BR112018003194A2 - sistema e método para estender a resposta espectral de quase infravermelho para sistemas de criação de imagem - Google Patents
sistema e método para estender a resposta espectral de quase infravermelho para sistemas de criação de imagemInfo
- Publication number
- BR112018003194A2 BR112018003194A2 BR112018003194-1A BR112018003194A BR112018003194A2 BR 112018003194 A2 BR112018003194 A2 BR 112018003194A2 BR 112018003194 A BR112018003194 A BR 112018003194A BR 112018003194 A2 BR112018003194 A2 BR 112018003194A2
- Authority
- BR
- Brazil
- Prior art keywords
- photodetector region
- lens
- substrate
- imaging systems
- spectral response
- Prior art date
Links
- 238000003384 imaging method Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 230000003595 spectral effect Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14649—Infrared imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14629—Reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1464—Back illuminated imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14685—Process for coatings or optical elements
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Light Receiving Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Abstract
uma inovação inclui um sensor de ir (400) possuindo um conjunto de pixels de sensor (401a-d) para converter luz em corrente, cada pixel de sensor do conjunto incluindo uma região de fotodetector (404, 412), uma lente (402) configurada para focar a luz para dentro da região de fotodetector, a lente adjacente à região de fotodetector de modo que a luz se propague através da lente e pra dentro da região de fotodetector, e um substrato (421) disposto com a região de fotodetector entre o substrato e a lente, o substrato possuindo um ou mais transistores (410) formados aqui. o sensor também inclui as estruturas refletoras (408) posicionadas entre pelo menos uma parte do substrato e pelo menos uma parte da região de fotodetector e de modo que pelo menos uma parte da região de fotodetector esteja entre uma ou mais estruturas refletoras e a lente, as uma ou mais estruturas refletoras configuradas para refletir a luz que passou através de pelo menos uma parte da região de fotodetector para dentro da região de fotodetector.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/832,290 | 2015-08-21 | ||
US14/832,290 US9698191B2 (en) | 2015-08-21 | 2015-08-21 | System and method to extend near infrared spectral response for imaging systems |
PCT/US2016/043307 WO2017034712A1 (en) | 2015-08-21 | 2016-07-21 | System and method to extend near infrared spectral response for imaging systems |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112018003194A2 true BR112018003194A2 (pt) | 2018-09-25 |
BR112018003194B1 BR112018003194B1 (pt) | 2022-11-16 |
Family
ID=56682249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112018003194-1A BR112018003194B1 (pt) | 2015-08-21 | 2016-07-21 | Sistema e método para estender a resposta espectral de quase infravermelho para sistemas de criação de imagem |
Country Status (7)
Country | Link |
---|---|
US (1) | US9698191B2 (pt) |
EP (1) | EP3338305B1 (pt) |
JP (1) | JP6900367B2 (pt) |
KR (1) | KR102125154B1 (pt) |
CN (1) | CN107851653B (pt) |
BR (1) | BR112018003194B1 (pt) |
WO (1) | WO2017034712A1 (pt) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9786705B2 (en) * | 2015-12-21 | 2017-10-10 | Qualcomm Incorporated | Solid state image sensor with extended spectral response |
CN107665930B (zh) * | 2017-08-30 | 2023-05-05 | 中国科学院上海技术物理研究所 | 一种实现波长拓展功能的量子阱红外探测器及设计方法 |
CN108847418A (zh) * | 2018-06-15 | 2018-11-20 | 上海微阱电子科技有限公司 | 一种增强近红外量子效率的图像传感器结构和形成方法 |
JP2021168316A (ja) * | 2018-07-13 | 2021-10-21 | ソニーセミコンダクタソリューションズ株式会社 | センサ素子および電子機器 |
KR20200027123A (ko) * | 2018-09-03 | 2020-03-12 | 삼성전자주식회사 | 이미지 센서 |
CN111048535B (zh) * | 2018-10-15 | 2022-06-07 | 联华电子股份有限公司 | 影像传感器 |
CN109411500B (zh) * | 2018-10-31 | 2021-01-22 | 京东方科技集团股份有限公司 | 探测面板及其制作方法 |
CN109713003B (zh) * | 2018-12-27 | 2021-06-04 | 厦门天马微电子有限公司 | 显示面板和显示装置 |
WO2020150938A1 (zh) * | 2019-01-23 | 2020-07-30 | 深圳市汇顶科技股份有限公司 | 光电传感器及其制备方法 |
US11268849B2 (en) * | 2019-04-22 | 2022-03-08 | Applied Materials Israel Ltd. | Sensing unit having photon to electron converter and a method |
CN110211981B (zh) * | 2019-06-12 | 2021-11-30 | 德淮半导体有限公司 | 图像传感器及其形成方法 |
US11276716B2 (en) | 2019-12-17 | 2022-03-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Image sensor with improved near-infrared (NIR) radiation phase-detection autofocus (PDAF) performance |
FR3114189A1 (fr) * | 2020-09-11 | 2022-03-18 | Stmicroelectronics (Crolles 2) Sas | Dispositif électronique comprenant une région semiconductrice photosensible et procédé de fabrication correspondant |
Family Cites Families (20)
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WO2006137867A1 (en) * | 2004-09-17 | 2006-12-28 | California Institute Of Technology | Fabrication method for back-illuminated cmos or ccd imagers made from soi wafer |
JP5147226B2 (ja) | 2006-12-15 | 2013-02-20 | 株式会社日立製作所 | 固体撮像素子、光検出器及びこれを用いた認証装置 |
JP5364989B2 (ja) | 2007-10-02 | 2013-12-11 | ソニー株式会社 | 固体撮像装置およびカメラ |
US7982177B2 (en) | 2008-01-31 | 2011-07-19 | Omnivision Technologies, Inc. | Frontside illuminated image sensor comprising a complex-shaped reflector |
JP5121764B2 (ja) * | 2009-03-24 | 2013-01-16 | 株式会社東芝 | 固体撮像装置 |
WO2010118418A2 (en) * | 2009-04-10 | 2010-10-14 | Lightwave Power, Inc. | Planar plasmonic device for light reflection, diffusion and guiding |
US8389921B2 (en) | 2010-04-30 | 2013-03-05 | Omnivision Technologies, Inc. | Image sensor having array of pixels and metal reflectors with widths scaled based on distance from center of the array |
JP2012064824A (ja) * | 2010-09-17 | 2012-03-29 | Toshiba Corp | 固体撮像素子、その製造方法、カメラ |
JP2012238632A (ja) | 2011-05-10 | 2012-12-06 | Sony Corp | 固体撮像装置、固体撮像装置の製造方法、及び、電子機器 |
JP5814625B2 (ja) * | 2011-05-27 | 2015-11-17 | キヤノン株式会社 | 固体撮像装置、それを用いた撮像システム及び固体撮像装置の製造方法 |
US20120313205A1 (en) * | 2011-06-10 | 2012-12-13 | Homayoon Haddad | Photosensitive Imagers Having Defined Textures for Light Trapping and Associated Methods |
JP5760811B2 (ja) | 2011-07-28 | 2015-08-12 | ソニー株式会社 | 固体撮像素子および撮像システム |
JP2013098503A (ja) | 2011-11-07 | 2013-05-20 | Toshiba Corp | 固体撮像素子 |
US8716823B2 (en) | 2011-11-08 | 2014-05-06 | Aptina Imaging Corporation | Backside image sensor pixel with silicon microlenses and metal reflector |
US8941203B2 (en) | 2012-03-01 | 2015-01-27 | Raytheon Company | Photodetector with surface plasmon resonance |
JP6035921B2 (ja) * | 2012-07-10 | 2016-11-30 | 富士通株式会社 | 光検出器およびその製造方法 |
US9105546B2 (en) * | 2012-09-19 | 2015-08-11 | Semiconductor Components Industries, Llc | Imaging systems with backside illuminated near infrared imaging pixels |
US9093345B2 (en) * | 2012-10-26 | 2015-07-28 | Canon Kabushiki Kaisha | Solid-state imaging apparatus and imaging system |
US9349770B2 (en) | 2014-02-11 | 2016-05-24 | Semiconductor Components Industries, Llc | Imaging systems with infrared pixels having increased quantum efficiency |
JP2016001633A (ja) * | 2014-06-11 | 2016-01-07 | ソニー株式会社 | 固体撮像素子、および電子装置 |
-
2015
- 2015-08-21 US US14/832,290 patent/US9698191B2/en active Active
-
2016
- 2016-07-21 CN CN201680045447.8A patent/CN107851653B/zh active Active
- 2016-07-21 JP JP2018508724A patent/JP6900367B2/ja active Active
- 2016-07-21 EP EP16750551.0A patent/EP3338305B1/en active Active
- 2016-07-21 WO PCT/US2016/043307 patent/WO2017034712A1/en active Application Filing
- 2016-07-21 BR BR112018003194-1A patent/BR112018003194B1/pt active IP Right Grant
- 2016-07-21 KR KR1020187004847A patent/KR102125154B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2018525837A (ja) | 2018-09-06 |
US20170053964A1 (en) | 2017-02-23 |
US9698191B2 (en) | 2017-07-04 |
BR112018003194B1 (pt) | 2022-11-16 |
EP3338305A1 (en) | 2018-06-27 |
JP6900367B2 (ja) | 2021-07-07 |
KR20180043271A (ko) | 2018-04-27 |
KR102125154B1 (ko) | 2020-06-19 |
WO2017034712A1 (en) | 2017-03-02 |
EP3338305B1 (en) | 2019-11-27 |
CN107851653A (zh) | 2018-03-27 |
CN107851653B (zh) | 2022-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 21/07/2016, OBSERVADAS AS CONDICOES LEGAIS |