BR0318515A - composições de revestimento sensìveis à luz úteis para elementos litográficos - Google Patents
composições de revestimento sensìveis à luz úteis para elementos litográficosInfo
- Publication number
- BR0318515A BR0318515A BRPI0318515-0A BR0318515A BR0318515A BR 0318515 A BR0318515 A BR 0318515A BR 0318515 A BR0318515 A BR 0318515A BR 0318515 A BR0318515 A BR 0318515A
- Authority
- BR
- Brazil
- Prior art keywords
- coating compositions
- light sensitive
- compositions useful
- sensitive coating
- lithographic elements
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Paints Or Removers (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
"COMPOSIçõES DE REVESTIMENTO SENSìVEIS à LUZ úTEIS PARA ELEMENTOS LITOGRáFICOS". Uma composição sensível à radiação, a qual é principalmente sensível na região próxima à UV e visível do espectro eletromagnético, é composta de um ligante polimérico, um monómero etilenicamente insaturado, um composto absorvedor de radiação, um fotoacelerador, um composto ónio, e um promotor de adesão, os quais são revestidos com uma camada de barreira de oxigênio. Quando aplicada ao suporte adequado e processada, a composição é útil como uma placa de impressão litográfica offset, filme para resistir à cor ou camada protetora de imagem.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/BR2003/000137 WO2005029186A1 (en) | 2003-09-24 | 2003-09-24 | Light sensitive coating compositions useful for lithographic elements |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0318515A true BR0318515A (pt) | 2006-09-12 |
Family
ID=34318710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0318515-0A BR0318515A (pt) | 2003-09-24 | 2003-09-24 | composições de revestimento sensìveis à luz úteis para elementos litográficos |
Country Status (8)
Country | Link |
---|---|
US (1) | US8741536B2 (pt) |
EP (1) | EP1673663B1 (pt) |
AT (1) | ATE503207T1 (pt) |
AU (1) | AU2003260206A1 (pt) |
BR (1) | BR0318515A (pt) |
DE (1) | DE60336512D1 (pt) |
ES (1) | ES2363748T3 (pt) |
WO (1) | WO2005029186A1 (pt) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014094080A1 (pt) * | 2012-12-19 | 2014-06-26 | Ibf Indústria Brasileira De Filmes S/A | Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5026706B2 (ja) * | 2006-01-27 | 2012-09-19 | 富士フイルム株式会社 | 光駆動型アクチュエータ及びその製造方法 |
US7524615B2 (en) * | 2006-08-14 | 2009-04-28 | Gary Ganghui Teng | Negative laser sensitive lithographic printing plate having specific photosensitive composition |
US8133651B2 (en) * | 2007-11-21 | 2012-03-13 | Gary Ganghui Teng | Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders |
JP5089422B2 (ja) * | 2008-02-15 | 2012-12-05 | 岡本化学工業株式会社 | 感光性組成物およびそれを用いた平版印刷版用原版 |
TWI491981B (zh) * | 2009-11-04 | 2015-07-11 | Sumitomo Chemical Co | Coloring the photosensitive resin composition |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4053316A (en) * | 1973-03-16 | 1977-10-11 | Ici United States Inc. | Photopolymerization of ethylenically-unsaturated organic compounds |
US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
DE3827245A1 (de) * | 1988-08-11 | 1990-02-15 | Hoechst Ag | Photopolymerisierbares aufzeichnungsmaterial |
JPH04161957A (ja) * | 1990-10-24 | 1992-06-05 | Nippon Paint Co Ltd | 光重合性組成物および感光性平版印刷版 |
DE4418645C1 (de) * | 1994-05-27 | 1995-12-14 | Sun Chemical Corp | Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial |
JP3478630B2 (ja) * | 1995-02-09 | 2003-12-15 | 富士写真フイルム株式会社 | 光重合性組成物 |
JP3651713B2 (ja) * | 1996-02-29 | 2005-05-25 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPH1026834A (ja) | 1996-07-09 | 1998-01-27 | Tokyo Ohka Kogyo Co Ltd | 画像形成方法 |
US5912105A (en) | 1996-12-23 | 1999-06-15 | Agfa-Gevaert | Thermally imageable material |
US6514668B1 (en) | 1996-12-26 | 2003-02-04 | Mitsubishi Chemical Corporation | Photosensitive lithographic printing plate |
US6232038B1 (en) | 1998-10-07 | 2001-05-15 | Mitsubishi Chemical Corporation | Photosensitive composition, image-forming material and image-forming method employing it |
US6439888B1 (en) * | 1999-05-03 | 2002-08-27 | Pls Liquidating Llc | Optical source and method |
JP4037015B2 (ja) * | 1999-09-22 | 2008-01-23 | 富士フイルム株式会社 | 光重合性組成物、画像形成材料及び平版印刷版用版材 |
JP3654422B2 (ja) | 2000-01-31 | 2005-06-02 | 三菱製紙株式会社 | 感光性組成物および感光性平版印刷版材料 |
JP4248137B2 (ja) * | 2000-11-22 | 2009-04-02 | 富士フイルム株式会社 | ネガ型感光性平版印刷版 |
JP4098483B2 (ja) * | 2001-03-12 | 2008-06-11 | 富士フイルム株式会社 | 平版印刷版原版 |
US6723493B2 (en) * | 2001-06-04 | 2004-04-20 | Gary Ganghui Teng | Negative lithographic printing plate comprising a specific compound in the photosensitive layer |
JP3878451B2 (ja) * | 2001-10-22 | 2007-02-07 | 富士フイルムホールディングス株式会社 | 感光性樹脂転写材料、画像形成方法、カラーフィルターとその製造方法、フォトマスクとその製造方法 |
US6899992B2 (en) * | 2002-11-08 | 2005-05-31 | Kodak Polychrome Graphics Llc | Polymerizable compounds with quadruple hydrogen bond forming groups |
-
2003
- 2003-09-24 AU AU2003260206A patent/AU2003260206A1/en not_active Abandoned
- 2003-09-24 EP EP03818680A patent/EP1673663B1/en not_active Expired - Lifetime
- 2003-09-24 WO PCT/BR2003/000137 patent/WO2005029186A1/en active Application Filing
- 2003-09-24 DE DE60336512T patent/DE60336512D1/de not_active Expired - Lifetime
- 2003-09-24 BR BRPI0318515-0A patent/BR0318515A/pt active IP Right Grant
- 2003-09-24 ES ES03818680T patent/ES2363748T3/es not_active Expired - Lifetime
- 2003-09-24 US US10/573,368 patent/US8741536B2/en not_active Expired - Lifetime
- 2003-09-24 AT AT03818680T patent/ATE503207T1/de not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014094080A1 (pt) * | 2012-12-19 | 2014-06-26 | Ibf Indústria Brasileira De Filmes S/A | Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem |
US10254646B2 (en) | 2012-12-19 | 2019-04-09 | Ibf Industria Brasileira De Filmes S/A | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process |
Also Published As
Publication number | Publication date |
---|---|
EP1673663B1 (en) | 2011-03-23 |
DE60336512D1 (de) | 2011-05-05 |
EP1673663A1 (en) | 2006-06-28 |
ATE503207T1 (de) | 2011-04-15 |
US20070202434A1 (en) | 2007-08-30 |
AU2003260206A1 (en) | 2005-04-11 |
ES2363748T3 (es) | 2011-08-12 |
US8741536B2 (en) | 2014-06-03 |
WO2005029186A1 (en) | 2005-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 24/09/2003, MEDIANTE O RECOLHIMENTO DA TAXAQUINQUENAL DE MANUTENCAO (ARTIGOS 119 E 120 DA LPI) E OBSERVADAS AS DEMAIS CONDICOES LEGAIS. |