BRPI0620330A2 - camada de detecção de analito microporoso depositado a plasma - Google Patents
camada de detecção de analito microporoso depositado a plasma Download PDFInfo
- Publication number
- BRPI0620330A2 BRPI0620330A2 BRPI0620330-2A BRPI0620330A BRPI0620330A2 BR PI0620330 A2 BRPI0620330 A2 BR PI0620330A2 BR PI0620330 A BRPI0620330 A BR PI0620330A BR PI0620330 A2 BRPI0620330 A2 BR PI0620330A2
- Authority
- BR
- Brazil
- Prior art keywords
- layer
- mesh layer
- analyte
- microporous
- plasma
- Prior art date
Links
- 238000001514 detection method Methods 0.000 title claims abstract description 121
- 239000012491 analyte Substances 0.000 title claims abstract description 110
- 238000000034 method Methods 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 239000011148 porous material Substances 0.000 claims abstract description 28
- 230000003287 optical effect Effects 0.000 claims abstract description 27
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000001301 oxygen Substances 0.000 claims abstract description 13
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 13
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 13
- 239000010703 silicon Substances 0.000 claims abstract description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000001257 hydrogen Substances 0.000 claims abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 4
- 238000010438 heat treatment Methods 0.000 claims description 47
- 230000008859 change Effects 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 19
- 239000007789 gas Substances 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 15
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 10
- 230000002209 hydrophobic effect Effects 0.000 claims description 10
- 229930195733 hydrocarbon Natural products 0.000 claims description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims description 8
- 150000001282 organosilanes Chemical class 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- 239000012298 atmosphere Substances 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 claims description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 30
- 239000010408 film Substances 0.000 description 30
- 239000000463 material Substances 0.000 description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 24
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- 230000004044 response Effects 0.000 description 14
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- 230000035945 sensitivity Effects 0.000 description 11
- 230000006870 function Effects 0.000 description 10
- 230000035699 permeability Effects 0.000 description 9
- 239000010409 thin film Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 239000003570 air Substances 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- -1 bis (methylsilane) ethane Chemical compound 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 238000010276 construction Methods 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000013532 laser treatment Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 239000012466 permeate Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000000985 reflectance spectrum Methods 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000012080 ambient air Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000000608 laser ablation Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000001345 alkine derivatives Chemical class 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 239000012229 microporous material Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000026041 response to humidity Effects 0.000 description 2
- 230000019491 signal transduction Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000000391 spectroscopic ellipsometry Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- KXURBYWVAZRHTL-UHFFFAOYSA-N C.C[SiH3].C[SiH3] Chemical compound C.C[SiH3].C[SiH3] KXURBYWVAZRHTL-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- QRHCILLLMDEFSD-UHFFFAOYSA-N bis(ethenyl)-dimethylsilane Chemical compound C=C[Si](C)(C)C=C QRHCILLLMDEFSD-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- JQZUMFHYRULBEN-UHFFFAOYSA-N diethyl(methyl)silicon Chemical compound CC[Si](C)CC JQZUMFHYRULBEN-UHFFFAOYSA-N 0.000 description 1
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- UTUAUBOPWUPBCH-UHFFFAOYSA-N dimethylsilylidene(dimethyl)silane Chemical compound C[Si](C)=[Si](C)C UTUAUBOPWUPBCH-UHFFFAOYSA-N 0.000 description 1
- 238000004980 dosimetry Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- KCWYOFZQRFCIIE-UHFFFAOYSA-N ethylsilane Chemical compound CC[SiH3] KCWYOFZQRFCIIE-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical compound [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- UIDUKLCLJMXFEO-UHFFFAOYSA-N propylsilane Chemical compound CCC[SiH3] UIDUKLCLJMXFEO-UHFFFAOYSA-N 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 231100000167 toxic agent Toxicity 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N2021/7706—Reagent provision
- G01N2021/7723—Swelling part, also for adsorption sensor, i.e. without chemical reaction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N2021/7706—Reagent provision
- G01N2021/7726—Porous glass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N2021/7793—Sensor comprising plural indicators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
- G01N21/783—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour for analysing gases
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Engineering & Computer Science (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/275.277 | 2005-12-21 | ||
| US11/275,277 US8293340B2 (en) | 2005-12-21 | 2005-12-21 | Plasma deposited microporous analyte detection layer |
| PCT/US2006/047958 WO2007075443A1 (en) | 2005-12-21 | 2006-12-15 | Plasma deposited microporous analyte detection layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BRPI0620330A2 true BRPI0620330A2 (pt) | 2011-11-08 |
Family
ID=38174065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0620330-2A BRPI0620330A2 (pt) | 2005-12-21 | 2006-12-15 | camada de detecção de analito microporoso depositado a plasma |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8293340B2 (enExample) |
| EP (1) | EP1963850A4 (enExample) |
| JP (1) | JP5319300B2 (enExample) |
| KR (1) | KR101331710B1 (enExample) |
| CN (1) | CN101341404B (enExample) |
| BR (1) | BRPI0620330A2 (enExample) |
| WO (1) | WO2007075443A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7887889B2 (en) * | 2001-12-14 | 2011-02-15 | 3M Innovative Properties Company | Plasma fluorination treatment of porous materials |
| EP2208058B1 (en) * | 2007-10-05 | 2018-07-11 | 3M Innovative Properties Company | Organic chemical sensor comprising plasma-deposited microporous layer, and method of making and using |
| WO2010002575A2 (en) * | 2008-06-30 | 2010-01-07 | 3M Innovative Properties Company | Exposure indicating device |
| BRPI0918200A2 (pt) * | 2008-12-23 | 2015-12-08 | 3M Innovative Properties Co | elemento de detecção e método de detecção de analitos químicos orgânicos |
| KR101821936B1 (ko) * | 2008-12-23 | 2018-01-24 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 미세다공성 유기실리케이트 재료를 갖는 유기 화학적 센서 |
| AU2010235022B2 (en) * | 2009-03-30 | 2013-08-22 | 3M Innovative Properties Company | Optoelectronic methods and devices for detection of analytes |
| US8225782B2 (en) * | 2009-05-22 | 2012-07-24 | 3M Innovative Properties Company | Filter cartridge having location-registered view window for end-of-service-life-indicator (ESLI) |
| BRPI1009623A2 (pt) * | 2009-05-22 | 2016-06-28 | 3M Innovative Properties Co | elemento de detecção opticamente interrogável e método para fabricação de elemento de detecção |
| US8365723B2 (en) * | 2009-05-22 | 2013-02-05 | 3M Innovative Properties Company | Filter cartridge having cone of visibility for end-of-service-life-indicator (ESLI) |
| KR20120016286A (ko) * | 2009-05-22 | 2012-02-23 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 다층 비색 센서 어레이 |
| US8336543B2 (en) * | 2009-05-22 | 2012-12-25 | 3M Innovative Properties Company | Filter cartridge having cover for masking service life indicator |
| KR20110020186A (ko) * | 2009-08-21 | 2011-03-02 | 한양대학교 산학협력단 | 고분자 전해질형 연료 전지용 고분자 전해질 막, 이의 제조 방법 및 이를 포함하는 고분자 전해질형 연료 전지 시스템 |
| US10516182B2 (en) | 2009-08-21 | 2019-12-24 | Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) | Polymer ion exchange membrane and method of preparing same |
| WO2011123403A1 (en) | 2010-04-02 | 2011-10-06 | 3M Innovative Properties Company | Filter systems including optical analyte sensors and optical readers |
| EP2553437A4 (en) | 2010-04-02 | 2017-12-06 | 3M Innovative Properties Company | Alignment registration feature for analyte sensor optical reader |
| WO2011123411A1 (en) | 2010-04-02 | 2011-10-06 | 3M Innovative Properties Company | Filter systems including patterned optical analyte sensors and optical readers |
| JP5800897B2 (ja) | 2010-06-15 | 2015-10-28 | スリーエム イノベイティブ プロパティズ カンパニー | 可変静電容量センサ及びその作製方法 |
| JP5932806B2 (ja) | 2010-09-30 | 2016-06-08 | スリーエム イノベイティブ プロパティズ カンパニー | センサー素子、その製造方法、及びそれを含むセンサー装置 |
| PL2622322T3 (pl) | 2010-10-01 | 2018-09-28 | 3M Innovative Properties Company | Sposób korelowania urządzenia monitorującego z końcem żywotności wkładu filtra |
| BR112013007516A2 (pt) | 2010-10-01 | 2020-10-06 | 3M Innovative Properties Company | monitor portátil para indicação de final de vida útil |
| TWI427288B (zh) * | 2010-10-11 | 2014-02-21 | 國立交通大學 | 垂直式感測器 |
| CN103492872B (zh) | 2011-04-13 | 2016-04-06 | 3M创新有限公司 | 使用吸收性传感器元件的方法 |
| US9429537B2 (en) | 2011-04-13 | 2016-08-30 | 3M Innovative Properties Company | Method of detecting volatile organic compounds |
| CN103477216A (zh) | 2011-04-13 | 2013-12-25 | 3M创新有限公司 | 包括具有集成加热的传感器元件的蒸气传感器 |
| LU91841B1 (en) * | 2011-07-15 | 2013-01-16 | Ct De Rech Public Gabriel Lippmann | Method for forming gas sensing layers |
| KR102027606B1 (ko) | 2011-12-12 | 2019-10-01 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 층상 필터 카트리지용 사용 수명 종료 표시 시스템 |
| US9751038B2 (en) | 2013-03-15 | 2017-09-05 | 3M Innovative Properties Company | End of service life indicating systems for layered filter cartridges |
| WO2015024065A1 (en) * | 2013-08-23 | 2015-02-26 | Pregtech Pty Ltd | Methods and sensors for detecting a biological parameter |
| DE102014112972A1 (de) * | 2013-09-12 | 2015-03-12 | Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG | Messmembran für einen optochemischen oder amperometrischen Sensor |
| CN106404860A (zh) * | 2016-08-30 | 2017-02-15 | 济南大学 | 一种氮化碳修饰三维石墨电极的制备方法及电致化学发光传感应用 |
| FR3066603B1 (fr) * | 2017-05-22 | 2019-07-05 | Universite D'aix-Marseille | Dispositif optique de detection et de quantification de composes volatils |
| DE102018116345A1 (de) * | 2018-07-05 | 2020-01-09 | Endress+Hauser Conducta Gmbh+Co. Kg | Sensormembran, Sensorkappe und Verfahren zum Aufbringen einer Sensormembran |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4685940A (en) * | 1984-03-12 | 1987-08-11 | Abraham Soffer | Separation device |
| JPS62224299A (ja) * | 1985-12-06 | 1987-10-02 | Fuji Photo Film Co Ltd | γ―グルタミルトランスフェラーゼ活性測定用試薬シート及び一体型多層分析要素 |
| JPH03231142A (ja) * | 1990-02-07 | 1991-10-15 | Nippon Sheet Glass Co Ltd | 光化学センサー |
| US5015843A (en) | 1990-02-15 | 1991-05-14 | Polysense, Inc. | Fiber optic chemical sensors based on polymer swelling |
| GB9014903D0 (en) * | 1990-07-05 | 1990-08-22 | Unilever Plc | Assays |
| AT403746B (de) | 1994-04-12 | 1998-05-25 | Avl Verbrennungskraft Messtech | Optochemischer sensor sowie verfahren zu seiner herstellung |
| JPH08184560A (ja) | 1994-12-28 | 1996-07-16 | Hoechst Japan Ltd | 有機溶剤蒸気を検出するための光センサ装置 |
| US5763836A (en) * | 1995-06-21 | 1998-06-09 | C & M Corporation Of Connecticut | Retractable multiconductor coil cord |
| ATE259893T1 (de) | 1996-05-15 | 2004-03-15 | Hyperion Catalysis Int | Starre, poröse kohlenstoffstrukturen, verfahren zu deren herstellung und verwendung und diese strukturen enthaltende erzeugnisse |
| US6416938B1 (en) | 1996-06-25 | 2002-07-09 | Ronald M. Kubacki | Photosensitive organosilicon films |
| US6331209B1 (en) | 1999-04-21 | 2001-12-18 | Jin Jang | Method of forming carbon nanotubes |
| US6180318B1 (en) | 1999-05-19 | 2001-01-30 | 3M Innovative Properties Company | Method of imaging an article |
| US6297293B1 (en) | 1999-09-15 | 2001-10-02 | Tda Research, Inc. | Mesoporous carbons and polymers |
| US6396616B1 (en) | 2000-10-10 | 2002-05-28 | 3M Innovative Properties Company | Direct laser imaging system |
| GB0120202D0 (en) * | 2001-08-18 | 2001-10-10 | Psimedica | Body fluid collection and analysis |
| US6878419B2 (en) | 2001-12-14 | 2005-04-12 | 3M Innovative Properties Co. | Plasma treatment of porous materials |
| JP2004026547A (ja) | 2002-06-24 | 2004-01-29 | Nippon Sheet Glass Co Ltd | 断熱合わせガラス |
| JP2005533893A (ja) | 2002-07-22 | 2005-11-10 | アスペン・エアロジェルズ・インコーポレーテッド | ポリイミドエーロゲル、炭素エーロゲル、及び金属炭化物エーロゲル並びにこれらの製造方法。 |
| US20040062682A1 (en) | 2002-09-30 | 2004-04-01 | Rakow Neal Anthony | Colorimetric sensor |
| US7449146B2 (en) * | 2002-09-30 | 2008-11-11 | 3M Innovative Properties Company | Colorimetric sensor |
| US7098149B2 (en) | 2003-03-04 | 2006-08-29 | Air Products And Chemicals, Inc. | Mechanical enhancement of dense and porous organosilicate materials by UV exposure |
| TWI240959B (en) * | 2003-03-04 | 2005-10-01 | Air Prod & Chem | Mechanical enhancement of dense and porous organosilicate materials by UV exposure |
| GB0317557D0 (en) | 2003-07-26 | 2003-08-27 | Univ Manchester | Microporous polymer material |
| US7524455B2 (en) * | 2003-11-24 | 2009-04-28 | General Electric Company | Methods for deposition of sensor regions onto optical storage media substrates and resulting devices |
| US7033667B2 (en) | 2003-12-18 | 2006-04-25 | 3M Innovative Properties Company | Printed circuits on shrink film |
| EP1699422A4 (en) * | 2003-12-31 | 2009-04-29 | Univ South Carolina | THIN-FILED POROUS OPTICAL SENSORS FOR GASES AND OTHER LIQUIDS |
| JP2005300528A (ja) * | 2004-03-18 | 2005-10-27 | Fuji Photo Film Co Ltd | 検体の検査方法に使用する分析要素。 |
-
2005
- 2005-12-21 US US11/275,277 patent/US8293340B2/en not_active Expired - Fee Related
-
2006
- 2006-12-15 KR KR1020087014918A patent/KR101331710B1/ko not_active Expired - Fee Related
- 2006-12-15 BR BRPI0620330-2A patent/BRPI0620330A2/pt not_active Application Discontinuation
- 2006-12-15 WO PCT/US2006/047958 patent/WO2007075443A1/en not_active Ceased
- 2006-12-15 JP JP2008547356A patent/JP5319300B2/ja not_active Expired - Fee Related
- 2006-12-15 EP EP06845568A patent/EP1963850A4/en not_active Withdrawn
- 2006-12-15 CN CN2006800483439A patent/CN101341404B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007075443A1 (en) | 2007-07-05 |
| US20070141580A1 (en) | 2007-06-21 |
| JP2009521679A (ja) | 2009-06-04 |
| CN101341404B (zh) | 2013-07-17 |
| KR20080078682A (ko) | 2008-08-27 |
| EP1963850A1 (en) | 2008-09-03 |
| KR101331710B1 (ko) | 2013-11-20 |
| EP1963850A4 (en) | 2011-03-02 |
| US8293340B2 (en) | 2012-10-23 |
| JP5319300B2 (ja) | 2013-10-16 |
| CN101341404A (zh) | 2009-01-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5319300B2 (ja) | プラズマ堆積微小多孔性の検体検出層 | |
| RU2360232C2 (ru) | Колориметрический датчик | |
| Lova et al. | Label-free vapor selectivity in poly (p-phenylene oxide) photonic crystal sensors | |
| Gao et al. | Porous-silicon vapor sensor based on laser interferometry | |
| US7042570B2 (en) | Porous thin film time-varying reflectivity analysis of samples | |
| US6421128B1 (en) | Coupled plasmon-waveguide resonance spectroscopic device and method for measuring film properties in the ultraviolet and infrared special ranges | |
| US8506902B2 (en) | Colorimetric sensor | |
| Zangooie et al. | Vapor sensitivity of thin porous silicon layers | |
| KR20090101289A (ko) | 플라즈마 증착된 미공성 탄소 재료 | |
| Sansierra et al. | Detection of organic vapors using tamm mode based devices built from mesoporous oxide thin films | |
| US20120184047A1 (en) | Nanoplasmonic device | |
| KR101821936B1 (ko) | 미세다공성 유기실리케이트 재료를 갖는 유기 화학적 센서 | |
| Rasson et al. | Vapor sensing using a bio-inspired porous silicon photonic crystal | |
| Kim et al. | Fabry–Perot cavity control for tunable Raman scattering | |
| Kim et al. | Detection of nerve agent stimulants based on photoluminescent porous silicon interferometer | |
| Sohn | A Luminescent Porous Silicon DBR Platform for Sensitive Detection of Chemical Warfare Agent Simulant Vapors | |
| Wang et al. | Return-path ellipsometry in gas sensing | |
| Sohn | Chemical sensors based on distributed Bragg reflector porous silicon smart particles | |
| De Stefano et al. | Porous silicon optical sensors for vapors, liquids, and biological molecules | |
| Rea et al. | Aperiodic photonic bandgap devices based on nanostructured porous silicon |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B15K | Others concerning applications: alteration of classification |
Free format text: AS CLASSIFICACOES ANTERIORES ERAM: G01N 33/50 , G01N 33/533 Ipc: G01N 21/78 (2006.01) |
|
| B15K | Others concerning applications: alteration of classification |
Free format text: A CLASSIFICACAO ANTERIOR ERA: G01N 21/78 Ipc: H05H 1/24 (2006.01), G01N 21/78 (2006.01) |
|
| B15K | Others concerning applications: alteration of classification |
Free format text: AS CLASSIFICACOES ANTERIORES ERAM: H05H 1/24 , G01N 21/78 Ipc: G01N 21/78 (2006.01) |
|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |