BR0317191A - Método de produção e composições aquosas curáveis por radiação - Google Patents

Método de produção e composições aquosas curáveis por radiação

Info

Publication number
BR0317191A
BR0317191A BR0317191-4A BR0317191A BR0317191A BR 0317191 A BR0317191 A BR 0317191A BR 0317191 A BR0317191 A BR 0317191A BR 0317191 A BR0317191 A BR 0317191A
Authority
BR
Brazil
Prior art keywords
radiation curable
curable aqueous
production method
aqueous compositions
water
Prior art date
Application number
BR0317191-4A
Other languages
English (en)
Other versions
BR0317191B1 (pt
Inventor
Subhankar Chatterjee
Mikhail Laksin
David Biro
Jean Dominique Turgis
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of BR0317191A publication Critical patent/BR0317191A/pt
Publication of BR0317191B1 publication Critical patent/BR0317191B1/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

"MéTODO DE PRODUçãO E COMPOSIçõES AQUOSAS CURáVEIS POR RADIAçãO". Método para produção de um filme resistente a solventes, baixo extraível a partir de uma composição homogênea aquosa curável por radiação actínica contendo um composto solúvel em água, tendo no mínimo uma ligação dupla polimerizável de radiação alfa, beta-etilenicamente insaturada e água como componentes essenciais.
BRPI0317191-4B1A 2002-12-27 2003-12-22 método de produção de um filme de baixos extraíveis sem conformidade com a fda, composição homogênea aquosa curável por radiação actínica e composição de tinta homogênea aquosa curável por radiação actínica BR0317191B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/331,676 US7037953B2 (en) 2000-03-29 2002-12-27 Radiation curable aqueous compositions
PCT/US2003/041051 WO2004061019A1 (en) 2002-12-27 2003-12-22 Radiation curable aqueous compositions

Publications (2)

Publication Number Publication Date
BR0317191A true BR0317191A (pt) 2005-11-01
BR0317191B1 BR0317191B1 (pt) 2013-06-25

Family

ID=32710842

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0317191-4B1A BR0317191B1 (pt) 2002-12-27 2003-12-22 método de produção de um filme de baixos extraíveis sem conformidade com a fda, composição homogênea aquosa curável por radiação actínica e composição de tinta homogênea aquosa curável por radiação actínica

Country Status (14)

Country Link
US (1) US7037953B2 (pt)
EP (1) EP1592752B1 (pt)
JP (2) JP2006512458A (pt)
CN (1) CN1732238A (pt)
AT (1) ATE388207T1 (pt)
AU (1) AU2003303558A1 (pt)
BR (1) BR0317191B1 (pt)
CA (1) CA2511790C (pt)
CR (1) CR7888A (pt)
DE (1) DE60319591T2 (pt)
EC (1) ECSP055889A (pt)
MX (1) MXPA05006995A (pt)
WO (1) WO2004061019A1 (pt)
ZA (1) ZA200504999B (pt)

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CN103725087B (zh) * 2013-12-19 2016-03-16 深圳市嘉卓成科技发展有限公司 一种无卤紫外光辐射固化导光油墨及制备、使用方法
CN104017470A (zh) * 2014-02-25 2014-09-03 李穆生 一种光固化涂料及其制备方法
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JP2019064699A (ja) * 2017-10-02 2019-04-25 東洋アルミニウム株式会社 蓋材及びその製造方法
WO2019069736A1 (ja) * 2017-10-02 2019-04-11 Dicグラフィックス株式会社 電子線硬化型表刷り用水性フレキソインキ、及びそれを用いたボイル・レトルト用パウチ
CN108117616B (zh) * 2017-11-22 2019-08-09 惠州市华泓新材料股份有限公司 二丁基芴基衍生物与其作为光引发剂的应用
JP2019147889A (ja) * 2018-02-27 2019-09-05 Dicグラフィックス株式会社 表刷り印刷用リキッドインキ組成物
US11339303B2 (en) * 2018-09-10 2022-05-24 Sun Chemical Corporation Energy curable compositions comprising reaction products of poly(alkylene oxide)-containing glycidyl ethers and acrylic acid
CN110669425A (zh) * 2019-10-16 2020-01-10 江苏巨珩新材料科技有限公司 一种eb固化涂料及其制备方法
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Also Published As

Publication number Publication date
JP2006512458A (ja) 2006-04-13
MXPA05006995A (es) 2005-08-18
ZA200504999B (en) 2006-06-28
CR7888A (es) 2007-08-28
ATE388207T1 (de) 2008-03-15
DE60319591T2 (de) 2009-03-26
BR0317191B1 (pt) 2013-06-25
EP1592752B1 (en) 2008-03-05
AU2003303558A1 (en) 2004-07-29
JP2013082930A (ja) 2013-05-09
CA2511790A1 (en) 2004-07-22
CN1732238A (zh) 2006-02-08
DE60319591D1 (de) 2008-04-17
ECSP055889A (es) 2005-09-20
WO2004061019A1 (en) 2004-07-22
US7037953B2 (en) 2006-05-02
CA2511790C (en) 2014-03-04
EP1592752A1 (en) 2005-11-09
US20030134931A1 (en) 2003-07-17

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B25G Requested change of headquarter approved

Owner name: SUN CHEMICAL CORPORATION (US)

Free format text: SEDE ALTERADA CONFORME SOLICITADO NA PETICAO NO 018060102338/SP DE 05/09/2006.

B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/12/2003, OBSERVADAS AS CONDICOES LEGAIS.