BR0317191A - Método de produção e composições aquosas curáveis por radiação - Google Patents

Método de produção e composições aquosas curáveis por radiação

Info

Publication number
BR0317191A
BR0317191A BR0317191-4A BR0317191A BR0317191A BR 0317191 A BR0317191 A BR 0317191A BR 0317191 A BR0317191 A BR 0317191A BR 0317191 A BR0317191 A BR 0317191A
Authority
BR
Brazil
Prior art keywords
radiation curable
curable aqueous
production method
aqueous compositions
water
Prior art date
Application number
BR0317191-4A
Other languages
English (en)
Other versions
BR0317191B1 (pt
Inventor
Subhankar Chatterjee
Mikhail Laksin
David Biro
Jean Dominique Turgis
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of BR0317191A publication Critical patent/BR0317191A/pt
Publication of BR0317191B1 publication Critical patent/BR0317191B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

"MéTODO DE PRODUçãO E COMPOSIçõES AQUOSAS CURáVEIS POR RADIAçãO". Método para produção de um filme resistente a solventes, baixo extraível a partir de uma composição homogênea aquosa curável por radiação actínica contendo um composto solúvel em água, tendo no mínimo uma ligação dupla polimerizável de radiação alfa, beta-etilenicamente insaturada e água como componentes essenciais.
BRPI0317191-4B1A 2002-12-27 2003-12-22 método de produção de um filme de baixos extraíveis sem conformidade com a fda, composição homogênea aquosa curável por radiação actínica e composição de tinta homogênea aquosa curável por radiação actínica BR0317191B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/331,676 US7037953B2 (en) 2000-03-29 2002-12-27 Radiation curable aqueous compositions
PCT/US2003/041051 WO2004061019A1 (en) 2002-12-27 2003-12-22 Radiation curable aqueous compositions

Publications (2)

Publication Number Publication Date
BR0317191A true BR0317191A (pt) 2005-11-01
BR0317191B1 BR0317191B1 (pt) 2013-06-25

Family

ID=32710842

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0317191-4B1A BR0317191B1 (pt) 2002-12-27 2003-12-22 método de produção de um filme de baixos extraíveis sem conformidade com a fda, composição homogênea aquosa curável por radiação actínica e composição de tinta homogênea aquosa curável por radiação actínica

Country Status (14)

Country Link
US (1) US7037953B2 (pt)
EP (1) EP1592752B1 (pt)
JP (2) JP2006512458A (pt)
CN (1) CN1732238A (pt)
AT (1) ATE388207T1 (pt)
AU (1) AU2003303558A1 (pt)
BR (1) BR0317191B1 (pt)
CA (1) CA2511790C (pt)
CR (1) CR7888A (pt)
DE (1) DE60319591T2 (pt)
EC (1) ECSP055889A (pt)
MX (1) MXPA05006995A (pt)
WO (1) WO2004061019A1 (pt)
ZA (1) ZA200504999B (pt)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040180226A1 (en) * 2000-03-29 2004-09-16 Subhankar Chatterjee Radiation curable aqueous compositions for low extractable film packaging
WO2003010250A1 (en) * 2001-07-20 2003-02-06 Ucb, S.A. Radiation curable polymeric ink compositions
DE102004005824A1 (de) * 2004-02-06 2005-08-25 Degussa Ag Organosiliciumeinheiten enthaltende Zubereitung auf Acrylatbasis, deren Herstellung und deren Verwendung
US7479511B2 (en) * 2005-04-12 2009-01-20 Sun Chemical Corporation Water based energy curable hybrid systems with improved properties
CN100351289C (zh) * 2005-07-13 2007-11-28 安徽大学 水系聚氨酯－含硅丙烯酸树脂织物涂层胶的制备方法
KR20080031264A (ko) * 2005-07-15 2008-04-08 다이니뽄 잉끼 가가꾸 고오교오 가부시끼가이샤 자외선 경화형 수지 조성물 및 광 정보 기록 매체
GB0519941D0 (en) * 2005-09-30 2005-11-09 Xennia Technology Ltd Inkjet printing
GB2450975B (en) * 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
US8877298B2 (en) * 2008-05-27 2014-11-04 The Hong Kong University Of Science And Technology Printing using a structure coated with ultraviolet radiation responsive material
CN102083866A (zh) * 2008-06-11 2011-06-01 巴斯夫欧洲公司 在可见光光致激发下可自由基聚合树脂的无粘性表面光固化的方法
US8378002B2 (en) * 2008-07-16 2013-02-19 Fujifilm Corporation Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method
EP2301975B1 (en) * 2008-07-17 2013-07-24 Kuraray Noritake Dental Inc. Polymerizable composition suitable for led light source
EP2590907A1 (en) * 2010-07-09 2013-05-15 DSM IP Assets B.V. Radiation curable coatings for concrete floors
CN103379967B (zh) * 2010-12-13 2016-08-10 太阳化学公司 用于在基材上施涂涂料或油墨组合物并暴露于辐射的方法及其产品
CN102153899B (zh) * 2011-01-28 2014-07-23 创兴精细化学(上海)有限公司 紫外线可固化水性有色涂料组合物
EP2845885B1 (en) * 2012-08-31 2018-01-31 HP Scitex Ltd Photo-curable ink composition
CN103725087B (zh) * 2013-12-19 2016-03-16 深圳市嘉卓成科技发展有限公司 一种无卤紫外光辐射固化导光油墨及制备、使用方法
CN104017470A (zh) * 2014-02-25 2014-09-03 李穆生 一种光固化涂料及其制备方法
EP3122824B1 (en) 2014-03-28 2020-08-19 Sun Chemical Corporation Low migration radiation curable inks
US9820931B2 (en) 2014-10-13 2017-11-21 L'oreal Latex nail compositions having low amounts of photo-initiator
US9649272B2 (en) 2014-10-13 2017-05-16 L'oréal Latex nail compositions having low amounts of photo-initiator
US9636293B2 (en) 2014-10-13 2017-05-02 L'oréal Latex nail compositions having low amounts of photo-initiator
US10941308B2 (en) * 2016-07-27 2021-03-09 Sun Chemical Corporation Water-based electrically-insulating energy-curable fluids
JP2019064699A (ja) * 2017-10-02 2019-04-25 東洋アルミニウム株式会社 蓋材及びその製造方法
CN111108159B (zh) * 2017-10-02 2021-06-11 Dic油墨株式会社 电子射线固化型表面印刷用水性柔版墨液和使用其的煮沸/蒸煮用小袋
CN108117616B (zh) * 2017-11-22 2019-08-09 惠州市华泓新材料股份有限公司 二丁基芴基衍生物与其作为光引发剂的应用
JP2019147889A (ja) * 2018-02-27 2019-09-05 Ｄｉｃグラフィックス株式会社 表刷り印刷用リキッドインキ組成物
US11339303B2 (en) * 2018-09-10 2022-05-24 Sun Chemical Corporation Energy curable compositions comprising reaction products of poly(alkylene oxide)-containing glycidyl ethers and acrylic acid
CN110669425A (zh) * 2019-10-16 2020-01-10 江苏巨珩新材料科技有限公司 一种eb固化涂料及其制备方法
IT202000001963A1 (it) 2020-01-31 2021-07-31 Lamberti Spa Metodo per rivestire un substrato mediante polimerizzazione a fascio di elettroni

Family Cites Families (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE160660C (pt)
DE252983C (pt) 1911-09-04
DE1621820B1 (de) 1967-11-02 1972-03-09 Bergolin Lack Und Farbenfabrik Verfahren zum Grundieren von Holz
GB1354436A (en) 1971-02-22 1974-06-05 Hoechst Ag Alkyd resin-modified dispersions
JPS5245757B2 (pt) * 1971-12-13 1977-11-18
JPS5233929A (en) 1975-09-12 1977-03-15 Nippon Erekutorokiyua Kk Method for rishin finishing
US4035273A (en) 1976-05-24 1977-07-12 Scm Corporation Cathodic electrocoating process
US4107013A (en) 1976-12-13 1978-08-15 Scm Corporation Ultraviolet curable latexes
US4171387A (en) 1978-02-06 1979-10-16 Champion International Corporation Coating wood substrates
JPS5539239A (en) 1978-09-11 1980-03-19 Matsushita Electric Works Ltd Surface treating method for wood
DE2853921A1 (de) 1978-12-14 1980-07-03 Basf Ag Strahlungshaertbare waessrige bindemitteldispersionen
US4269749A (en) 1979-04-30 1981-05-26 The Dow Chemical Company Method of imparting salt and/or mechanical stability to aqueous polymer microsuspensions
JPH0379362B2 (pt) 1979-08-31 1991-12-18 Suteibondo Pty Ltd
DE3114341A1 (de) 1981-04-09 1982-11-11 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen, ihre herstellung und verwendung
DE3200907A1 (de) 1982-01-14 1983-07-21 Bayer Ag, 5090 Leverkusen Strahlungshaertbare waessrige bindemittelemulsionen
DE3235610A1 (de) 1982-09-25 1984-03-29 Bayer Ag, 5090 Leverkusen Strahlenhaertbares grundiermittel und seine verwendung
DE3316593A1 (de) 1983-05-06 1984-11-08 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von (meth)-acrylsaeureestern und deren verwendung
DE3502944A1 (de) 1985-01-30 1986-07-31 Basf Ag, 6700 Ludwigshafen Waessrige grundierung fuer holzanstriche
DE3512179A1 (de) 1985-04-03 1986-12-04 Merck Patent Gmbh, 6100 Darmstadt Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen
DE3616434A1 (de) 1986-05-15 1987-11-19 Bayer Ag Verfahren zur grundierung von holz
US4782109A (en) 1986-06-26 1988-11-01 Lindsay Finishes, Incorporated Latex paint formulations and methods
DE3704098A1 (de) 1987-02-11 1988-08-25 Basf Ag Strahlungshaertbare acrylate
DE3740139A1 (de) 1987-11-26 1989-06-08 Helmut Sallinger Gmbh Verfahren zur grundierung von wasserlacken auf holz
US5824717A (en) 1988-05-27 1998-10-20 Exxon Chemical Patents Inc. Peroxide and radiation curable compositions containing isobutylenene copolymers having acrylate functionality
JPH01304935A (ja) 1988-06-03 1989-12-08 Dainippon Ink & Chem Inc 難燃性木質材料
IT1228982B (it) 1989-03-07 1991-07-11 Lamberti Flli Spa Dispersioni acquose di fotoiniziatori e loro impiego.
AU647061B2 (en) 1989-12-28 1994-03-17 Dainippon Ink And Chemicals Inc. Active energy ray curable composition and applicable method
DE4007146A1 (de) 1990-03-07 1991-09-12 Basf Ag Strahlungshaertbare amin- und harnstoffgruppen enthaltende urethanacrylatverbindungen
EP0493317B2 (de) 1990-12-18 2001-01-10 Ciba SC Holding AG Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungsmittel
US5387642A (en) 1991-01-19 1995-02-07 Bayer Aktiengesellschaft Aqueous binder composition and a process for its preparation
DE4114518C2 (de) 1991-05-03 1995-09-14 Ls Industrielacke Gmbh Oberflächenbeschichtungsmaterial und Verfahren zu dessen Auftragung sowie Vorrichtung dafür
JPH05155952A (ja) 1991-12-06 1993-06-22 Nippon Kayaku Co Ltd 印刷インキ用樹脂組成物及びその硬化物
DE4227355A1 (de) 1992-08-19 1994-02-24 Hoechst Ag Wasserverdünnbare Zweikomponenten-Überzugsmasse
DE4228713A1 (de) 1992-08-28 1994-03-03 Hoechst Ag Wäßrige, strahlenhärtbare Bindemitteldispersionen
WO1994013467A1 (en) 1992-12-09 1994-06-23 Hoechst Aktiengesellschaft Biaxially oriented penbb film primed with radiation curable coating composition
DE69413363T2 (de) 1993-12-14 1999-04-29 Canon K.K., Tokio/Tokyo Tinte, Tintenstrahlaufzeichnungsverfahren und Tintenstrahldruckgerät unter Verwendung derselben
DE4343885A1 (de) 1993-12-22 1995-06-29 Hoechst Ag Wäßrige, strahlenhärtbare Bindemitteldispersionen
FR2739838A3 (fr) 1993-12-31 1997-04-18 Thiebaut Chantal Procede de fabrication de vernis a sechage ultra violet destine a l'application blisier et vernis barriere dans les dommaines graphiques et particulierement dans l'emballage et la fabrication des etiquettes
EP0756609A4 (en) 1994-04-19 1998-12-02 Univ Lehigh PRINTING INK COMPOSITIONS, METHODS OF MAKING AND USES THEREOF
IL111014A (en) 1994-09-21 1999-05-09 Scitex Corp Ltd Ink compositions and a method for making same
DE4434554A1 (de) 1994-09-28 1996-04-04 Basf Ag Strahlungshärtbare wäßrige Polyurethandispersionen
GB9606966D0 (en) 1996-04-02 1996-06-05 Sericol Ltd Printing ink
JPH10219158A (ja) * 1997-01-31 1998-08-18 Teikoku Ink Seizo Kk 高性能インクジェット印刷用水性インク
DE19718948A1 (de) * 1997-05-05 1998-11-12 Basf Ag Wässrige, strahlungshärtbare Beschichtungsmassen
EP1023360B1 (en) 1997-10-16 2011-03-09 Sun Chemical Corporation PHOTONEUTRALIZATION OF pH SENSITIVE AQUEOUS POLYMERIC DISPERSIONS AND METHODS FOR USING SAME
US6087417A (en) 1998-01-16 2000-07-11 The Valspar Corporation Epoxy resin/acid/tertiary amine reaction product with reactive diluent
US6232361B1 (en) 1998-12-11 2001-05-15 Sun Chemical Corporation Radiation curable water based cationic inks and coatings
JP2000248023A (ja) * 1999-03-01 2000-09-12 Kyoeisha Chem Co Ltd インク受像層用硬化性組成物
AU2001268203B2 (en) 2000-06-06 2006-04-06 Cryovac, Llc Printed thermoplastic film with radiation-cured overprint varnish
JP3893262B2 (ja) * 2000-09-14 2007-03-14 キヤノン株式会社 水性光硬化型樹脂組成物、水性インク、インクカートリッジ、記録ユニット及びインクジェット記録装置
JP2002346473A (ja) * 2001-03-19 2002-12-03 Gen Gijutsu Kenkyusho:Kk 硬化塗膜の形成方法
WO2002081576A1 (en) * 2001-04-03 2002-10-17 Sun Chemical Corporation Radiaton curable aqueous compositions for low extractable film packaging
PT1392780E (pt) * 2001-04-03 2008-09-08 Sun Chemical Corp Composições aquosas curáveis por radiação
JP2003147230A (ja) * 2001-11-02 2003-05-21 Sun Chemical Corp 輻射線硬化性水性組成物

Also Published As

Publication number Publication date
MXPA05006995A (es) 2005-08-18
BR0317191B1 (pt) 2013-06-25
CR7888A (es) 2007-08-28
DE60319591D1 (de) 2008-04-17
CA2511790C (en) 2014-03-04
CA2511790A1 (en) 2004-07-22
JP2013082930A (ja) 2013-05-09
ZA200504999B (en) 2006-06-28
JP2006512458A (ja) 2006-04-13
US7037953B2 (en) 2006-05-02
ATE388207T1 (de) 2008-03-15
DE60319591T2 (de) 2009-03-26
WO2004061019A1 (en) 2004-07-22
EP1592752A1 (en) 2005-11-09
US20030134931A1 (en) 2003-07-17
ECSP055889A (es) 2005-09-20
EP1592752B1 (en) 2008-03-05
CN1732238A (zh) 2006-02-08
AU2003303558A1 (en) 2004-07-29

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Legal Events

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Owner name: SUN CHEMICAL CORPORATION (US)

Free format text: SEDE ALTERADA CONFORME SOLICITADO NA PETICAO NO 018060102338/SP DE 05/09/2006.

B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/12/2003, OBSERVADAS AS CONDICOES LEGAIS.