BR112015032334A2 - camadas decorativas de material duro de hipims - Google Patents
camadas decorativas de material duro de hipimsInfo
- Publication number
- BR112015032334A2 BR112015032334A2 BR112015032334A BR112015032334A BR112015032334A2 BR 112015032334 A2 BR112015032334 A2 BR 112015032334A2 BR 112015032334 A BR112015032334 A BR 112015032334A BR 112015032334 A BR112015032334 A BR 112015032334A BR 112015032334 A2 BR112015032334 A2 BR 112015032334A2
- Authority
- BR
- Brazil
- Prior art keywords
- hard material
- hipims
- layer
- decorative layers
- deposited
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Fluid Mechanics (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361839454P | 2013-06-26 | 2013-06-26 | |
US61/839,454 | 2013-06-26 | ||
PCT/EP2014/063611 WO2014207154A1 (de) | 2013-06-26 | 2014-06-26 | Dekorative hipims-hartstoffschichten |
Publications (3)
Publication Number | Publication Date |
---|---|
BR112015032334A2 true BR112015032334A2 (pt) | 2017-09-26 |
BR112015032334A8 BR112015032334A8 (pt) | 2018-01-02 |
BR112015032334B1 BR112015032334B1 (pt) | 2021-06-15 |
Family
ID=51014298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112015032334-0A BR112015032334B1 (pt) | 2013-06-26 | 2014-06-26 | Processo para revestimento de pelo menos regiões parciais da superfície de um substrato ou para produção de substratos com uma região de superfície |
Country Status (17)
Country | Link |
---|---|
US (1) | US11060181B2 (pt) |
EP (1) | EP3013996B1 (pt) |
JP (1) | JP6426726B2 (pt) |
KR (1) | KR102274981B1 (pt) |
CN (1) | CN105683409B (pt) |
BR (1) | BR112015032334B1 (pt) |
CA (1) | CA2916640A1 (pt) |
ES (1) | ES2636867T3 (pt) |
IL (1) | IL243283B (pt) |
MX (1) | MX2015017868A (pt) |
MY (1) | MY181967A (pt) |
PH (1) | PH12015502837A1 (pt) |
PL (1) | PL3013996T3 (pt) |
PT (1) | PT3013996T (pt) |
RU (1) | RU2016102152A (pt) |
SG (1) | SG11201510649VA (pt) |
WO (1) | WO2014207154A1 (pt) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107532277B (zh) * | 2015-02-24 | 2020-06-05 | 欧瑞康表面解决方案股份公司,普费菲孔 | 用于高强度钢金属冷成形的高性能涂层和使用所述涂层涂覆基材表面的方法 |
MY189225A (en) * | 2016-04-22 | 2022-01-31 | Oerlikon Surface Solutions Ag Pfaffikon | Ticn having reduced growth defects by means of hipims |
JP7393946B2 (ja) * | 2017-04-07 | 2023-12-07 | サンドビック インテレクチュアル プロパティー アクティエボラーグ | コーティングされた切削工具 |
EP3406751A1 (en) * | 2017-05-24 | 2018-11-28 | Walter Ag | A coated cutting tool and a method for its production |
EP3682046B1 (en) * | 2017-09-15 | 2023-06-21 | Oerlikon Surface Solutions AG, Pfäffikon | Method for producing coating with colored surface |
DE102020124032A1 (de) * | 2020-09-15 | 2022-03-17 | Cemecon Ag. | Beschichtungsvorrichtung und Beschichtungsverfahren mit unterteilten Pulsen |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4393120A (en) | 1980-09-26 | 1983-07-12 | Yuken Industry Co., Ltd. | Plastic coated with golden evaporated film |
DE3150039A1 (de) | 1981-12-17 | 1983-06-23 | W.C. Heraeus Gmbh, 6450 Hanau | "zahnprothesen mit goldfarbenem ueberzug" |
JPS58153776A (ja) | 1982-03-05 | 1983-09-12 | Citizen Watch Co Ltd | 装飾部品の製造方法およびそれに用いるイオンプレ−テイング装置 |
JPS6089565A (ja) * | 1983-10-21 | 1985-05-20 | Seiko Instr & Electronics Ltd | 時計用外装部品 |
DE3425468A1 (de) | 1984-07-11 | 1986-01-23 | Battelle-Institut E.V., 6000 Frankfurt | Verfahren zur herstellung von goldfarbenen titannitrid-schichten |
FR2612204A1 (fr) | 1987-03-12 | 1988-09-16 | Vac Tec Syst | Procede et appareil pour le depot par un plasma d'arc electrique sous vide de revetements decoratifs et de revetements resistant a l'usure |
JPH0925562A (ja) * | 1995-07-10 | 1997-01-28 | Ulvac Japan Ltd | 反射防止多層薄膜およびその成膜方法並びにその成膜装置 |
DE10018879B4 (de) * | 2000-04-17 | 2013-02-28 | Melec Gmbh | Stromversorgungsgerät zur bipolaren Stromversorgung |
US7147759B2 (en) * | 2002-09-30 | 2006-12-12 | Zond, Inc. | High-power pulsed magnetron sputtering |
US20050103620A1 (en) * | 2003-11-19 | 2005-05-19 | Zond, Inc. | Plasma source with segmented magnetron cathode |
US20060066248A1 (en) * | 2004-09-24 | 2006-03-30 | Zond, Inc. | Apparatus for generating high current electrical discharges |
EP1614764B1 (fr) * | 2004-07-07 | 2009-04-08 | Haute Ecole Arc NE-BE-JU | Revêtement décoratif par déposition de couches alternées de nitrures |
US20060076231A1 (en) | 2004-10-12 | 2006-04-13 | Southwest Research Institute | Method for magnetron sputter deposition |
DE102006061324B4 (de) * | 2006-06-20 | 2008-07-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Regelung eines reaktiven Hochleistungs-Puls-Magnetronsputterprozesses und Vorrichtung hierzu |
SE533395C2 (sv) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Sätt att göra PVD-beläggningar |
EP2157205B1 (en) * | 2008-07-29 | 2011-11-30 | Sulzer Metaplas GmbH | A high-power pulsed magnetron sputtering process as well as a high-power electrical energy source |
WO2010127845A1 (en) * | 2009-05-07 | 2010-11-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for the production of oxide and nitride coatings and its use |
EP2492251B1 (de) * | 2011-02-23 | 2017-01-04 | Schott Ag | Substrat mit Antireflexionsbeschichtung und Verahren zu dessen Herstellung |
DE102011117994A1 (de) * | 2011-11-09 | 2013-05-16 | Oerlikon Trading Ag, Trübbach | HIPIMS-Schichten |
US9607416B2 (en) | 2013-06-21 | 2017-03-28 | Yokogawa Electric Corporation | Device for displaying a trend related to a process variable |
CN103469168B (zh) * | 2013-08-26 | 2015-09-30 | 中国科学院宁波材料技术与工程研究所 | 一种制备润湿性可控的高光滑高硬TiN薄膜的方法 |
-
2014
- 2014-06-26 RU RU2016102152A patent/RU2016102152A/ru not_active Application Discontinuation
- 2014-06-26 PT PT147329197T patent/PT3013996T/pt unknown
- 2014-06-26 SG SG11201510649VA patent/SG11201510649VA/en unknown
- 2014-06-26 MY MYPI2015704726A patent/MY181967A/en unknown
- 2014-06-26 CN CN201480047434.5A patent/CN105683409B/zh not_active Expired - Fee Related
- 2014-06-26 EP EP14732919.7A patent/EP3013996B1/de active Active
- 2014-06-26 WO PCT/EP2014/063611 patent/WO2014207154A1/de active Application Filing
- 2014-06-26 BR BR112015032334-0A patent/BR112015032334B1/pt not_active IP Right Cessation
- 2014-06-26 CA CA2916640A patent/CA2916640A1/en not_active Abandoned
- 2014-06-26 US US14/901,313 patent/US11060181B2/en active Active
- 2014-06-26 JP JP2016522517A patent/JP6426726B2/ja not_active Expired - Fee Related
- 2014-06-26 ES ES14732919.7T patent/ES2636867T3/es active Active
- 2014-06-26 KR KR1020167000912A patent/KR102274981B1/ko active IP Right Grant
- 2014-06-26 MX MX2015017868A patent/MX2015017868A/es unknown
- 2014-06-26 PL PL14732919T patent/PL3013996T3/pl unknown
-
2015
- 2015-12-21 PH PH12015502837A patent/PH12015502837A1/en unknown
- 2015-12-22 IL IL243283A patent/IL243283B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US11060181B2 (en) | 2021-07-13 |
CN105683409A (zh) | 2016-06-15 |
EP3013996B1 (de) | 2017-05-10 |
KR20160024915A (ko) | 2016-03-07 |
BR112015032334B1 (pt) | 2021-06-15 |
JP2016528382A (ja) | 2016-09-15 |
KR102274981B1 (ko) | 2021-07-09 |
IL243283B (en) | 2018-11-29 |
PH12015502837A1 (en) | 2016-03-28 |
RU2016102152A (ru) | 2017-07-31 |
MX2015017868A (es) | 2016-08-18 |
CN105683409B (zh) | 2018-09-07 |
PT3013996T (pt) | 2017-07-20 |
BR112015032334A8 (pt) | 2018-01-02 |
JP6426726B2 (ja) | 2018-11-21 |
PL3013996T3 (pl) | 2017-10-31 |
CA2916640A1 (en) | 2014-12-31 |
MY181967A (en) | 2021-01-15 |
WO2014207154A1 (de) | 2014-12-31 |
SG11201510649VA (en) | 2016-01-28 |
US20160369386A1 (en) | 2016-12-22 |
ES2636867T3 (es) | 2017-10-09 |
EP3013996A1 (de) | 2016-05-04 |
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