BE776319A - Dispositif semiconducteur et procede permettant sa fabrication - Google Patents
Dispositif semiconducteur et procede permettant sa fabricationInfo
- Publication number
- BE776319A BE776319A BE776319A BE776319A BE776319A BE 776319 A BE776319 A BE 776319A BE 776319 A BE776319 A BE 776319A BE 776319 A BE776319 A BE 776319A BE 776319 A BE776319 A BE 776319A
- Authority
- BE
- Belgium
- Prior art keywords
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
- H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
- H01L27/0727—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors
- H01L27/0738—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors in combination with resistors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/904—Charge carrier lifetime control
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Ceramic Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3512271 | 1971-07-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE776319A true BE776319A (fr) | 1972-06-06 |
Family
ID=10374091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE776319A BE776319A (fr) | 1971-07-27 | 1971-12-06 | Dispositif semiconducteur et procede permettant sa fabrication |
Country Status (11)
Country | Link |
---|---|
US (1) | US3969744A (fr) |
JP (1) | JPS5121750B1 (fr) |
BE (1) | BE776319A (fr) |
CA (1) | CA933671A (fr) |
CH (1) | CH544410A (fr) |
DE (1) | DE2160462C2 (fr) |
FR (1) | FR2147016B1 (fr) |
GB (1) | GB1345818A (fr) |
IT (1) | IT943189B (fr) |
NL (1) | NL161922C (fr) |
SE (1) | SE377862B (fr) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4053925A (en) * | 1975-08-07 | 1977-10-11 | Ibm Corporation | Method and structure for controllng carrier lifetime in semiconductor devices |
DE2537559C3 (de) * | 1975-08-22 | 1978-05-03 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung einer monolithisch integrierten Halbleiterschaltung mit einem Junction-Feldeffekttransistor und einem komplementären MIS-Feldeffekttransistor |
US4080718A (en) * | 1976-12-14 | 1978-03-28 | Smc Standard Microsystems Corporation | Method of modifying electrical characteristics of MOS devices using ion implantation |
US4257826A (en) * | 1979-10-11 | 1981-03-24 | Texas Instruments Incorporated | Photoresist masking in manufacture of semiconductor device |
JPS5812493A (ja) * | 1981-07-14 | 1983-01-24 | Matsushita Electric Ind Co Ltd | カラ−テレビジヨンカメラ |
US4391651A (en) * | 1981-10-15 | 1983-07-05 | The United States Of America As Represented By The Secretary Of The Navy | Method of forming a hyperabrupt interface in a GaAs substrate |
JPS5869124A (ja) * | 1981-10-20 | 1983-04-25 | Toshiba Corp | 半導体集積回路 |
US4656493A (en) * | 1982-05-10 | 1987-04-07 | General Electric Company | Bidirectional, high-speed power MOSFET devices with deep level recombination centers in base region |
FR2526587B1 (fr) * | 1982-05-10 | 1987-02-27 | Gen Electric | Dispositif a transistor a effet de champ a metal oxyde-silicium de puissance, bidirectionnel |
DE3605516A1 (de) * | 1985-02-21 | 1986-09-04 | Canon K.K., Tokio/Tokyo | Optisches funktionselement sowie optische funktionsvorrichtung |
US5250445A (en) * | 1988-12-20 | 1993-10-05 | Texas Instruments Incorporated | Discretionary gettering of semiconductor circuits |
JPH0526226A (ja) * | 1991-07-23 | 1993-02-02 | Nissan Motor Co Ltd | 軸方向移動型ピロボールブツシユ |
JPH05275692A (ja) * | 1992-03-25 | 1993-10-22 | Sony Corp | 半導体装置およびその製造方法 |
JP3541958B2 (ja) * | 1993-12-16 | 2004-07-14 | 株式会社東芝 | 不揮発性半導体記憶装置 |
US6455903B1 (en) * | 2000-01-26 | 2002-09-24 | Advanced Micro Devices, Inc. | Dual threshold voltage MOSFET by local confinement of channel depletion layer using inert ion implantation |
DE10261307B4 (de) * | 2002-12-27 | 2010-11-11 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zur Herstellung einer Spannungsoberflächenschicht in einem Halbleiterelement |
US20080180160A1 (en) * | 2007-01-31 | 2008-07-31 | Infineon Technologies Ag | High voltage dual gate cmos switching device and method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3341754A (en) * | 1966-01-20 | 1967-09-12 | Ion Physics Corp | Semiconductor resistor containing interstitial and substitutional ions formed by an ion implantation method |
US3540925A (en) * | 1967-08-02 | 1970-11-17 | Rca Corp | Ion bombardment of insulated gate semiconductor devices |
US3515956A (en) * | 1967-10-16 | 1970-06-02 | Ion Physics Corp | High-voltage semiconductor device having a guard ring containing substitutionally active ions in interstitial positions |
GB1261723A (en) * | 1968-03-11 | 1972-01-26 | Associated Semiconductor Mft | Improvements in and relating to semiconductor devices |
JPS5211199B1 (fr) * | 1970-05-27 | 1977-03-29 | ||
JPS4831036A (fr) * | 1971-08-26 | 1973-04-24 |
-
1971
- 1971-07-27 GB GB3512271A patent/GB1345818A/en not_active Expired
- 1971-12-04 NL NL7116693.A patent/NL161922C/xx active
- 1971-12-06 BE BE776319A patent/BE776319A/fr unknown
- 1971-12-06 IT IT71005/71A patent/IT943189B/it active
- 1971-12-06 SE SE7115630A patent/SE377862B/xx unknown
- 1971-12-06 CA CA129348A patent/CA933671A/en not_active Expired
- 1971-12-06 CH CH1773771A patent/CH544410A/de not_active IP Right Cessation
- 1971-12-06 DE DE2160462A patent/DE2160462C2/de not_active Expired
- 1971-12-09 JP JP46099145A patent/JPS5121750B1/ja active Pending
- 1971-12-09 FR FR7144223A patent/FR2147016B1/fr not_active Expired
- 1971-12-13 US US05/207,138 patent/US3969744A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
FR2147016A1 (fr) | 1973-03-09 |
CH544410A (de) | 1973-11-15 |
US3969744A (en) | 1976-07-13 |
NL161922B (nl) | 1979-10-15 |
DE2160462C2 (de) | 1982-05-13 |
IT943189B (it) | 1973-04-02 |
NL161922C (nl) | 1980-03-17 |
JPS5121750B1 (fr) | 1976-07-05 |
SE377862B (fr) | 1975-07-28 |
FR2147016B1 (fr) | 1976-06-04 |
AU3637771A (en) | 1973-06-07 |
DE2160462A1 (de) | 1973-02-08 |
NL7116693A (fr) | 1973-01-30 |
GB1345818A (en) | 1974-02-06 |
CA933671A (en) | 1973-09-11 |
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