BR0109106A - Uso de polìmeros de acetal, que contêm grupos carboxila, em composições fotossensìveis e placas impressoras litográficas - Google Patents
Uso de polìmeros de acetal, que contêm grupos carboxila, em composições fotossensìveis e placas impressoras litográficasInfo
- Publication number
- BR0109106A BR0109106A BR0109106-9A BR0109106A BR0109106A BR 0109106 A BR0109106 A BR 0109106A BR 0109106 A BR0109106 A BR 0109106A BR 0109106 A BR0109106 A BR 0109106A
- Authority
- BR
- Brazil
- Prior art keywords
- printing plates
- corresponds
- formula
- radically polymerizable
- carboxyl groups
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 5
- 229920006324 polyoxymethylene Polymers 0.000 title abstract 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 title 1
- 239000011230 binding agent Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000012954 diazonium Substances 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 abstract 2
- 238000006068 polycondensation reaction Methods 0.000 abstract 2
- -1 CARBOXYL GROUPS Chemical group 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
Abstract
"USO DE POLìMEROS DE ACETAL, QUE CONTêM GRUPOS CARBOXILA, EM COMPOSIçõES FOTOSSENSìVEIS E PLACAS IMPRESSORAS LITOGRáFICAS". A presente invenção refere-se a composições fotossensíveis, que contêm: (i) pelo menos um produto de policondensação de diazónio ou pelo menos um sistema polimerizável radicalmente, que consiste em fotoiniciadores e compostos insaturados, que são polimerizáveis radicalmente, ou pelo menos um sistema híbrido, que consiste em um produto de policondensação de diazónio e um sistema polimerizável radicalmente, que consiste em fotoiniciadores e compostos insaturados, que são polimerizáveis radicalmente, (ii) pelo menos um aglutinante, bem como opcionalmente, um ou mais indicadores de exposição, um ou mais corantes, para aumento do contraste de imagem, bem como um ou mais ácidos, para estabilização da composição fotossensível, que está caracterizada pelo fato de que o aglutinante consiste, substancialmente, em unidades A, B, C, D, sendo que A corresponde à fórmula (I), B corresponde à fórmula (II), C corresponde à fórmula (III) e D corresponde à fórmula (IV), ao uso da mesma para revestimento de placas impressoras, bem como a placas impressoras, que estão revestidas com essa composição fotossensível.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10011096A DE10011096A1 (de) | 2000-03-09 | 2000-03-09 | Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
PCT/EP2001/002543 WO2001067179A2 (de) | 2000-03-09 | 2001-03-07 | Verwendung von carboxylgruppenhaltigen acetalpolymeren in lichtempfindlichen zusammensetzungen und lithographischen druckplatten |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0109106A true BR0109106A (pt) | 2002-12-03 |
Family
ID=7633843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0109106-9A BR0109106A (pt) | 2000-03-09 | 2001-03-07 | Uso de polìmeros de acetal, que contêm grupos carboxila, em composições fotossensìveis e placas impressoras litográficas |
Country Status (5)
Country | Link |
---|---|
US (1) | US6808858B2 (pt) |
EP (1) | EP1292860A2 (pt) |
BR (1) | BR0109106A (pt) |
DE (1) | DE10011096A1 (pt) |
WO (1) | WO2001067179A2 (pt) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014094080A1 (pt) | 2012-12-19 | 2014-06-26 | Ibf Indústria Brasileira De Filmes S/A | Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4248137B2 (ja) | 2000-11-22 | 2009-04-02 | 富士フイルム株式会社 | ネガ型感光性平版印刷版 |
DE10319198A1 (de) * | 2002-07-04 | 2004-01-15 | Kuraray Specialities Europe Gmbh | Vernetzte Polyvinylacetale |
DE10233631B4 (de) * | 2002-07-24 | 2004-09-30 | Kodak Polychrome Graphics Gmbh | Lithographie-Druckplattenvorläufer mit zwei strahlungsempfindlichen Schichten |
DE10257131B4 (de) * | 2002-12-05 | 2005-07-28 | Kuraray Specialities Europe Gmbh | Beschichtetes Material zur Tintenstrahlbedruckung, Verfahren zu seiner Herstellung |
WO2004063232A1 (de) * | 2003-01-09 | 2004-07-29 | Kuraray Specialities Europe Gmbh | Vernetzte polyvinylacetale |
MXPA05007218A (es) * | 2003-01-09 | 2005-11-23 | Kuraray Specialities Europe | Poliacetales degradados. |
ES2401701T3 (es) * | 2005-06-03 | 2013-04-23 | American Dye Source, Inc. | Copolímeros de acetal que absorben en el infrarrojo cercano térmicamente reactivos, métodos de preparación y métodos se uso |
US7723013B2 (en) * | 2007-01-11 | 2010-05-25 | Southern Lithoplate, Inc. | Negative-acting photolithographic printing plate with improved pre-burn performance |
ES2395993T3 (es) | 2010-03-19 | 2013-02-18 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
CN104870193B (zh) | 2013-01-01 | 2017-12-22 | 爱克发印艺公司 | (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途 |
EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
ES2617557T3 (es) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2179051A (en) * | 1935-09-26 | 1939-11-07 | Shawinigan Chem Ltd | Process of making polyvinyl acetal resins |
SE344247B (pt) * | 1964-06-15 | 1972-04-04 | Agfa Gevaert Nv | |
US3382069A (en) | 1964-06-18 | 1968-05-07 | Azoplate Corp | Planographic printing plate |
DE2053363C3 (de) | 1970-10-30 | 1980-09-18 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
DE2053364A1 (de) | 1970-10-30 | 1972-05-04 | Kalle Ag, 6202 Wiesbaden-Biebrich | Lichtempfindliche Kopiermasse |
BE788679A (fr) | 1971-09-13 | 1973-03-12 | Scott Paper Co | Composition de photopolymere |
US4355096A (en) * | 1980-07-11 | 1982-10-19 | American Hoechst Corporation | Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof |
US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
DE3036077A1 (de) | 1980-09-25 | 1982-05-06 | Hoechst Ag, 6000 Frankfurt | Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
JPS5953836A (ja) | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
DE3404366A1 (de) | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
EP0208145B1 (en) | 1985-06-07 | 1991-03-13 | Fuji Photo Film Co., Ltd. | Hearing aid with pivotable cover |
US4665124A (en) * | 1985-08-02 | 1987-05-12 | American Hoechst Corporation | Resin |
DE3676605D1 (de) | 1985-08-02 | 1991-02-07 | Hoechst Celanese Corp | Polyvinylacetal und dieses enthaltendes lichtempfindliches gemisch. |
DE3528309A1 (de) | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
JPS63123858A (ja) | 1986-11-13 | 1988-05-27 | 電気化学工業株式会社 | セラミツク粉体成形用バインダ− |
DE3644162A1 (de) | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
JP3321162B2 (ja) | 1991-07-30 | 2002-09-03 | コダック ポリクロウム グラフィクス リミティド ライアビリティ カンパニー | 酸置換された三元アセタールポリマー並びに感光性組成物および平板印刷版におけるそれの使用 |
US5169897A (en) * | 1991-07-30 | 1992-12-08 | Eastman Kodak Company | Binary acetal polymers useful in photosensitive compositions and lithographic printing plates |
US5534381A (en) * | 1995-07-06 | 1996-07-09 | Minnesota Mining And Manufacturing Company | Acetal polymers useful in photosensitive compositions |
DE19524851C2 (de) | 1995-07-07 | 1998-05-07 | Sun Chemical Corp | Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten |
DE19644515A1 (de) | 1996-10-25 | 1998-06-25 | Sun Chemical Corp | Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten |
US6596456B2 (en) * | 2001-05-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates |
-
2000
- 2000-03-09 DE DE10011096A patent/DE10011096A1/de not_active Ceased
-
2001
- 2001-03-07 WO PCT/EP2001/002543 patent/WO2001067179A2/de not_active Application Discontinuation
- 2001-03-07 EP EP01929416A patent/EP1292860A2/de not_active Withdrawn
- 2001-03-07 BR BR0109106-9A patent/BR0109106A/pt not_active Application Discontinuation
- 2001-03-07 US US10/221,117 patent/US6808858B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014094080A1 (pt) | 2012-12-19 | 2014-06-26 | Ibf Indústria Brasileira De Filmes S/A | Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem |
US10254646B2 (en) | 2012-12-19 | 2019-04-09 | Ibf Industria Brasileira De Filmes S/A | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process |
Also Published As
Publication number | Publication date |
---|---|
US6808858B2 (en) | 2004-10-26 |
EP1292860A2 (de) | 2003-03-19 |
DE10011096A1 (de) | 2001-10-11 |
WO2001067179A2 (de) | 2001-09-13 |
US20030180654A1 (en) | 2003-09-25 |
WO2001067179A3 (de) | 2002-01-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |