BR9001122A - Mistura sensivel a irradiacoes,de funcionamento positivo,material de registro e processo para registro de irradiacoes altamente energeticas - Google Patents

Mistura sensivel a irradiacoes,de funcionamento positivo,material de registro e processo para registro de irradiacoes altamente energeticas

Info

Publication number
BR9001122A
BR9001122A BR909001122A BR9001122A BR9001122A BR 9001122 A BR9001122 A BR 9001122A BR 909001122 A BR909001122 A BR 909001122A BR 9001122 A BR9001122 A BR 9001122A BR 9001122 A BR9001122 A BR 9001122A
Authority
BR
Brazil
Prior art keywords
irradiation
registration
sensitive
recording material
highly energy
Prior art date
Application number
BR909001122A
Other languages
English (en)
Inventor
Ralph Dammel
Juergen Lingnau
Georg Pawlowski
Juergen Theis
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9001122A publication Critical patent/BR9001122A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
BR909001122A 1989-03-11 1990-03-09 Mistura sensivel a irradiacoes,de funcionamento positivo,material de registro e processo para registro de irradiacoes altamente energeticas BR9001122A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3907954A DE3907954A1 (de) 1989-03-11 1989-03-11 Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung

Publications (1)

Publication Number Publication Date
BR9001122A true BR9001122A (pt) 1991-03-05

Family

ID=6376122

Family Applications (1)

Application Number Title Priority Date Filing Date
BR909001122A BR9001122A (pt) 1989-03-11 1990-03-09 Mistura sensivel a irradiacoes,de funcionamento positivo,material de registro e processo para registro de irradiacoes altamente energeticas

Country Status (11)

Country Link
US (1) US5217843A (pt)
EP (1) EP0387623B1 (pt)
JP (1) JP2974718B2 (pt)
KR (1) KR900014936A (pt)
AU (1) AU631610B2 (pt)
BR (1) BR9001122A (pt)
CA (1) CA2011728A1 (pt)
DE (2) DE3907954A1 (pt)
FI (1) FI901178A0 (pt)
HK (1) HK1000194A1 (pt)
ZA (1) ZA901797B (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3907953A1 (de) * 1989-03-11 1990-09-13 Hoechst Ag Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE69029104T2 (de) * 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
EP0422628A3 (en) * 1989-10-13 1992-02-26 E.I. Du Pont De Nemours And Company Photosensitive element
US5364738A (en) * 1991-10-07 1994-11-15 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPH05247386A (ja) * 1991-11-27 1993-09-24 Hitachi Chem Co Ltd ポジ型感光性アニオン電着塗料樹脂組成物、ポジ型感光性アニオン電着塗料、電着塗装浴、電着塗装法及びプリント回路板の製造法
JPH0954437A (ja) * 1995-06-05 1997-02-25 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
EP1209528B1 (en) 2000-11-28 2015-07-22 Eternal Technology Corporation Photoresist composition
US20100025069A1 (en) * 2008-07-30 2010-02-04 Smith Iii Robert L Cable and a method of assembling same

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3502476A (en) * 1965-10-20 1970-03-24 Konishiroku Photo Ind Light-sensitive photographic materials
GB1248036A (en) * 1968-01-12 1971-09-29 Agfa Gevaert Photopolymerisation of ethylenically unsaturated organic compounds
DE1949010C3 (de) * 1969-09-27 1979-11-29 Bayer Ag, 5090 Leverkusen Verwendung von halogenmethylierten Benzophenonen als Photopolymerisationsinitiatoren
US3912606A (en) * 1974-11-21 1975-10-14 Eastman Kodak Co Photosensitive compositions containing benzoxazole sensitizers
CH621416A5 (pt) * 1975-03-27 1981-01-30 Hoechst Ag
DE2541977B2 (de) * 1975-09-20 1978-07-06 Te Ka De Felten & Guilleaume Fernmeldeanlagen Gmbh, 8500 Nuernberg Anordnung zum Entzerren von Restdämpfungskurven
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
US4398001A (en) * 1982-03-22 1983-08-09 International Business Machines Corporation Terpolymer resist compositions
EP0130599B1 (en) * 1983-06-29 1988-08-10 Fuji Photo Film Co., Ltd. Photosolubilizable composition
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
DE3442756A1 (de) * 1984-11-23 1986-05-28 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen
JPH067263B2 (ja) * 1985-08-19 1994-01-26 富士写真フイルム株式会社 光可溶化組成物
CA1307695C (en) * 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
DE3621376A1 (de) * 1986-06-26 1988-01-07 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial

Also Published As

Publication number Publication date
CA2011728A1 (en) 1990-09-11
AU5122890A (en) 1990-09-13
DE3907954A1 (de) 1990-09-13
US5217843A (en) 1993-06-08
EP0387623A3 (de) 1991-07-24
EP0387623B1 (de) 1997-04-23
EP0387623A2 (de) 1990-09-19
DE59010703D1 (de) 1997-05-28
FI901178A0 (fi) 1990-03-08
AU631610B2 (en) 1992-12-03
JPH02272554A (ja) 1990-11-07
KR900014936A (ko) 1990-10-25
ZA901797B (en) 1990-11-28
HK1000194A1 (en) 1998-01-27
JP2974718B2 (ja) 1999-11-10

Similar Documents

Publication Publication Date Title
BR8902357A (pt) Compostos,processo para a sua preparacao,mistura polimerizavel por irradiacao e material de registro
BR8605989A (pt) Material de folha e processo para preparar um material de folha
BR8906545A (pt) Material de registro,processo para sua preparacao,tinta,aplicacoes e composicao
BR9000110A (pt) Mistura sensivel a radiaco,de atuacao positiva,material de registro e processo para sua preparacao
PT94059A (pt) Processo para a preparacao de copolimetros hidrossoluveis, de n-vinilamidas
BR8902297A (pt) Processo para a preparacao de 1,1,1,2-tetrafluoretano
BR9006437A (pt) Processo para a preparacao de um carbonato de copoliester
BR8600794A (pt) Processo para preparacao de um material resinoso
BR9003345A (pt) Processo para a preparacao de 1,1,1,2-tetrafluoretano
BR8903078A (pt) Mistura endurecivel por radiacao de alta energia,material de registro,bem como processo para registro de radiacao de alta energia
BR9002164A (pt) Processo para o tingimento de materiais de construcao
BR8903484A (pt) Processo e meios para a fabricacao de fechos de correr
PT87514A (pt) Processo para a preparacao de poli-imidas aromaticas muito soluveis
BR9002806A (pt) Agentes de endurecimento,misturas de endurecedor,processo para a preparacao dos agentes e emprego
BR8701149A (pt) Eixo de acionamento,processo e dispositivo para a fabricacao do eixo de acionamento
BR9007558A (pt) Material laminado aperfeicoado e processo para sua producao
BR9004194A (pt) Poliisocianatos,misturas,processo para sua preparacao e emprego
BR9100436A (pt) Mistura sensivel a radiacao,material de desenho sensivel a radiacao e processo para preparacao de desenhos em relevo
BR9001122A (pt) Mistura sensivel a irradiacoes,de funcionamento positivo,material de registro e processo para registro de irradiacoes altamente energeticas
BR8900886A (pt) Processo e aparelho para cortar chapas de material
BR8907009A (pt) Processo e aparelho para pulverizacao de material
BR8900414A (pt) Processo para a producao de um material fibroso,e,material fibroso aperfeicoado
BR9006105A (pt) Processo e mecanismo para a preparacao de flocos
BR9004539A (pt) Processo para a obtencao de 1,1,1,2-tetrafluoretano
BR8301127A (pt) Processo para a pigmentacao de material organico molecular superior,complexos,processo para a preparacao de complexos e material organico molecular superior

Legal Events

Date Code Title Description
B15K Others concerning applications: alteration of classification

Ipc: G03F 7/004 (2006.01)