BRPI0620330A2 - camada de detecção de analito microporoso depositado a plasma - Google Patents
camada de detecção de analito microporoso depositado a plasma Download PDFInfo
- Publication number
- BRPI0620330A2 BRPI0620330A2 BRPI0620330-2A BRPI0620330A BRPI0620330A2 BR PI0620330 A2 BRPI0620330 A2 BR PI0620330A2 BR PI0620330 A BRPI0620330 A BR PI0620330A BR PI0620330 A2 BRPI0620330 A2 BR PI0620330A2
- Authority
- BR
- Brazil
- Prior art keywords
- layer
- mesh layer
- analyte
- microporous
- plasma
- Prior art date
Links
- 238000001514 detection method Methods 0.000 title claims abstract description 121
- 239000012491 analyte Substances 0.000 title claims abstract description 110
- 238000000034 method Methods 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 239000011148 porous material Substances 0.000 claims abstract description 28
- 230000003287 optical effect Effects 0.000 claims abstract description 27
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000001301 oxygen Substances 0.000 claims abstract description 13
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 13
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- 239000010703 silicon Substances 0.000 claims abstract description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000001257 hydrogen Substances 0.000 claims abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 4
- 238000010438 heat treatment Methods 0.000 claims description 47
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- 229930195733 hydrocarbon Natural products 0.000 claims description 8
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- 230000015572 biosynthetic process Effects 0.000 claims description 5
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 claims description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
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- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 24
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- -1 bis (methylsilane) ethane Chemical compound 0.000 description 6
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
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- 229910052759 nickel Inorganic materials 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 239000012466 permeate Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
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- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
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- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
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- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- 239000000377 silicon dioxide Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- KXURBYWVAZRHTL-UHFFFAOYSA-N C.C[SiH3].C[SiH3] Chemical compound C.C[SiH3].C[SiH3] KXURBYWVAZRHTL-UHFFFAOYSA-N 0.000 description 1
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- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
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- 229910045601 alloy Inorganic materials 0.000 description 1
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- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- QRHCILLLMDEFSD-UHFFFAOYSA-N bis(ethenyl)-dimethylsilane Chemical compound C=C[Si](C)(C)C=C QRHCILLLMDEFSD-UHFFFAOYSA-N 0.000 description 1
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- 239000001273 butane Substances 0.000 description 1
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- JQZUMFHYRULBEN-UHFFFAOYSA-N diethyl(methyl)silicon Chemical compound CC[Si](C)CC JQZUMFHYRULBEN-UHFFFAOYSA-N 0.000 description 1
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- KCWYOFZQRFCIIE-UHFFFAOYSA-N ethylsilane Chemical compound CC[SiH3] KCWYOFZQRFCIIE-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
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- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
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- 238000005305 interferometry Methods 0.000 description 1
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- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical compound [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- UIDUKLCLJMXFEO-UHFFFAOYSA-N propylsilane Chemical compound CCC[SiH3] UIDUKLCLJMXFEO-UHFFFAOYSA-N 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 231100000167 toxic agent Toxicity 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N2021/7706—Reagent provision
- G01N2021/7723—Swelling part, also for adsorption sensor, i.e. without chemical reaction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N2021/7706—Reagent provision
- G01N2021/7726—Porous glass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N2021/7793—Sensor comprising plural indicators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
- G01N21/783—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour for analysing gases
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Engineering & Computer Science (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/275.277 | 2005-12-21 | ||
| US11/275,277 US8293340B2 (en) | 2005-12-21 | 2005-12-21 | Plasma deposited microporous analyte detection layer |
| PCT/US2006/047958 WO2007075443A1 (en) | 2005-12-21 | 2006-12-15 | Plasma deposited microporous analyte detection layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BRPI0620330A2 true BRPI0620330A2 (pt) | 2011-11-08 |
Family
ID=38174065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0620330-2A BRPI0620330A2 (pt) | 2005-12-21 | 2006-12-15 | camada de detecção de analito microporoso depositado a plasma |
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| EP (1) | EP1963850A4 (enExample) |
| JP (1) | JP5319300B2 (enExample) |
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| CN (1) | CN101341404B (enExample) |
| BR (1) | BRPI0620330A2 (enExample) |
| WO (1) | WO2007075443A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| RU2513773C1 (ru) * | 2010-04-02 | 2014-04-20 | 3М Инновейтив Пропертиз Компани | Фильтрующая система, включающая структурированные оптические датчики аналитов и оптические считывающие устройства |
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| EP2622321A4 (en) | 2010-10-01 | 2014-03-19 | 3M Innovative Properties Co | PORTABLE MONITOR TO INDICATE THE END OF A EQUIPMENT LIFE |
| TWI427288B (zh) | 2010-10-11 | 2014-02-21 | Univ Nat Chiao Tung | 垂直式感測器 |
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| EP3036544A4 (en) * | 2013-08-23 | 2017-03-29 | Pregtech Pty Ltd. | Methods and sensors for detecting a biological parameter |
| DE102014112972A1 (de) * | 2013-09-12 | 2015-03-12 | Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG | Messmembran für einen optochemischen oder amperometrischen Sensor |
| CN106404860A (zh) * | 2016-08-30 | 2017-02-15 | 济南大学 | 一种氮化碳修饰三维石墨电极的制备方法及电致化学发光传感应用 |
| FR3066603B1 (fr) * | 2017-05-22 | 2019-07-05 | Universite D'aix-Marseille | Dispositif optique de detection et de quantification de composes volatils |
| DE102018116345A1 (de) * | 2018-07-05 | 2020-01-09 | Endress+Hauser Conducta Gmbh+Co. Kg | Sensormembran, Sensorkappe und Verfahren zum Aufbringen einer Sensormembran |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4685940A (en) * | 1984-03-12 | 1987-08-11 | Abraham Soffer | Separation device |
| JPS62224299A (ja) * | 1985-12-06 | 1987-10-02 | Fuji Photo Film Co Ltd | γ―グルタミルトランスフェラーゼ活性測定用試薬シート及び一体型多層分析要素 |
| JPH03231142A (ja) * | 1990-02-07 | 1991-10-15 | Nippon Sheet Glass Co Ltd | 光化学センサー |
| US5015843A (en) * | 1990-02-15 | 1991-05-14 | Polysense, Inc. | Fiber optic chemical sensors based on polymer swelling |
| GB9014903D0 (en) * | 1990-07-05 | 1990-08-22 | Unilever Plc | Assays |
| AT403746B (de) * | 1994-04-12 | 1998-05-25 | Avl Verbrennungskraft Messtech | Optochemischer sensor sowie verfahren zu seiner herstellung |
| JPH08184560A (ja) | 1994-12-28 | 1996-07-16 | Hoechst Japan Ltd | 有機溶剤蒸気を検出するための光センサ装置 |
| US5763836A (en) * | 1995-06-21 | 1998-06-09 | C & M Corporation Of Connecticut | Retractable multiconductor coil cord |
| WO1997043116A1 (en) * | 1996-05-15 | 1997-11-20 | Hyperion Catalysis International, Inc. | Rigid porous carbon structures, methods of making, methods of using and products containing same |
| US6416938B1 (en) * | 1996-06-25 | 2002-07-09 | Ronald M. Kubacki | Photosensitive organosilicon films |
| US6331209B1 (en) * | 1999-04-21 | 2001-12-18 | Jin Jang | Method of forming carbon nanotubes |
| US6180318B1 (en) * | 1999-05-19 | 2001-01-30 | 3M Innovative Properties Company | Method of imaging an article |
| US6297293B1 (en) * | 1999-09-15 | 2001-10-02 | Tda Research, Inc. | Mesoporous carbons and polymers |
| US6396616B1 (en) * | 2000-10-10 | 2002-05-28 | 3M Innovative Properties Company | Direct laser imaging system |
| GB0120202D0 (en) * | 2001-08-18 | 2001-10-10 | Psimedica | Body fluid collection and analysis |
| US6878419B2 (en) * | 2001-12-14 | 2005-04-12 | 3M Innovative Properties Co. | Plasma treatment of porous materials |
| JP2004026547A (ja) | 2002-06-24 | 2004-01-29 | Nippon Sheet Glass Co Ltd | 断熱合わせガラス |
| CA2493243A1 (en) * | 2002-07-22 | 2004-01-29 | Aspen Aerogels, Inc. | Polyimide aerogels, carbon aerogels, and metal carbide aerogels and methods of making same |
| US20040062682A1 (en) * | 2002-09-30 | 2004-04-01 | Rakow Neal Anthony | Colorimetric sensor |
| US7449146B2 (en) | 2002-09-30 | 2008-11-11 | 3M Innovative Properties Company | Colorimetric sensor |
| US7098149B2 (en) * | 2003-03-04 | 2006-08-29 | Air Products And Chemicals, Inc. | Mechanical enhancement of dense and porous organosilicate materials by UV exposure |
| TWI240959B (en) | 2003-03-04 | 2005-10-01 | Air Prod & Chem | Mechanical enhancement of dense and porous organosilicate materials by UV exposure |
| GB0317557D0 (en) | 2003-07-26 | 2003-08-27 | Univ Manchester | Microporous polymer material |
| US7524455B2 (en) * | 2003-11-24 | 2009-04-28 | General Electric Company | Methods for deposition of sensor regions onto optical storage media substrates and resulting devices |
| US7033667B2 (en) * | 2003-12-18 | 2006-04-25 | 3M Innovative Properties Company | Printed circuits on shrink film |
| US7889346B2 (en) * | 2003-12-31 | 2011-02-15 | University Of South Carolina | Thin-layer porous optical sensors for gases and other fluids |
| JP2005300528A (ja) * | 2004-03-18 | 2005-10-27 | Fuji Photo Film Co Ltd | 検体の検査方法に使用する分析要素。 |
-
2005
- 2005-12-21 US US11/275,277 patent/US8293340B2/en not_active Expired - Fee Related
-
2006
- 2006-12-15 KR KR1020087014918A patent/KR101331710B1/ko not_active Expired - Fee Related
- 2006-12-15 JP JP2008547356A patent/JP5319300B2/ja not_active Expired - Fee Related
- 2006-12-15 WO PCT/US2006/047958 patent/WO2007075443A1/en not_active Ceased
- 2006-12-15 EP EP06845568A patent/EP1963850A4/en not_active Withdrawn
- 2006-12-15 CN CN2006800483439A patent/CN101341404B/zh not_active Expired - Fee Related
- 2006-12-15 BR BRPI0620330-2A patent/BRPI0620330A2/pt not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| US20070141580A1 (en) | 2007-06-21 |
| CN101341404A (zh) | 2009-01-07 |
| KR101331710B1 (ko) | 2013-11-20 |
| US8293340B2 (en) | 2012-10-23 |
| JP2009521679A (ja) | 2009-06-04 |
| EP1963850A1 (en) | 2008-09-03 |
| WO2007075443A1 (en) | 2007-07-05 |
| EP1963850A4 (en) | 2011-03-02 |
| KR20080078682A (ko) | 2008-08-27 |
| CN101341404B (zh) | 2013-07-17 |
| JP5319300B2 (ja) | 2013-10-16 |
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