BE623060A - - Google Patents

Info

Publication number
BE623060A
BE623060A BE623060DA BE623060A BE 623060 A BE623060 A BE 623060A BE 623060D A BE623060D A BE 623060DA BE 623060 A BE623060 A BE 623060A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE623060A publication Critical patent/BE623060A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006Thin film resistors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49082Resistor making
    • Y10T29/49099Coating resistive material on a base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
BE623060D 1961-10-03 1962-10-01 BE623060A (US06171609-20010109-C00001.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US142702A US3242006A (en) 1961-10-03 1961-10-03 Tantalum nitride film resistor

Publications (1)

Publication Number Publication Date
BE623060A true BE623060A (US06171609-20010109-C00001.png) 1962-10-31

Family

ID=22500933

Family Applications (2)

Application Number Title Priority Date Filing Date
BE634012D BE634012A (US06171609-20010109-C00001.png) 1961-10-03
BE623060D BE623060A (US06171609-20010109-C00001.png) 1961-10-03 1962-10-01

Family Applications Before (1)

Application Number Title Priority Date Filing Date
BE634012D BE634012A (US06171609-20010109-C00001.png) 1961-10-03

Country Status (7)

Country Link
US (1) US3242006A (US06171609-20010109-C00001.png)
BE (2) BE623060A (US06171609-20010109-C00001.png)
DE (1) DE1490927C3 (US06171609-20010109-C00001.png)
FR (1) FR1334290A (US06171609-20010109-C00001.png)
GB (1) GB1015143A (US06171609-20010109-C00001.png)
NL (2) NL124711C (US06171609-20010109-C00001.png)
SE (1) SE308151B (US06171609-20010109-C00001.png)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3369991A (en) * 1965-01-28 1968-02-20 Ibm Apparatus for cathode sputtering including a shielded rf electrode
US3413711A (en) * 1966-09-07 1968-12-03 Western Electric Co Method of making palladium copper contact for soldering
US3537891A (en) * 1967-09-25 1970-11-03 Gen Electric Resistor films of transition metal nitrides and method of forming
US3516914A (en) * 1968-02-26 1970-06-23 United Aircraft Corp Aluminum masking of active components during tantalum/nitride sputtering
US3639165A (en) * 1968-06-20 1972-02-01 Gen Electric Resistor thin films formed by low-pressure deposition of molybdenum and tungsten
US3607384A (en) * 1968-07-11 1971-09-21 Western Electric Co Thin-film resistors having positive resistivity profiles
US3574143A (en) * 1969-02-19 1971-04-06 Bell Telephone Labor Inc Resistive composition of matter and device utilizing same
US3664943A (en) * 1969-06-25 1972-05-23 Oki Electric Ind Co Ltd Method of producing tantalum nitride film resistors
US3622410A (en) * 1969-12-18 1971-11-23 Control Data Corp Method of fabricating film resistors
US3655544A (en) * 1970-03-02 1972-04-11 Gen Electric Refractory metal/refractory metal nitride resistor films
US3664931A (en) * 1970-07-27 1972-05-23 Dieter Gerstenberg Method for fabrication of thin film capacitor
FR2112667A5 (US06171609-20010109-C00001.png) * 1970-11-05 1972-06-23 Lignes Telegraph Telephon
BE793097A (fr) * 1971-12-30 1973-04-16 Western Electric Co Procede pour ajuster le coefficient de resistance en fonction de la temperature d'alliages tantale-aluminium
US3847658A (en) * 1972-01-14 1974-11-12 Western Electric Co Article of manufacture having a film comprising nitrogen-doped beta tantalum
BE791139A (fr) * 1972-01-14 1973-03-01 Western Electric Co Procede pour le depot de beta-tantale dope par l'azote
US3775278A (en) * 1972-03-22 1973-11-27 Bell Telephone Labor Inc Technique for the fabrication of thin film resistors
US3912612A (en) * 1972-07-14 1975-10-14 Westinghouse Electric Corp Method for making thin film superconductors
US3916075A (en) * 1972-07-22 1975-10-28 Philips Corp Chemically highly resistant material
US4325048A (en) * 1980-02-29 1982-04-13 Gould Inc. Deformable flexure element for strain gage transducer and method of manufacture
DE3113745A1 (de) * 1981-04-04 1982-10-21 Robert Bosch Gmbh, 7000 Stuttgart Duennschicht-dehnungsmessstreifen und verfahren zu seiner herstellung
JPS61255001A (ja) * 1985-05-07 1986-11-12 富士ゼロックス株式会社 サ−マルヘツド
US5201923A (en) * 1990-07-27 1993-04-13 Toshiba Tungaloy Co., Ltd. Stoichiometric b1-type tantalum nitride and a sintered body thereof and method of synthesizing the b1-type tantalum nitride
JPH0819516B2 (ja) * 1990-10-26 1996-02-28 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 薄膜状のアルファTaを形成するための方法および構造
US5221449A (en) * 1990-10-26 1993-06-22 International Business Machines Corporation Method of making Alpha-Ta thin films
FR2679651B1 (fr) * 1991-07-26 1993-11-12 Schlumberger Services Petroliers Couche mince extensometrique en cermet a base de tantale et de nitrate de tantale, son procede de preparation et son utilisation dans un capteur de pression.
DE69415408T2 (de) 1993-06-28 1999-06-10 Canon K.K., Tokio/Tokyo Wärmeerzeugender, TaNO.8 enthaltender Widerstand, Substrat mit diesem wärmeerzeugenden Widerstand für Flüssigkeitsstrahlkopf, Flüssigkeitsstrahlkopf mit diesem Substrat, und Gerät für einen Flüssigkeitsstrahl mit diesem Flüssigkeitsstrahlkopf
JPH09120713A (ja) * 1995-10-25 1997-05-06 Murata Mfg Co Ltd 抵抗材料組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US420881A (en) * 1890-02-04 Rudolf langhans
US896341A (en) * 1904-11-14 1908-08-18 Gen Electric Filament for incandescent lamps.
US1123585A (en) * 1913-05-31 1915-01-05 Int Agricultural Corp Double-nitrid composition of matter.
AT86825B (de) * 1920-06-14 1921-12-27 Hugo Janistyn Verfahren zur Herstellung von Glühkörpern für Beleuchtungs- und Durchleuchtungszwecke.
US2003592A (en) * 1933-01-03 1935-06-04 Globar Corp Glaze for nonmetallic resistors
DE1069448B (de) * 1953-11-16 1959-11-19 MetallgeseMschaft Aktiengesellschaft, Frankfurt/M Zahnräder
GB830391A (en) * 1955-10-28 1960-03-16 Edwards High Vacuum Ltd Improvements in or relating to cathodic sputtering of metal and dielectric films
US2917442A (en) * 1955-12-30 1959-12-15 Electronique & Automatisme Sa Method of making electroluminescent layers
US3063858A (en) * 1959-07-22 1962-11-13 Nat Res Corp Vapor source and processes for vaporizing iron, nickel and copper

Also Published As

Publication number Publication date
NL124711C (US06171609-20010109-C00001.png)
FR1334290A (fr) 1963-08-02
DE1490927C3 (de) 1973-10-31
GB1015143A (en) 1965-12-31
DE1490927A1 (de) 1969-11-13
SE308151B (US06171609-20010109-C00001.png) 1969-02-03
US3242006A (en) 1966-03-22
DE1490927B2 (de) 1973-04-12
NL283435A (US06171609-20010109-C00001.png)
BE634012A (US06171609-20010109-C00001.png)

Similar Documents

Publication Publication Date Title
BE614497A (US06171609-20010109-C00001.png)
BE601393A (US06171609-20010109-C00001.png)
BE396226A (US06171609-20010109-C00001.png)
BE458606A (US06171609-20010109-C00001.png)
BE464928A (US06171609-20010109-C00001.png)
BE469342A (US06171609-20010109-C00001.png)
BE472265A (US06171609-20010109-C00001.png)
BE475425A (US06171609-20010109-C00001.png)
BE475477A (US06171609-20010109-C00001.png)
BE476407A (US06171609-20010109-C00001.png)
BE478349A (US06171609-20010109-C00001.png)
BE482264A (US06171609-20010109-C00001.png)
BE493336A (US06171609-20010109-C00001.png)
BE567723A (US06171609-20010109-C00001.png)
BE568568A (US06171609-20010109-C00001.png)
BE583834A (US06171609-20010109-C00001.png)
BE587184A (US06171609-20010109-C00001.png)
BE596839A (US06171609-20010109-C00001.png)
BE597352A (US06171609-20010109-C00001.png)
BE597570A (US06171609-20010109-C00001.png)
BE598861A (US06171609-20010109-C00001.png)
BE599016A (US06171609-20010109-C00001.png)
BE599210A (US06171609-20010109-C00001.png)
BE599528A (US06171609-20010109-C00001.png)
BE599922A (US06171609-20010109-C00001.png)