BE673939A - - Google Patents

Info

Publication number
BE673939A
BE673939A BE673939A BE673939A BE673939A BE 673939 A BE673939 A BE 673939A BE 673939 A BE673939 A BE 673939A BE 673939 A BE673939 A BE 673939A BE 673939 A BE673939 A BE 673939A
Authority
BE
Belgium
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
BE673939A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE673939A publication Critical patent/BE673939A/xx
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354Introduction of auxiliary energy into the plasma
    • C23C14/355Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Closures For Containers (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
BE673939A 1965-12-17 1965-12-17 Expired BE673939A (US06252093-20010626-C00008.png)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
BE21744 1965-12-17
CH1750265A CH456294A (de) 1965-12-17 1965-12-18 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
DE19742459030 DE2459030B2 (de) 1965-12-17 1974-12-13 Sicherheitsverschluss fuer behaelter

Publications (1)

Publication Number Publication Date
BE673939A true BE673939A (US06252093-20010626-C00008.png) 1966-06-17

Family

ID=27158372

Family Applications (2)

Application Number Title Priority Date Filing Date
BE673939A Expired BE673939A (US06252093-20010626-C00008.png) 1965-12-17 1965-12-17
BE691083D BE691083A (US06252093-20010626-C00008.png) 1965-12-17 1966-12-12

Family Applications After (1)

Application Number Title Priority Date Filing Date
BE691083D BE691083A (US06252093-20010626-C00008.png) 1965-12-17 1966-12-12

Country Status (17)

Country Link
US (3) US3540993A (US06252093-20010626-C00008.png)
JP (1) JPS5184381A (US06252093-20010626-C00008.png)
AR (1) AR207605A1 (US06252093-20010626-C00008.png)
BE (2) BE673939A (US06252093-20010626-C00008.png)
CH (3) CH456294A (US06252093-20010626-C00008.png)
DD (1) DD122355A5 (US06252093-20010626-C00008.png)
DE (3) DE1515296A1 (US06252093-20010626-C00008.png)
DK (2) DK129950B (US06252093-20010626-C00008.png)
ES (1) ES330812A1 (US06252093-20010626-C00008.png)
FR (3) FR1505170A (US06252093-20010626-C00008.png)
GB (3) GB1162832A (US06252093-20010626-C00008.png)
IT (1) IT1051344B (US06252093-20010626-C00008.png)
LU (1) LU51389A1 (US06252093-20010626-C00008.png)
NL (3) NL6600953A (US06252093-20010626-C00008.png)
NO (1) NO116568B (US06252093-20010626-C00008.png)
SE (3) SE320247B (US06252093-20010626-C00008.png)
SU (1) SU569277A3 (US06252093-20010626-C00008.png)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1765850A1 (de) * 1967-11-10 1971-10-28 Euratom Verfahren und Vorrichtung zum Aufbringen von duennen Schichten
US3669871A (en) * 1969-09-10 1972-06-13 Ibm Sputtering apparatus having a concave source cathode
BE766345A (fr) * 1971-04-27 1971-09-16 Universitaire De L Etat A Mons Dispositif pour fabriquer des couches minces de substances minerales.
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere
CH551497A (de) * 1971-10-06 1974-07-15 Balzers Patent Beteilig Ag Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung.
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
DE2735525A1 (de) * 1977-08-06 1979-02-22 Leybold Heraeus Gmbh & Co Kg Katodenanordnung mit target fuer zerstaeubungsanlagen zum aufstaeuben dielektrischer oder amagnetischer schichten auf substrate
JPS57174467A (en) * 1981-04-20 1982-10-27 Inoue Japax Res Inc Ion working device
DE3206421A1 (de) * 1982-02-23 1983-09-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase
GB2138410B (en) * 1983-04-22 1986-07-16 Metal Closures Group Plc Safety closure with click mechanism
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4559125A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Apparatus for evaporation arc stabilization during the initial clean-up of an arc target
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate
US4489834A (en) * 1984-07-02 1984-12-25 Thackrey James D Counting cap for medicine bottles
IT1181798B (it) * 1984-12-13 1987-09-30 Taplast Di Evans Santagiuliana Tappo per bottiglie con sigillo e apertura di sicurezza realizzato preferibilmente in materia plastica
DE3503398A1 (de) * 1985-02-01 1986-08-07 W.C. Heraeus Gmbh, 6450 Hanau Sputteranlage zum reaktiven beschichten eines substrates mit hartstoffen
US5020681A (en) * 1990-02-01 1991-06-04 Owens-Illinois Closure Inc. Child resistant closure
AU662349B2 (en) * 1991-07-30 1995-08-31 Warner-Lambert Company Tamper-evident cap for a container
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
JPH07257425A (ja) * 1994-03-18 1995-10-09 Honda Motor Co Ltd 自動車用車体のサブフレーム取付け構造
DE19625577A1 (de) * 1996-06-27 1998-01-02 Vaw Motor Gmbh Aluminium-Gußteil und Verfahren zu seiner Herstellung
US5917285A (en) * 1996-07-24 1999-06-29 Georgia Tech Research Corporation Apparatus and method for reducing operating voltage in gas discharge devices
US6217715B1 (en) * 1997-02-06 2001-04-17 Applied Materials, Inc. Coating of vacuum chambers to reduce pump down time and base pressure
IT1291620B1 (it) * 1997-04-18 1999-01-11 Phaba Srl Chiusura antibambino per flaconi in genere ad azionamento facilitato e a sicurezza incrementata
US6382444B1 (en) * 1999-03-17 2002-05-07 Sentinel Packaging Systems, Inc. Tamper-evident plastic closure system with snap-on band
US6551471B1 (en) 1999-11-30 2003-04-22 Canon Kabushiki Kaisha Ionization film-forming method and apparatus
FR2814724B1 (fr) * 2000-10-04 2003-04-04 Airsec Sa Dispositif de fermeture de securite a l'epreuve d'enfants par vissage d'un conteneur muni d'une embouchure a filet de vis
US7141145B2 (en) * 2003-10-02 2006-11-28 Seagate Technology Llc Gas injection for uniform composition reactively sputter-deposited thin films
US20050145086A1 (en) * 2004-01-05 2005-07-07 Mohr Monte D. Combination pencil sharpener bottle cap
IT1394229B1 (it) * 2009-04-16 2012-06-01 Tapi S R L Tappo a vite per contenitori per liquidi
WO2017220729A1 (en) * 2016-06-22 2017-12-28 Clariant Healthcare Packaging (France) Sas Tamper-evident closure, container with such closure and its use

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2069835A (en) * 1935-04-25 1937-02-09 Bell Telephone Labor Inc Coating apparatus
BE417869A (US06252093-20010626-C00008.png) * 1935-10-12
NL50072C (US06252093-20010626-C00008.png) * 1935-12-28
DE672664C (de) * 1936-06-17 1939-03-08 Bernhard Berghaus Verfahren zur Kathodenzerstaeubung mittels zusaetzlich geheizter Kathode
US2920002A (en) * 1952-06-25 1960-01-05 Auwarter Max Process for the manufacture of thin films
US3021271A (en) * 1959-04-27 1962-02-13 Gen Mills Inc Growth of solid layers on substrates which are kept under ion bombardment before and during deposition
US3250694A (en) * 1962-10-17 1966-05-10 Ibm Apparatus for coating articles by cathode sputtering
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3386909A (en) * 1964-12-08 1968-06-04 Air Force Usa Apparatus for depositing material on a filament from ionized coating material
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3287243A (en) * 1965-03-29 1966-11-22 Bell Telephone Labor Inc Deposition of insulating films by cathode sputtering in an rf-supported discharge
US3394829A (en) * 1967-04-10 1968-07-30 Harris M. Peterson Safety cap
US3857505A (en) * 1973-10-01 1974-12-31 Owens Illinois Inc Safety closure

Also Published As

Publication number Publication date
FR2294100B1 (US06252093-20010626-C00008.png) 1982-03-19
DK129950C (US06252093-20010626-C00008.png) 1975-05-20
NL6610803A (US06252093-20010626-C00008.png) 1967-06-19
NL130959C (US06252093-20010626-C00008.png)
US3540993A (en) 1970-11-17
DE1515294B2 (de) 1972-06-08
FR1505170A (fr) 1967-12-08
DE1515294A1 (de) 1969-08-14
IT1051344B (it) 1981-04-21
FR2294100A1 (fr) 1976-07-09
DK136767C (da) 1978-05-08
DE2459030B2 (de) 1976-11-11
LU51389A1 (US06252093-20010626-C00008.png) 1966-08-22
SE324684B (US06252093-20010626-C00008.png) 1970-06-08
GB1505170A (en) 1978-03-30
DK136767B (da) 1977-11-21
AR207605A1 (es) 1976-10-15
FR1502647A (US06252093-20010626-C00008.png) 1968-02-07
DK129950B (da) 1974-12-02
GB1162832A (en) 1969-08-27
DE2459030A1 (de) 1976-06-24
US3972436A (en) 1976-08-03
SU569277A3 (ru) 1977-08-15
SE7513992L (sv) 1976-06-14
CH456294A (de) 1968-05-15
DK565675A (da) 1976-06-14
JPS5184381A (US06252093-20010626-C00008.png) 1976-07-23
NO116568B (US06252093-20010626-C00008.png) 1969-04-14
GB1113579A (en) 1968-05-15
NL6600953A (US06252093-20010626-C00008.png) 1967-06-19
SE320247B (US06252093-20010626-C00008.png) 1970-02-02
DD122355A5 (US06252093-20010626-C00008.png) 1976-10-05
US3516919A (en) 1970-06-23
BE691083A (US06252093-20010626-C00008.png) 1967-05-16
SE423520B (sv) 1982-05-10
CH593836A5 (US06252093-20010626-C00008.png) 1977-12-15
DE1515296A1 (de) 1969-08-14
NL149234B (nl) 1976-04-15
ES330812A1 (es) 1969-08-16
CH478255A (fr) 1969-09-15
DE1515294C3 (de) 1973-01-04

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