BE818885A - Procede pour realiser un dispositif a deplacement de charges dans la technique a deux phases - Google Patents
Procede pour realiser un dispositif a deplacement de charges dans la technique a deux phasesInfo
- Publication number
- BE818885A BE818885A BE147640A BE147640A BE818885A BE 818885 A BE818885 A BE 818885A BE 147640 A BE147640 A BE 147640A BE 147640 A BE147640 A BE 147640A BE 818885 A BE818885 A BE 818885A
- Authority
- BE
- Belgium
- Prior art keywords
- making
- shifting device
- load shifting
- phase technique
- technique
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D44/00—Charge transfer devices
- H10D44/40—Charge-coupled devices [CCD]
- H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes
- H10D44/472—Surface-channel CCD
- H10D44/474—Two-phase CCD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D44/00—Charge transfer devices
- H10D44/40—Charge-coupled devices [CCD]
- H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/335—Channel regions of field-effect devices of charge-coupled devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/143—Shadow masking
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2341154A DE2341154C2 (de) | 1973-08-14 | 1973-08-14 | Verfahren zur Herstellung einer Zweiphasen-Ladungsverschiebeanordnung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE818885A true BE818885A (fr) | 1974-12-02 |
Family
ID=5889756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE147640A BE818885A (fr) | 1973-08-14 | 1974-08-14 | Procede pour realiser un dispositif a deplacement de charges dans la technique a deux phases |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US3908262A (cs) |
| JP (1) | JPS5051277A (cs) |
| AT (1) | AT341580B (cs) |
| BE (1) | BE818885A (cs) |
| CA (1) | CA1001775A (cs) |
| CH (1) | CH573662A5 (cs) |
| DE (1) | DE2341154C2 (cs) |
| DK (1) | DK139369C (cs) |
| FR (1) | FR2241142B1 (cs) |
| GB (1) | GB1444452A (cs) |
| IE (1) | IE39610B1 (cs) |
| IT (1) | IT1019904B (cs) |
| LU (1) | LU70712A1 (cs) |
| NL (1) | NL7410201A (cs) |
| SE (1) | SE394766B (cs) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1534896A (en) * | 1975-05-19 | 1978-12-06 | Itt | Direct metal contact to buried layer |
| US4035906A (en) * | 1975-07-23 | 1977-07-19 | Texas Instruments Incorporated | Silicon gate CCD structure |
| US4027382A (en) * | 1975-07-23 | 1977-06-07 | Texas Instruments Incorporated | Silicon gate CCD structure |
| US4060427A (en) * | 1976-04-05 | 1977-11-29 | Ibm Corporation | Method of forming an integrated circuit region through the combination of ion implantation and diffusion steps |
| US4167017A (en) * | 1976-06-01 | 1979-09-04 | Texas Instruments Incorporated | CCD structures with surface potential asymmetry beneath the phase electrodes |
| US4182023A (en) * | 1977-10-21 | 1980-01-08 | Ncr Corporation | Process for minimum overlap silicon gate devices |
| US4525919A (en) * | 1982-06-16 | 1985-07-02 | Raytheon Company | Forming sub-micron electrodes by oblique deposition |
| FR2571177B1 (fr) * | 1984-10-02 | 1987-02-27 | Thomson Csf | Procede de realisation de grilles en siliciure ou en silicium pour circuit integre comportant des elements du type grille - isolant - semi-conducteur |
| WO1987001507A1 (en) * | 1985-08-27 | 1987-03-12 | Lockheed Missiles & Space Company, Inc. | Gate alignment procedure in fabricating semiconductor devices |
| NL8502765A (nl) * | 1985-10-10 | 1987-05-04 | Philips Nv | Werkwijze ter vervaardiging van een halfgeleiderinrichting. |
| JPH0834194B2 (ja) * | 1989-06-30 | 1996-03-29 | 松下電器産業株式会社 | イオン注入方法及び本方法を用いた半導体装置の製造方法 |
| KR940010932B1 (ko) * | 1991-12-23 | 1994-11-19 | 금성일렉트론주식회사 | Ccd영상소자 제조방법 |
| US5290358A (en) * | 1992-09-30 | 1994-03-01 | International Business Machines Corporation | Apparatus for directional low pressure chemical vapor deposition (DLPCVD) |
| US5328854A (en) * | 1993-03-31 | 1994-07-12 | At&T Bell Laboratories | Fabrication of electronic devices with an internal window |
| IL106892A0 (en) * | 1993-09-02 | 1993-12-28 | Pierre Badehi | Methods and apparatus for producing integrated circuit devices |
| IL108359A (en) * | 1994-01-17 | 2001-04-30 | Shellcase Ltd | Method and apparatus for producing integrated circuit devices |
| US5444007A (en) * | 1994-08-03 | 1995-08-22 | Kabushiki Kaisha Toshiba | Formation of trenches having different profiles |
| US5668018A (en) * | 1995-06-07 | 1997-09-16 | International Business Machines Corporation | Method for defining a region on a wall of a semiconductor structure |
| GB9512089D0 (en) * | 1995-06-14 | 1995-08-09 | Evans Jonathan L | Semiconductor device fabrication |
| JP2965061B2 (ja) * | 1996-04-19 | 1999-10-18 | 日本電気株式会社 | 電荷結合素子およびその製造方法 |
| DE10115912A1 (de) * | 2001-03-30 | 2002-10-17 | Infineon Technologies Ag | Verfahren zur Herstellung einer Halbleiteranordnung und Verwendung einer Ionenstrahlanlage zur Durchführung des Verfahrens |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2666814A (en) * | 1949-04-27 | 1954-01-19 | Bell Telephone Labor Inc | Semiconductor translating device |
| GB1355806A (en) * | 1970-12-09 | 1974-06-05 | Mullard Ltd | Methods of manufacturing a semiconductor device |
| US3796932A (en) * | 1971-06-28 | 1974-03-12 | Bell Telephone Labor Inc | Charge coupled devices employing nonuniform concentrations of immobile charge along the information channel |
| US3851379A (en) * | 1973-05-16 | 1974-12-03 | Westinghouse Electric Corp | Solid state components |
-
1973
- 1973-08-14 DE DE2341154A patent/DE2341154C2/de not_active Expired
-
1974
- 1974-07-15 IE IE1488/74A patent/IE39610B1/xx unknown
- 1974-07-17 GB GB3156074A patent/GB1444452A/en not_active Expired
- 1974-07-29 NL NL7410201A patent/NL7410201A/xx not_active Application Discontinuation
- 1974-07-31 US US493267A patent/US3908262A/en not_active Expired - Lifetime
- 1974-08-01 FR FR7426755A patent/FR2241142B1/fr not_active Expired
- 1974-08-01 AT AT631774A patent/AT341580B/de not_active IP Right Cessation
- 1974-08-06 CH CH1072574A patent/CH573662A5/xx not_active IP Right Cessation
- 1974-08-08 SE SE7410186A patent/SE394766B/xx unknown
- 1974-08-12 LU LU70712A patent/LU70712A1/xx unknown
- 1974-08-13 CA CA206,899A patent/CA1001775A/en not_active Expired
- 1974-08-13 IT IT26267/74A patent/IT1019904B/it active
- 1974-08-13 DK DK430874A patent/DK139369C/da active
- 1974-08-14 BE BE147640A patent/BE818885A/xx unknown
- 1974-08-14 JP JP49093190A patent/JPS5051277A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CH573662A5 (cs) | 1976-03-15 |
| DE2341154C2 (de) | 1975-06-26 |
| DK139369B (da) | 1979-02-05 |
| IE39610L (en) | 1975-02-14 |
| ATA631774A (de) | 1977-06-15 |
| IE39610B1 (en) | 1978-11-22 |
| DE2341154B1 (de) | 1974-11-07 |
| NL7410201A (nl) | 1975-02-18 |
| GB1444452A (en) | 1976-07-28 |
| DK139369C (da) | 1979-08-20 |
| FR2241142A1 (cs) | 1975-03-14 |
| SE7410186L (cs) | 1975-02-17 |
| DK430874A (cs) | 1975-04-14 |
| IT1019904B (it) | 1977-11-30 |
| SE394766B (sv) | 1977-07-04 |
| US3908262A (en) | 1975-09-30 |
| JPS5051277A (cs) | 1975-05-08 |
| LU70712A1 (cs) | 1974-12-10 |
| FR2241142B1 (cs) | 1977-10-14 |
| AT341580B (de) | 1978-02-10 |
| CA1001775A (en) | 1976-12-14 |
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