BR8705319A - Mistura sensivel a luz e material de copia sensivel a luz dela produzida - Google Patents

Mistura sensivel a luz e material de copia sensivel a luz dela produzida

Info

Publication number
BR8705319A
BR8705319A BR8705319A BR8705319A BR8705319A BR 8705319 A BR8705319 A BR 8705319A BR 8705319 A BR8705319 A BR 8705319A BR 8705319 A BR8705319 A BR 8705319A BR 8705319 A BR8705319 A BR 8705319A
Authority
BR
Brazil
Prior art keywords
light
sensitive
copy material
mixture
produced
Prior art date
Application number
BR8705319A
Other languages
English (en)
Inventor
Paul Stahlhofen
Hansjoerg W Vollmann
Alberto Guzzi
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8705319A publication Critical patent/BR8705319A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BR8705319A 1986-10-09 1987-10-07 Mistura sensivel a luz e material de copia sensivel a luz dela produzida BR8705319A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863634371 DE3634371A1 (de) 1986-10-09 1986-10-09 Lichtempfindliches gemisch und hieraus hergestelltes lichtempfindliches kopiermaterial

Publications (1)

Publication Number Publication Date
BR8705319A true BR8705319A (pt) 1988-05-24

Family

ID=6311360

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8705319A BR8705319A (pt) 1986-10-09 1987-10-07 Mistura sensivel a luz e material de copia sensivel a luz dela produzida

Country Status (4)

Country Link
EP (1) EP0263434B1 (pt)
JP (1) JPS6397948A (pt)
BR (1) BR8705319A (pt)
DE (2) DE3634371A1 (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3004044B2 (ja) * 1990-10-29 2000-01-31 東洋合成工業株式会社 感光性着色樹脂組成物
JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
US5286599A (en) * 1991-09-26 1994-02-15 International Business Machines Corporation Base developable negative photoresist composition and use thereof
JPH0643637A (ja) * 1992-07-23 1994-02-18 Sumitomo Chem Co Ltd パターンの保持方法
JPH07120914A (ja) * 1993-10-21 1995-05-12 Hoechst Japan Ltd ポジ型ホトレジスト組成物
DE4414897A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen
JP3513789B2 (ja) 1997-02-10 2004-03-31 日本電気エンジニアリング株式会社 電話機
US7470500B2 (en) 2005-07-19 2008-12-30 Az Electronic Materials Usa Corp. Organic bottom antireflective polymer compositions
DE102010009852A1 (de) 2010-03-02 2011-09-08 Kalle Gmbh Antimikrobiell ausgerüstete Folien, Schwämme und Schwammtücher

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
DE3246037A1 (de) * 1982-12-09 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
DK241885A (da) * 1984-06-01 1985-12-02 Rohm & Haas Fotosensible belaegningssammensaetninger, termisk stabile belaegninger fremstillet deraf og anvendelse af saadanne belaegninger til dannelse af termisk stabile polymerbilleder

Also Published As

Publication number Publication date
DE3789593D1 (de) 1994-05-19
DE3634371A1 (de) 1988-04-21
EP0263434A2 (de) 1988-04-13
EP0263434A3 (en) 1990-02-28
EP0263434B1 (de) 1994-04-13
JPS6397948A (ja) 1988-04-28

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