BR0107792A - Dispositivo composto e processo de manufatura do mesmo - Google Patents

Dispositivo composto e processo de manufatura do mesmo

Info

Publication number
BR0107792A
BR0107792A BR0107792-9A BR0107792A BR0107792A BR 0107792 A BR0107792 A BR 0107792A BR 0107792 A BR0107792 A BR 0107792A BR 0107792 A BR0107792 A BR 0107792A
Authority
BR
Brazil
Prior art keywords
composite device
manufacturing process
mixed film
improved
photocatalytic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
BR0107792-9A
Other languages
English (en)
Inventor
Masakazu Anpo
Masato Takeuchi
Satoru Dohshi
Norihiko Kuzuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murakami Corp
Original Assignee
Murakami Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murakami Corp filed Critical Murakami Corp
Publication of BR0107792A publication Critical patent/BR0107792A/pt
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
    • B01J37/347—Ionic or cathodic spraying; Electric discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/391—Physical properties of the active metal ingredient
    • B01J35/395—Thickness of the active catalytic layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0238—Impregnation, coating or precipitation via the gaseous phase-sublimation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/02—Boron or aluminium; Oxides or hydroxides thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45—Inorganic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/477—Titanium oxide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249987—With nonvoid component of specified composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Composite Materials (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Dispersion Chemistry (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Catalysts (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

"DISPOSITIVO COMPOSTO E PROCESSO DE MANUFATURA DO MESMO". Esta invenção proporciona um dispositivo composto com o qual a reflexão superficial e as cores interferentes podem ser inibidas, o desempenho de decomposição fotocatalítica pode ser aperfeiçoado e a taxa de obtenção de hidrofilia pode ser aperfeiçoada. Um filme misto (14) é depositado sobre a superfície de uma base (12). O filme misto (14) é um filme misto incolor e transparente com uma alta transmitância de luz, feito de uma mistura de óxido de boro e óxido de titânio fotocatalítico.
BR0107792-9A 2000-11-24 2001-11-13 Dispositivo composto e processo de manufatura do mesmo Withdrawn BR0107792A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000357326A JP3802335B2 (ja) 2000-11-24 2000-11-24 複合素子およびその製造方法
PCT/JP2001/009897 WO2002042517A1 (fr) 2000-11-24 2001-11-13 Element composite et procede d'elaboration

Publications (1)

Publication Number Publication Date
BR0107792A true BR0107792A (pt) 2002-10-29

Family

ID=18829416

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0107792-9A Withdrawn BR0107792A (pt) 2000-11-24 2001-11-13 Dispositivo composto e processo de manufatura do mesmo

Country Status (11)

Country Link
US (2) US6878450B2 (pt)
EP (1) EP1340836B1 (pt)
JP (1) JP3802335B2 (pt)
KR (1) KR100510570B1 (pt)
CN (1) CN1245533C (pt)
AU (1) AU2002224035A1 (pt)
BR (1) BR0107792A (pt)
DE (1) DE60143217D1 (pt)
MX (1) MXPA02007211A (pt)
TW (1) TWI294786B (pt)
WO (1) WO2002042517A1 (pt)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020086188A1 (en) * 2000-10-12 2002-07-04 Eugene Halsey Reduced contrast improved transmission conductively coated transparent substrate
FR2855479A1 (fr) * 2003-06-02 2004-12-03 Valeo Systemes Dessuyage Agencement pour le nettoyage d'un panneau vitre par association de revetements photocatalytique et hydrophile
KR100653939B1 (ko) 2003-10-27 2006-12-04 주식회사 씨엔텍 클러스터 이온 증착 공정을 이용한 코팅 방법, 그 코팅방법을 이용한 코팅 장치 및 그 코팅 방법에 의한 결과물
JP2008505842A (ja) 2004-07-12 2008-02-28 日本板硝子株式会社 低保守コーティング
SE534738C2 (sv) 2004-11-11 2011-12-06 Inview Ab Metod och anordning för att skicka ett meddelande genom användande av endast en omkopplare
WO2007121215A1 (en) * 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
CN101657564A (zh) * 2007-02-12 2010-02-24 莲花应用技术有限责任公司 用原子层沉积制备复合材料
WO2009036263A2 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coating technology
JP6450300B2 (ja) * 2015-10-20 2019-01-09 松田産業株式会社 ルテニウムを含む積層めっき被覆材及びその製造方法
EP3541762B1 (en) 2016-11-17 2022-03-02 Cardinal CG Company Static-dissipative coating technology
JP6649915B2 (ja) * 2017-04-21 2020-02-19 松田産業株式会社 ルテニウムを含む積層めっき被覆材
US10286159B2 (en) * 2017-09-07 2019-05-14 URO-1, Inc. Medical injection assemblies for onabotulinumtoxina delivery and methods of use thereof
JP7088082B2 (ja) * 2019-03-04 2022-06-21 信越化学工業株式会社 酸化チタン微粒子混合物、その分散液、光触媒薄膜、光触媒薄膜を表面に有する部材及び酸化チタン微粒子分散液の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0490543A3 (en) * 1990-12-07 1992-09-23 Asaoka, Makiko Titanium-boron-oxide, synthetic materials based thereon and method of preparing the same
US5616532A (en) * 1990-12-14 1997-04-01 E. Heller & Company Photocatalyst-binder compositions
JP2901550B2 (ja) 1996-07-26 1999-06-07 株式会社村上開明堂 防曇素子
JPH10235204A (ja) * 1997-02-27 1998-09-08 Toto Ltd 光触媒性親水性部材
TW375534B (en) * 1997-06-20 1999-12-01 Sumitomo Metal Ind Titanium oxide photocatalyst and producing method
DE19831610A1 (de) * 1997-07-15 1999-01-21 Central Glass Co Ltd Photokatalytischer Glasgegenstand und Verfahren zu seiner Herstellung
EP0924164A3 (en) * 1997-12-18 2000-01-05 Hoya Corporation Methods for producing oxides or composites thereof
AU4931999A (en) * 1998-07-30 2000-02-21 Toto Ltd. Method for producing high-performance material having photocatalytic function and device therefor
JP2000155344A (ja) * 1998-11-20 2000-06-06 Murakami Corp エレクトロクロミック素子

Also Published As

Publication number Publication date
US6878450B2 (en) 2005-04-12
US20030003292A1 (en) 2003-01-02
CN1245533C (zh) 2006-03-15
KR100510570B1 (ko) 2005-08-26
US6787199B2 (en) 2004-09-07
US20030198735A1 (en) 2003-10-23
CN1396964A (zh) 2003-02-12
WO2002042517A1 (fr) 2002-05-30
TWI294786B (en) 2008-03-21
DE60143217D1 (de) 2010-11-18
EP1340836A4 (en) 2005-09-14
EP1340836B1 (en) 2010-10-06
JP3802335B2 (ja) 2006-07-26
EP1340836A1 (en) 2003-09-03
AU2002224035A1 (en) 2002-06-03
MXPA02007211A (es) 2002-12-09
KR20020070347A (ko) 2002-09-05
JP2002161354A (ja) 2002-06-04

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 5A, 6A, 7A E 8A ANUIDADES.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO PUBLICADO NA RPI 1963 DE 19.08.2008.