BR0318515A - composições de revestimento sensìveis à luz úteis para elementos litográficos - Google Patents

composições de revestimento sensìveis à luz úteis para elementos litográficos

Info

Publication number
BR0318515A
BR0318515A BRPI0318515-0A BR0318515A BR0318515A BR 0318515 A BR0318515 A BR 0318515A BR 0318515 A BR0318515 A BR 0318515A BR 0318515 A BR0318515 A BR 0318515A
Authority
BR
Brazil
Prior art keywords
coating compositions
light sensitive
compositions useful
sensitive coating
lithographic elements
Prior art date
Application number
BRPI0318515-0A
Other languages
English (en)
Inventor
Andre Luiz Arias
Luiz Nei Arias
Marjorie Arias
Mario Italo Provenzano
Original Assignee
Ibf Ind Brasileira De Filmes L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibf Ind Brasileira De Filmes L filed Critical Ibf Ind Brasileira De Filmes L
Publication of BR0318515A publication Critical patent/BR0318515A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

"COMPOSIçõES DE REVESTIMENTO SENSìVEIS à LUZ úTEIS PARA ELEMENTOS LITOGRáFICOS". Uma composição sensível à radiação, a qual é principalmente sensível na região próxima à UV e visível do espectro eletromagnético, é composta de um ligante polimérico, um monómero etilenicamente insaturado, um composto absorvedor de radiação, um fotoacelerador, um composto ónio, e um promotor de adesão, os quais são revestidos com uma camada de barreira de oxigênio. Quando aplicada ao suporte adequado e processada, a composição é útil como uma placa de impressão litográfica offset, filme para resistir à cor ou camada protetora de imagem.
BRPI0318515-0A 2003-09-24 2003-09-24 composições de revestimento sensìveis à luz úteis para elementos litográficos BR0318515A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/BR2003/000137 WO2005029186A1 (en) 2003-09-24 2003-09-24 Light sensitive coating compositions useful for lithographic elements

Publications (1)

Publication Number Publication Date
BR0318515A true BR0318515A (pt) 2006-09-12

Family

ID=34318710

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0318515-0A BR0318515A (pt) 2003-09-24 2003-09-24 composições de revestimento sensìveis à luz úteis para elementos litográficos

Country Status (8)

Country Link
US (1) US8741536B2 (pt)
EP (1) EP1673663B1 (pt)
AT (1) ATE503207T1 (pt)
AU (1) AU2003260206A1 (pt)
BR (1) BR0318515A (pt)
DE (1) DE60336512D1 (pt)
ES (1) ES2363748T3 (pt)
WO (1) WO2005029186A1 (pt)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014094080A1 (pt) * 2012-12-19 2014-06-26 Ibf Indústria Brasileira De Filmes S/A Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5026706B2 (ja) * 2006-01-27 2012-09-19 富士フイルム株式会社 光駆動型アクチュエータ及びその製造方法
US7524615B2 (en) * 2006-08-14 2009-04-28 Gary Ganghui Teng Negative laser sensitive lithographic printing plate having specific photosensitive composition
US8133651B2 (en) * 2007-11-21 2012-03-13 Gary Ganghui Teng Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders
JP5089422B2 (ja) * 2008-02-15 2012-12-05 岡本化学工業株式会社 感光性組成物およびそれを用いた平版印刷版用原版
TWI491981B (zh) * 2009-11-04 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
US4053316A (en) * 1973-03-16 1977-10-11 Ici United States Inc. Photopolymerization of ethylenically-unsaturated organic compounds
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
JPH04161957A (ja) * 1990-10-24 1992-06-05 Nippon Paint Co Ltd 光重合性組成物および感光性平版印刷版
DE4418645C1 (de) 1994-05-27 1995-12-14 Sun Chemical Corp Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial
JP3478630B2 (ja) * 1995-02-09 2003-12-15 富士写真フイルム株式会社 光重合性組成物
JP3651713B2 (ja) * 1996-02-29 2005-05-25 富士写真フイルム株式会社 光重合性組成物
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法
US5912105A (en) * 1996-12-23 1999-06-15 Agfa-Gevaert Thermally imageable material
DE69703378T2 (de) 1996-12-26 2001-05-23 Mitsubishi Chem Corp Photoempfindliche lithographische Druckplatte
US6232038B1 (en) 1998-10-07 2001-05-15 Mitsubishi Chemical Corporation Photosensitive composition, image-forming material and image-forming method employing it
US6439888B1 (en) * 1999-05-03 2002-08-27 Pls Liquidating Llc Optical source and method
JP4037015B2 (ja) * 1999-09-22 2008-01-23 富士フイルム株式会社 光重合性組成物、画像形成材料及び平版印刷版用版材
JP3654422B2 (ja) * 2000-01-31 2005-06-02 三菱製紙株式会社 感光性組成物および感光性平版印刷版材料
JP4248137B2 (ja) * 2000-11-22 2009-04-02 富士フイルム株式会社 ネガ型感光性平版印刷版
JP4098483B2 (ja) * 2001-03-12 2008-06-11 富士フイルム株式会社 平版印刷版原版
US6723493B2 (en) * 2001-06-04 2004-04-20 Gary Ganghui Teng Negative lithographic printing plate comprising a specific compound in the photosensitive layer
JP3878451B2 (ja) * 2001-10-22 2007-02-07 富士フイルムホールディングス株式会社 感光性樹脂転写材料、画像形成方法、カラーフィルターとその製造方法、フォトマスクとその製造方法
US6899992B2 (en) * 2002-11-08 2005-05-31 Kodak Polychrome Graphics Llc Polymerizable compounds with quadruple hydrogen bond forming groups

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014094080A1 (pt) * 2012-12-19 2014-06-26 Ibf Indústria Brasileira De Filmes S/A Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem
US10254646B2 (en) 2012-12-19 2019-04-09 Ibf Industria Brasileira De Filmes S/A Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process

Also Published As

Publication number Publication date
US20070202434A1 (en) 2007-08-30
US8741536B2 (en) 2014-06-03
EP1673663A1 (en) 2006-06-28
WO2005029186A1 (en) 2005-03-31
DE60336512D1 (de) 2011-05-05
AU2003260206A1 (en) 2005-04-11
ES2363748T3 (es) 2011-08-12
ATE503207T1 (de) 2011-04-15
EP1673663B1 (en) 2011-03-23

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Legal Events

Date Code Title Description
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 24/09/2003, MEDIANTE O RECOLHIMENTO DA TAXAQUINQUENAL DE MANUTENCAO (ARTIGOS 119 E 120 DA LPI) E OBSERVADAS AS DEMAIS CONDICOES LEGAIS.