BE778333A - Element photodurcissable composite pour formation de masques - Google Patents

Element photodurcissable composite pour formation de masques

Info

Publication number
BE778333A
BE778333A BE778333A BE778333A BE778333A BE 778333 A BE778333 A BE 778333A BE 778333 A BE778333 A BE 778333A BE 778333 A BE778333 A BE 778333A BE 778333 A BE778333 A BE 778333A
Authority
BE
Belgium
Prior art keywords
mask formation
composite curing
curing element
composite
mask
Prior art date
Application number
BE778333A
Other languages
English (en)
French (fr)
Inventor
L Roos
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of BE778333A publication Critical patent/BE778333A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/10—Organic substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
BE778333A 1971-01-21 1972-01-21 Element photodurcissable composite pour formation de masques BE778333A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10857771A 1971-01-21 1971-01-21
US20061171A 1971-11-19 1971-11-19

Publications (1)

Publication Number Publication Date
BE778333A true BE778333A (fr) 1972-07-24

Family

ID=26806041

Family Applications (1)

Application Number Title Priority Date Filing Date
BE778333A BE778333A (fr) 1971-01-21 1972-01-21 Element photodurcissable composite pour formation de masques

Country Status (6)

Country Link
BE (1) BE778333A (cs)
CA (1) CA993709A (cs)
DE (1) DE2202360C3 (cs)
FR (1) FR2122578B1 (cs)
GB (1) GB1385241A (cs)
NL (1) NL173790C (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2623925C2 (de) * 1975-06-03 1985-02-14 E.I. Du Pont De Nemours And Co., Wilmington, Del. Bildreproduktionsverfahren
DE2660921C3 (de) * 1975-11-17 1987-07-30 E.I. Du Pont De Nemours And Co., Wilmington, Del. Verfahren zur Herstellung von punktgeätzten Masken
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
DE2721687C2 (de) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Verfahren zum Abdecken von Kopiervorlagen mit Masken
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
JPS5420719A (en) 1977-07-15 1979-02-16 Fuji Photo Film Co Ltd Photosensitive material for image formation and image formation method
EP0036221B1 (en) * 1980-02-20 1984-03-14 Agfa-Gevaert N.V. Photosensitive material and a process for reproducing photo-information
JPS5962859A (ja) * 1982-10-04 1984-04-10 Fuji Photo Film Co Ltd 感光性平版印刷版の製版方法
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
GB8414867D0 (en) * 1984-06-11 1984-07-18 Minnesota Mining & Mfg Pre-press proofing system
ES2060579T3 (es) * 1985-12-09 1994-12-01 Nippon Paint Co Ltd Material de impresion a base de resina fotosensible.
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
EP0266069A3 (en) * 1986-10-01 1988-09-21 Napp Systems (Usa) Inc. Photopolymerizable composition useful for printing plates
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP2003502449A (ja) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
CN1318774A (zh) * 2000-04-18 2001-10-24 富士胶片株式会社 光敏影像记录材料
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element

Also Published As

Publication number Publication date
NL173790C (nl) 1984-03-01
NL173790B (nl) 1983-10-03
FR2122578B1 (cs) 1977-09-02
DE2202360B2 (de) 1979-08-02
GB1385241A (en) 1975-02-26
DE2202360C3 (de) 1980-04-10
CA993709A (en) 1976-07-27
DE2202360A1 (de) 1973-05-17
FR2122578A1 (cs) 1972-09-01
NL7200858A (nl) 1972-07-25

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: E.I. DU PONT DE NEMOURS AND CY

Effective date: 19920121