BE729010A - - Google Patents

Info

Publication number
BE729010A
BE729010A BE729010DA BE729010A BE 729010 A BE729010 A BE 729010A BE 729010D A BE729010D A BE 729010DA BE 729010 A BE729010 A BE 729010A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE729010A publication Critical patent/BE729010A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Insulated Conductors (AREA)
BE729010D 1968-02-28 1969-02-27 BE729010A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70905568A 1968-02-28 1968-02-28

Publications (1)

Publication Number Publication Date
BE729010A true BE729010A (xx) 1969-08-27

Family

ID=24848302

Family Applications (1)

Application Number Title Priority Date Filing Date
BE729010D BE729010A (xx) 1968-02-28 1969-02-27

Country Status (4)

Country Link
US (1) US3506556A (xx)
BE (1) BE729010A (xx)
DE (1) DE1909910A1 (xx)
FR (1) FR2002744A1 (xx)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3655545A (en) * 1968-02-28 1972-04-11 Ppg Industries Inc Post heating of sputtered metal oxide films
US3664895A (en) * 1969-06-13 1972-05-23 Gen Electric Method of forming a camera tube diode array target by masking and diffusion
GB1295914A (xx) * 1970-01-16 1972-11-08
GB1336559A (en) * 1970-05-20 1973-11-07 Triplex Safety Glass Co Metal oxide coatings
US3907660A (en) * 1970-07-31 1975-09-23 Ppg Industries Inc Apparatus for coating glass
US3899241A (en) * 1973-12-11 1975-08-12 Ppg Industries Inc Visual display windshield
US3916041A (en) * 1974-02-14 1975-10-28 Westinghouse Electric Corp Method of depositing titanium dioxide films by chemical vapor deposition
JPS5170492A (en) * 1974-12-16 1976-06-18 Kogyo Gijutsuin Teiteikono sankainjiumudodenmakuno seizoho
DE2551832C2 (de) * 1975-11-19 1983-02-03 Dornier System Gmbh, 7990 Friedrichshafen Verfahren zur Herstellung einer selektiv absorbierenden Oberfläche für Solarkollektoren und Vorrichtung zur Durchführung des Verfahrens
DE2724498C2 (de) * 1977-05-31 1982-06-03 Siemens AG, 1000 Berlin und 8000 München Elektrischer Schichtwiderstand und Verfahren zu seiner Herstellung
DE2845401C2 (de) * 1978-10-18 1980-10-02 Gao Gesellschaft Fuer Automation Und Organisation Mbh, 8000 Muenchen Bedrucktes Wertpapier mit Echtheitsmerkmalen und Verfahren zur Prüfung seineT Echtheit
DE2930373A1 (de) * 1979-07-26 1981-02-19 Siemens Ag Verfahren zum herstellen transparenter, elektrisch leitender indiumoxid (in tief 2 o tief 3 )-schichten
DE3112104A1 (de) * 1981-03-27 1982-10-07 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum herstellen von elektrisch leitfaehigen transparenten oxidschichten
DE3201783A1 (de) * 1982-01-21 1983-09-08 Leybold-Heraeus GmbH, 5000 Köln Verfahren zum herstellen von in der draufsicht und durchsicht weitgehend farbneutralen, einen hohen infrarotanteil der strahlung reflektierenden scheiben durch katodenzerstaeubung von targets sowie durch das verfahren hergestellte glasscheiben
CA1184877A (en) 1982-05-12 1985-04-02 James B. Webb Method and apparatus for depositing conducting oxide on a substrate
US4421622A (en) * 1982-09-20 1983-12-20 Advanced Coating Technology, Inc. Method of making sputtered coatings
US4650557A (en) * 1982-11-03 1987-03-17 Donnelly Corporation Process for making a conductively coated glass member and the product thereof
US4490227A (en) * 1982-11-03 1984-12-25 Donnelly Mirrors, Inc. Process for making a curved, conductively coated glass member and the product thereof
US4592933A (en) * 1984-06-29 1986-06-03 International Business Machines Corporation High efficiency homogeneous chemical vapor deposition
GB2171118A (en) * 1985-02-14 1986-08-20 Pilkington Brothers Plc Metal oxide protective coating for silicon-coated glass
JPH0817159B2 (ja) * 1985-08-15 1996-02-21 キヤノン株式会社 堆積膜の形成方法
US4837048A (en) * 1985-10-24 1989-06-06 Canon Kabushiki Kaisha Method for forming a deposited film
JPH0645885B2 (ja) * 1985-12-16 1994-06-15 キヤノン株式会社 堆積膜形成法
JPH0645888B2 (ja) * 1985-12-17 1994-06-15 キヤノン株式会社 堆積膜形成法
JPH0645890B2 (ja) * 1985-12-18 1994-06-15 キヤノン株式会社 堆積膜形成法
JPS62142778A (ja) * 1985-12-18 1987-06-26 Canon Inc 堆積膜形成法
US5160543A (en) * 1985-12-20 1992-11-03 Canon Kabushiki Kaisha Device for forming a deposited film
US4655811A (en) * 1985-12-23 1987-04-07 Donnelly Corporation Conductive coating treatment of glass sheet bending process
JPH0746729B2 (ja) * 1985-12-26 1995-05-17 キヤノン株式会社 薄膜トランジスタの製造方法
US4834023A (en) * 1986-12-19 1989-05-30 Canon Kabushiki Kaisha Apparatus for forming deposited film
JPS63184210A (ja) * 1987-01-27 1988-07-29 日本板硝子株式会社 透明導電体の製造方法
US4931158A (en) * 1988-03-22 1990-06-05 The Regents Of The Univ. Of Calif. Deposition of films onto large area substrates using modified reactive magnetron sputtering
US5601652A (en) * 1989-08-03 1997-02-11 United Technologies Corporation Apparatus for applying ceramic coatings
US5087477A (en) * 1990-02-05 1992-02-11 United Technologies Corporation Eb-pvd method for applying ceramic coatings
US5135581A (en) * 1991-04-08 1992-08-04 Minnesota Mining And Manufacturing Company Light transmissive electrically conductive oxide electrode formed in the presence of a stabilizing gas
DE4131181C1 (xx) * 1991-09-19 1993-01-07 Leybold Ag, 6450 Hanau, De
US5397920A (en) * 1994-03-24 1995-03-14 Minnesota Mining And Manufacturing Company Light transmissive, electrically-conductive, oxide film and methods of production
BR0017605B1 (pt) * 1999-03-12 2013-01-22 composiÇço inseticida sinÉrgica, processo para controle de insetos e processo para proteger plantas contra infestaÇço e ataque de insetos.
US6783719B2 (en) 2001-01-19 2004-08-31 Korry Electronics, Co. Mold with metal oxide surface compatible with ionic release agents
US6852266B2 (en) * 2001-01-19 2005-02-08 Korry Electronics Co. Ultrasonic assisted deposition of anti-stick films on metal oxides
DE112009000156T5 (de) * 2008-01-24 2011-06-22 ULVAC, Inc., Kanagawa Verfahren zur Herstellung einer Flüssigkristallanzeigevorrichtung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA565153A (en) * 1958-10-28 A. Veszi Gabor Production of thin layers by cathode sputtering
US2189580A (en) * 1937-05-29 1940-02-06 Gen Electric Method of making a photoelectric cell
US2825687A (en) * 1952-04-04 1958-03-04 Nat Res Dev Transparent conducting films
US3121852A (en) * 1960-04-18 1964-02-18 Gen Motors Corp Ohmic contacts on semiconductors
US3388053A (en) * 1965-06-03 1968-06-11 Bell Telephone Labor Inc Method of preparing a film resistor by sputtering a ternary alloy of tin, antimony and indium in the presence of oxygen
US3418229A (en) * 1965-06-30 1968-12-24 Weston Instruments Inc Method of forming films of compounds having at least two anions by cathode sputtering
US3419761A (en) * 1965-10-11 1968-12-31 Ibm Method for depositing silicon nitride insulating films and electric devices incorporating such films
US3400066A (en) * 1965-11-15 1968-09-03 Ibm Sputtering processes for depositing thin films of controlled thickness

Also Published As

Publication number Publication date
US3506556A (en) 1970-04-14
FR2002744A1 (xx) 1969-10-31
DE1909910A1 (de) 1969-09-25

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