BR8804797A - Mistura sensivel a radiacao e material de copia dela preparado - Google Patents

Mistura sensivel a radiacao e material de copia dela preparado

Info

Publication number
BR8804797A
BR8804797A BR8804797A BR8804797A BR8804797A BR 8804797 A BR8804797 A BR 8804797A BR 8804797 A BR8804797 A BR 8804797A BR 8804797 A BR8804797 A BR 8804797A BR 8804797 A BR8804797 A BR 8804797A
Authority
BR
Brazil
Prior art keywords
radiation
material prepared
copy material
sensitive mixture
sensitive
Prior art date
Application number
BR8804797A
Other languages
English (en)
Inventor
Michael Emmelius
Andreas Elsaesser
Dieter Mohr
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8804797A publication Critical patent/BR8804797A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BR8804797A 1987-09-18 1988-09-16 Mistura sensivel a radiacao e material de copia dela preparado BR8804797A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873731439 DE3731439A1 (de) 1987-09-18 1987-09-18 Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial

Publications (1)

Publication Number Publication Date
BR8804797A true BR8804797A (pt) 1989-04-25

Family

ID=6336339

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8804797A BR8804797A (pt) 1987-09-18 1988-09-16 Mistura sensivel a radiacao e material de copia dela preparado

Country Status (5)

Country Link
EP (1) EP0307828A3 (pt)
JP (1) JPH01100538A (pt)
KR (1) KR890005573A (pt)
BR (1) BR8804797A (pt)
DE (1) DE3731439A1 (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4106357A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester
JP4040217B2 (ja) * 1998-08-14 2008-01-30 富士フイルム株式会社 平版印刷版の製造方法および感光性樹脂組成物
JP2000347397A (ja) 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用
JP2006259461A (ja) * 2005-03-18 2006-09-28 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物およびカラーフィルタ
JP4713262B2 (ja) * 2005-07-22 2011-06-29 昭和電工株式会社 感光性の樹脂組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1005673A (en) * 1972-12-22 1977-02-22 Constantine C. Petropoulos Positive printing plate incorporating diazoquinone
DE3528929A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
DE3528930A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch

Also Published As

Publication number Publication date
DE3731439A1 (de) 1989-03-30
JPH01100538A (ja) 1989-04-18
EP0307828A3 (de) 1990-05-16
EP0307828A2 (de) 1989-03-22
KR890005573A (ko) 1989-05-15

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Legal Events

Date Code Title Description
B15K Others concerning applications: alteration of classification

Ipc: G03F 7/023 (2006.01)