BE850519A - Matiere photopolymerisable - Google Patents

Matiere photopolymerisable

Info

Publication number
BE850519A
BE850519A BE174191A BE174191A BE850519A BE 850519 A BE850519 A BE 850519A BE 174191 A BE174191 A BE 174191A BE 174191 A BE174191 A BE 174191A BE 850519 A BE850519 A BE 850519A
Authority
BE
Belgium
Prior art keywords
photopolymerisable material
photopolymerisable
Prior art date
Application number
BE174191A
Other languages
English (en)
French (fr)
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of BE850519A publication Critical patent/BE850519A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y10T428/31525—Next to glass or quartz
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y10T428/31529—Next to metal
BE174191A 1976-01-23 1977-01-19 Matiere photopolymerisable BE850519A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762602419 DE2602419A1 (de) 1976-01-23 1976-01-23 Photopolymerisierbare masse

Publications (1)

Publication Number Publication Date
BE850519A true BE850519A (fr) 1977-07-19

Family

ID=5968057

Family Applications (1)

Application Number Title Priority Date Filing Date
BE174191A BE850519A (fr) 1976-01-23 1977-01-19 Matiere photopolymerisable

Country Status (8)

Country Link
US (1) US4054682A (de)
JP (1) JPS52104592A (de)
BE (1) BE850519A (de)
DE (1) DE2602419A1 (de)
FR (1) FR2338952A1 (de)
GB (1) GB1566953A (de)
IT (1) IT1067967B (de)
NL (1) NL7700579A (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54130633A (en) * 1978-04-01 1979-10-11 Nippon Synthetic Chem Ind Co Ltd:The Ultraviolet-curing coating composition
US4199420A (en) * 1978-04-06 1980-04-22 Stauffer Chemical Company Alkoxymethylbenzophenones as photoinitiators for photopolymerizable compositions and process based thereon
DE2962781D1 (en) * 1978-05-23 1982-07-01 Ciba Geigy Ag New mercaptophenylketones and their use as initiators for the photopolymerisation of ethylenically unsaturated compounds
DE2923602A1 (de) * 1978-06-23 1980-01-10 Sandoz Ag Verwendung von substituierten alkylarylsulfoxiden und phenylarylsulfoxiden als photoinitiatoren
EP0051329B1 (de) * 1980-11-05 1984-11-28 Akzo N.V. Photopolymerisierbare Zusammensetzung, Mischung von Photoinitiatoren und Härtungsverfahren
JPS6049038A (ja) * 1983-08-29 1985-03-18 Toyobo Co Ltd ナイロンレンズ表面硬化剤
DE3331157A1 (de) * 1983-08-30 1985-03-14 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischungen, enthaltend tertiaere amine als photoaktivatoren
DE3505998A1 (de) * 1985-02-21 1986-08-21 Merck Patent Gmbh, 6100 Darmstadt Verwendung thiosubstituierter ketone als photoinitiatoren
JP2622113B2 (ja) * 1986-12-02 1997-06-18 キヤノン 株式会社 転写記録媒体及び画像記録方法
DE3710281A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US4753965A (en) * 1987-04-09 1988-06-28 Merrell Dow Pharmaceuticals, Inc. Method of treating multiple sclerosis with chalcone derivatives
US4863968A (en) * 1987-04-09 1989-09-05 Merrell Dow Pharmaceuticals Inc. Methods of treating gout with chalcone derivatives
US4904697A (en) * 1987-04-09 1990-02-27 Merrell Dow Pharmaceuticals Inc. Controlling the growth of certain tumor tissue with chalcone derivatives
DE3738864A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
DE3743457A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743454A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743455A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3824903A1 (de) * 1988-07-22 1990-02-01 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH0497152A (ja) * 1990-08-09 1992-03-30 Kansai Paint Co Ltd 光重合性組成物からパターンを形成する方法
CA2479942A1 (en) * 2002-04-26 2003-11-06 Albemarle Corporation A new class of amine coinitiators in photoinitiated polymerizations
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
US7157535B2 (en) * 2002-06-19 2007-01-02 National Starch And Chemical Investment Holding Corporation Polymeric photoinitiators
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
US10316024B2 (en) * 2014-08-05 2019-06-11 Miyoshi Oil & Fat Co., Ltd. Additive for imparting ultraviolet absorbency and/or high refractive index to matrix, and resin member using same
EP3656824A1 (de) * 2018-11-26 2020-05-27 Agfa-Gevaert Nv Strahlungshärtbare strahltinte zur herstellung von leiterplatten
WO2023190767A1 (ja) * 2022-03-29 2023-10-05 国立研究開発法人産業技術総合研究所 ポリエーテルエーテルケトン分解方法およびこの分解方法によって得られた分解生成物を原料とした新規物質

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES366028A1 (es) * 1968-04-16 1971-02-16 Bayer Ag Procedimiento para la preparacion de masas moldeables y de revestimiento.
DE2155000A1 (de) * 1971-11-05 1973-05-10 Bayer Ag Thiomethylierte benzophenone
US3827959A (en) * 1973-01-12 1974-08-06 Scm Corp Process for photopolymerization with carbonylated phenyl nuclear sulfonyl chloride sensitizer

Also Published As

Publication number Publication date
FR2338952A1 (fr) 1977-08-19
IT1067967B (it) 1985-03-21
DE2602419A1 (de) 1977-07-28
NL7700579A (nl) 1977-07-26
JPS52104592A (en) 1977-09-02
US4054682A (en) 1977-10-18
GB1566953A (en) 1980-05-08
FR2338952B3 (de) 1979-09-21

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: BASF A.G.

Effective date: 19850119