BE863414A - Compositions de resines organiques durcissables par la lumiere ultra-violette - Google Patents
Compositions de resines organiques durcissables par la lumiere ultra-violetteInfo
- Publication number
- BE863414A BE863414A BE184708A BE184708A BE863414A BE 863414 A BE863414 A BE 863414A BE 184708 A BE184708 A BE 184708A BE 184708 A BE184708 A BE 184708A BE 863414 A BE863414 A BE 863414A
- Authority
- BE
- Belgium
- Prior art keywords
- ultra
- compositions
- violet light
- organic resins
- resins curable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/768,074 US4102687A (en) | 1977-02-14 | 1977-02-14 | UV Curable composition of a thermosetting condensation resin and Group VIa onium salt |
Publications (1)
Publication Number | Publication Date |
---|---|
BE863414A true BE863414A (fr) | 1978-07-27 |
Family
ID=25081445
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE184708A BE863414A (fr) | 1977-02-14 | 1978-01-27 | Compositions de resines organiques durcissables par la lumiere ultra-violette |
Country Status (6)
Country | Link |
---|---|
US (1) | US4102687A (de) |
JP (2) | JPS53108196A (de) |
BE (1) | BE863414A (de) |
DE (1) | DE2805633B2 (de) |
FR (1) | FR2380322A1 (de) |
GB (1) | GB1591556A (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4173476A (en) * | 1978-02-08 | 1979-11-06 | Minnesota Mining And Manufacturing Company | Complex salt photoinitiator |
US4186108A (en) * | 1978-02-08 | 1980-01-29 | Minnesota Mining And Manufacturing Company | Liquid compositions containing triarylsulfonium complex salts and oxyethylene material |
US4216288A (en) * | 1978-09-08 | 1980-08-05 | General Electric Company | Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents |
US4231886A (en) * | 1979-01-29 | 1980-11-04 | Minnesota Mining And Manufacturing Company | Ester solutions of complex salts |
US4230814A (en) * | 1979-02-12 | 1980-10-28 | General Electric Company | Heat curable compositions |
US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
US4306953A (en) * | 1979-11-05 | 1981-12-22 | American Can Company | Cationically polymerizable compositions containing sulfonium salt photoinitiators and stable free radicals as odor suppressants and _method of polymerization using same |
US4339567A (en) * | 1980-03-07 | 1982-07-13 | Ciba-Geigy Corporation | Photopolymerization by means of sulphoxonium salts |
US4383025A (en) * | 1980-07-10 | 1983-05-10 | Ciba-Geigy Corporation | Photopolymerization by means of sulfoxonium salts |
US4398014A (en) * | 1980-11-04 | 1983-08-09 | Ciba-Geigy Corporation | Sulfoxonium salts and their use as polymerization catalysts |
US4510290A (en) * | 1982-01-11 | 1985-04-09 | Ciba Geigy Corporation | Acid-curable composition containing a masked curing catalyst, and a process for the curing thereof |
US4504372A (en) * | 1982-03-12 | 1985-03-12 | Ciba-Geigy Corporation | Acid-curable composition containing a masked curing catalyst, and a process for its preparation |
JPS58151622U (ja) * | 1982-04-02 | 1983-10-11 | 楠絹織株式会社 | 紋付和服仕立用反物 |
JPS58151623U (ja) * | 1982-04-02 | 1983-10-11 | 楠絹織株式会社 | 紋付和服仕立用反物 |
GB2137626B (en) * | 1983-03-31 | 1986-10-15 | Sericol Group Ltd | Water based photopolymerisable compositions and their use |
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
JPS62170572A (ja) * | 1986-01-17 | 1987-07-27 | 有限会社さんきち | 縮緬原反に刺繍を施す方法 |
US4760013A (en) * | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
US4800152A (en) * | 1987-03-16 | 1989-01-24 | International Business Machines Corporation | Negative resist compositions |
IL94474A (en) * | 1989-06-09 | 1993-07-08 | Morton Int Inc | Photoimageable compositions |
US5019481A (en) * | 1989-09-25 | 1991-05-28 | International Business Machines Corporation | Aqueous base developable negative resist compositions |
US5238747A (en) * | 1989-12-29 | 1993-08-24 | The Dow Chemical Company | Photocurable compositions |
US5464538A (en) * | 1989-12-29 | 1995-11-07 | The Dow Chemical Company | Reverse osmosis membrane |
US5310581A (en) * | 1989-12-29 | 1994-05-10 | The Dow Chemical Company | Photocurable compositions |
US5206116A (en) * | 1991-03-04 | 1993-04-27 | Shipley Company Inc. | Light-sensitive composition for use as a soldermask and process |
JPH06126003A (ja) * | 1992-07-13 | 1994-05-10 | Chin-Chei Chen | ゴルフクラブのヘッドの製造方法 |
JPH07140666A (ja) * | 1993-06-04 | 1995-06-02 | Internatl Business Mach Corp <Ibm> | マイクロリトグラフィックレジスト組成物、酸不安定化合物、マイクロリトグラフィックレリーフ画像形成方法及び酸感知性ポリマー組成物 |
EP0889360B1 (de) * | 1997-06-30 | 2002-01-30 | Siemens Aktiengesellschaft | Reaktionsharzmischungen und deren Verwendung |
CA2357001C (en) * | 1998-12-22 | 2009-01-20 | Vantico Ag | Production of photoresist coatings |
EP1277085A4 (de) | 2000-04-17 | 2005-02-23 | Univ Yale | Verfahren zur messung der diffusion eines photochemisch erzeugten katalysators in chemisch verstärkten resisten |
CA2443317C (en) | 2001-03-30 | 2013-06-18 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Materials, methods, and uses for photochemical generation of acids and/or radical species |
US7199192B2 (en) | 2004-12-21 | 2007-04-03 | Callaway Golf Company | Golf ball |
CN108440741B (zh) * | 2018-03-13 | 2020-04-28 | 广东工业大学 | 一种可阳离子光固化脲-异丁醛-甲醛树脂及其制备方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
UST861022I4 (en) | 1968-09-27 | 1969-04-08 | Defensive | |
US3691133A (en) * | 1971-03-25 | 1972-09-12 | Union Carbon Corp | Polyepoxide compositions containing dicyandiamide and an iodonium, phosphonium, or sulfonium salt |
GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
US3843603A (en) * | 1972-10-25 | 1974-10-22 | Howson Algraphy Ltd | Light-sensitive polymeric esters containing azido substituted styryl groups |
US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
US3907706A (en) * | 1973-07-06 | 1975-09-23 | Minnesota Mining & Mfg | Latent catalyst systems for cationically polymerizable materials |
GB1516512A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Chalcogenium salts |
IE42085B1 (en) * | 1974-09-18 | 1980-06-04 | Ici Ltd | Photopolymerisable compositions |
-
1977
- 1977-02-14 US US05/768,074 patent/US4102687A/en not_active Expired - Lifetime
-
1978
- 1978-01-27 BE BE184708A patent/BE863414A/xx not_active IP Right Cessation
- 1978-02-07 FR FR7803327A patent/FR2380322A1/fr active Granted
- 1978-02-07 GB GB4952/78A patent/GB1591556A/en not_active Expired
- 1978-02-10 DE DE2805633A patent/DE2805633B2/de not_active Ceased
- 1978-02-13 JP JP1419778A patent/JPS53108196A/ja active Granted
-
1981
- 1981-05-13 JP JP56070889A patent/JPS5761043A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5761043A (en) | 1982-04-13 |
FR2380322B1 (de) | 1982-01-29 |
JPS53108196A (en) | 1978-09-20 |
DE2805633B2 (de) | 1979-12-06 |
JPS575413B2 (de) | 1982-01-30 |
DE2805633A1 (de) | 1978-08-17 |
FR2380322A1 (fr) | 1978-09-08 |
GB1591556A (en) | 1981-06-24 |
JPS6121570B2 (de) | 1986-05-28 |
US4102687A (en) | 1978-07-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: GENERAL ELECTRIC CY Effective date: 19940131 |