BR9100436A - Mistura sensivel a radiacao,material de desenho sensivel a radiacao e processo para preparacao de desenhos em relevo - Google Patents
Mistura sensivel a radiacao,material de desenho sensivel a radiacao e processo para preparacao de desenhos em relevoInfo
- Publication number
- BR9100436A BR9100436A BR919100436A BR9100436A BR9100436A BR 9100436 A BR9100436 A BR 9100436A BR 919100436 A BR919100436 A BR 919100436A BR 9100436 A BR9100436 A BR 9100436A BR 9100436 A BR9100436 A BR 9100436A
- Authority
- BR
- Brazil
- Prior art keywords
- radiation
- sensitive
- design material
- mixture
- preparing relief
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4003025A DE4003025A1 (de) | 1990-02-02 | 1990-02-02 | Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9100436A true BR9100436A (pt) | 1991-10-22 |
Family
ID=6399246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR919100436A BR9100436A (pt) | 1990-02-02 | 1991-02-01 | Mistura sensivel a radiacao,material de desenho sensivel a radiacao e processo para preparacao de desenhos em relevo |
Country Status (6)
Country | Link |
---|---|
US (1) | US5376496A (pt) |
EP (1) | EP0440086B1 (pt) |
JP (1) | JP2761482B2 (pt) |
BR (1) | BR9100436A (pt) |
CA (1) | CA2035406A1 (pt) |
DE (2) | DE4003025A1 (pt) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6238471A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 感光性平版印刷版の製造方法 |
US6340552B1 (en) * | 1990-12-27 | 2002-01-22 | Kabushiki Kaisha Toshiba | Photosensitive composition containing a dissolution inhibitor and an acid releasing compound |
JP3474196B2 (ja) * | 1994-12-28 | 2003-12-08 | クラリアント インターナショナル リミテッド | 放射性感応性組成物及びそれを用いた記録媒体 |
KR19990077276A (ko) * | 1996-12-03 | 1999-10-25 | 다께다 가즈히꼬 | 감광성 수지 조성물 및 물품 |
US6214517B1 (en) * | 1997-02-17 | 2001-04-10 | Fuji Photo Film Co., Ltd. | Positive photoresist composition |
KR100551653B1 (ko) * | 1997-08-18 | 2006-05-25 | 제이에스알 가부시끼가이샤 | 감방사선성수지조성물 |
GB9811813D0 (en) * | 1998-06-03 | 1998-07-29 | Horsell Graphic Ind Ltd | Polymeric compounds |
EP1077392A1 (en) * | 1999-08-16 | 2001-02-21 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
US6517988B1 (en) | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
KR101221468B1 (ko) * | 2005-01-27 | 2013-01-11 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
JP4699053B2 (ja) * | 2005-03-10 | 2011-06-08 | 東京応化工業株式会社 | カラーフィルタ用感光性樹脂組成物およびカラーフィルタ |
JP2006259461A (ja) * | 2005-03-18 | 2006-09-28 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物およびカラーフィルタ |
KR101882722B1 (ko) * | 2010-12-13 | 2018-07-27 | 후지필름 가부시키가이샤 | 포지티브형 감광성 수지 조성물 |
JP5417422B2 (ja) * | 2010-12-13 | 2014-02-12 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物 |
JP5593405B2 (ja) * | 2012-02-28 | 2014-09-24 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機el表示装置および液晶表示装置 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL185407B (nl) * | 1953-03-11 | Mitsui Petrochemical Ind | Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze. | |
US3515552A (en) * | 1966-09-16 | 1970-06-02 | Minnesota Mining & Mfg | Light-sensitive imaging sheet and method of using |
US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
GB1375461A (pt) * | 1972-05-05 | 1974-11-27 | ||
US4139384A (en) * | 1974-02-21 | 1979-02-13 | Fuji Photo Film Co., Ltd. | Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate |
JPS5136129A (ja) * | 1974-09-20 | 1976-03-26 | Konishiroku Photo Ind | Kankoseisoseibutsu |
JPS5241052A (en) * | 1975-09-25 | 1977-03-30 | Hiroshi Matsuda | Umbrella |
US4189323A (en) * | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
DE2829511A1 (de) * | 1978-07-05 | 1980-01-24 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
DE2928636A1 (de) * | 1979-07-16 | 1981-02-12 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
DE3337024A1 (de) * | 1983-10-12 | 1985-04-25 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch |
US4551409A (en) * | 1983-11-07 | 1985-11-05 | Shipley Company Inc. | Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide |
DE3406927A1 (de) * | 1984-02-25 | 1985-08-29 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen |
DE3442756A1 (de) * | 1984-11-23 | 1986-05-28 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen |
CA1254432A (en) * | 1984-12-28 | 1989-05-23 | Conrad G. Houle | High-temperature resistant, selectively developable positive-working resist |
FR2583534B1 (fr) * | 1985-06-18 | 1990-06-22 | Labo Electronique Physique | Composition pour obtenir une resine photosensible de haute resolution, developpable par plasma et procede photolithographique mettant en oeuvre cette resine. |
DE3528929A1 (de) * | 1985-08-13 | 1987-02-26 | Hoechst Ag | Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern |
DE3528930A1 (de) * | 1985-08-13 | 1987-02-26 | Hoechst Ag | Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch |
DE3731439A1 (de) * | 1987-09-18 | 1989-03-30 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial |
JPH01154797A (ja) * | 1987-12-11 | 1989-06-16 | Fuji Photo Film Co Ltd | 平版印刷版用アルミニウム支持体の電解粗面化処理方法 |
DE3820699A1 (de) * | 1988-06-18 | 1989-12-21 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
JP2623778B2 (ja) * | 1988-10-18 | 1997-06-25 | 日本合成ゴム株式会社 | 感放射線性樹脂組成物 |
-
1990
- 1990-02-02 DE DE4003025A patent/DE4003025A1/de not_active Withdrawn
-
1991
- 1991-01-24 EP EP91100860A patent/EP0440086B1/de not_active Expired - Lifetime
- 1991-01-24 DE DE59106745T patent/DE59106745D1/de not_active Expired - Fee Related
- 1991-01-30 US US07/648,143 patent/US5376496A/en not_active Expired - Fee Related
- 1991-01-31 CA CA002035406A patent/CA2035406A1/en not_active Abandoned
- 1991-02-01 JP JP3032214A patent/JP2761482B2/ja not_active Expired - Fee Related
- 1991-02-01 BR BR919100436A patent/BR9100436A/pt unknown
Also Published As
Publication number | Publication date |
---|---|
JPH04213459A (ja) | 1992-08-04 |
EP0440086B1 (de) | 1995-10-25 |
US5376496A (en) | 1994-12-27 |
EP0440086A3 (en) | 1991-12-11 |
EP0440086A2 (de) | 1991-08-07 |
CA2035406A1 (en) | 1991-08-03 |
JP2761482B2 (ja) | 1998-06-04 |
DE4003025A1 (de) | 1991-08-08 |
DE59106745D1 (de) | 1995-11-30 |
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