BR0304732A - Látex e processos para a sua preparação - Google Patents

Látex e processos para a sua preparação

Info

Publication number
BR0304732A
BR0304732A BR0304732-6A BR0304732A BR0304732A BR 0304732 A BR0304732 A BR 0304732A BR 0304732 A BR0304732 A BR 0304732A BR 0304732 A BR0304732 A BR 0304732A
Authority
BR
Brazil
Prior art keywords
latex
processes
preparation
molar ratio
bouncing
Prior art date
Application number
BR0304732-6A
Other languages
English (en)
Other versions
BR0304732B1 (pt
Inventor
Jinqiu Chen
Sabine Hahn
Hans-Peter Schwenzfeier
Jens Wieboldt
Original Assignee
Polymer Latex Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polymer Latex Gmbh & Co Kg filed Critical Polymer Latex Gmbh & Co Kg
Publication of BR0304732A publication Critical patent/BR0304732A/pt
Publication of BR0304732B1 publication Critical patent/BR0304732B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F285/00—Macromolecular compounds obtained by polymerising monomers on to preformed graft polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L55/00—Compositions of homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups C08L23/00 - C08L53/00
    • C08L55/02—ABS [Acrylonitrile-Butadiene-Styrene] polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

"LáTEX E PROCESSOS PARA A SUA PREPARAçãO". A presente invenção refere-se a um látex, obtenível mediante reação em um modo processual de gradiente, com a condição, de que a razão molar dos componentes A para B incidentes de uma faixa entre 0,15 0,95 ou 1,05 - 6,66 é ajustada por pelo menos uma mudança saltitante da quantidade dosada por unidade de tempo para uma razão molar dos componentes A para B incidentes de 1,05 - 6,66 ou 0, 1 5 - 0,95.
BRPI0304732-6B1A 2002-10-09 2003-10-07 látex e seu processo de preparação BR0304732B1 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10247051A DE10247051A1 (de) 2002-10-09 2002-10-09 Latex und Verfahren zu seiner Herstellung

Publications (2)

Publication Number Publication Date
BR0304732A true BR0304732A (pt) 2004-08-31
BR0304732B1 BR0304732B1 (pt) 2013-07-16

Family

ID=32010397

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0304732-6B1A BR0304732B1 (pt) 2002-10-09 2003-10-07 látex e seu processo de preparação

Country Status (11)

Country Link
US (1) US7101927B2 (pt)
EP (1) EP1408059B1 (pt)
JP (1) JP4363946B2 (pt)
CN (1) CN1290878C (pt)
BR (1) BR0304732B1 (pt)
CA (1) CA2444428C (pt)
DE (1) DE10247051A1 (pt)
DK (1) DK1408059T3 (pt)
ES (1) ES2466378T3 (pt)
PL (1) PL209103B1 (pt)
ZA (1) ZA200307846B (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4537870B2 (ja) * 2005-03-16 2010-09-08 ガンツ化成株式会社 アルキル（メタ）アクリレート共重合体エマルジョンの製造法。
US7642314B2 (en) * 2005-12-30 2010-01-05 Columbia Insurance Company Emulsion polymers having multimodal molecular weight distributions
CN100500994C (zh) * 2006-10-23 2009-06-17 上海东升新材料有限公司 一种真空镀铝纸处理用水性基料的制备方法
DE602007009792D1 (de) * 2007-03-30 2010-11-25 Kemira Oyj Gepfropfter Interpolymerlatex und Herstellungsverfahren dafür
US9731456B2 (en) 2013-03-14 2017-08-15 Sabic Global Technologies B.V. Method of manufacturing a functionally graded article
EP3891192A1 (de) 2018-12-03 2021-10-13 Basf Se Verfahren zur herstellung einer wässrigen polymerdispersion aus vinylaromatischer verbindung und konjugiertem aliphatischen dien
CN111929435B (zh) * 2020-07-07 2023-01-17 武汉生之源生物科技股份有限公司 提高胶乳免疫比浊法稳定性的胶乳微球、制备方法及应用

Family Cites Families (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2744859A (en) * 1951-02-20 1956-05-08 Robert H Rines Electroplating method and system
US3317410A (en) * 1962-12-18 1967-05-02 Ibm Agitation system for electrodeposition of magnetic alloys
US3438668A (en) * 1965-08-26 1969-04-15 Gen Electric Contactless lifter
US3477051A (en) * 1967-12-26 1969-11-04 Ibm Die casting of core windings
BE757781A (fr) * 1969-10-22 1971-04-01 Minnesota Mining & Mfg Procede perfectionne d'electroformage et dispositif pour sa mise en pratique
CA979569A (en) * 1970-12-09 1975-12-09 Toray Industries, Inc. Method for producing impact resistant thermoplastic resin by continuous bulk polymerization
US3804881A (en) * 1972-06-20 1974-04-16 Union Carbide Corp Polymerization using varying monomer concentration
GB1513444A (en) * 1974-09-06 1978-06-07 Chemical Reactor Equip As Pick-up devices for lifting and moving semiconductor wafers
US4008815A (en) * 1975-04-14 1977-02-22 Applied Materials, Inc. Reactor loading apparatus
US4111876A (en) * 1976-03-30 1978-09-05 Union Carbide Corporation Impact modifiers for polyvinyl chloride
US4065520A (en) * 1976-06-04 1977-12-27 Union Carbide Corporation Gradient polymers of two or more alpha mono-olefinic monomers capable of polymerizing with themselves and each other
US4212785A (en) * 1978-08-29 1980-07-15 Chemische Werke Huls A.G. Process for the preparation of copolymers useful as viscosity-raising agents
US4437961A (en) * 1982-08-19 1984-03-20 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method for sequentially processing a multi-level interconnect circuit in a vacuum chamber
US4588343A (en) * 1984-05-18 1986-05-13 Varian Associates, Inc. Workpiece lifting and holding apparatus
US4586743A (en) * 1984-09-24 1986-05-06 Intelledex Incorporated Robotic gripper for disk-shaped objects
US4668365A (en) * 1984-10-25 1987-05-26 Applied Materials, Inc. Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
EP0189279B1 (en) * 1985-01-22 1991-10-09 Applied Materials, Inc. Semiconductor processing system
US5280983A (en) * 1985-01-22 1994-01-25 Applied Materials, Inc. Semiconductor processing system with robotic autoloader and load lock
US4820396A (en) * 1985-03-18 1989-04-11 Masi Amerigo De Rack or transport tool for the manufacturing of printed wired boards
US4892947A (en) * 1985-04-27 1990-01-09 Nissan Chemical Industries Ltd. 3(2H)Pyridazinone, process for its preparation and anti-allergic agent containing it
US4749465A (en) * 1985-05-09 1988-06-07 Seagate Technology In-line disk sputtering system
JPH07105345B2 (ja) * 1985-08-08 1995-11-13 日電アネルバ株式会社 基体処理装置
US5013385A (en) * 1986-04-18 1991-05-07 General Signal Corporation Quad processor
US5102495A (en) * 1986-04-18 1992-04-07 General Signal Corporation Method providing multiple-processing of substrates
US5308431A (en) * 1986-04-18 1994-05-03 General Signal Corporation System providing multiple processing of substrates
US5110249A (en) * 1986-10-23 1992-05-05 Innotec Group, Inc. Transport system for inline vacuum processing
US5292393A (en) * 1986-12-19 1994-03-08 Applied Materials, Inc. Multichamber integrated process system
US5000113A (en) * 1986-12-19 1991-03-19 Applied Materials, Inc. Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
US5882165A (en) * 1986-12-19 1999-03-16 Applied Materials, Inc. Multiple chamber integrated process system
US4842683A (en) * 1986-12-19 1989-06-27 Applied Materials, Inc. Magnetic field-enhanced plasma etch reactor
US5755886A (en) * 1986-12-19 1998-05-26 Applied Materials, Inc. Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing
US4892753A (en) * 1986-12-19 1990-01-09 Applied Materials, Inc. Process for PECVD of silicon oxide using TEOS decomposition
US4819167A (en) * 1987-04-20 1989-04-04 Applied Materials, Inc. System and method for detecting the center of an integrated circuit wafer
US5080549A (en) * 1987-05-11 1992-01-14 Epsilon Technology, Inc. Wafer handling system with Bernoulli pick-up
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
CA1335908C (en) * 1988-10-07 1995-06-13 Junji Oshima Core-shell polymer, composition containing the polymers and its molded articles.
JP2779950B2 (ja) * 1989-04-25 1998-07-23 東陶機器株式会社 静電チャックの電圧印加方法および電圧印加装置
US5447409A (en) * 1989-10-20 1995-09-05 Applied Materials, Inc. Robot assembly
US5000827A (en) * 1990-01-02 1991-03-19 Motorola, Inc. Method and apparatus for adjusting plating solution flow characteristics at substrate cathode periphery to minimize edge effect
JPH0453803A (ja) * 1990-06-20 1992-02-21 Japan Synthetic Rubber Co Ltd ポリマーエマルジョンの製造方法
US5200049A (en) * 1990-08-10 1993-04-06 Viratec Thin Films, Inc. Cantilever mount for rotating cylindrical magnetrons
US5199483A (en) * 1991-05-15 1993-04-06 Applied Materials, Inc. Method and apparatus for cooling wafers
US5242860A (en) * 1991-07-24 1993-09-07 Applied Materials, Inc. Method for the formation of tin barrier layer with preferential (111) crystallographic orientation
US5198089A (en) * 1991-10-29 1993-03-30 National Semiconductor Corporation Plating tank
US5315473A (en) * 1992-01-21 1994-05-24 Applied Materials, Inc. Isolated electrostatic chuck and excitation method
KR100302012B1 (ko) * 1992-11-06 2001-11-30 조셉 제이. 스위니 미소-환경 콘테이너 연결방법 및 미소-환경 로드 로크
US5387067A (en) * 1993-01-14 1995-02-07 Applied Materials, Inc. Direct load/unload semiconductor wafer cassette apparatus and transfer system
JP2875945B2 (ja) * 1993-01-28 1999-03-31 アプライド マテリアルズ インコーポレイテッド Ｃｖｄにより大面積のガラス基板上に高堆積速度でシリコン窒化薄膜を堆積する方法
US5607009A (en) * 1993-01-28 1997-03-04 Applied Materials, Inc. Method of heating and cooling large area substrates and apparatus therefor
DE69304038T2 (de) * 1993-01-28 1996-12-19 Applied Materials Inc Vorrichtung für ein Vakuumverfahren mit verbessertem Durchsatz
DE59406900D1 (de) * 1993-02-08 1998-10-22 Sez Semiconduct Equip Zubehoer Träger für scheibenförmige Gegenstände
DE59407361D1 (de) * 1993-02-08 1999-01-14 Sez Semiconduct Equip Zubehoer Träger für scheibenförmige Gegenstände
US5630916A (en) * 1993-03-02 1997-05-20 Cvc Products, Inc. Magnetic orienting device for thin film deposition and method of use
US5403459A (en) * 1993-05-17 1995-04-04 Applied Materials, Inc. Cleaning of a PVD chamber containing a collimator
US5377816A (en) * 1993-07-15 1995-01-03 Materials Research Corp. Spiral magnetic linear translating mechanism
US5427666A (en) * 1993-09-09 1995-06-27 Applied Materials, Inc. Method for in-situ cleaning a Ti target in a Ti + TiN coating process
US5747360A (en) * 1993-09-17 1998-05-05 Applied Materials, Inc. Method of metalizing a semiconductor wafer
US5538390A (en) * 1993-10-29 1996-07-23 Applied Materials, Inc. Enclosure for load lock interface
US5851602A (en) * 1993-12-09 1998-12-22 Applied Materials, Inc. Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors
US5563798A (en) * 1994-04-05 1996-10-08 Applied Materials, Inc. Wafer positioning system
EP0757844A1 (en) * 1994-04-28 1997-02-12 Semitool, Inc. Semiconductor processing systems
US5618338A (en) * 1994-07-08 1997-04-08 Canon Kabushiki Kaisha Liquid composition, ink set and image-forming method and apparatus which employ the same
US5514258A (en) * 1994-08-18 1996-05-07 Brinket; Oscar J. Substrate plating device having laminar flow
US5730801A (en) * 1994-08-23 1998-03-24 Applied Materials, Inc. Compartnetalized substrate processing chamber
US5516412A (en) * 1995-05-16 1996-05-14 International Business Machines Corporation Vertical paddle plating cell
US5871588A (en) * 1995-07-10 1999-02-16 Cvc, Inc. Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment
GB2319262B (en) * 1995-07-10 1999-02-24 Cvc Products Inc Permanent magnet array apparatus and method
WO1997003456A1 (de) * 1995-07-12 1997-01-30 Sez Semiconductor-Equipment Zubehör Für Die Halbleiterfertigung Gesellschaft Mbh Träger für scheibenförmige gegenstände, insbesondere siliziumscheiben
US5756573A (en) * 1995-10-05 1998-05-26 Sc Johnson Commerical Markets, Inc. Seed polymerized latex polymer having a gradient polymeric morphology and process for preparing the same
US6024526A (en) * 1995-10-20 2000-02-15 Aesop, Inc. Integrated prober, handler and tester for semiconductor components
US5597460A (en) * 1995-11-13 1997-01-28 Reynolds Tech Fabricators, Inc. Plating cell having laminar flow sparger
US5746460A (en) * 1995-12-08 1998-05-05 Applied Materials, Inc. End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector
JPH1064902A (ja) * 1996-07-12 1998-03-06 Applied Materials Inc アルミニウム材料の成膜方法及び成膜装置
US6048154A (en) * 1996-10-02 2000-04-11 Applied Materials, Inc. High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock
US5865894A (en) * 1997-06-11 1999-02-02 Reynolds Tech Fabricators, Inc. Megasonic plating system
US5855681A (en) * 1996-11-18 1999-01-05 Applied Materials, Inc. Ultra high throughput wafer vacuum processing system
US5905302A (en) * 1996-11-18 1999-05-18 Applied Materials, Inc. Loadlock cassette with wafer support rails
AT407312B (de) * 1996-11-20 2001-02-26 Sez Semiconduct Equip Zubehoer Rotierbarer träger für kreisrunde, scheibenförmige gegenstände, insbesondere halbleiterwafer oder -substrate
US5861086A (en) * 1997-03-10 1999-01-19 Applied Materials, Inc. Method and apparatus for sputter etch conditioning a ceramic body
JP3462970B2 (ja) * 1997-04-28 2003-11-05 三菱電機株式会社 メッキ処理装置およびメッキ処理方法
DE19721691A1 (de) * 1997-05-23 1998-11-26 Basf Ag Klebstoffe auf Basis einer wässrigen Polymerdispersion, Verfahren zu ihrer Herstellung und ihre Verwendung
US5893966A (en) * 1997-07-28 1999-04-13 Micron Technology, Inc. Method and apparatus for continuous processing of semiconductor wafers
US6017437A (en) * 1997-08-22 2000-01-25 Cutek Research, Inc. Process chamber and method for depositing and/or removing material on a substrate
US6027631A (en) * 1997-11-13 2000-02-22 Novellus Systems, Inc. Electroplating system with shields for varying thickness profile of deposited layer
US6179983B1 (en) * 1997-11-13 2001-01-30 Novellus Systems, Inc. Method and apparatus for treating surface including virtual anode
US6159354A (en) * 1997-11-13 2000-12-12 Novellus Systems, Inc. Electric potential shaping method for electroplating
JPH11160356A (ja) * 1997-11-25 1999-06-18 Matsushita Electric Ind Co Ltd ウェハ一括型測定検査用プローブカードおよびセラミック多層配線基板ならびにそれらの製造方法
US6197181B1 (en) * 1998-03-20 2001-03-06 Semitool, Inc. Apparatus and method for electrolytically depositing a metal on a microelectronic workpiece
US6198616B1 (en) * 1998-04-03 2001-03-06 Applied Materials, Inc. Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing system
JP2886157B1 (ja) * 1998-04-03 1999-04-26 日本エレクトロプレイテイング・エンジニヤース株式会社 カップ式めっき方法及びそれに用いる清浄装置
DE19822790A1 (de) * 1998-05-20 1999-11-25 Basf Ag Wässrige Zubereitungen
US6022465A (en) * 1998-06-01 2000-02-08 Cutek Research, Inc. Apparatus and method utilizing an electrode adapter for customized contact placement on a wafer
US6099702A (en) * 1998-06-10 2000-08-08 Novellus Systems, Inc. Electroplating chamber with rotatable wafer holder and pre-wetting and rinsing capability
US6228232B1 (en) * 1998-07-09 2001-05-08 Semitool, Inc. Reactor vessel having improved cup anode and conductor assembly
US6161311A (en) * 1998-07-10 2000-12-19 Asm America, Inc. System and method for reducing particles in epitaxial reactors
KR100286471B1 (ko) * 1998-08-25 2001-04-16 김충세 중공구조를 갖는 유화 중합체 및 그 제조방법
US6217272B1 (en) * 1998-10-01 2001-04-17 Applied Science And Technology, Inc. In-line sputter deposition system
US6234788B1 (en) * 1998-11-05 2001-05-22 Applied Science And Technology, Inc. Disk furnace for thermal processing
US6228233B1 (en) * 1998-11-30 2001-05-08 Applied Materials, Inc. Inflatable compliant bladder assembly
AU2212200A (en) * 1998-12-23 2000-07-12 Applied Science And Technology, Inc. Permanent magnet ecr plasma source with integrated multipolar magnetic confinement
US6167893B1 (en) * 1999-02-09 2001-01-02 Novellus Systems, Inc. Dynamic chuck for semiconductor wafer or other substrate
US6174011B1 (en) * 1999-04-14 2001-01-16 Arthur Keigler Method of and apparatus for handling thin and flat workpieces and the like
US6236555B1 (en) * 1999-04-19 2001-05-22 Applied Materials, Inc. Method for rapidly dechucking a semiconductor wafer from an electrostatic chuck utilizing a hysteretic discharge cycle
US6337359B1 (en) * 1999-08-05 2002-01-08 Gencorp Inc. Latex binder for nonwoven fibers and article made therewith
US6682288B2 (en) * 2000-07-27 2004-01-27 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
US6530733B2 (en) * 2000-07-27 2003-03-11 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
DE10129537A1 (de) * 2001-06-21 2003-01-09 Basf Ag Verfahren zur Herstellung einer wässrigen Dispersion von aus Polymerisat und feinteiligem anorganischem Feststoff aufgebauten Partikeln
US20030125459A1 (en) * 2001-12-27 2003-07-03 Basf Akiengesellschaft Aqueous polymer dispersions, their preparation and use

Also Published As

Publication number Publication date
PL362732A1 (en) 2004-04-19
EP1408059A1 (en) 2004-04-14
DK1408059T3 (da) 2014-07-28
ES2466378T3 (es) 2014-06-10
JP2004131734A (ja) 2004-04-30
CN1290878C (zh) 2006-12-20
CN1496998A (zh) 2004-05-19
BR0304732B1 (pt) 2013-07-16
CA2444428A1 (en) 2004-04-09
PL209103B1 (pl) 2011-07-29
ZA200307846B (en) 2004-07-06
US7101927B2 (en) 2006-09-05
EP1408059B1 (en) 2014-04-23
US20040072945A1 (en) 2004-04-15
CA2444428C (en) 2012-12-11
DE10247051A1 (de) 2004-04-22
JP4363946B2 (ja) 2009-11-11

Similar Documents

Publication Publication Date Title
BRPI0410177A (pt) métodos de distribuir um ingrediente
BRPI0410439A (pt) compostos e composições imunossupressoras
BR0317392A (pt) Formulação não-higroscópica incluindo uma droga higroscópica
BRPI0406427A (pt) Processo para a preparação de roflumilast
BRPI0501450A (pt) Composição funcional, e, artigo
NO975598L (no) Monoklonale ape-antistoffer som er spesifikke for primatiserte humane B7.1- og/eller B7.2-former, samt farmasöytiske sammensetninger
ECSP045081A (es) Derivados de 1,8-naftiridina y su uso para el tratamiento de la diabetes y trastornos relacionados
BRPI0315296B8 (pt) derivados do ciclohexanol espirocíclicos, medicamento incluindo pelo menos um derivado do ciclohexano espirocíclico e uso de um derivado do ciclohexano espirocíclico
ATE362345T1 (de) Haltemechanismen für knochenplattenbefestiger
BRPI0602161A (pt) massa de moldar transparente
BRPI0505747A (pt) confeito congelado e processo de fabricação do mesmo
BR9610502A (pt) Cartão de felicitação ou similar
BRPI0602671A (pt) processo para a preparação de terpolìmeros de nitrila de mooney baixa
BR0304732A (pt) Látex e processos para a sua preparação
BR0316723A (pt) Derivados de anilinopirazol úteis para o tratamento de diabetes
ATE469570T1 (de) Kreatin enthaltende nahrungsmittelzusammensetzungen
BR0113148A (pt) Composições de 2-piridinamina e métodos relacionados
BR0300673A (pt) Método para aprimorar o clareamento da pele
BR0314638A (pt) Equipamento de medição para medir dentaduras e diâmetros em componentes dinamicamente balançados
BRPI0411638A (pt) produto alimentìcio e métodos de preparação de uma formulação
BR0309747A (pt) Método para o tratamento de distúrbios vasculares mediados pelo fator de crescimento vascular endotelial
WO2002046846A3 (en) Analog timepiece having hands-free dial area
EP1563754A3 (en) Bracelet fastening device for watches and jewelry
BR0315967A (pt) Sistema de serviço de certificados de ligação gratuita
WO2003046559A3 (en) Individualization of therapy with antiviral agents

Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 07/10/2003, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 17A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2599 DE 27-10-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.