27 2007-07-04 松下电工株式会社 等离子体处理装置、生成等离子体反应容器的制造方法及等离子体处理方法
DE112004000057B4 (de) * 2003-05-27 2008-09-25 Matsushita Electric Works, Ltd., Kadoma Plasmabehandlungsapparat und Plasmabehandlungsverfahren
WO2005004556A2 (en) 2003-06-20 2005-01-13 Drexel University Vortex reactor and method of using it
US20050016831A1 (en) 2003-07-24 2005-01-27 Paganessi Joseph E. Generation of acetylene for on-site use in carburization and other processes
JP4772398B2 (ja) 2005-07-04 2011-09-14 住友重機械工業株式会社 成膜方法及び成膜装置
CN101972621B (zh) 2005-10-10 2012-08-22 韩国机械研究院 等离子体反应器

Also Published As

Publication number Publication date
KR101258010B1 (ko) 2013-04-24
CA2631064A1 (en) 2008-11-09
EP1991038A2 (en) 2008-11-12
US8268094B2 (en) 2012-09-18
CN101307422B (zh) 2011-10-05
MX2008006049A (es) 2009-03-03
KR20110058763A (ko) 2011-06-01
MY151853A (en) 2014-07-14
TWI397611B (zh) 2013-06-01
KR101151190B1 (ko) 2012-06-11
BRPI0803083A2 (pt) 2011-08-16
KR20080099822A (ko) 2008-11-13
CN101307422A (zh) 2008-11-19
EP1991038B1 (en) 2014-10-01
TW200912039A (en) 2009-03-16
EP1991038A3 (en) 2010-09-01
PL1991038T3 (pl) 2015-03-31
CA2631064C (en) 2011-09-27
SG148109A1 (en) 2008-12-31
US20080283153A1 (en) 2008-11-20
RU2008118730A (ru) 2009-11-20

Similar Documents

Publication Publication Date Title
BRPI0803083A8 (pt) injetor de gás ativado para uso com um reator de atmosfera controlada possuindo uma câmara do reator, sistema reator de atmosfera controlada, e método para ativação de uma atmosfera contida por uma câmara do reator de um reator de atmosfera controlada
TW200734276A (en) Fluid purification device and method
PH12018500283A1 (en) A system and method for treating water systems with high voltage discharge and ozone
WO2012024570A3 (en) Mass spectrometer with soft ionizing glow discharge and conditioner
BR112012027765A2 (pt) métodos, composições e kits para tratamento de distúrbios de mineralização da matriz.
EP1726351A4 (en) AIR CLEANING DEVICE
NZ593249A (en) Optically-based stimulation of target cells and modifications thereto
PH12013501622A1 (en) Seawater desalination apparatus
NZ609460A (en) Method for activating helper t cell
EP2120254A3 (en) Plasma processing apparatus
BR112018016443A2 (pt) sistema de transposon replicativo
BR112016023566A2 (pt) sistema de tratamento para tratar água em um sistema de água corrente com uma descarga de plasma e ozônio, e, método para tratar uma corrente de água corrente
Wende et al. Proteomic tools to characterize non-thermal plasma effects in eukaryotic cells
GB2432532A (en) Sterilization method and sterilization apparatus
WO2021092464A3 (en) Chemically modified oligonucleotides targeting bromodomain containing protein 4 (brd4) for immunotherapy
UA48850U (ru) Устройство для обработки газов, в частности для сушки природного или биологического газа
BR112015012811A2 (pt) genes dgat compreendendo domínios de homologia de plecstrina e uso em micro-organismos recombinantes
WO2014160886A3 (en) Systems and methods for treating material surfaces
CN102479659A (zh) 一种电离源及其在气溶胶检测中的应用
BR112012033172A2 (pt) processo e dispositivo para fragmentação de aparelhos de refrigeração
EP4226999A3 (en) Plasma reactor for liquid and gas and related methods
Yamamoto et al. Water vapor desorption and adsorbent regeneration for air conditioning unit using pulsed corona plasma
Kopel et al. Draft genome sequences of two ulvan-degrading isolates, strains LTR and LOR, that belong to the Alteromonas genus
CN204704784U (zh) 一种空气净化灯灯座
TW200743241A (en) Method for activating fuel cell and device thereof

Legal Events

Date Code Title Description
B06G Technical and formal requirements: other requirements [chapter 6.7 patent gazette]

Free format text: SOLICITA-SE A REGULARIZACAO DA PROCURACAO, UMA VEZ QUE BASEADO NO ARTIGO 216 1O DA LPI, O DOCUMENTO DE PROCURACAO DEVE SER APRESENTADO NO ORIGINAL, TRASLADO OU FOTOCOPIA AUTENTICADA.

B03A Publication of a patent application or of a certificate of addition of invention [chapter 3.1 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B03H Publication of an application: rectification [chapter 3.8 patent gazette]