BE718055A - - Google Patents

Info

Publication number
BE718055A
BE718055A BE718055DA BE718055A BE 718055 A BE718055 A BE 718055A BE 718055D A BE718055D A BE 718055DA BE 718055 A BE718055 A BE 718055A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE718055A publication Critical patent/BE718055A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
BE718055D 1967-02-18 1968-07-12 BE718055A (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB37135/66A GB1235281A (en) 1967-02-18 1967-02-18 Improvements in or relating to lithographic printing plates
BE718055 1968-07-12
NL6810074A NL6810074A (de) 1967-02-18 1968-07-17
FR160290 1968-07-23
DE1772947A DE1772947C2 (de) 1967-02-18 1968-07-25 Vorsensibilisierte Flachdruckplatte

Publications (1)

Publication Number Publication Date
BE718055A true BE718055A (de) 1969-01-13

Family

ID=27507697

Family Applications (1)

Application Number Title Priority Date Filing Date
BE718055D BE718055A (de) 1967-02-18 1968-07-12

Country Status (5)

Country Link
BE (1) BE718055A (de)
DE (1) DE1772947C2 (de)
FR (1) FR1574534A (de)
GB (1) GB1235281A (de)
NL (1) NL6810074A (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2551372A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer lichtempfindlichen masse
DE2652304C2 (de) * 1976-11-17 1987-04-23 Hoechst Ag, 6230 Frankfurt Negativ arbeitendes lichtempfindliches Gemisch und damit hergestellte lichtempfindliche Flachdruckplatte
FR2382709A1 (fr) 1977-03-04 1978-09-29 Thomson Csf Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique
JPS5964396A (ja) * 1982-10-05 1984-04-12 Fuji Photo Film Co Ltd 平版印刷版用版面保護剤
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
JPH01128064A (ja) * 1987-11-12 1989-05-19 Chisso Corp 光硬化性樹脂組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US20090081592A1 (en) 2007-09-26 2009-03-26 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
EP2042339B1 (de) 2007-09-26 2013-05-22 FUJIFILM Corporation Feuchtwasserzusammensetzung für Lithographiedruck und Offset-Druckverfahren für wärmehärtende Tinte
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009234247A (ja) 2008-03-07 2009-10-15 Fujifilm Corp 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5288268B2 (ja) 2009-03-25 2013-09-11 富士フイルム株式会社 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5281130B2 (ja) 2011-07-05 2013-09-04 富士フイルム株式会社 平版印刷用湿し水組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL70798C (de) * 1948-10-15
BE563723A (de) * 1957-01-04

Also Published As

Publication number Publication date
DE1772947C2 (de) 1982-03-25
GB1235281A (en) 1971-06-09
NL6810074A (de) 1970-01-20
DE1772947A1 (de) 1971-07-08
FR1574534A (de) 1969-07-11

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: W.H. HOWSON LTD

Effective date: 19840712