BE816632R - Couches d'aluminium-tantale pour montages a couche minces - Google Patents

Couches d'aluminium-tantale pour montages a couche minces

Info

Publication number
BE816632R
BE816632R BE145686A BE145686A BE816632R BE 816632 R BE816632 R BE 816632R BE 145686 A BE145686 A BE 145686A BE 145686 A BE145686 A BE 145686A BE 816632 R BE816632 R BE 816632R
Authority
BE
Belgium
Prior art keywords
aluminum
thin layer
tantalum layers
layer mounts
mounts
Prior art date
Application number
BE145686A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732331586 external-priority patent/DE2331586C3/de
Application filed filed Critical
Application granted granted Critical
Publication of BE816632R publication Critical patent/BE816632R/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
    • H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Multi-Conductor Connections (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
BE145686A 1973-06-20 1974-06-20 Couches d'aluminium-tantale pour montages a couche minces BE816632R (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732331586 DE2331586C3 (de) 1973-06-20 Aluminium-Tantal-Schichten für Dünnschichtschaltungen sowie diskrete Widerstände und Kondensatoren

Publications (1)

Publication Number Publication Date
BE816632R true BE816632R (fr) 1974-10-16

Family

ID=5884643

Family Applications (1)

Application Number Title Priority Date Filing Date
BE145686A BE816632R (fr) 1973-06-20 1974-06-20 Couches d'aluminium-tantale pour montages a couche minces

Country Status (17)

Country Link
US (1) US3949275A (no)
JP (1) JPS5346266B2 (no)
AT (1) AT342733B (no)
BE (1) BE816632R (no)
CA (1) CA1007382A (no)
CH (1) CH574200A5 (no)
DK (1) DK143084C (no)
FR (1) FR2234638B2 (no)
GB (1) GB1424980A (no)
IE (1) IE39514B1 (no)
IL (1) IL45045A (no)
IT (1) IT1019657B (no)
LU (1) LU70349A1 (no)
NL (1) NL7408158A (no)
NO (1) NO139021C (no)
SE (1) SE405052B (no)
YU (2) YU40428B (no)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51108469A (ja) * 1975-03-19 1976-09-25 Hitachi Metals Ltd Gokanchoryukonbeya
US4445274A (en) * 1977-12-23 1984-05-01 Ngk Insulators, Ltd. Method of manufacturing a ceramic structural body
DE2823881C3 (de) * 1978-05-31 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von elektrischen Dünnschichtschaltungen für die Herstellung integrierter Leiterbahnüberkreuzungen
DE2906813C2 (de) * 1979-02-22 1982-06-03 Robert Bosch Gmbh, 7000 Stuttgart Elektronische Dünnschichtschaltung
US4200502A (en) * 1979-03-12 1980-04-29 Siemens Aktiengesellschaft Method for producing an electrical thin layer circuit
US4654680A (en) * 1980-09-24 1987-03-31 Semiconductor Energy Laboratory Co., Ltd. Sidewall gate IGFET
DE3480243D1 (en) * 1983-03-31 1989-11-23 Matsushita Electric Ind Co Ltd Method of manufacturing thin-film integrated devices
JPS6045008A (ja) * 1983-08-22 1985-03-11 松下電器産業株式会社 薄膜コンデンサの製造方法
JPS60147462U (ja) * 1984-03-13 1985-09-30 長谷川化学工業株式会社 竹刀
JP3411983B2 (ja) * 1989-02-28 2003-06-03 キヤノン株式会社 Ｉｒ、Ｔａ及びＡｌを含有する非単結晶質物質
US5027253A (en) * 1990-04-09 1991-06-25 Ibm Corporation Printed circuit boards and cards having buried thin film capacitors and processing techniques for fabricating said boards and cards
US5419787A (en) * 1994-06-24 1995-05-30 The United States Of America As Represented By The Secretary Of The Air Force Stress reduced insulator
KR100206621B1 (ko) * 1994-08-26 1999-07-01 사토 게니치로 칩형 후막 콘덴서 및 그의 제조 방법
US5598131A (en) * 1995-11-16 1997-01-28 Emc Technology, Inc. AC coupled termination
US5977582A (en) * 1997-05-23 1999-11-02 Lucent Technologies Inc. Capacitor comprising improved TaOx -based dielectric
KR100359860B1 (ko) * 1998-12-31 2003-02-20 주식회사 하이닉스반도체 반도체 소자의 캐패시터 형성방법
DE19902865A1 (de) * 1999-01-25 2000-07-27 Philips Corp Intellectual Pty Zero-IF-Konverter mit RC-Filter
US6278356B1 (en) * 2000-05-17 2001-08-21 Compeq Manufacturing Company Limited Flat, built-in resistors and capacitors for a printed circuit board
DE10039710B4 (de) * 2000-08-14 2017-06-22 United Monolithic Semiconductors Gmbh Verfahren zur Herstellung passiver Bauelemente auf einem Halbleitersubstrat

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2179960A (en) * 1931-11-28 1939-11-14 Schwarzkopf Paul Agglomerated material in particular for electrical purposes and shaped bodies made therefrom
US3217209A (en) * 1960-05-12 1965-11-09 Xerox Corp Printed circuits with resistive and capacitive elements
US3386011A (en) * 1962-10-23 1968-05-28 Philco Ford Corp Thin-film rc circuits on single substrate
US3172196A (en) * 1963-01-22 1965-03-09 Brush Beryllium Co Sintered intermetallic compoundcomposition bodies
US3198628A (en) * 1963-06-13 1965-08-03 Dow Chemical Co Uranium-tantalum-aluminum alloy
US3406043A (en) * 1964-11-09 1968-10-15 Western Electric Co Integrated circuit containing multilayer tantalum compounds
US3387952A (en) * 1964-11-09 1968-06-11 Western Electric Co Multilayer thin-film coated substrate with metallic parting layer to permit selectiveequential etching
US3423821A (en) * 1965-03-18 1969-01-28 Hitachi Ltd Method of producing thin film integrated circuits
FR1537897A (fr) * 1967-07-19 1968-08-30 Europ Composants Electron Procédé de fabrication de circuits électriques en couches minces
US3616282A (en) * 1968-11-14 1971-10-26 Hewlett Packard Co Method of producing thin-film circuit elements
US3607679A (en) * 1969-05-05 1971-09-21 Bell Telephone Labor Inc Method for the fabrication of discrete rc structure
US3718565A (en) * 1970-11-27 1973-02-27 Bell Telephone Labor Inc Technique for the fabrication of discrete rc structure
US3781610A (en) * 1972-05-22 1973-12-25 G Bodway Thin film circuits and method for manufacture

Also Published As

Publication number Publication date
US3949275A (en) 1976-04-06
YU173274A (en) 1982-02-28
CA1007382A (en) 1977-03-22
DK325474A (no) 1975-02-17
YU286980A (en) 1982-10-31
IE39514L (en) 1974-12-20
JPS5032474A (no) 1975-03-29
SE7407961L (no) 1974-12-23
AT342733B (de) 1978-04-25
GB1424980A (en) 1976-02-11
JPS5346266B2 (no) 1978-12-12
FR2234638B2 (no) 1978-08-04
IL45045A0 (en) 1974-09-10
DK143084C (da) 1981-10-26
IL45045A (en) 1977-04-29
AU7019474A (en) 1975-12-18
DE2331586B2 (de) 1976-11-25
NO742086L (no) 1975-01-13
IE39514B1 (en) 1978-10-25
DK143084B (da) 1981-03-23
NL7408158A (no) 1974-12-24
NO139021B (no) 1978-09-11
SE405052B (sv) 1978-11-13
CH574200A5 (no) 1976-03-31
LU70349A1 (no) 1974-10-17
IT1019657B (it) 1977-11-30
NO139021C (no) 1978-12-20
FR2234638A2 (no) 1975-01-17
ATA476974A (de) 1977-08-15
YU40428B (en) 1986-02-28
DE2331586A1 (de) 1975-01-09

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: SIEMENS A.G.

Effective date: 19881031