BR112018014694A2 - aparelho para dissipar calor e métodos para fotoreatores uv-led - Google Patents

aparelho para dissipar calor e métodos para fotoreatores uv-led

Info

Publication number
BR112018014694A2
BR112018014694A2 BR112018014694A BR112018014694A BR112018014694A2 BR 112018014694 A2 BR112018014694 A2 BR 112018014694A2 BR 112018014694 A BR112018014694 A BR 112018014694A BR 112018014694 A BR112018014694 A BR 112018014694A BR 112018014694 A2 BR112018014694 A2 BR 112018014694A2
Authority
BR
Brazil
Prior art keywords
heat
conducting substrate
led
insulating body
heat conducting
Prior art date
Application number
BR112018014694A
Other languages
English (en)
Inventor
Taghipour Fariborz
Original Assignee
Univ British Columbia
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=59361228&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR112018014694(A2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Univ British Columbia filed Critical Univ British Columbia
Publication of BR112018014694A2 publication Critical patent/BR112018014694A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
    • H05K1/0203—Cooling of mounted components
    • H05K1/0204—Cooling of mounted components using means for thermal conduction connection in the thickness direction of the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/18—Printed circuits structurally associated with non-printed electric components
    • H05K1/181—Printed circuits structurally associated with non-printed electric components associated with surface mounted components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00—Constructional details common to different types of electric apparatus
    • H05K7/20—Modifications to facilitate cooling, ventilating, or heating
    • H05K7/20218—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant without phase change in electronic enclosures
    • H05K7/20272—Accessories for moving fluid, for expanding fluid, for connecting fluid conduits, for distributing fluid, for removing gas or for preventing leakage, e.g. pumps, tanks or manifolds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/026—Treating water for medical or cosmetic purposes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3222—Units using UV-light emitting diodes [LED]
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3227—Units with two or more lamps
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/326—Lamp control systems
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/328—Having flow diverters (baffles)
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00—General aspects of water treatment
    • C02F2301/02—Fluid flow conditions
    • C02F2301/028—Tortuous
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2307/00—Location of water treatment or water treatment device
    • C02F2307/10—Location of water treatment or water treatment device as part of a potable water dispenser, e.g. for use in homes or offices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10007—Types of components
    • H05K2201/10106—Light emitting diode [LED]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Water Treatments (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Led Device Packages (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)

Abstract

reator uv que irradia um fluxo de fluido com a radiação uv. o reator compreende: um conduto de fluido definido por um corpo isolador de passagem condutora de calor que compreende um ou mais paredes condutoras de calor para permitir um fluxo de fluido através do mesmo; um diodo emissor de luz uv operativamente ligado a um pcb e orientado para dirigir a radiação para dentro do conduto de fluido. a pcb compreende um substrato condutor de calor que tem uma primeira superfície. o corpo isolador de passagem está em contato térmico com a primeira superfície do substrato condutor de calor 1. o calor é dissipado a partir do meio do substrato condutor de calor led-uv, o contato térmico entre a primeira superfície do substrato condutor de calor e a realização de corpo isolador de passagem de calor, e a partir do um ou mais paredes condutoras de calor da condução de calor do corpo do conduto para o fluido que flui através do conduto de fluido.
BR112018014694A 2016-01-19 2017-01-19 aparelho para dissipar calor e métodos para fotoreatores uv-led BR112018014694A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662280630P 2016-01-19 2016-01-19
PCT/CA2017/050061 WO2017124191A1 (en) 2016-01-19 2017-01-19 Heat dissipation apparatus and methods for uv-led photoreactors

Publications (1)

Publication Number Publication Date
BR112018014694A2 true BR112018014694A2 (pt) 2018-12-26

Family

ID=59361228

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112018014694A BR112018014694A2 (pt) 2016-01-19 2017-01-19 aparelho para dissipar calor e métodos para fotoreatores uv-led

Country Status (12)

Country Link
US (3) US10829394B2 (pt)
EP (1) EP3405284A4 (pt)
JP (2) JP7204485B2 (pt)
KR (1) KR20180104039A (pt)
CN (1) CN108778485A (pt)
BR (1) BR112018014694A2 (pt)
CA (1) CA3011890C (pt)
MX (1) MX2018008881A (pt)
PH (1) PH12018501544A1 (pt)
SG (1) SG11201805817VA (pt)
WO (1) WO2017124191A1 (pt)
ZA (1) ZA201804602B (pt)

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* Cited by examiner, † Cited by third party
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WO2017124191A1 (en) * 2016-01-19 2017-07-27 The University Of British Columbia Heat dissipation apparatus and methods for uv-led photoreactors
MX2018008880A (es) 2016-01-19 2019-02-21 Univ British Columbia Metodos y aparatos para controlar la dosis de radiacion para fluidos en fotorreactores led uv.
JP6891537B2 (ja) * 2017-02-28 2021-06-18 東芝ライテック株式会社 流体殺菌装置
US11312642B2 (en) 2017-03-31 2022-04-26 Industrial Technology Research Institute Fluid sterilizing device
CN108686249A (zh) * 2017-03-31 2018-10-23 财团法人工业技术研究院 流体杀菌装置及应用其的净水设备
EP3655151A4 (en) * 2017-07-19 2021-03-24 The University of British Columbia RADIANT AND HYDRODYNAMIC UV LED PHOTOREACTORS CONTROLLED AND METHODS FOR MANUFACTURING AND USING THE SAME
US11857924B2 (en) * 2017-09-28 2024-01-02 Sonata Scientific LLC Photocatalytic fluidized bed reactor systems
JP6897602B2 (ja) * 2018-02-27 2021-06-30 豊田合成株式会社 流体殺菌装置
CN109956517A (zh) * 2017-12-14 2019-07-02 丰田合成株式会社 紫外光照射杀菌装置和流体杀菌装置
KR101986305B1 (ko) * 2017-12-22 2019-06-07 엘지전자 주식회사 정수기
CN112074483B (zh) 2018-03-22 2023-04-04 贝德福德系统有限责任公司 低功率液体净化器
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CN109647312A (zh) * 2019-01-24 2019-04-19 王冠宇 一种新型光催化反应器
US11952293B2 (en) 2019-03-07 2024-04-09 International Water-Guard Industries Inc. Apparatus for disinfecting a fluid
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CN114599611A (zh) * 2019-08-26 2022-06-07 晶体公司 周期性uvc配给
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DE102019218722A1 (de) * 2019-12-02 2021-06-02 Wmf Group Gmbh Kaffeemaschine mit Modul zur Inaktivierung von Mikroorganismen
CN112191203A (zh) * 2020-03-13 2021-01-08 上海合全药业股份有限公司 一种led光源光催化管式反应器及其应用
IT202000011890A1 (it) * 2020-05-21 2021-11-21 Lelantos S R L Dispositivo e procedimento per l’igienizzazione di aria e/o superfici
JP7257368B2 (ja) * 2020-09-23 2023-04-13 サンスター技研株式会社 空気清浄機
US20230054238A1 (en) * 2020-11-12 2023-02-23 Charles E. Rigby Germicidal duct assembly
EP4247544A1 (en) * 2020-11-17 2023-09-27 Teva Czech Industries s.r.o. Uv-leds photoreactor apparatus and associated methods
US20220249727A1 (en) * 2021-02-11 2022-08-11 Ammi Llc. Ultraviolet lamp
WO2023282094A1 (ja) * 2021-07-08 2023-01-12 日亜化学工業株式会社 流体紫外光処理装置
JP7397366B2 (ja) * 2021-07-08 2023-12-13 日亜化学工業株式会社 流体紫外光処理装置
US11987508B2 (en) * 2022-01-05 2024-05-21 Access Business Group International Llc Water treatment system

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US5288461A (en) 1992-08-31 1994-02-22 Teledyne Industries, Inc. Fluid treatment system
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MX2018008880A (es) 2016-01-19 2019-02-21 Univ British Columbia Metodos y aparatos para controlar la dosis de radiacion para fluidos en fotorreactores led uv.

Also Published As

Publication number Publication date
WO2017124191A1 (en) 2017-07-27
SG11201805817VA (en) 2018-08-30
ZA201804602B (en) 2020-07-29
US20210122650A1 (en) 2021-04-29
EP3405284A1 (en) 2018-11-28
JP2023052169A (ja) 2023-04-11
CN108778485A (zh) 2018-11-09
US11649175B2 (en) 2023-05-16
CA3011890A1 (en) 2017-07-27
US20240018019A1 (en) 2024-01-18
JP2019505350A (ja) 2019-02-28
KR20180104039A (ko) 2018-09-19
PH12018501544A1 (en) 2019-05-27
CA3011890C (en) 2024-02-20
US20190062180A1 (en) 2019-02-28
JP7204485B2 (ja) 2023-01-16
US10829394B2 (en) 2020-11-10
MX2018008881A (es) 2019-02-21
EP3405284A4 (en) 2019-08-28

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]
B350 Update of information on the portal [chapter 15.35 patent gazette]