WO2001067179A2 - Verwendung von carboxylgruppenhaltigen acetalpolymeren in lichtempfindlichen zusammensetzungen und lithographischen druckplatten - Google Patents
Verwendung von carboxylgruppenhaltigen acetalpolymeren in lichtempfindlichen zusammensetzungen und lithographischen druckplatten Download PDFInfo
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- WO2001067179A2 WO2001067179A2 PCT/EP2001/002543 EP0102543W WO0167179A2 WO 2001067179 A2 WO2001067179 A2 WO 2001067179A2 EP 0102543 W EP0102543 W EP 0102543W WO 0167179 A2 WO0167179 A2 WO 0167179A2
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- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- INXWLSDYDXPENO-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CO)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C INXWLSDYDXPENO-UHFFFAOYSA-N 0.000 description 1
- XRMBQHTWUBGQDN-UHFFFAOYSA-N [2-[2,2-bis(prop-2-enoyloxymethyl)butoxymethyl]-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CC)COCC(CC)(COC(=O)C=C)COC(=O)C=C XRMBQHTWUBGQDN-UHFFFAOYSA-N 0.000 description 1
- APZPSKFMSWZPKL-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)CO APZPSKFMSWZPKL-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 125000004036 acetal group Chemical group 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- DIGBQDMXLUJMHN-FSWJYKAZSA-M apalcillin sodium Chemical compound [Na+].C1([C@@H](NC(=O)C=2C(=C3N=CC=CC3=NC=2)O)C(=O)N[C@H]2[C@H]3SC([C@@H](N3C2=O)C([O-])=O)(C)C)=CC=CC=C1 DIGBQDMXLUJMHN-FSWJYKAZSA-M 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- DMLAVOWQYNRWNQ-UHFFFAOYSA-N azobenzene Chemical compound C1=CC=CC=C1N=NC1=CC=CC=C1 DMLAVOWQYNRWNQ-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid group Chemical group C(C1=CC=CC=C1)(=O)O WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- IQFVPQOLBLOTPF-HKXUKFGYSA-L congo red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(/N=N/C3=CC=C(C=C3)C3=CC=C(C=C3)/N=N/C3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-HKXUKFGYSA-L 0.000 description 1
- 239000000994 contrast dye Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000006705 deacetalization reaction Methods 0.000 description 1
- 150000001989 diazonium salts Chemical group 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- AOCYHPQXGJBAQQ-UHFFFAOYSA-N ethyl n-sulfonylcarbamate Chemical group CCOC(=O)N=S(=O)=O AOCYHPQXGJBAQQ-UHFFFAOYSA-N 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- UZZYXUGECOQHPU-UHFFFAOYSA-M n-octyl sulfate Chemical compound CCCCCCCCOS([O-])(=O)=O UZZYXUGECOQHPU-UHFFFAOYSA-M 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 229940067739 octyl sulfate Drugs 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003791 organic solvent mixture Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- SQYNKIJPMDEDEG-UHFFFAOYSA-N paraldehyde Chemical compound CC1OC(C)OC(C)O1 SQYNKIJPMDEDEG-UHFFFAOYSA-N 0.000 description 1
- 229960003868 paraldehyde Drugs 0.000 description 1
- 150000008379 phenol ethers Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical compound O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000001022 rhodamine dye Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- UZZYXUGECOQHPU-UHFFFAOYSA-N sulfuric acid monooctyl ester Natural products CCCCCCCCOS(O)(=O)=O UZZYXUGECOQHPU-UHFFFAOYSA-N 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/221,117 US6808858B2 (en) | 2000-03-09 | 2001-03-07 | Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates |
EP01929416A EP1292860A2 (de) | 2000-03-09 | 2001-03-07 | Verwendung von carboxylgruppenhaltigen acetalpolymeren in lichtempfindlichen zusammensetzungen und lithographischen druckplatten |
BR0109106-9A BR0109106A (pt) | 2000-03-09 | 2001-03-07 | Uso de polìmeros de acetal, que contêm grupos carboxila, em composições fotossensìveis e placas impressoras litográficas |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10011096.7 | 2000-03-09 | ||
DE10011096A DE10011096A1 (de) | 2000-03-09 | 2000-03-09 | Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001067179A2 true WO2001067179A2 (de) | 2001-09-13 |
WO2001067179A3 WO2001067179A3 (de) | 2002-01-17 |
Family
ID=7633843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2001/002543 WO2001067179A2 (de) | 2000-03-09 | 2001-03-07 | Verwendung von carboxylgruppenhaltigen acetalpolymeren in lichtempfindlichen zusammensetzungen und lithographischen druckplatten |
Country Status (5)
Country | Link |
---|---|
US (1) | US6808858B2 (de) |
EP (1) | EP1292860A2 (de) |
BR (1) | BR0109106A (de) |
DE (1) | DE10011096A1 (de) |
WO (1) | WO2001067179A2 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1216830A2 (de) * | 2000-11-22 | 2002-06-26 | Fuji Photo Film Co., Ltd. | Negativ arbeitende licht- oder wärmeempfindliche lithographische Druckplatte |
JP2006513285A (ja) * | 2003-01-09 | 2006-04-20 | クラレイ スペシャリティーズ ヨーロッパ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 架橋したポリビニルアセタール |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10319198A1 (de) * | 2002-07-04 | 2004-01-15 | Kuraray Specialities Europe Gmbh | Vernetzte Polyvinylacetale |
DE10233631B4 (de) * | 2002-07-24 | 2004-09-30 | Kodak Polychrome Graphics Gmbh | Lithographie-Druckplattenvorläufer mit zwei strahlungsempfindlichen Schichten |
DE10257131B4 (de) * | 2002-12-05 | 2005-07-28 | Kuraray Specialities Europe Gmbh | Beschichtetes Material zur Tintenstrahlbedruckung, Verfahren zu seiner Herstellung |
US7511096B2 (en) * | 2003-01-09 | 2009-03-31 | Kuraray Europe Gmbh | Crosslinked polyvinyl acetals |
BRPI0611018B1 (pt) * | 2005-06-03 | 2017-03-07 | American Dye Source Inc | copolímeros de acetal de absorção próxima do infravermelho termicamente reativos, métodos de preparo e métodos de uso |
US7723013B2 (en) * | 2007-01-11 | 2010-05-25 | Southern Lithoplate, Inc. | Negative-acting photolithographic printing plate with improved pre-burn performance |
ES2395993T3 (es) | 2010-03-19 | 2013-02-18 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
BR112015014898B1 (pt) | 2012-12-19 | 2021-12-07 | Ibf Industria Brasileira De Filmes S/A. | Chapas para impressão sensível à radiação no espectro eletromagnético e gráfica e processo de revelação de imagem |
CN104870193B (zh) | 2013-01-01 | 2017-12-22 | 爱克发印艺公司 | (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途 |
EP2933278B1 (de) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern |
EP2944657B1 (de) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylen-,Vinylacetal-)Copolymere und deren Verwendung in Lithographiedruckplattenvorläufern |
ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
EP2963496B1 (de) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren |
JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
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EP0752430A2 (de) * | 1995-07-07 | 1997-01-08 | Sun Chemical Corporation | Acetalpolymere und Verwendung zur lichtempfindlichen Gemischen und lithographischen Druckplatten |
EP0838478A1 (de) * | 1996-10-25 | 1998-04-29 | Sun Chemical Corporation | Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten |
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US2179051A (en) | 1935-09-26 | 1939-11-07 | Shawinigan Chem Ltd | Process of making polyvinyl acetal resins |
SE344247B (de) * | 1964-06-15 | 1972-04-04 | Agfa Gevaert Nv | |
US3382069A (en) | 1964-06-18 | 1968-05-07 | Azoplate Corp | Planographic printing plate |
DE2053364A1 (de) | 1970-10-30 | 1972-05-04 | Kalle Ag, 6202 Wiesbaden-Biebrich | Lichtempfindliche Kopiermasse |
DE2053363C3 (de) | 1970-10-30 | 1980-09-18 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
BE788679A (fr) | 1971-09-13 | 1973-03-12 | Scott Paper Co | Composition de photopolymere |
US4355096A (en) | 1980-07-11 | 1982-10-19 | American Hoechst Corporation | Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof |
US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
DE3036077A1 (de) | 1980-09-25 | 1982-05-06 | Hoechst Ag, 6000 Frankfurt | Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
JPS5953836A (ja) | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
DE3404366A1 (de) | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
DE3678050D1 (de) | 1985-06-07 | 1991-04-18 | Fuji Photo Film Co Ltd | Hoergeraet mit einer schwenkbaren klappe. |
US4665124A (en) * | 1985-08-02 | 1987-05-12 | American Hoechst Corporation | Resin |
DE3676605D1 (de) | 1985-08-02 | 1991-02-07 | Hoechst Celanese Corp | Polyvinylacetal und dieses enthaltendes lichtempfindliches gemisch. |
DE3528309A1 (de) | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
JPS63123858A (ja) * | 1986-11-13 | 1988-05-27 | 電気化学工業株式会社 | セラミツク粉体成形用バインダ− |
DE3644162A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
WO1993003068A1 (en) | 1991-07-30 | 1993-02-18 | Eastman Kodak Company | Acid-substituted ternary acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
US5169897A (en) | 1991-07-30 | 1992-12-08 | Eastman Kodak Company | Binary acetal polymers useful in photosensitive compositions and lithographic printing plates |
US5534381A (en) * | 1995-07-06 | 1996-07-09 | Minnesota Mining And Manufacturing Company | Acetal polymers useful in photosensitive compositions |
US6596456B2 (en) * | 2001-05-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates |
-
2000
- 2000-03-09 DE DE10011096A patent/DE10011096A1/de not_active Ceased
-
2001
- 2001-03-07 EP EP01929416A patent/EP1292860A2/de not_active Withdrawn
- 2001-03-07 US US10/221,117 patent/US6808858B2/en not_active Expired - Fee Related
- 2001-03-07 BR BR0109106-9A patent/BR0109106A/pt not_active Application Discontinuation
- 2001-03-07 WO PCT/EP2001/002543 patent/WO2001067179A2/de not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0752430A2 (de) * | 1995-07-07 | 1997-01-08 | Sun Chemical Corporation | Acetalpolymere und Verwendung zur lichtempfindlichen Gemischen und lithographischen Druckplatten |
EP0838478A1 (de) * | 1996-10-25 | 1998-04-29 | Sun Chemical Corporation | Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1216830A2 (de) * | 2000-11-22 | 2002-06-26 | Fuji Photo Film Co., Ltd. | Negativ arbeitende licht- oder wärmeempfindliche lithographische Druckplatte |
EP1216830A3 (de) * | 2000-11-22 | 2003-11-05 | Fuji Photo Film Co., Ltd. | Negativ arbeitende licht- oder wärmeempfindliche lithographische Druckplatte |
US6794116B2 (en) | 2000-11-22 | 2004-09-21 | Fuji Photo Film Co., Ltd. | Negative photosensitive lithograhic printing plate |
JP2006513285A (ja) * | 2003-01-09 | 2006-04-20 | クラレイ スペシャリティーズ ヨーロッパ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 架橋したポリビニルアセタール |
Also Published As
Publication number | Publication date |
---|---|
WO2001067179A3 (de) | 2002-01-17 |
US20030180654A1 (en) | 2003-09-25 |
EP1292860A2 (de) | 2003-03-19 |
US6808858B2 (en) | 2004-10-26 |
BR0109106A (pt) | 2002-12-03 |
DE10011096A1 (de) | 2001-10-11 |
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